JP2004051785A5 - - Google Patents
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- Publication number
- JP2004051785A5 JP2004051785A5 JP2002211343A JP2002211343A JP2004051785A5 JP 2004051785 A5 JP2004051785 A5 JP 2004051785A5 JP 2002211343 A JP2002211343 A JP 2002211343A JP 2002211343 A JP2002211343 A JP 2002211343A JP 2004051785 A5 JP2004051785 A5 JP 2004051785A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- structural unit
- carbon atoms
- represent
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000004432 carbon atom Chemical group C* 0.000 claims 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 6
- 238000000034 method Methods 0.000 claims 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 229930195734 saturated hydrocarbon Natural products 0.000 claims 4
- 125000000524 functional group Chemical group 0.000 claims 3
- 229920000642 polymer Polymers 0.000 claims 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000002950 monocyclic group Chemical group 0.000 claims 2
- 125000003367 polycyclic group Chemical group 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002211343A JP4236423B2 (ja) | 2002-07-19 | 2002-07-19 | 重合体、レジスト組成物、およびパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002211343A JP4236423B2 (ja) | 2002-07-19 | 2002-07-19 | 重合体、レジスト組成物、およびパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004051785A JP2004051785A (ja) | 2004-02-19 |
| JP2004051785A5 true JP2004051785A5 (https=) | 2005-10-27 |
| JP4236423B2 JP4236423B2 (ja) | 2009-03-11 |
Family
ID=31934610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002211343A Expired - Lifetime JP4236423B2 (ja) | 2002-07-19 | 2002-07-19 | 重合体、レジスト組成物、およびパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4236423B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4669745B2 (ja) * | 2004-06-28 | 2011-04-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いたパターン形成方法 |
| TWI375121B (en) * | 2004-06-28 | 2012-10-21 | Fujifilm Corp | Photosensitive composition and method for forming pattern using the same |
| JP5344743B2 (ja) * | 2008-08-04 | 2013-11-20 | 三菱レイヨン株式会社 | レジスト用重合体の製造方法 |
| JP2011024347A (ja) * | 2009-07-15 | 2011-02-03 | Nikon Corp | 電子機器 |
-
2002
- 2002-07-19 JP JP2002211343A patent/JP4236423B2/ja not_active Expired - Lifetime
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