JP2001233917A5 - - Google Patents
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- Publication number
- JP2001233917A5 JP2001233917A5 JP2000375504A JP2000375504A JP2001233917A5 JP 2001233917 A5 JP2001233917 A5 JP 2001233917A5 JP 2000375504 A JP2000375504 A JP 2000375504A JP 2000375504 A JP2000375504 A JP 2000375504A JP 2001233917 A5 JP2001233917 A5 JP 2001233917A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer compound
- resist material
- alkyl group
- compound according
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 2
- 150000007514 bases Chemical class 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 2
- 229910052731 fluorine Inorganic materials 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000375504A JP3981803B2 (ja) | 1999-12-15 | 2000-12-11 | 高分子化合物、レジスト材料及びパターン形成方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35622099 | 1999-12-15 | ||
| JP11-356220 | 1999-12-15 | ||
| JP2000375504A JP3981803B2 (ja) | 1999-12-15 | 2000-12-11 | 高分子化合物、レジスト材料及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001233917A JP2001233917A (ja) | 2001-08-28 |
| JP2001233917A5 true JP2001233917A5 (https=) | 2004-10-28 |
| JP3981803B2 JP3981803B2 (ja) | 2007-09-26 |
Family
ID=26580399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000375504A Expired - Fee Related JP3981803B2 (ja) | 1999-12-15 | 2000-12-11 | 高分子化合物、レジスト材料及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3981803B2 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6673523B2 (en) * | 1999-03-09 | 2004-01-06 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method |
| US6730452B2 (en) * | 2001-01-26 | 2004-05-04 | International Business Machines Corporation | Lithographic photoresist composition and process for its use |
| JP3962893B2 (ja) * | 2001-02-09 | 2007-08-22 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| TW574607B (en) * | 2001-06-25 | 2004-02-01 | Shinetsu Chemical Co | Polymers, resist compositions and patterning process |
| JP4516250B2 (ja) * | 2001-09-13 | 2010-08-04 | パナソニック株式会社 | パターン形成材料及びパターン形成方法 |
| JP3945200B2 (ja) * | 2001-09-27 | 2007-07-18 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
| JP2003140345A (ja) * | 2001-11-02 | 2003-05-14 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| JP2003186197A (ja) * | 2001-12-19 | 2003-07-03 | Sony Corp | レジスト材料及び露光方法 |
| US6866983B2 (en) * | 2002-04-05 | 2005-03-15 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
| JP4139948B2 (ja) * | 2002-06-28 | 2008-08-27 | 日本電気株式会社 | 不飽和単量体、重合体、化学増幅レジスト組成物、および、パターン形成方法 |
| JP4525912B2 (ja) * | 2004-01-30 | 2010-08-18 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| JP7165029B2 (ja) | 2017-12-05 | 2022-11-02 | 信越化学工業株式会社 | 反射防止積層膜、反射防止積層膜の形成方法、及び眼鏡型ディスプレイ |
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2000
- 2000-12-11 JP JP2000375504A patent/JP3981803B2/ja not_active Expired - Fee Related