JP2002363123A - 光活性化合物および感光性樹脂組成物 - Google Patents

光活性化合物および感光性樹脂組成物

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Publication number
JP2002363123A
JP2002363123A JP2002094756A JP2002094756A JP2002363123A JP 2002363123 A JP2002363123 A JP 2002363123A JP 2002094756 A JP2002094756 A JP 2002094756A JP 2002094756 A JP2002094756 A JP 2002094756A JP 2002363123 A JP2002363123 A JP 2002363123A
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JP
Japan
Prior art keywords
group
bis
tert
hydroxy
synthesis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002094756A
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English (en)
Japanese (ja)
Other versions
JP2002363123A5 (https=
Inventor
Makoto Hanabatake
誠 花畑
Masahiro Sato
正洋 佐藤
Junko Katayama
淳子 片山
Satsuki Kitajima
さつき 北島
Atsushi Niwa
淳 丹羽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Research Institute KRI Inc
Original Assignee
Kansai Research Institute KRI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Research Institute KRI Inc filed Critical Kansai Research Institute KRI Inc
Priority to JP2002094756A priority Critical patent/JP2002363123A/ja
Publication of JP2002363123A publication Critical patent/JP2002363123A/ja
Publication of JP2002363123A5 publication Critical patent/JP2002363123A5/ja
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002094756A 2001-03-29 2002-03-29 光活性化合物および感光性樹脂組成物 Pending JP2002363123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002094756A JP2002363123A (ja) 2001-03-29 2002-03-29 光活性化合物および感光性樹脂組成物

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001097019 2001-03-29
JP2001097020 2001-03-29
JP2001-97019 2001-03-29
JP2001-97020 2001-03-29
JP2002094756A JP2002363123A (ja) 2001-03-29 2002-03-29 光活性化合物および感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JP2002363123A true JP2002363123A (ja) 2002-12-18
JP2002363123A5 JP2002363123A5 (https=) 2005-09-15

Family

ID=27346404

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JP2002094756A Pending JP2002363123A (ja) 2001-03-29 2002-03-29 光活性化合物および感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JP2002363123A (https=)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004137262A (ja) * 2002-09-27 2004-05-13 Osaka Gas Co Ltd フルオレン誘導体及び光活性化合物
WO2005029189A1 (ja) * 2003-09-18 2005-03-31 Mitsubishi Gas Chemical Company, Inc. レジスト用化合物および感放射線性組成物
JP2005139087A (ja) * 2003-11-05 2005-06-02 Asahi Organic Chem Ind Co Ltd フェノール誘導体の製造方法
JP2005346024A (ja) * 2003-09-18 2005-12-15 Mitsubishi Gas Chem Co Inc レジスト用化合物および感放射線性組成物
JP2006151833A (ja) * 2004-11-25 2006-06-15 Osaka Gas Co Ltd フルオレン誘導体および感光性樹脂組成物
WO2006068267A1 (ja) * 2004-12-24 2006-06-29 Mitsubishi Gas Chemical Company, Inc. レジスト用化合物および感放射線性組成物
KR100660016B1 (ko) 2005-02-18 2006-12-20 삼성전자주식회사 감광성 수지, 이를 포함하는 포토레지스트 조성물 및 이를이용한 포토레지스트 패턴 형성 방법
EP1757980A1 (en) 2005-08-17 2007-02-28 JSR Corporation Radiation sensitive resin composition
JP2009199021A (ja) * 2008-02-25 2009-09-03 Fujifilm Corp ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP2011081046A (ja) * 2009-10-02 2011-04-21 Tokyo Ohka Kogyo Co Ltd レジスト組成物、レジストパターン形成方法
JP2013011905A (ja) * 2012-09-18 2013-01-17 Fujifilm Corp ポジ型レジスト組成物及びそれを用いたパターン形成方法
US8722306B2 (en) 2007-06-05 2014-05-13 Jsr Corporation Radiation-sensitive resin composition
US8884034B2 (en) 2009-07-08 2014-11-11 Dermira (Canada), Inc. TOFA analogs useful in treating dermatological disorders or conditions
US8889336B2 (en) 2010-12-02 2014-11-18 Jsr Corporation Radiation-sensitive resin composition and radiation-sensitive acid generating agent
US8889335B2 (en) 2010-09-09 2014-11-18 Jsr Corporation Radiation-sensitive resin composition
US9104102B2 (en) 2010-01-29 2015-08-11 Jsr Corporation Radiation-sensitive resin composition
US9122154B2 (en) 2011-01-11 2015-09-01 Jsr Corporation Radiation-sensitive resin composition, and radiation-sensitive acid generating agent

