JP2002515349A5 - - Google Patents

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Publication number
JP2002515349A5
JP2002515349A5 JP2000549428A JP2000549428A JP2002515349A5 JP 2002515349 A5 JP2002515349 A5 JP 2002515349A5 JP 2000549428 A JP2000549428 A JP 2000549428A JP 2000549428 A JP2000549428 A JP 2000549428A JP 2002515349 A5 JP2002515349 A5 JP 2002515349A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000549428A
Other languages
Japanese (ja)
Other versions
JP2002515349A (ja
JP4408566B2 (ja
Filing date
Publication date
Priority claimed from US09/080,094 external-priority patent/US6436228B1/en
Application filed filed Critical
Publication of JP2002515349A publication Critical patent/JP2002515349A/ja
Publication of JP2002515349A5 publication Critical patent/JP2002515349A5/ja
Application granted granted Critical
Publication of JP4408566B2 publication Critical patent/JP4408566B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000549428A 1998-05-15 1999-04-30 基板保持器 Expired - Fee Related JP4408566B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/080,094 US6436228B1 (en) 1998-05-15 1998-05-15 Substrate retainer
US09/080,094 1998-05-15
PCT/US1999/009569 WO1999059776A1 (en) 1998-05-15 1999-04-30 Substrate retainer

Publications (3)

Publication Number Publication Date
JP2002515349A JP2002515349A (ja) 2002-05-28
JP2002515349A5 true JP2002515349A5 (enExample) 2009-07-30
JP4408566B2 JP4408566B2 (ja) 2010-02-03

Family

ID=22155219

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000549428A Expired - Fee Related JP4408566B2 (ja) 1998-05-15 1999-04-30 基板保持器

Country Status (6)

Country Link
US (5) US6436228B1 (enExample)
EP (1) EP1077789A1 (enExample)
JP (1) JP4408566B2 (enExample)
KR (1) KR20010043642A (enExample)
TW (1) TW541229B (enExample)
WO (1) WO1999059776A1 (enExample)

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KR102229556B1 (ko) 2013-01-11 2021-03-18 어플라이드 머티어리얼스, 인코포레이티드 화학 기계적 폴리싱 장치 및 방법
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US10500695B2 (en) 2015-05-29 2019-12-10 Applied Materials, Inc. Retaining ring having inner surfaces with features
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US10029346B2 (en) 2015-10-16 2018-07-24 Applied Materials, Inc. External clamp ring for a chemical mechanical polishing carrier head
JP6380333B2 (ja) * 2015-10-30 2018-08-29 株式会社Sumco ウェーハ研磨装置およびこれに用いる研磨ヘッド
CN107088829B (zh) * 2017-05-16 2023-08-08 张家港市宇安精密机械有限公司 套筒研磨夹具
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CN113573844B (zh) 2019-02-28 2023-12-08 应用材料公司 用于化学机械抛光承载头的固定器
JP1651619S (enExample) * 2019-07-11 2020-01-27
JP1651618S (enExample) * 2019-07-11 2020-01-27
JP1651623S (enExample) * 2019-07-18 2020-01-27
US11691241B1 (en) * 2019-08-05 2023-07-04 Keltech Engineering, Inc. Abrasive lapping head with floating and rigid workpiece carrier
US11511390B2 (en) 2019-08-30 2022-11-29 Applied Materials, Inc. Pivotable substrate retaining ring
US11724355B2 (en) 2020-09-30 2023-08-15 Applied Materials, Inc. Substrate polish edge uniformity control with secondary fluid dispense
WO2022081398A1 (en) 2020-10-13 2022-04-21 Applied Materials, Inc. Substrate polishing apparatus with contact extension or adjustable stop
US11623321B2 (en) 2020-10-14 2023-04-11 Applied Materials, Inc. Polishing head retaining ring tilting moment control
US20230063687A1 (en) * 2021-08-27 2023-03-02 Taiwan Semiconductor Manufacturing Company Limited Apparatus for polishing a wafer
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) * 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
US20230356354A1 (en) * 2022-05-03 2023-11-09 Applied Materials, Inc. Compliant inner ring for a chemical mechanical polishing system
CN115008342B (zh) * 2022-06-15 2023-08-25 安徽禾臣新材料有限公司 一种晶片抛光用防崩角的无蜡垫及其生产工艺
US20240075584A1 (en) * 2022-09-01 2024-03-07 Applied Materials, Inc. Retainer for chemical mechanical polishing carrier head
JP1741176S (ja) * 2022-10-20 2023-04-06 サセプタ用カバーベース
JP1745873S (ja) * 2022-10-20 2023-06-08 サセプタ
JP1741174S (ja) * 2022-10-20 2023-04-06 サセプタ
JP1741172S (ja) * 2022-10-20 2023-04-06 サセプタカバー
JP1745925S (ja) * 2022-10-20 2023-06-08 サセプタカバー
JP1746405S (ja) * 2023-01-11 2023-06-15 サセプタカバー
JP1746407S (ja) * 2023-01-11 2023-06-15 サセプタ
JP1746408S (ja) * 2023-01-11 2023-06-15 サセプタ
JP1746406S (ja) * 2023-01-11 2023-06-15 サセプタユニット
JP1746403S (ja) * 2023-01-11 2023-06-15 サセプタ

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