JP2003043202A - 反射防止膜及び光学部品 - Google Patents
反射防止膜及び光学部品Info
- Publication number
- JP2003043202A JP2003043202A JP2001231044A JP2001231044A JP2003043202A JP 2003043202 A JP2003043202 A JP 2003043202A JP 2001231044 A JP2001231044 A JP 2001231044A JP 2001231044 A JP2001231044 A JP 2001231044A JP 2003043202 A JP2003043202 A JP 2003043202A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- antireflection film
- antireflection
- index material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 44
- 239000000463 material Substances 0.000 claims abstract description 108
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000010408 film Substances 0.000 claims abstract 8
- 239000012788 optical film Substances 0.000 claims abstract 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 13
- 230000003667 anti-reflective effect Effects 0.000 abstract 1
- 230000003595 spectral effect Effects 0.000 description 30
- 230000000694 effects Effects 0.000 description 23
- 238000002834 transmittance Methods 0.000 description 22
- 238000010586 diagram Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 13
- 238000007733 ion plating Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001917 fluorescence detection Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001231044A JP2003043202A (ja) | 2001-07-31 | 2001-07-31 | 反射防止膜及び光学部品 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001231044A JP2003043202A (ja) | 2001-07-31 | 2001-07-31 | 反射防止膜及び光学部品 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003043202A true JP2003043202A (ja) | 2003-02-13 |
JP2003043202A5 JP2003043202A5 (enrdf_load_stackoverflow) | 2008-10-02 |
Family
ID=19063154
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001231044A Pending JP2003043202A (ja) | 2001-07-31 | 2001-07-31 | 反射防止膜及び光学部品 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003043202A (enrdf_load_stackoverflow) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005274327A (ja) * | 2004-03-24 | 2005-10-06 | Citizen Watch Co Ltd | 時計用風防ガラスおよび時計 |
JP2005274938A (ja) * | 2004-03-24 | 2005-10-06 | Seiko Epson Corp | プラスチックレンズ |
JP2007251130A (ja) * | 2006-03-17 | 2007-09-27 | Epitech Technology Corp | 発光ダイオード及びその製造方法 |
JP2008070459A (ja) * | 2006-09-12 | 2008-03-27 | Sumitomo Osaka Cement Co Ltd | 反射防止膜及び光学部材並びに表示装置 |
US8029871B2 (en) | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
JP2011221465A (ja) * | 2010-04-14 | 2011-11-04 | Hoya Corp | 反射防止膜、及びこれを有する光学部材 |
US8298622B2 (en) | 2005-04-22 | 2012-10-30 | Pentax Ricoh Imaging Company, Ltd. | Silica aerogel coating and its production method |
JP2017073489A (ja) * | 2015-10-08 | 2017-04-13 | エヌイーシー ショット コンポーネンツ株式会社 | メタル−ガラスリッドおよびそれを利用したduv−led装置 |
CN109791219A (zh) * | 2016-09-29 | 2019-05-21 | 依视路国际公司 | 包括具有多角度效率的减反射涂层的光学镜片 |
CN110218006A (zh) * | 2019-04-25 | 2019-09-10 | 福耀玻璃工业集团股份有限公司 | 一种车辆用夹层玻璃 |
CN110441845A (zh) * | 2019-07-19 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | 渐变界面纳米薄层提升HfO2/Al2O3/SiO2紫外反射膜激光损伤阈值的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6032001A (ja) * | 1983-08-01 | 1985-02-19 | Minolta Camera Co Ltd | 反射防止膜 |
JPS60130704A (ja) * | 1983-12-20 | 1985-07-12 | Canon Inc | 合成樹脂基板の反射防止膜 |
-
2001
- 2001-07-31 JP JP2001231044A patent/JP2003043202A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6032001A (ja) * | 1983-08-01 | 1985-02-19 | Minolta Camera Co Ltd | 反射防止膜 |
JPS60130704A (ja) * | 1983-12-20 | 1985-07-12 | Canon Inc | 合成樹脂基板の反射防止膜 |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005274327A (ja) * | 2004-03-24 | 2005-10-06 | Citizen Watch Co Ltd | 時計用風防ガラスおよび時計 |
JP2005274938A (ja) * | 2004-03-24 | 2005-10-06 | Seiko Epson Corp | プラスチックレンズ |
US8298622B2 (en) | 2005-04-22 | 2012-10-30 | Pentax Ricoh Imaging Company, Ltd. | Silica aerogel coating and its production method |
US8029871B2 (en) | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
JP2007251130A (ja) * | 2006-03-17 | 2007-09-27 | Epitech Technology Corp | 発光ダイオード及びその製造方法 |
JP2008070459A (ja) * | 2006-09-12 | 2008-03-27 | Sumitomo Osaka Cement Co Ltd | 反射防止膜及び光学部材並びに表示装置 |
JP2011221465A (ja) * | 2010-04-14 | 2011-11-04 | Hoya Corp | 反射防止膜、及びこれを有する光学部材 |
JP2017073489A (ja) * | 2015-10-08 | 2017-04-13 | エヌイーシー ショット コンポーネンツ株式会社 | メタル−ガラスリッドおよびそれを利用したduv−led装置 |
CN109791219A (zh) * | 2016-09-29 | 2019-05-21 | 依视路国际公司 | 包括具有多角度效率的减反射涂层的光学镜片 |
US11573431B1 (en) | 2016-09-29 | 2023-02-07 | Essilor International | Optical lens comprising an antireflective coating with multiangular efficiency |
CN110218006A (zh) * | 2019-04-25 | 2019-09-10 | 福耀玻璃工业集团股份有限公司 | 一种车辆用夹层玻璃 |
CN110441845A (zh) * | 2019-07-19 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | 渐变界面纳米薄层提升HfO2/Al2O3/SiO2紫外反射膜激光损伤阈值的方法 |
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