JP2004086930A - 磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 - Google Patents
磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 Download PDFInfo
- Publication number
- JP2004086930A JP2004086930A JP2002210363A JP2002210363A JP2004086930A JP 2004086930 A JP2004086930 A JP 2004086930A JP 2002210363 A JP2002210363 A JP 2002210363A JP 2002210363 A JP2002210363 A JP 2002210363A JP 2004086930 A JP2004086930 A JP 2004086930A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- magnetic
- magnetic disk
- manufacturing
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 203
- 239000000758 substrate Substances 0.000 title claims abstract description 203
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 62
- 238000004140 cleaning Methods 0.000 claims abstract description 129
- 238000000034 method Methods 0.000 claims abstract description 53
- 238000012545 processing Methods 0.000 claims abstract description 27
- 239000007788 liquid Substances 0.000 claims description 61
- 239000005354 aluminosilicate glass Substances 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 10
- 230000005415 magnetization Effects 0.000 claims description 10
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 9
- 229910052593 corundum Inorganic materials 0.000 claims description 9
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 229910052681 coesite Inorganic materials 0.000 claims description 8
- 229910052906 cristobalite Inorganic materials 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- 229910052682 stishovite Inorganic materials 0.000 claims description 8
- 229910052905 tridymite Inorganic materials 0.000 claims description 8
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims description 6
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 68
- 239000000243 solution Substances 0.000 description 38
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 36
- 238000005498 polishing Methods 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 230000003746 surface roughness Effects 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 18
- 229910045601 alloy Inorganic materials 0.000 description 14
- 239000000956 alloy Substances 0.000 description 14
- 238000003426 chemical strengthening reaction Methods 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 238000005406 washing Methods 0.000 description 12
- 238000002386 leaching Methods 0.000 description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 10
- 239000010408 film Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 239000006061 abrasive grain Substances 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- -1 hydrogen ions Chemical class 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 229910021642 ultra pure water Inorganic materials 0.000 description 5
- 239000012498 ultrapure water Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000003599 detergent Substances 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000011086 high cleaning Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- 229910018979 CoPt Inorganic materials 0.000 description 2
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 240000004050 Pentaglottis sempervirens Species 0.000 description 2
- 235000004522 Pentaglottis sempervirens Nutrition 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 239000005345 chemically strengthened glass Substances 0.000 description 2
- 239000010952 cobalt-chrome Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 241000511976 Hoya Species 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Images
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002210363A JP2004086930A (ja) | 2002-07-03 | 2002-07-19 | 磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002195069 | 2002-07-03 | ||
| JP2002210363A JP2004086930A (ja) | 2002-07-03 | 2002-07-19 | 磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004086930A true JP2004086930A (ja) | 2004-03-18 |
| JP2004086930A5 JP2004086930A5 (https=) | 2005-10-27 |
Family
ID=32071960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002210363A Pending JP2004086930A (ja) | 2002-07-03 | 2002-07-19 | 磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004086930A (https=) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006022145A1 (en) * | 2004-08-27 | 2006-03-02 | Showa Denko K.K. | Process for manufacturing glass substrate for magnetic recording medium and glass substrate for magnetic recording medium obtained by the process |
