JP2003303881A5 - - Google Patents

Download PDF

Info

Publication number
JP2003303881A5
JP2003303881A5 JP2002108551A JP2002108551A JP2003303881A5 JP 2003303881 A5 JP2003303881 A5 JP 2003303881A5 JP 2002108551 A JP2002108551 A JP 2002108551A JP 2002108551 A JP2002108551 A JP 2002108551A JP 2003303881 A5 JP2003303881 A5 JP 2003303881A5
Authority
JP
Japan
Prior art keywords
forming
wiring
insulating film
hole
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002108551A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003303881A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002108551A priority Critical patent/JP2003303881A/ja
Priority claimed from JP2002108551A external-priority patent/JP2003303881A/ja
Publication of JP2003303881A publication Critical patent/JP2003303881A/ja
Publication of JP2003303881A5 publication Critical patent/JP2003303881A5/ja
Pending legal-status Critical Current

Links

JP2002108551A 2002-04-10 2002-04-10 半導体装置及びその製造方法 Pending JP2003303881A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002108551A JP2003303881A (ja) 2002-04-10 2002-04-10 半導体装置及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002108551A JP2003303881A (ja) 2002-04-10 2002-04-10 半導体装置及びその製造方法

Publications (2)

Publication Number Publication Date
JP2003303881A JP2003303881A (ja) 2003-10-24
JP2003303881A5 true JP2003303881A5 (enExample) 2005-09-15

Family

ID=29392302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002108551A Pending JP2003303881A (ja) 2002-04-10 2002-04-10 半導体装置及びその製造方法

Country Status (1)

Country Link
JP (1) JP2003303881A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100432285C (zh) * 2003-10-30 2008-11-12 上海集成电路研发中心有限公司 一种减少金属线a1空洞的金属线溅射膜工艺
JP2007194468A (ja) * 2006-01-20 2007-08-02 Renesas Technology Corp 半導体装置およびその製造方法
JP6025190B2 (ja) * 2012-06-12 2016-11-16 シナプティクス・ジャパン合同会社 Sram

Similar Documents

Publication Publication Date Title
JPH11233631A5 (enExample)
JP2001291720A5 (enExample)
JP2003152077A5 (enExample)
JP2000269213A5 (enExample)
JP2005527098A5 (enExample)
JP2003297918A5 (enExample)
KR100596794B1 (ko) 반도체 소자의 금속 배선 형성방법
JP2003303881A5 (enExample)
US5380680A (en) Method for forming a metal contact of a semiconductor device
KR950030308A (ko) 반도체 장치 제조방법
US8810033B2 (en) Barrier layer for integrated circuit contacts
JP2004022642A5 (enExample)
CN111199912A (zh) 一种半导体结构及其制造方法
JP2003115488A5 (enExample)
WO2002013240A3 (en) Method for forming aluminum lines over aluminum-filled vias in a semiconductor substrate
TW200529324A (en) A semiconductor device having a second level of metallization formed over a first level with minimal damage to the first level and method
TW200616080A (en) Methods for forming plugs, fabricating dual damasecne structures, and improving photolithographic process
KR100593125B1 (ko) 반도체 소자의 콘택 플러그 형성 방법
JP2005277114A5 (enExample)
KR100414745B1 (ko) 반도체소자의금속배선형성방법
KR970053559A (ko) 반도체 집적회로의 배선구조 및 그의 형성방법
KR100781456B1 (ko) 반도체 소자의 금속배선 제조 시 배리어막 형성방법
JP2001110896A5 (enExample)
JPH1187264A (ja) 半導体装置およびその製造方法
JPH06268077A (ja) 半導体装置の製造方法