CN1196232C - 一种导电接头的制造方法 - Google Patents
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- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
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- B23K2103/00—Materials to be soldered, welded or cut
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- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
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Abstract
一种制造与由铜和铜合金组成的导电轨有关的导电接头的方法,在该方法中,在要连接的导电轨元件之间施加焊接/铜焊剂,随后至少加热连接区,以产生一个接头。根据本方法,所用的焊接/铜焊剂是分层的焊接/铜焊剂金属薄片(3),它包括表面层(4,6),以及它们之间的中间层(5),并且对连接区进行热处理,以便产生一个扩散接头。
Description
技术领域
本发明涉及一种用于制造由铜或铜合金制成的导电轨的导电接头的方法。
背景技术
在需要大电功率的工厂中,所用的电力导线一般为由铜或铜合金组成的导电轨。导电轨很长并且一般包括通过诸如螺钉之类的固定原件生产的夹紧接头。通常接头为交迭接头,在这种情况中是通过多个片连接到一起,至少在横向的方向上要钻一个洞。洞设置成相互匹配,并在其中插入诸如螺钉之类的固定元件,这是通过诸如螺母之类的配对物来紧固的,以便需要连接的片的连接面压在一起。当采用螺钉接头时,电流的传导取决于连接的片之间的机械接触。仅仅当机械接点整齐时,才能确保导电的有效和安全。经过一段时间夹紧接头通常会被氧化,此时,在连接处会产生传导(transfer)阻抗,从而不必要地消耗大量的电力。例如冶金工业中耗电量大的其它单位有电解工厂和冶金工艺中使用的电熔炉。由于螺钉接头导电能力减弱和产生传导阻抗,所以增加的电力消耗引起了严重的电力损失。而且,接头的修理,其中10年的接头甚至需要更新,导致许多人工费用。
发明内容
本发明的目的在于实现能够避免现有技术缺点的一种方法和一种接头。本发明的另一个目的在于实现一种既能制造新接头又能修复旧接头的方法。
根据本发明的第一方面,提供了一种用于制造由铜或铜合金制成的导电轨的导电接头的方法,在该方法中,在要连接的导电轨元件之间施加焊接剂,随后至少加热连接区,以便产生一个接头,其中,所用的焊接剂是分层的焊接剂金属薄片,它包括由锡Sn或其它能很好地溶解在铜中且具有低熔化温度的金属制成的表面层,以及表面层之间的中间层,该中间层具有与铜形成的低共熔合成物,对连接区进行热处理,以便产生一个扩散接头。
根据本发明的第二方面,提供了一种用于制造导电接头的方法,该方法应用于修复由铜或铜合金制成的导电轨的接头,其中,该方法引进一个用于旁路要修复的接头的导电元件,所述导电元件的第一端连接到要修复的接头的第一部分,该导电元件的第二端连接到要修复的接头的第二部分,在要连接的部分之间施加一个包括表面层以及该表面层之间的中间层的分层的焊接剂金属薄片,对所述连接部分进行热处理以产生扩散接头,从而采用扩散接头将导电元件连接到所述第一、第二部分上,其中,所述分层的焊接剂的表面层由锡或者能很好地溶解在铜中并具有低熔化温度的其它金属制成。
根据本发明的装置有几个显著的优点。通过应用本发明的方法,可以获得非常持久耐用的接头,它的导电能力保持良好。根据本发明的方法可相当容易地应用于不同导电轨的配置。这种接头的制造速度快,而且这种方法能应用于各种不同的安装环境。通过本发明的方法的一个实施例,处于不良状况的现存机械接头能容易地修复。通过利用层状金属薄片作为焊接/铜焊剂,将获得非常好的焊接/铜焊剂化合物,这种化合物易于使用。当根据本发明的方法用于修复旧接头时,可以不动旧接头而用一个导电元件对其进行旁路,例如,将它牢固地焊接在该旧接点的两侧。
