JP2004003030A5 - - Google Patents
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- Publication number
- JP2004003030A5 JP2004003030A5 JP2003156776A JP2003156776A JP2004003030A5 JP 2004003030 A5 JP2004003030 A5 JP 2004003030A5 JP 2003156776 A JP2003156776 A JP 2003156776A JP 2003156776 A JP2003156776 A JP 2003156776A JP 2004003030 A5 JP2004003030 A5 JP 2004003030A5
- Authority
- JP
- Japan
- Prior art keywords
- plate
- thin film
- fixing device
- magnetic material
- deposition apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020020030613A KR100838065B1 (ko) | 2002-05-31 | 2002-05-31 | 박막증착기용 고정장치와 이를 이용한 고정방법 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004003030A JP2004003030A (ja) | 2004-01-08 |
| JP2004003030A5 true JP2004003030A5 (enExample) | 2006-07-27 |
| JP4545393B2 JP4545393B2 (ja) | 2010-09-15 |
Family
ID=36969574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003156776A Expired - Lifetime JP4545393B2 (ja) | 2002-05-31 | 2003-06-02 | 薄膜蒸着装置用基板固定装置及び基板固定方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7097750B2 (enExample) |
| JP (1) | JP4545393B2 (enExample) |
| KR (1) | KR100838065B1 (enExample) |
| CN (1) | CN100587996C (enExample) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005206939A (ja) * | 2003-12-26 | 2005-08-04 | Seiko Epson Corp | 薄膜形成方法、薄膜形成装置、有機エレクトロルミネッセンス装置の製造方法、有機エレクトロルミネッセンス装置、及び電子機器 |
| JP4734508B2 (ja) * | 2004-06-21 | 2011-07-27 | 京セラ株式会社 | Elディスプレイおよびその製造方法 |
| KR100692049B1 (ko) * | 2004-12-01 | 2007-03-12 | 엘지전자 주식회사 | 유기 전계발광표시소자의 제조장치 및 방법 |
| KR100583522B1 (ko) * | 2005-01-05 | 2006-05-25 | 삼성에스디아이 주식회사 | 기판 고정 트레이, 이를 이용한 기판 정렬 시스템 및 그방법 |
| JP2006199998A (ja) * | 2005-01-20 | 2006-08-03 | Seiko Epson Corp | 成膜装置、成膜方法 |
| JP4609754B2 (ja) * | 2005-02-23 | 2011-01-12 | 三井造船株式会社 | マスククランプの移動機構および成膜装置 |
| KR100696554B1 (ko) * | 2005-12-16 | 2007-03-19 | 삼성에스디아이 주식회사 | 증착 장치 |
| KR100721056B1 (ko) * | 2006-01-06 | 2007-05-25 | 한국원자력연구원 | 자성체가 적용되는 물리적 구조물을 이용하여 임의의금속막 패턴을 소재 표면에 형성하는 장치 및 방법 |
| US8039052B2 (en) * | 2007-09-06 | 2011-10-18 | Intermolecular, Inc. | Multi-region processing system and heads |
| JP5297046B2 (ja) * | 2008-01-16 | 2013-09-25 | キヤノントッキ株式会社 | 成膜装置 |
| KR101517020B1 (ko) * | 2008-05-15 | 2015-05-04 | 삼성디스플레이 주식회사 | 유기전계발광표시장치의 제조장치 및 제조방법 |
| DE102008037387A1 (de) * | 2008-09-24 | 2010-03-25 | Aixtron Ag | Verfahren sowie Vorrichtung zum Abscheiden lateral strukturierter Schichten mittels einer magnetisch auf einem Substrathalter gehaltenen Schattenmaske |
| KR101049804B1 (ko) * | 2009-02-19 | 2011-07-15 | 삼성모바일디스플레이주식회사 | 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치 |
