JP2002321967A - 低熱膨張セラミックス - Google Patents

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Publication number

JP2002321967A

JP2002321967A JP2001126307A JP2001126307A JP2002321967A JP 2002321967 A JP2002321967 A JP 2002321967A JP 2001126307 A JP2001126307 A JP 2001126307A JP 2001126307 A JP2001126307 A JP 2001126307A JP 2002321967 A JP2002321967 A JP 2002321967A

Authority

JP

Japan

Prior art keywords

ceramic

thermal expansion

pores

jis

ceramics

Prior art date

2001-04-24

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

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• 239000000919 ceramic Substances 0.000 title claims abstract description 51
• 238000004519 manufacturing process Methods 0.000 claims abstract description 19
• 239000011148 porous material Substances 0.000 claims abstract description 19
• 239000004065 semiconductor Substances 0.000 claims abstract description 19
• 239000000463 material Substances 0.000 claims abstract description 11
• 229910052581 Si3N4 Inorganic materials 0.000 claims description 12
• 238000000034 method Methods 0.000 claims description 12
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 12
• NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 9
• CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 claims description 8
• 229910052642 spodumene Inorganic materials 0.000 claims description 8
• 229910000505 Al2TiO5 Inorganic materials 0.000 claims description 7
• 229910000174 eucryptite Inorganic materials 0.000 claims description 7
• AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 claims description 7
• 229910019142 PO4 Inorganic materials 0.000 claims description 6
• NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 6
• 239000010452 phosphate Substances 0.000 claims description 6
• QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 3
• OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 3
• 229910052799 carbon Inorganic materials 0.000 claims description 3
• PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
• JCDAAXRCMMPNBO-UHFFFAOYSA-N iron(3+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4].[Fe+3].[Fe+3] JCDAAXRCMMPNBO-UHFFFAOYSA-N 0.000 claims description 3
• HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 3
• 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
• XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 3
• 229910001887 tin oxide Inorganic materials 0.000 claims description 3
• MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 3
• 239000000758 substrate Substances 0.000 claims description 2
• 229910010293 ceramic material Inorganic materials 0.000 abstract 1
• 238000005245 sintering Methods 0.000 description 8
• 238000002156 mixing Methods 0.000 description 6
• 230000000052 comparative effect Effects 0.000 description 5
• 239000000428 dust Substances 0.000 description 5
• 239000000203 mixture Substances 0.000 description 5
• 239000010954 inorganic particle Substances 0.000 description 4
• 239000012212 insulator Substances 0.000 description 4
• 239000002245 particle Substances 0.000 description 4
• 239000000843 powder Substances 0.000 description 4
• 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
• XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
• 238000000206 photolithography Methods 0.000 description 2
• 229910018068 Li 2 O Inorganic materials 0.000 description 1
• 229910000502 Li-aluminosilicate Inorganic materials 0.000 description 1
• BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
• 230000000996 additive effect Effects 0.000 description 1
• 239000011324 bead Substances 0.000 description 1
• 229910052918 calcium silicate Inorganic materials 0.000 description 1
• 239000000378 calcium silicate Substances 0.000 description 1
• OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
• 239000002131 composite material Substances 0.000 description 1
• 238000007796 conventional method Methods 0.000 description 1
• 229910052878 cordierite Inorganic materials 0.000 description 1
• 230000007423 decrease Effects 0.000 description 1
• 230000007547 defect Effects 0.000 description 1
• JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
• 238000005516 engineering process Methods 0.000 description 1
• 238000001125 extrusion Methods 0.000 description 1
• 238000010304 firing Methods 0.000 description 1
• 230000005484 gravity Effects 0.000 description 1
• 238000001513 hot isostatic pressing Methods 0.000 description 1
• 239000011261 inert gas Substances 0.000 description 1
• 230000010354 integration Effects 0.000 description 1
• 229910052742 iron Inorganic materials 0.000 description 1
• 238000005259 measurement Methods 0.000 description 1
• 238000000465 moulding Methods 0.000 description 1
• 230000000704 physical effect Effects 0.000 description 1
• 238000003825 pressing Methods 0.000 description 1
• 238000010298 pulverizing process Methods 0.000 description 1
• 230000035939 shock Effects 0.000 description 1
• 229910052710 silicon Inorganic materials 0.000 description 1
• 239000010703 silicon Substances 0.000 description 1
• 230000003068 static effect Effects 0.000 description 1
• LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1

Cited By (2)