当扩散接头所要求的连接材料被用在足够薄,且被优化的各层中时,根据扩散机理它甚至在低工作温度下也能在最终结头结构中获得熔化温度高于原连接材料的熔化温度几百度的固相。这样,接头可以自我纠正,因为它比纯的接头材料更耐高温。扩散原理所要求的连接材料与被连接对象之间的热量能够通过加热设备,如液态气体燃烧炉来获得。其它适合的加热设备,如感应加热,也能用来加热连接区。在焊接/铜焊剂金属薄片的表面和/或在至少被连接的一个表面,在制做接头前施加一层锡(Sn)。提供锡层可降低制作接头所需温度。而且,可避免被连接面的氧化,并且不需要与制做接头有关的保护性气体设备。为了开始相态转变反应和获得连接缝的最佳结构,提供一个几微米厚的锡层作为银+铜的中间层和被连接的对象之间的焊接/铜焊剂就足够了。根据本方法的技术,使用银+铜组合物并不是关键点所在,在这些情况中甚至纯银也能用。甚至在相对低的温度下,从熔化的和固体材料的扩散以及随后的相态转变反应制造接头是相当快的。通过应用本发明的方法的一个优选实施例,产生抵抗迥然不同的氧化环境的焊接/铜焊剂。至于发生在工作环境中的腐蚀,在所产生的镀金箔中的锡是无害的,因为它不象锌和铜那样被硫化。至于溶解在接头焊缝各相态中的银,它有助于提高镀金箔的耐腐蚀性。利用本方法,可以获得非常好的保持原有的导电能力并适合用于耗电非常大的工厂的导电轨配置的接头。
附图说明
下面将参照附图,对本发明作详细说明,其中:
图1示出根据本发明的接头在进行热处理之前的横截面;和
图2示出根据本发明的方法的另一个实施例。
具体实施方式
根据本发明的方法,一个基本上主要由铜组成的导电轨1被连接到另一个主要由铜组成的导电轨2。根据本方法,在导电轨的连接面之间涂有熔化温度低于被连接在一起的部分1,2的熔化温度的焊接/铜焊剂3;至少连接区被加热到至少达到该焊接/铜焊剂部分的熔化温度或接近该熔化温度,然后连接区冷却。通过使用本发明的方法,将获得一个扩散接头(diffusion joint)。温度能够升到所描述的高度,以便在连接区暂时产生一个熔化相态。所用的焊接/铜焊剂是分层的焊接/铜焊剂金属薄片3,它包括表面层4,6,以及它们之间的中间层5。根据本方法,连接区被加热以便产生一个扩散接头。
薄片形焊接/铜焊剂便于处理,薄片的宽度做成正合适然后剪成所需长度,并且它能事先安装在连接中想要的准确地点,在这种情况下,连接表面的整个区能够获得非常好的接头。焊接/铜焊剂金属薄片置于要连接在一起的部分1,2之间,以便焊接/铜焊剂3与要连接的片一起形成一个层状结构。如图1所示,为清楚起见调整了比例,从而图中显示的焊接/铜焊剂3比实际中厚得多。
焊接/铜焊剂的中间层5从下面几组中选择:银和铜的混合物(Ag+Cu),铝和铜的混合物(Al+Cu),或者锡和铜的混合物(Sn+Cu)。关于它们的熔化特性,焊接/铜焊剂化合物有益地和铜形成低共熔的合成物。例如,银和铜的焊接/铜焊剂,低共熔的合成物包括重量比为71%的银(Ag)和重量比为29%的铜(Cu)。焊接/铜焊剂也可以是纯银(Ag)或铝(Al)。
焊接/铜焊剂金属薄片3的表面层4,6包括锡(Sn)或一些其它溶于铜且熔化温度低的金属,由此焊接/铜焊操作所要求的温度能够降低。例如,表面层4,6能通过浸入组成熔化锡薄片中间层5的焊接/铜焊剂中来形成,必要时,可以在此之后将金属薄片滚平。
根据本方法,通过利用一个具有包含银和铜(Ag+Cu)且厚度为50μm的中间层5以及具有包含锡(Sn)且厚度为5-10μm的表面层4,6的分层的焊接/铜焊剂金属薄片3,可以获得质量非常高的接头。焊接/铜焊剂金属薄片的典型厚度为10-500μm,优选为20-100μm。当锡层施加于表面时,金属薄片的中间层5的厚度为10-100μm,且表面层4,6的厚度为1-20μm。
当锡层用作表面层4,6,至于焊接/铜焊,也可用一个铜含量低于低共熔合成物的含有铜的中间层。例如,Ag+Cu焊接/铜焊剂中铜含量重量比也能为0-29%。当用锡层时,则组成成分对本方法并不是关键所在。