| JP2011233510A (ja) * | 2010-04-05 | 2011-11-17 | Canon Inc | 蒸着装置 |
| JP6243898B2 (ja) * | 2012-04-19 | 2017-12-06 | インテヴァック インコーポレイテッド | 太陽電池製造のための2重マスク装置 |
| US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
| SG11201406893XA (en) | 2012-04-26 | 2014-11-27 | Intevac Inc | System architecture for vacuum processing |
| KR102112751B1 (ko) * | 2013-02-01 | 2020-05-19 | 삼성디스플레이 주식회사 | 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치 |
| KR102103176B1 (ko) * | 2013-07-17 | 2020-04-22 | 주식회사 선익시스템 | 기판 탈부착 장치 |
| KR102270080B1 (ko) * | 2013-10-30 | 2021-06-29 | 삼성디스플레이 주식회사 | 박막 증착 장치 |
| KR102218644B1 (ko) * | 2013-12-19 | 2021-02-23 | 삼성디스플레이 주식회사 | 증착 장치 |
| CN106688088B (zh) | 2014-08-05 | 2020-01-10 | 因特瓦克公司 | 注入掩膜及对齐 |
| SG11201710300SA (en) * | 2015-06-12 | 2018-01-30 | Ulvac Inc | Substrate holding device, film deposition device, and substrate holding method |
| CN104993070A (zh) * | 2015-07-02 | 2015-10-21 | 深圳市华星光电技术有限公司 | 一种制作柔性oled显示器件的方法 |
| CN106337164A (zh) * | 2015-07-08 | 2017-01-18 | 上海和辉光电有限公司 | 一种蒸镀装置 |
| KR102396758B1 (ko) * | 2015-08-07 | 2022-05-13 | (주)선익시스템 | 마스크를 이용하는 공정챔버용 처킹시스템 |
| KR102339616B1 (ko) * | 2015-08-17 | 2021-12-17 | (주)선익시스템 | 마스크를 이용하는 공정챔버용 처킹시스템 |
| CN105154830B (zh) * | 2015-09-06 | 2017-04-19 | 京东方科技集团股份有限公司 | 一种固定方法和蒸镀方法 |
| JP6298138B2 (ja) * | 2015-11-25 | 2018-03-20 | キヤノントッキ株式会社 | 成膜システム、磁性体部及び膜の製造方法 |
| KR101702785B1 (ko) * | 2015-12-02 | 2017-02-07 | 에스엔유 프리시젼 주식회사 | 박막 증착장치 |
| JP6309048B2 (ja) * | 2016-07-01 | 2018-04-11 | キヤノントッキ株式会社 | マスク吸着装置 |
| CN106756779B (zh) * | 2017-01-03 | 2019-09-06 | 京东方科技集团股份有限公司 | 一种磁控溅射台以及磁控溅射装置 |
| JP6785171B2 (ja) * | 2017-03-08 | 2020-11-18 | 株式会社日本製鋼所 | 成膜方法および電子装置の製造方法並びにプラズマ原子層成長装置 |
| JP6857522B2 (ja) * | 2017-03-17 | 2021-04-14 | 株式会社日本製鋼所 | 成膜方法および電子装置の製造方法並びにマスク保持体 |
| KR102411538B1 (ko) * | 2017-09-04 | 2022-06-22 | 삼성디스플레이 주식회사 | 표시 장치의 제조장치 및 표시 장치의 제조방법 |
| CN108060388A (zh) * | 2017-12-18 | 2018-05-22 | 信利(惠州)智能显示有限公司 | 一种基板和掩膜板的对位方法 |
| KR102489336B1 (ko) * | 2017-12-26 | 2023-01-19 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 표시 장치의 제조 방법 |
| KR101963982B1 (ko) * | 2017-12-27 | 2019-03-29 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 |
| KR102036523B1 (ko) * | 2017-12-29 | 2019-10-25 | 주식회사 에스에프에이 | 기판 증착장치 |
| KR102020766B1 (ko) * | 2017-12-29 | 2019-09-11 | 주식회사 에스에프에이 | 기판 증착장치 |
| CN108110092A (zh) * | 2018-02-28 | 2018-06-01 | 北京创昱科技有限公司 | 一种基片装夹装置 |
| KR102591646B1 (ko) * | 2018-06-29 | 2023-10-20 | 삼성디스플레이 주식회사 | 증착 장치 및 증착 장치의 마그넷 플레이트 얼라인 방법 |
