JP2003168744A5 - - Google Patents
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- Publication number
- JP2003168744A5 JP2003168744A5 JP2001369449A JP2001369449A JP2003168744A5 JP 2003168744 A5 JP2003168744 A5 JP 2003168744A5 JP 2001369449 A JP2001369449 A JP 2001369449A JP 2001369449 A JP2001369449 A JP 2001369449A JP 2003168744 A5 JP2003168744 A5 JP 2003168744A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- forming
- tantalum pentoxide
- integrated circuit
- semiconductor integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 16
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims 16
- 239000004065 semiconductor Substances 0.000 claims 14
- 238000004519 manufacturing process Methods 0.000 claims 12
- 239000013078 crystal Substances 0.000 claims 8
- 230000001590 oxidative effect Effects 0.000 claims 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 6
- 239000003990 capacitor Substances 0.000 claims 6
- 229910052710 silicon Inorganic materials 0.000 claims 6
- 239000010703 silicon Substances 0.000 claims 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 4
- 238000002425 crystallisation Methods 0.000 claims 3
- 230000008025 crystallization Effects 0.000 claims 3
- 238000010438 heat treatment Methods 0.000 claims 3
- 238000005121 nitriding Methods 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 238000003860 storage Methods 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 2
- 239000011574 phosphorus Substances 0.000 claims 2
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- 238000000277 atomic layer chemical vapour deposition Methods 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001369449A JP4051922B2 (ja) | 2001-12-04 | 2001-12-04 | 五酸化タンタルからなるｍｉｓキャパシタの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001369449A JP4051922B2 (ja) | 2001-12-04 | 2001-12-04 | 五酸化タンタルからなるｍｉｓキャパシタの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003168744A JP2003168744A (ja) | 2003-06-13 |
| JP2003168744A5 true JP2003168744A5 (https=) | 2005-06-30 |
| JP4051922B2 JP4051922B2 (ja) | 2008-02-27 |
Family
ID=19178836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001369449A Expired - Fee Related JP4051922B2 (ja) | 2001-12-04 | 2001-12-04 | 五酸化タンタルからなるｍｉｓキャパシタの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4051922B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005150416A (ja) * | 2003-11-17 | 2005-06-09 | Hitachi Ltd | 半導体集積回路装置及びその製造方法 |
| JP4111963B2 (ja) * | 2004-06-10 | 2008-07-02 | 松下電器産業株式会社 | キャパシタの製造方法 |
-
2001
- 2001-12-04 JP JP2001369449A patent/JP4051922B2/ja not_active Expired - Fee Related
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