JP2003527971A5 - - Google Patents

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Publication number
JP2003527971A5
JP2003527971A5 JP2001569928A JP2001569928A JP2003527971A5 JP 2003527971 A5 JP2003527971 A5 JP 2003527971A5 JP 2001569928 A JP2001569928 A JP 2001569928A JP 2001569928 A JP2001569928 A JP 2001569928A JP 2003527971 A5 JP2003527971 A5 JP 2003527971A5
Authority
JP
Japan
Prior art keywords
copper
joint
intermediate layer
agent
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2001569928A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003527971A (ja
Filing date
Publication date
Priority claimed from FI20000657A external-priority patent/FI108376B/fi
Application filed filed Critical
Publication of JP2003527971A publication Critical patent/JP2003527971A/ja
Publication of JP2003527971A5 publication Critical patent/JP2003527971A5/ja
Abandoned legal-status Critical Current

Links

JP2001569928A 2000-03-21 2001-03-21 導電性接合部作成方法 Abandoned JP2003527971A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20000657A FI108376B (fi) 2000-03-21 2000-03-21 Menetelmõ sõhk÷õjohtavan liitoksen muodostamiseksi
FI20000657 2000-03-21
PCT/FI2001/000281 WO2001071852A1 (en) 2000-03-21 2001-03-21 Method for making an electroconductive joint

Publications (2)

Publication Number Publication Date
JP2003527971A JP2003527971A (ja) 2003-09-24
JP2003527971A5 true JP2003527971A5 (enExample) 2008-02-07

Family

ID=8557990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001569928A Abandoned JP2003527971A (ja) 2000-03-21 2001-03-21 導電性接合部作成方法

Country Status (17)

Country Link
US (1) US6772936B2 (enExample)
EP (1) EP1266430B1 (enExample)
JP (1) JP2003527971A (enExample)
KR (1) KR100734189B1 (enExample)
CN (1) CN1196232C (enExample)
AT (1) ATE349781T1 (enExample)
AU (2) AU4839801A (enExample)
BG (1) BG65249B1 (enExample)
BR (1) BR0109307A (enExample)
CA (1) CA2403864C (enExample)
DE (1) DE60125521T2 (enExample)
EA (1) EA004489B1 (enExample)
FI (1) FI108376B (enExample)
MX (1) MXPA02009127A (enExample)
PL (1) PL202272B1 (enExample)
WO (1) WO2001071852A1 (enExample)
ZA (1) ZA200207286B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080217042A1 (en) * 2007-03-05 2008-09-11 Judson Ward M Method for making rail bonds
US20090004500A1 (en) * 2007-06-26 2009-01-01 Daewoong Suh Multilayer preform for fast transient liquid phase bonding
DE102008054415A1 (de) * 2008-12-09 2010-06-10 Robert Bosch Gmbh Anordnung zweier Substrate mit einer SLID-Bondverbindung und Verfahren zur Herstellung einer solchen Anordnung
US8348139B2 (en) * 2010-03-09 2013-01-08 Indium Corporation Composite solder alloy preform
JP5643029B2 (ja) 2010-08-30 2014-12-17 矢崎総業株式会社 電線端部の接合方法
CN102489807A (zh) * 2011-11-28 2012-06-13 苏州工业园区隆盛电器成套设备制造有限公司 一种轨道车辆用变压器的铜铜焊接工艺
CN102489871A (zh) * 2011-12-05 2012-06-13 贵研铂业股份有限公司 一种铜及铜合金的焊接方法
JP6075465B2 (ja) * 2014-01-07 2017-02-08 株式会社村田製作所 補修方法および補修材
US9937575B2 (en) * 2015-02-05 2018-04-10 United Technologies Corporation Brazed joints and methods of forming brazed joints
CN105834541A (zh) * 2016-06-04 2016-08-10 北京工业大学 一种低温连接高温使用Cu/Sn/Cu钎焊界面的制备方法及结构
CN108247238A (zh) * 2017-12-11 2018-07-06 安徽宝辰机电设备科技有限公司 一种延长使用寿命紫铜用焊接剂及其使用方法
DE102018217612A1 (de) * 2018-10-15 2020-04-16 Siemens Aktiengesellschaft Verfahren zur elektrischen Kontaktierung eines supraleitenden Bandleiters
DE102020105154A1 (de) 2020-02-27 2021-09-02 Bayerische Motoren Werke Aktiengesellschaft Verbindungsanordnung sowie Verfahren zum Herstellen einer Verbindungsanordnung
CN115041913B (zh) * 2022-06-01 2024-04-30 中国社会科学院考古研究所 一种基于热分解还原的出土银器保护修复方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1389542A (en) * 1971-06-17 1975-04-03 Mullard Ltd Methods of securing a semiconductor body to a support
US4497430A (en) * 1982-09-20 1985-02-05 Allied Corporation Brazing method using homogeneous low melting point copper based alloys
US4678720A (en) 1985-01-04 1987-07-07 Gte Laboratories Incorporated Silver-copper-titanium brazing alloy
DE3930859C2 (de) * 1988-09-20 1997-04-30 Schulz Harder Juergen Verfahren zum Verlöten wenigstens zweier Elemente
EP0380200A1 (en) * 1989-01-11 1990-08-01 Sumitomo Special Metals Co., Ltd. Composite foil brazing material
DE19638209A1 (de) * 1996-09-19 1998-03-26 Bosch Gmbh Robert Hochschmelzende elektrisch leitende Verbindung und Verfahren zu deren Herstellung
JP3688429B2 (ja) * 1997-04-25 2005-08-31 株式会社東芝 電子部品実装用基板および電子部品実装基板
US6047876A (en) * 1997-09-12 2000-04-11 Materials Resources International Process of using an active solder alloy
JP3335896B2 (ja) * 1997-12-26 2002-10-21 株式会社東芝 ハンダ材及びハンダ材の製造方法
EP1081770B1 (en) * 1999-09-01 2009-02-18 Kaneka Corporation Thin-film solar cell module and method of manufacturing the same
FI114691B (fi) * 2000-02-23 2004-12-15 Outokumpu Oy Menetelmä kuparin ja ruostumattoman teräksen välisen liitoksen muodostamiseksi
FI109233B (fi) * 2000-02-23 2002-06-14 Outokumpu Oy Jäähdytyselementti ja menetelmä jäähdytyselementin valmistamiseksi

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