图2说明根据本发明的方法的另一个实施例,在旧的螺钉接头8的旁边做了一个本质上比该旧接头具有更好的导电能力的新接头。在这个实施例中,用了一个导电元件7,它的第一端连到要修复的接头的第一部分1,第二端连到要修复的接头的第二部分2。导电元件7通过一个扩散接头3连接第一和/或第二部分。导电元件被设计成适合于该接头。典型地,接头通过利用一个分层的焊接/铜焊金属薄片,采用硬(hard)焊接/铜焊方法做成。
例子1
在这个例子中,利用重量百分比为银占71%和铜占29%的Ag+Cu焊接/铜焊剂,一个铜物体被连接到另一个铜物体。所施加的焊接/铜焊剂金属薄片厚度为50μm,而且,在金属薄片表面涂有厚度为5-10μm的锡层。温度升至大约600℃。保持时间大约5分钟。根据本例子的接头相当成功。于是获得了紧致和平滑的接头,其中最初基本上是纯元素的锡与铜形成了一个镀金箔焊缝。
利用根据本发明的方法,能够用由铜和/或铜合金组成的连接表面来连接导电轨,其中铜的典型含量至少在50%。
Claims (9)
1、一种用于制造由铜或铜合金制成的导电轨的导电接头的方法,在该方法中,在要连接的导电轨元件之间施加焊接剂,随后至少加热连接区,以便产生一个接头,其特征在于:所用的焊接剂是分层的焊接剂金属薄片(3),它包括由锡Sn或其它能很好地溶解在铜中且具有低熔化温度的金属制成的表面层(4,6),以及表面层之间的中间层(5),该中间层具有与铜形成的低共熔合成物;对连接区进行热处理,以便产生一个扩散接头。
2、如权利要求1所述的方法,其特征在于:焊接剂的中间层(5)从下面几组中选择一组:银和铜的混合物Ag+Cu,铝和铜的混合物Al+Cu,锡和铜的混合物Sn+Cu。
3、如权利要求1或2所述的方法,其特征在于:按重量百分比,焊接剂的中间层(5)包括71%的银Ag和29%的铜Cu。
4、如权利要求1所述的方法,其特征在于:焊接剂的中间层(5)基本上主要包括银Ag。
5、如权利要求1所述的方法,其特征在于:焊接剂的中间层(5)基本上主要包括铝Al。
6、如权利要求1-2中任一项所述的方法,其特征在于:焊接剂金属薄片(3)的厚度为10-500μm。
7、如权利要求6所述的方法,其特征在于,所述焊接剂金属薄片(3)的厚度为20-100μm。
8、如权利要求6所述的方法,其特征在于:焊接剂的中间层(5)的厚度为10-100μm且表面层(4,6)的厚度为1-20μm。
9、一种用于制造导电接头的方法,该方法应用于修复由铜或铜合金制成的导电轨的接头,其特征在于:该方法引进一个用于旁路所述要修复的接头的导电元件(7),所述导电元件(7)的第一端连接到要修复的接头的第一部分(1),该导电元件(7)的第二端连接到要修复的接头的第二部分(2),在要连接的部分之间施加一个包括表面层(4,6)以及该表面层之间的中间层(5)的分层的焊接剂金属薄片(3),对所述连接部分进行热处理以产生扩散接头,从而采用扩散接头将导电元件(7)连接到所述第一、第二部分(1,2)上,其中,所述分层的焊接剂的表面层由锡或者能很好地溶解在铜中并具有低熔化温度的其它金属制成。
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US20080217042A1 (en) * | 2007-03-05 | 2008-09-11 | Judson Ward M | Method for making rail bonds |
US20090004500A1 (en) * | 2007-06-26 | 2009-01-01 | Daewoong Suh | Multilayer preform for fast transient liquid phase bonding |
DE102008054415A1 (de) * | 2008-12-09 | 2010-06-10 | Robert Bosch Gmbh | Anordnung zweier Substrate mit einer SLID-Bondverbindung und Verfahren zur Herstellung einer solchen Anordnung |
US8348139B2 (en) * | 2010-03-09 | 2013-01-08 | Indium Corporation | Composite solder alloy preform |
