JP2003511561A5 - - Google Patents

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JP2003511561A5
JP2003511561A5 JP2001529476A JP2001529476A JP2003511561A5 JP 2003511561 A5 JP2003511561 A5 JP 2003511561A5 JP 2001529476 A JP2001529476 A JP 2001529476A JP 2001529476 A JP2001529476 A JP 2001529476A JP 2003511561 A5 JP2003511561 A5 JP 2003511561A5
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group
compound
alkyl
borane
tungsten
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JP2001529476A
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JP2003511561A (ja
JP4713041B2 (ja
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Priority claimed from FI992234A external-priority patent/FI117944B/fi
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JP2001529476A 1999-10-15 2000-10-13 遷移金属窒化物薄膜の堆積方法 Expired - Lifetime JP4713041B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI19992234 1999-10-15
FI992234A FI117944B (fi) 1999-10-15 1999-10-15 Menetelmä siirtymämetallinitridiohutkalvojen kasvattamiseksi
PCT/FI2000/000895 WO2001027347A1 (en) 1999-10-15 2000-10-13 Method of depositing transition metal nitride thin films

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JP2003511561A JP2003511561A (ja) 2003-03-25
JP2003511561A5 true JP2003511561A5 (https=) 2007-09-13
JP4713041B2 JP4713041B2 (ja) 2011-06-29

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JP2001529476A Expired - Lifetime JP4713041B2 (ja) 1999-10-15 2000-10-13 遷移金属窒化物薄膜の堆積方法

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US (1) US6863727B1 (https=)
EP (1) EP1242647B1 (https=)
JP (1) JP4713041B2 (https=)
KR (1) KR100744219B1 (https=)
AU (1) AU7926800A (https=)
DE (1) DE60004566T2 (https=)
FI (1) FI117944B (https=)
TW (1) TW541351B (https=)
WO (1) WO2001027347A1 (https=)

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