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004137262A (ja) * 2002-09-27 2004-05-13 Osaka Gas Co Ltd フルオレン誘導体及び光活性化合物
WO2005029189A1 (ja) * 2003-09-18 2005-03-31 Mitsubishi Gas Chemical Company, Inc. レジスト用化合物および感放射線性組成物
JP2005346024A (ja) * 2003-09-18 2005-12-15 Mitsubishi Gas Chem Co Inc レジスト用化合物および感放射線性組成物
JP2005139087A (ja) * 2003-11-05 2005-06-02 Asahi Organic Chem Ind Co Ltd フェノール誘導体の製造方法
JP2006151833A (ja) * 2004-11-25 2006-06-15 Osaka Gas Co Ltd フルオレン誘導体および感光性樹脂組成物
US8802353B2 (en) 2004-12-24 2014-08-12 Mitsubishi Gas Chemical Company, Inc. Compound for resist and radiation-sensitive composition specification
WO2006068267A1 (ja) * 2004-12-24 2006-06-29 Mitsubishi Gas Chemical Company, Inc. レジスト用化合物および感放射線性組成物
US7919223B2 (en) 2004-12-24 2011-04-05 Mitsubishi Gas Chemical Company, Inc. Compound for resist and radiation-sensitive composition
EP2808736A2 (en) 2004-12-24 2014-12-03 Mitsubishi Gas Chemical Company, Inc. Compound for resist and radiation-sensitive composition
US8350096B2 (en) 2004-12-24 2013-01-08 Mitsubishi Gas Chemical Company, Inc. Compound for resist and radiation-sensitive composition
EP2662727A2 (en) 2004-12-24 2013-11-13 Mitsubishi Gas Chemical Company, Inc. Compound for resist and radiation-sensitive composition
KR100660016B1 (ko) 2005-02-18 2006-12-20 삼성전자주식회사 감광성 수지, 이를 포함하는 포토레지스트 조성물 및 이를이용한 포토레지스트 패턴 형성 방법
EP1757980A1 (en) 2005-08-17 2007-02-28 JSR Corporation Radiation sensitive resin composition
US8722306B2 (en) 2007-06-05 2014-05-13 Jsr Corporation Radiation-sensitive resin composition
JP2009199021A (ja) * 2008-02-25 2009-09-03 Fujifilm Corp ポジ型レジスト組成物及びそれを用いたパターン形成方法
US9782382B2 (en) 2009-07-08 2017-10-10 Dermira (Canada), Inc. TOFA analogs useful in treating dermatological disorders or conditions
US8884034B2 (en) 2009-07-08 2014-11-11 Dermira (Canada), Inc. TOFA analogs useful in treating dermatological disorders or conditions
US9434718B2 (en) 2009-07-08 2016-09-06 Dermira (Canada), Inc. TOFA analogs useful in treating dermatological disorders or conditions
JP2011081046A (ja) * 2009-10-02 2011-04-21 Tokyo Ohka Kogyo Co Ltd レジスト組成物、レジストパターン形成方法
US9104102B2 (en) 2010-01-29 2015-08-11 Jsr Corporation Radiation-sensitive resin composition
US8889335B2 (en) 2010-09-09 2014-11-18 Jsr Corporation Radiation-sensitive resin composition
US8889336B2 (en) 2010-12-02 2014-11-18 Jsr Corporation Radiation-sensitive resin composition and radiation-sensitive acid generating agent
US9122154B2 (en) 2011-01-11 2015-09-01 Jsr Corporation Radiation-sensitive resin composition, and radiation-sensitive acid generating agent
JP2013011905A (ja) * 2012-09-18 2013-01-17 Fujifilm Corp ポジ型レジスト組成物及びそれを用いたパターン形成方法

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