JP2002523398A5 - - Google Patents

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Publication number
JP2002523398A5
JP2002523398A5 JP2000566246A JP2000566246A JP2002523398A5 JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5 JP 2000566246 A JP2000566246 A JP 2000566246A JP 2000566246 A JP2000566246 A JP 2000566246A JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5
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JP
Japan
Prior art keywords
phenyl
alkyl
substituted
unsubstituted
compound
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2000566246A
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English (en)
Japanese (ja)
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JP4489954B2 (ja
JP2002523398A (ja
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Application filed filed Critical
Priority claimed from PCT/EP1999/005698 external-priority patent/WO2000010972A1/en
Publication of JP2002523398A publication Critical patent/JP2002523398A/ja
Publication of JP2002523398A5 publication Critical patent/JP2002523398A5/ja
Application granted granted Critical
Publication of JP4489954B2 publication Critical patent/JP4489954B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000566246A 1998-08-19 1999-08-06 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途 Expired - Fee Related JP4489954B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98810810 1998-08-19
EP98810810.6 1998-08-19
PCT/EP1999/005698 WO2000010972A1 (en) 1998-08-19 1999-08-06 New unsaturated oxime derivatives and the use thereof as latent acids

Publications (3)

Publication Number Publication Date
JP2002523398A JP2002523398A (ja) 2002-07-30
JP2002523398A5 true JP2002523398A5 (cg-RX-API-DMAC7.html) 2006-09-14
JP4489954B2 JP4489954B2 (ja) 2010-06-23

Family

ID=8236266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000566246A Expired - Fee Related JP4489954B2 (ja) 1998-08-19 1999-08-06 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途

Country Status (10)

Country Link
US (1) US6703182B1 (cg-RX-API-DMAC7.html)
EP (1) EP1105373B1 (cg-RX-API-DMAC7.html)
JP (1) JP4489954B2 (cg-RX-API-DMAC7.html)
KR (1) KR100640092B1 (cg-RX-API-DMAC7.html)
CN (1) CN100340547C (cg-RX-API-DMAC7.html)
AU (1) AU5373999A (cg-RX-API-DMAC7.html)
DE (1) DE69903453T2 (cg-RX-API-DMAC7.html)
MY (1) MY117695A (cg-RX-API-DMAC7.html)
TW (1) TW575792B (cg-RX-API-DMAC7.html)
WO (1) WO2000010972A1 (cg-RX-API-DMAC7.html)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4685265B2 (ja) * 2001-05-10 2011-05-18 コダック株式会社 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
KR20040089607A (ko) 2002-02-06 2004-10-21 시바 스페셜티 케미칼스 홀딩 인크. 설포네이트 유도체 및 잠산으로서의 이의 용도
CN100361815C (zh) * 2002-04-24 2008-01-16 东芝泰格有限公司 喷墨记录设备
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
JP4996870B2 (ja) * 2006-03-28 2012-08-08 富士フイルム株式会社 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
EP2037323B1 (en) * 2007-07-17 2014-12-10 FUJIFILM Corporation Photosensitive compositions
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
DE102008038943A1 (de) 2008-08-11 2010-02-18 Borealis Agrolinz Melamine Gmbh Vernetzbare Acrylatharze
WO2010112408A1 (en) 2009-03-30 2010-10-07 Basf Se Uv-dose indicator films
US8569393B2 (en) 2009-12-07 2013-10-29 Agfa-Gevaert N.V. UV-LED curable compositions and inks
AU2010330044B2 (en) 2009-12-07 2014-08-28 Agfa Graphics N.V. Photoinitiators for UV-LED curable compositions and inks
KR101813298B1 (ko) * 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置
KR102824944B1 (ko) 2018-09-07 2025-06-24 아이지엠 레진스 이탈리아 에스.알.엘. 다관능성 비스아실포스핀 옥사이드 광개시제
WO2020136522A1 (en) 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
US11981650B2 (en) 2019-10-11 2024-05-14 Igm Resins Italia S.R.L. Coumarin glyoxylates for LED photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
JP2025514405A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、クマリン系増感剤及びアミン添加剤を含む光開始剤パッケージ
JP2025514446A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、オキサゾール系増感剤及びアミン添加剤を含む光開始剤パッケージ
EP4273200B1 (en) 2022-05-06 2026-03-25 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
JP2025533845A (ja) 2022-10-05 2025-10-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ ポリマー性（メタ）アクリレート光開始剤
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123255A (en) * 1977-01-03 1978-10-31 Chevron Research Company O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4347372A (en) * 1978-09-01 1982-08-31 Ciba-Geigy Corporation Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives
US4346094A (en) * 1980-09-22 1982-08-24 Eli Lilly And Company 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels
US4510294A (en) * 1982-07-02 1985-04-09 Polaroid Corporation Polymerization of monomeric hydrogen-blocked oxime derivatives
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
MY117352A (en) * 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3875271B2 (ja) 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition

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