JP5643029B2 (ja) | 2010-08-30 | 2014-12-17 | 矢崎総業株式会社 | 電線端部の接合方法 |
CN102489807A (zh) * | 2011-11-28 | 2012-06-13 | 苏州工业园区隆盛电器成套设备制造有限公司 | 一种轨道车辆用变压器的铜铜焊接工艺 |
CN102489871A (zh) * | 2011-12-05 | 2012-06-13 | 贵研铂业股份有限公司 | 一种铜及铜合金的焊接方法 |
JP6075465B2 (ja) * | 2014-01-07 | 2017-02-08 | 株式会社村田製作所 | 補修方法および補修材 |
US9937575B2 (en) * | 2015-02-05 | 2018-04-10 | United Technologies Corporation | Brazed joints and methods of forming brazed joints |
CN105834541A (zh) * | 2016-06-04 | 2016-08-10 | 北京工业大学 | 一种低温连接高温使用Cu/Sn/Cu钎焊界面的制备方法及结构 |
CN108247238A (zh) * | 2017-12-11 | 2018-07-06 | 安徽宝辰机电设备科技有限公司 | 一种延长使用寿命紫铜用焊接剂及其使用方法 |
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US4497430A (en) * | 1982-09-20 | 1985-02-05 | Allied Corporation | Brazing method using homogeneous low melting point copper based alloys |
US4678720A (en) | 1985-01-04 | 1987-07-07 | Gte Laboratories Incorporated | Silver-copper-titanium brazing alloy |
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FI20000657A0 (fi) | 2000-03-21 |
DE60125521D1 (de) | 2007-02-08 |
EP1266430B1 (en) | 2006-12-27 |
KR100734189B1 (ko) | 2007-07-02 |
KR20020084231A (ko) | 2002-11-04 |
CN1423848A (zh) | 2003-06-11 |
CA2403864A1 (en) | 2001-09-27 |
ATE349781T1 (de) | 2007-01-15 |
BG107123A (en) | 2003-05-30 |
FI20000657A (fi) | 2001-09-22 |
US6772936B2 (en) | 2004-08-10 |
JP2003527971A (ja) | 2003-09-24 |
PL357723A1 (en) | 2004-07-26 |
AU4839801A (en) | 2001-10-03 |
CA2403864C (en) | 2010-06-08 |
MXPA02009127A (es) | 2004-08-12 |
FI108376B (fi) | 2002-01-15 |
ZA200207286B (en) | 2003-05-06 |
PL202272B1 (pl) | 2009-06-30 |
EA200200994A1 (ru) | 2003-04-24 |
DE60125521T2 (de) | 2007-07-05 |
US20030038165A1 (en) | 2003-02-27 |
AU2001248398B2 (en) | 2004-07-01 |
BG65249B1 (bg) | 2007-09-28 |
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