JP4236423B2 - 重合体、レジスト組成物、およびパターン形成方法 - Google Patents

重合体、レジスト組成物、およびパターン形成方法 Download PDF

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Publication number
JP4236423B2
JP4236423B2 JP2002211343A JP2002211343A JP4236423B2 JP 4236423 B2 JP4236423 B2 JP 4236423B2 JP 2002211343 A JP2002211343 A JP 2002211343A JP 2002211343 A JP2002211343 A JP 2002211343A JP 4236423 B2 JP4236423 B2 JP 4236423B2
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group
polymer
carbon atoms
hydrophilic functional
hydrogen atom
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Japanese (ja)
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JP2004051785A (ja
JP2004051785A5 (https=
Inventor
竜一 安斉
匡之 藤原
昭史 上田
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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Priority to JP2002211343A priority Critical patent/JP4236423B2/ja
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Publication of JP2004051785A5 publication Critical patent/JP2004051785A5/ja
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  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002211343A 2002-07-19 2002-07-19 重合体、レジスト組成物、およびパターン形成方法 Expired - Lifetime JP4236423B2 (ja)

Priority Applications (1)

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JP2002211343A JP4236423B2 (ja) 2002-07-19 2002-07-19 重合体、レジスト組成物、およびパターン形成方法

Applications Claiming Priority (1)

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JP2002211343A JP4236423B2 (ja) 2002-07-19 2002-07-19 重合体、レジスト組成物、およびパターン形成方法

Publications (3)

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JP2004051785A JP2004051785A (ja) 2004-02-19
JP2004051785A5 JP2004051785A5 (https=) 2005-10-27
JP4236423B2 true JP4236423B2 (ja) 2009-03-11

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4669745B2 (ja) * 2004-06-28 2011-04-13 富士フイルム株式会社 感光性組成物及びそれを用いたパターン形成方法
TWI375121B (en) * 2004-06-28 2012-10-21 Fujifilm Corp Photosensitive composition and method for forming pattern using the same
JP5344743B2 (ja) * 2008-08-04 2013-11-20 三菱レイヨン株式会社 レジスト用重合体の製造方法
JP2011024347A (ja) * 2009-07-15 2011-02-03 Nikon Corp 電子機器

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