JP2002516919A5 - - Google Patents

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Publication number
JP2002516919A5
JP2002516919A5 JP2000551051A JP2000551051A JP2002516919A5 JP 2002516919 A5 JP2002516919 A5 JP 2002516919A5 JP 2000551051 A JP2000551051 A JP 2000551051A JP 2000551051 A JP2000551051 A JP 2000551051A JP 2002516919 A5 JP2002516919 A5 JP 2002516919A5
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JP
Japan
Prior art keywords
tantalum
alloy ingot
silicon
ppm
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000551051A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002516919A (ja
JP5070617B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US1999/011169 external-priority patent/WO1999061672A1/en
Publication of JP2002516919A publication Critical patent/JP2002516919A/ja
Publication of JP2002516919A5 publication Critical patent/JP2002516919A5/ja
Application granted granted Critical
Publication of JP5070617B2 publication Critical patent/JP5070617B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2000551051A 1998-05-22 1999-05-20 タンタル−ケイ素合金およびそれを含む製品およびそれを製造する方法 Expired - Lifetime JP5070617B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US8638598P 1998-05-22 1998-05-22
US60/086,385 1998-05-22
PCT/US1999/011169 WO1999061672A1 (en) 1998-05-22 1999-05-20 Tantalum-silicon alloys and products containing the same and processes of making the same

Publications (3)

Publication Number Publication Date
JP2002516919A JP2002516919A (ja) 2002-06-11
JP2002516919A5 true JP2002516919A5 (https=) 2011-06-16
JP5070617B2 JP5070617B2 (ja) 2012-11-14

Family

ID=22198232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000551051A Expired - Lifetime JP5070617B2 (ja) 1998-05-22 1999-05-20 タンタル−ケイ素合金およびそれを含む製品およびそれを製造する方法

Country Status (17)

Country Link
US (2) US6576069B1 (https=)
EP (1) EP1080242B1 (https=)
JP (1) JP5070617B2 (https=)
KR (1) KR20010025086A (https=)
CN (1) CN1113972C (https=)
AT (1) ATE252165T1 (https=)
AU (1) AU744454B2 (https=)
BR (1) BR9910664A (https=)
CZ (1) CZ302590B6 (https=)
DE (1) DE69912119T2 (https=)
DK (1) DK1080242T3 (https=)
ES (1) ES2207946T3 (https=)
HU (1) HUP0102315A3 (https=)
IL (1) IL139757A (https=)
PT (1) PT1080242E (https=)
RU (1) RU2228382C2 (https=)
WO (1) WO1999061672A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6660057B1 (en) * 1999-10-01 2003-12-09 Showa Denko K.K. Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body
KR20030086593A (ko) * 2001-02-12 2003-11-10 에이치. 씨. 스타아크 아이앤씨 커패시터 애노드용 탄탈-규소 및 니오븀-규소 기재
US7666243B2 (en) * 2004-10-27 2010-02-23 H.C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
US20070044873A1 (en) 2005-08-31 2007-03-01 H. C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
DE102006002342A1 (de) * 2006-01-18 2007-07-26 Kompetenzzentrum Neue Materialien Nordbayern Gmbh Werkzeug
KR20150014976A (ko) * 2007-04-27 2015-02-09 에이치. 씨. 스타아크 아이앤씨 수용액에 대한 내식성이 있는 탄탈계 합금
US9994929B2 (en) 2013-03-15 2018-06-12 Ati Properties Llc Processes for producing tantalum alloys and niobium alloys
RU2623959C2 (ru) * 2015-12-07 2017-06-29 Федеральное государственное бюджетное учреждение науки Институт физики прочности и материаловедения Сибирского отделения Российской академии наук (ИФПМ СО РАН) Способ получения сплава из порошков металлов с разницей температур плавления
IL277122B2 (en) * 2018-03-05 2025-09-01 Global Advanced Metals Usa Inc Spherical tantalum powder, products containing it, and methods for producing it
TWI877173B (zh) 2019-07-19 2025-03-21 美商環球高級金屬美國公司 球形鉭-鈦合金粉末,包含彼之產品及製備彼之方法