| WO2006022146A1 (en) * | 2004-08-27 | 2006-03-02 | Showa Denko K.K. | Process for manufacturing glass substrate for magnetic recording medium, glass substrate for magnetic recording medium obtained by the process, and magnetic recording medium obtained using the substrate |
| WO2007119775A1 (ja) * | 2006-04-14 | 2007-10-25 | Showa Denko K.K. | ガラス基板の加工方法及びガラス基板加工用リンス剤組成物 |
| JP2009205767A (ja) * | 2008-02-28 | 2009-09-10 | Hoya Corp | 磁気ディスクの製造方法 |
| JP2012183977A (ja) * | 2011-03-08 | 2012-09-27 | U S:Kk | 車両洗浄システム |
| JP2015188818A (ja) * | 2014-03-28 | 2015-11-02 | ＡｖａｎＳｔｒａｔｅ株式会社 | ガラス基板の製造方法 |
-
2002
- 2002-07-19 JP JP2002210363A patent/JP2004086930A/ja active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006022145A1 (en) * | 2004-08-27 | 2006-03-02 | Showa Denko K.K. | Process for manufacturing glass substrate for magnetic recording medium and glass substrate for magnetic recording medium obtained by the process |
| WO2006022146A1 (en) * | 2004-08-27 | 2006-03-02 | Showa Denko K.K. | Process for manufacturing glass substrate for magnetic recording medium, glass substrate for magnetic recording medium obtained by the process, and magnetic recording medium obtained using the substrate |
| JP2006089363A (ja) * | 2004-08-27 | 2006-04-06 | Showa Denko Kk | 磁気記録媒体用ガラス基板の製造方法、それにより得られる磁気記録媒体用ガラス基板およびこの基板を用いて得られる磁気記録媒体 |
| US7700205B2 (en) | 2004-08-27 | 2010-04-20 | Showa Denko K.K. | Process for manufacturing glass substrate for magnetic recording medium, glass substrate for magnetic recording medium obtained by the process, and magnetic recording medium obtained using the substrate |
| WO2007119775A1 (ja) * | 2006-04-14 | 2007-10-25 | Showa Denko K.K. | ガラス基板の加工方法及びガラス基板加工用リンス剤組成物 |
| JP2009205767A (ja) * | 2008-02-28 | 2009-09-10 | Hoya Corp | 磁気ディスクの製造方法 |
| JP2012183977A (ja) * | 2011-03-08 | 2012-09-27 | U S:Kk | 車両洗浄システム |
| JP2015188818A (ja) * | 2014-03-28 | 2015-11-02 | ＡｖａｎＳｔｒａｔｅ株式会社 | ガラス基板の製造方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3512702B2 (ja) | 情報記録媒体用ガラス基板の製造方法、及び情報記録媒体の製造方法 | |
| JP6141636B2 (ja) | 基板の製造方法、磁気ディスク用ガラス基板の製造方法、及び磁気ディスクの製造方法 | |
| JP3801568B2 (ja) | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 | |
| JP4623211B2 (ja) | 情報記録媒体用ガラス基板の製造方法およびそれを用いる磁気ディスク | |
| JP5235118B2 (ja) | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 | |
| JP2004086930A (ja) | 磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 | |
| JP3577486B2 (ja) | 磁気記録媒体及びその製造方法 | |
| JP2003173518A (ja) | 磁気記録媒体用ガラス基板の製造方法、及び磁気記録媒体の製造方法 | |
| CN104054130B (zh) | 玻璃基板、使用该玻璃基板的信息记录介质以及该玻璃基板的制造方法 | |
| JP2004335081A (ja) | 磁気ディスク用ガラス基板の洗浄方法及び磁気ディスク用ガラス基板の製造方法並びに磁気ディスクの製造方法 | |
| JP3025654B2 (ja) | 情報記録媒体用ガラス基板の製造方法、及び情報記録媒体の製造方法 | |
| JP2008090898A (ja) | 情報記録媒体用ガラス基板の製造方法および情報記録媒体の製造方法 | |
| JP3564631B2 (ja) | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体の製造方法、並びに磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法。 | |
| JP5778165B2 (ja) | 情報記録媒体用ガラス基板の製造方法および情報記録媒体の製造方法 | |
| JPH10194785A (ja) | 情報記録媒体用ガラス基板の製造方法、及び情報記録媒体の製造方法 | |
| JP3969717B2 (ja) | 磁気ディスク用ガラス基板及び磁気ディスク | |
| JP3766424B2 (ja) | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 | |
| JP3511002B2 (ja) | 情報記録媒体用ガラス基板の製造方法及び情報記録媒体の製造方法 | |
| JPH10194786A (ja) | 情報記録媒体用ガラス基板の製造方法、及び情報記録媒体の製造方法 | |
| JP4698546B2 (ja) | 磁気ディスク用ガラス基板の製造方法、磁気ディスクの製造方法 | |
| JP6041290B2 (ja) | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 | |
| JP2004290787A (ja) | 磁気ディスク用基板の洗浄方法及び磁気ディスク用基板の製造方法並びに磁気ディスクの製造方法 | |
| JP6021911B2 (ja) | 情報記録媒体用ガラス基板および情報記録媒体用ガラス基板の製造方法 | |
| WO2014045653A1 (ja) | 情報記録媒体用ガラス基板の製造方法 | |
| JP5722618B2 (ja) | 磁気情報記録媒体用ガラス基板の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Effective date: 20050719 Free format text: JAPANESE INTERMEDIATE CODE: A523 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050719 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070402 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070802 |
|
| A02 | Decision of refusal |
Effective date: 20080325 Free format text: JAPANESE INTERMEDIATE CODE: A02 |