JP2003282398A5 - - Google Patents

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Publication number
JP2003282398A5
JP2003282398A5 JP2002078917A JP2002078917A JP2003282398A5 JP 2003282398 A5 JP2003282398 A5 JP 2003282398A5 JP 2002078917 A JP2002078917 A JP 2002078917A JP 2002078917 A JP2002078917 A JP 2002078917A JP 2003282398 A5 JP2003282398 A5 JP 2003282398A5
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JP
Japan
Prior art keywords
mirror
exposure
illumination
shape
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2002078917A
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English (en)
Japanese (ja)
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JP2003282398A (ja
JP4006251B2 (ja
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Application filed filed Critical
Priority to JP2002078917A priority Critical patent/JP4006251B2/ja
Priority claimed from JP2002078917A external-priority patent/JP4006251B2/ja
Priority to US10/389,925 priority patent/US6831744B2/en
Priority to EP03251695A priority patent/EP1353232A3/en
Publication of JP2003282398A publication Critical patent/JP2003282398A/ja
Publication of JP2003282398A5 publication Critical patent/JP2003282398A5/ja
Application granted granted Critical
Publication of JP4006251B2 publication Critical patent/JP4006251B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002078917A 2002-03-20 2002-03-20 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法 Expired - Fee Related JP4006251B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002078917A JP4006251B2 (ja) 2002-03-20 2002-03-20 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法
US10/389,925 US6831744B2 (en) 2002-03-20 2003-03-18 Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method
EP03251695A EP1353232A3 (en) 2002-03-20 2003-03-19 Mirror device, mirror adjustment method, exposure apparatus, exposure method, and semiconductor device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002078917A JP4006251B2 (ja) 2002-03-20 2002-03-20 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2003282398A JP2003282398A (ja) 2003-10-03
JP2003282398A5 true JP2003282398A5 (enExample) 2005-09-08
JP4006251B2 JP4006251B2 (ja) 2007-11-14

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ID=28035617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002078917A Expired - Fee Related JP4006251B2 (ja) 2002-03-20 2002-03-20 ミラー装置、ミラーの調整方法、露光装置、露光方法及び半導体デバイスの製造方法

Country Status (3)

Country Link
US (1) US6831744B2 (enExample)
EP (1) EP1353232A3 (enExample)
JP (1) JP4006251B2 (enExample)

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JP4458333B2 (ja) 2003-02-13 2010-04-28 キヤノン株式会社 露光装置、およびデバイスの製造方法
JP4311711B2 (ja) * 2003-02-24 2009-08-12 キヤノン株式会社 露光装置及びデバイス製造方法
DE10317662A1 (de) * 2003-04-17 2004-11-18 Carl Zeiss Smt Ag Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
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US7423765B2 (en) * 2004-07-31 2008-09-09 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus
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US7462841B2 (en) 2005-10-19 2008-12-09 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and use of a radiation collector
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US20090288003A1 (en) * 2006-05-31 2009-11-19 Marinkovic Sinisa V Cost effective system and method for monitoring machinery units
US8052289B2 (en) * 2006-06-07 2011-11-08 Asml Netherlands B.V. Mirror array for lithography
US8760615B2 (en) * 2007-05-24 2014-06-24 Asml Netherlands B.V. Lithographic apparatus having encoder type position sensor system
US8687166B2 (en) * 2007-05-24 2014-04-01 Asml Netherlands B.V. Lithographic apparatus having an encoder position sensor system
DE102009054869B4 (de) * 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
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US8746975B2 (en) * 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
DE102011004446A1 (de) * 2011-02-21 2012-08-23 Carl Zeiss Smt Gmbh Gekühltes optisches Element
US8731139B2 (en) * 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
DE102014203144A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
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DE102015212859A1 (de) * 2015-07-09 2016-07-07 Carl Zeiss Smt Gmbh Lithographieanlage sowie Verfahren
WO2017130346A1 (ja) * 2016-01-28 2017-08-03 ギガフォトン株式会社 極端紫外光生成装置
DE102019201810A1 (de) * 2019-02-12 2020-08-13 Carl Zeiss Smt Gmbh Steuerungssystem, optisches system und verfahren
US11506986B2 (en) * 2020-04-09 2022-11-22 Taiwan Semiconductor Manufacturing Co., Ltd. Thermal controlling method in lithography system
JP7579152B2 (ja) * 2021-01-13 2024-11-07 株式会社荏原製作所 半導体製造装置におけるデータの管理方法、およびリングバッファを備えた制御装置

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US6846086B2 (en) * 2002-03-11 2005-01-25 Intel Corporation Mirror assembly with thermal contour control
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