JP2011523971A5 - - Google Patents
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- Publication number
- JP2011523971A5 JP2011523971A5 JP2011512932A JP2011512932A JP2011523971A5 JP 2011523971 A5 JP2011523971 A5 JP 2011523971A5 JP 2011512932 A JP2011512932 A JP 2011512932A JP 2011512932 A JP2011512932 A JP 2011512932A JP 2011523971 A5 JP2011523971 A5 JP 2011523971A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- interrupted
- cycloalkyl
- compound
- cycloalkenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052760 oxygen Inorganic materials 0.000 claims 32
- 150000001875 compounds Chemical class 0.000 claims 29
- -1 phenylsulfonyloxy Chemical group 0.000 claims 28
- 229910052717 sulfur Inorganic materials 0.000 claims 25
- 239000002253 acid Substances 0.000 claims 18
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 claims 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 16
- 239000000203 mixture Substances 0.000 claims 12
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 claims 10
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 10
- 229910052736 halogen Inorganic materials 0.000 claims 10
- 150000002367 halogens Chemical class 0.000 claims 10
- 229910004013 NO 2 Inorganic materials 0.000 claims 8
- 229920000642 polymer Polymers 0.000 claims 8
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims 7
- 229910052799 carbon Inorganic materials 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 7
- 239000001257 hydrogen Substances 0.000 claims 7
- 150000002431 hydrogen Chemical class 0.000 claims 6
- 229920002120 photoresistant polymer Polymers 0.000 claims 6
- 235000010290 biphenyl Nutrition 0.000 claims 5
- 239000004305 biphenyl Substances 0.000 claims 5
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 5
- 125000001072 heteroaryl group Chemical group 0.000 claims 5
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 5
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 claims 4
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims 4
- 125000001624 naphthyl group Chemical group 0.000 claims 4
- 125000005561 phenanthryl group Chemical group 0.000 claims 4
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims 4
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical class C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims 4
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 claims 4
- 125000004423 acyloxy group Chemical group 0.000 claims 3
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 125000005549 heteroarylene group Chemical group 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 125000004957 naphthylene group Chemical group 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 206010070834 Sensitisation Diseases 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000004414 alkyl thio group Chemical group 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000006331 halo benzoyl group Chemical group 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 239000000049 pigment Substances 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- 230000008313 sensitization Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08158090 | 2008-06-12 | ||
| EP08158090.4 | 2008-06-12 | ||
| PCT/EP2009/056703 WO2009150074A1 (en) | 2008-06-12 | 2009-06-02 | Sulfonium derivatives and the use thereof as latent acids |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2011523971A JP2011523971A (ja) | 2011-08-25 |
| JP2011523971A5 true JP2011523971A5 (cg-RX-API-DMAC7.html) | 2012-07-19 |
Family
ID=40469989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011512932A Withdrawn JP2011523971A (ja) | 2008-06-12 | 2009-06-02 | スルホニウム塩及び潜在性酸としての使用 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20110171569A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2288599A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2011523971A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20110025211A (cg-RX-API-DMAC7.html) |
| CN (1) | CN102056913A (cg-RX-API-DMAC7.html) |
| TW (1) | TW201004934A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2009150074A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5622448B2 (ja) * | 2010-06-15 | 2014-11-12 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、高分子化合物、化合物 |
| JP6002705B2 (ja) * | 2013-03-01 | 2016-10-05 | 富士フイルム株式会社 | パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、電子デバイスの製造方法 |
| WO2015127459A1 (en) | 2014-02-24 | 2015-08-27 | Tokyo Electron Limited | Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes |
| US10020195B2 (en) | 2014-02-25 | 2018-07-10 | Tokyo Electron Limited | Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists |
| US10429745B2 (en) | 2016-02-19 | 2019-10-01 | Osaka University | Photo-sensitized chemically amplified resist (PS-CAR) simulation |
| US10048594B2 (en) | 2016-02-19 | 2018-08-14 | Tokyo Electron Limited | Photo-sensitized chemically amplified resist (PS-CAR) model calibration |
| KR102475021B1 (ko) | 2016-05-13 | 2022-12-06 | 도쿄엘렉트론가부시키가이샤 | 감광 화학물질 또는 감광 화학 증폭형 레지스트의 사용에 의한 임계 치수 제어 |
| KR102177192B1 (ko) | 2016-05-13 | 2020-11-10 | 도쿄엘렉트론가부시키가이샤 | 광 작용제의 사용에 의한 임계 치수 제어 |
| WO2021034567A1 (en) | 2019-08-16 | 2021-02-25 | Tokyo Electron Limited | Method and process for stochastic driven defectivity healing |
| JP2022164585A (ja) * | 2021-04-15 | 2022-10-27 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP2022164586A (ja) * | 2021-04-15 | 2022-10-27 | 住友化学株式会社 | カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| US20230004084A1 (en) * | 2021-05-06 | 2023-01-05 | Sumitomo Chemical Company, Limited | Salt, acid generator, resist composition and method for producing resist pattern |
| JP7687292B2 (ja) * | 2021-07-28 | 2025-06-03 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
| EP1902019B1 (en) * | 2005-07-01 | 2010-07-07 | Basf Se | Sulphonium salt initiators |
| JP5313873B2 (ja) * | 2006-04-13 | 2013-10-09 | チバ ホールディング インコーポレーテッド | スルホニウム塩開始剤 |
| CN101473268A (zh) * | 2006-06-20 | 2009-07-01 | 西巴控股有限公司 | 肟磺酸酯和其作为潜伏酸的用途 |
| JP5290183B2 (ja) * | 2006-10-04 | 2013-09-18 | チバ ホールディング インコーポレーテッド | スルホニウム塩光開始剤 |
| JP5538229B2 (ja) * | 2007-10-10 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
| WO2009047105A1 (en) * | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| JP5473921B2 (ja) * | 2007-10-10 | 2014-04-16 | ビーエーエスエフ ソシエタス・ヨーロピア | スルホニウム塩開始剤 |
-
2009
- 2009-06-02 WO PCT/EP2009/056703 patent/WO2009150074A1/en not_active Ceased
- 2009-06-02 CN CN200980121819.0A patent/CN102056913A/zh active Pending
- 2009-06-02 JP JP2011512932A patent/JP2011523971A/ja not_active Withdrawn
- 2009-06-02 KR KR1020117000725A patent/KR20110025211A/ko not_active Withdrawn
- 2009-06-02 US US12/996,795 patent/US20110171569A1/en not_active Abandoned
- 2009-06-02 EP EP09761637A patent/EP2288599A1/en not_active Withdrawn
- 2009-06-11 TW TW098119527A patent/TW201004934A/zh unknown