Family Cites Families (29)

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CA883221A (en) 1971-10-12 E.I. Du Pont De Nemours And Company Metal alloy
GB190806051A (en) 1907-03-26 1908-07-16 Siemens Ag An Improved Process for Hardening Tantalum.
US3166414A (en) 1962-07-09 1965-01-19 Westinghouse Electric Corp Tantalum base alloys
US3597192A (en) 1968-12-05 1971-08-03 Atomic Energy Commission Preparation of tantalum metal
JPS539399B2 (https=) 1972-12-09 1978-04-05
US4062679A (en) 1973-03-29 1977-12-13 Fansteel Inc. Embrittlement-resistant tantalum wire
US3790913A (en) 1973-04-02 1974-02-05 F Peters Thin film resistor comprising sputtered alloy of silicon and tantalum
US4073971A (en) 1973-07-31 1978-02-14 Nobuo Yasujima Process of manufacturing terminals of a heat-proof metallic thin film resistor
US3933474A (en) * 1974-03-27 1976-01-20 Norton Company Leech alloying
US4235629A (en) 1977-10-17 1980-11-25 Fansteel Inc. Method for producing an embrittlement-resistant tantalum wire
US4394352A (en) 1980-03-17 1983-07-19 Motorola, Inc. Melt recharge apparatus
US4631560A (en) 1984-12-19 1986-12-23 Eaton Corporation MOMS tunnel emission transistor
JPS61206243A (ja) 1985-03-08 1986-09-12 Mitsubishi Electric Corp 高融点金属電極・配線膜を用いた半導体装置
DE3663871D1 (en) 1985-04-11 1989-07-13 Siemens Ag Integrated semiconductor circuit having an aluminium or aluminium alloy contact conductor path and an intermediate tantalum silicide layer as a diffusion barrier
JPS62170450A (ja) * 1986-01-22 1987-07-27 Nec Corp Ta系非晶質合金及びその製造方法
DE3700659A1 (de) * 1986-01-29 1987-07-30 Fansteel Inc Feinkoerniger versproedungsfester tantaldraht
US4859257A (en) 1986-01-29 1989-08-22 Fansteel Inc. Fine grained embrittlement resistant tantalum wire
US5247198A (en) 1988-09-20 1993-09-21 Hitachi, Ltd. Semiconductor integrated circuit device with multiplayered wiring
US5286669A (en) 1989-07-06 1994-02-15 Kabushiki Kaisha Toshiba Solid-state imaging device and method of manufacturing the same
EP0532658B1 (en) * 1990-06-06 1997-09-10 Cabot Corporation Tantalum or niobium base alloys
RU2100467C1 (ru) * 1990-06-06 1997-12-27 Кабот Корпорейшн Изделие из сплава на основе тугоплавкого металла и проволока из сплава на основе тантала
DE69117443T2 (de) 1990-11-12 1996-08-08 Salvador Casablanca Plaxats Olle Verfahren zum Blasformen von thermoplastischen Kunstharzen
JP2962813B2 (ja) * 1990-11-20 1999-10-12 三洋電機株式会社 水素吸蔵合金電極
KR960001611B1 (ko) 1991-03-06 1996-02-02 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법
US5171379A (en) 1991-05-15 1992-12-15 Cabot Corporation Tantalum base alloys
US5545571A (en) 1991-08-26 1996-08-13 Semiconductor Energy Laboratory Co., Ltd. Method of making TFT with anodic oxidation process using positive and negative voltages
US5576225A (en) 1992-05-09 1996-11-19 Semiconductor Energy Laboratory Co., Ltd. Method of forming electric circuit using anodic oxidation
US5411611A (en) 1993-08-05 1995-05-02 Cabot Corporation Consumable electrode method for forming micro-alloyed products
JPH08165528A (ja) * 1994-12-09 1996-06-25 Japan Energy Corp 高純度高融点金属または合金の製造方法

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