| CN110004407B (zh) * | 2019-05-21 | 2021-03-02 | 京东方科技集团股份有限公司 | 掩膜版组件及其制备方法 |
| US11613802B2 (en) * | 2020-04-17 | 2023-03-28 | Rockwell Collins, Inc. | Additively manufactured shadow masks for material deposition control |
| US11326246B2 (en) * | 2020-07-27 | 2022-05-10 | Rockwell Collins, Inc. | Controlled warping of shadow mask tooling for improved reliability and miniturization via thin film deposition |
| CN112853273B (zh) * | 2020-12-31 | 2022-12-16 | 南京深光科技有限公司 | 一种柔性amoled掩模版表面镀膜设备 |
| CN114112573B (zh) * | 2021-11-15 | 2022-06-10 | 哈尔滨工业大学(威海) | 用于介观尺度拉伸试样力学性能测试的磁控溅射成形装置 |
| CN114112574B (zh) * | 2021-11-15 | 2022-06-24 | 哈尔滨工业大学(威海) | 用于介观尺度弯曲试样力学性能测试的磁控溅射成形装置 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US625123A (en) * | 1899-05-16 | romans | ||
| US4011143A (en) * | 1973-06-25 | 1977-03-08 | Honeywell Inc. | Material deposition masking for microcircuit structures |
| US4599970A (en) * | 1985-03-11 | 1986-07-15 | Rca Corporation | Apparatus for coating a selected area of the surface of an object |
| US4915057A (en) * | 1985-10-23 | 1990-04-10 | Gte Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
| JP2950338B2 (ja) | 1990-09-03 | 1999-09-20 | 富士通株式会社 | メタルマスク位置合わせ装置 |
| GB9317170D0 (en) * | 1993-08-18 | 1993-10-06 | Applied Vision Ltd | Improvements in physical vapour deposition apparatus |
| CH687427A5 (de) | 1993-10-13 | 1996-11-29 | Balzers Hochvakuum | Sputterquelle mit Targetanordnung und Halterung. |
| JPH08297869A (ja) | 1995-04-24 | 1996-11-12 | Shin Etsu Chem Co Ltd | 基板ホルダー保持装置 |
| JP4058149B2 (ja) * | 1997-12-01 | 2008-03-05 | キヤノンアネルバ株式会社 | 真空成膜装置のマスク位置合わせ方法 |
| US6251233B1 (en) | 1998-08-03 | 2001-06-26 | The Coca-Cola Company | Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation |
| US6132575A (en) | 1998-09-28 | 2000-10-17 | Alcatel | Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films |
| JP2002075638A (ja) * | 2000-08-29 | 2002-03-15 | Nec Corp | マスク蒸着方法及び蒸着装置 |
| EP1202329A3 (en) * | 2000-10-31 | 2006-04-12 | The Boc Group, Inc. | Mask Restraining method and apparatus |
| JP4112535B2 (ja) | 2004-07-30 | 2008-07-02 | 株式会社一宮電機 | ステータ及びブラシレスモータ |
-
2002
- 2002-05-31 KR KR1020020030613A patent/KR100838065B1/ko not_active Expired - Lifetime
-
2003
- 2003-05-30 US US10/448,141 patent/US7097750B2/en not_active Expired - Lifetime
- 2003-06-02 JP JP2003156776A patent/JP4545393B2/ja not_active Expired - Lifetime
- 2003-06-02 CN CN03142457A patent/CN100587996C/zh not_active Expired - Lifetime
-
2006
- 2006-05-17 US US11/434,722 patent/US7695596B2/en not_active Expired - Lifetime
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