JP2002283580A5 - - Google Patents
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- Publication number
- JP2002283580A5 JP2002283580A5 JP2002071598A JP2002071598A JP2002283580A5 JP 2002283580 A5 JP2002283580 A5 JP 2002283580A5 JP 2002071598 A JP2002071598 A JP 2002071598A JP 2002071598 A JP2002071598 A JP 2002071598A JP 2002283580 A5 JP2002283580 A5 JP 2002283580A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- trench
- thin film
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 15
- 239000010409 thin film Substances 0.000 claims 13
- 238000005530 etching Methods 0.000 claims 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 8
- 229920005591 polysilicon Polymers 0.000 claims 8
- 238000000034 method Methods 0.000 claims 7
- 238000001039 wet etching Methods 0.000 claims 3
- 230000000873 masking effect Effects 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/811,052 US6517735B2 (en) | 2001-03-15 | 2001-03-15 | Ink feed trench etch technique for a fully integrated thermal inkjet printhead |
| US09/811052 | 2001-03-15 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002283580A JP2002283580A (ja) | 2002-10-03 |
| JP2002283580A5 true JP2002283580A5 (cg-RX-API-DMAC7.html) | 2005-04-07 |
| JP4278335B2 JP4278335B2 (ja) | 2009-06-10 |
Family
ID=25205411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002071598A Expired - Fee Related JP4278335B2 (ja) | 2001-03-15 | 2002-03-15 | 完全に一体化した熱インクジェットプリントヘッド用のインク供給トレンチエッチング技術 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6517735B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1241009B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4278335B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE60204251T2 (cg-RX-API-DMAC7.html) |
| HK (1) | HK1046388B (cg-RX-API-DMAC7.html) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6675476B2 (en) * | 2000-12-05 | 2004-01-13 | Hewlett-Packard Development Company, L.P. | Slotted substrates and techniques for forming same |
| US7052117B2 (en) | 2002-07-03 | 2006-05-30 | Dimatix, Inc. | Printhead having a thin pre-fired piezoelectric layer |
| KR100499132B1 (ko) * | 2002-10-24 | 2005-07-04 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| CN100355573C (zh) * | 2002-12-27 | 2007-12-19 | 佳能株式会社 | 用于制造喷墨记录头的基础件 |
| US7036913B2 (en) * | 2003-05-27 | 2006-05-02 | Samsung Electronics Co., Ltd. | Ink-jet printhead |
| US7281778B2 (en) | 2004-03-15 | 2007-10-16 | Fujifilm Dimatix, Inc. | High frequency droplet ejection device and method |
| US8491076B2 (en) | 2004-03-15 | 2013-07-23 | Fujifilm Dimatix, Inc. | Fluid droplet ejection devices and methods |
| WO2006074016A2 (en) | 2004-12-30 | 2006-07-13 | Fujifilm Dimatix, Inc. | Ink jet printing |
| JP4854328B2 (ja) * | 2005-04-13 | 2012-01-18 | キヤノン株式会社 | 液体吐出記録ヘッド |
| US7390745B2 (en) * | 2005-09-23 | 2008-06-24 | International Business Machines Corporation | Pattern enhancement by crystallographic etching |
| US7988247B2 (en) | 2007-01-11 | 2011-08-02 | Fujifilm Dimatix, Inc. | Ejection of drops having variable drop size from an ink jet printer |
| US9016837B2 (en) | 2013-05-14 | 2015-04-28 | Stmicroelectronics, Inc. | Ink jet printhead device with compressive stressed dielectric layer |
| US9016836B2 (en) | 2013-05-14 | 2015-04-28 | Stmicroelectronics, Inc. | Ink jet printhead with polarity-changing driver for thermal resistors |
| US11746005B2 (en) | 2021-03-04 | 2023-09-05 | Funai Electric Co. Ltd | Deep reactive ion etching process for fluid ejection heads |
| CN113584456A (zh) * | 2021-07-21 | 2021-11-02 | 深圳清华大学研究院 | 超滑骨架及其加工方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0367303A1 (en) | 1986-04-28 | 1990-05-09 | Hewlett-Packard Company | Thermal ink jet printhead |
| US4789425A (en) | 1987-08-06 | 1988-12-06 | Xerox Corporation | Thermal ink jet printhead fabricating process |
| US4864329A (en) | 1988-09-22 | 1989-09-05 | Xerox Corporation | Fluid handling device with filter and fabrication process therefor |
| US5001085A (en) * | 1990-07-17 | 1991-03-19 | Micron Technology, Inc. | Process for creating a metal etch mask which may be utilized for halogen-plasma excavation of deep trenches |
| US5648806A (en) | 1992-04-02 | 1997-07-15 | Hewlett-Packard Company | Stable substrate structure for a wide swath nozzle array in a high resolution inkjet printer |
| US5852459A (en) | 1994-10-31 | 1998-12-22 | Hewlett-Packard Company | Printer using print cartridge with internal pressure regulator |
| US6305790B1 (en) * | 1996-02-07 | 2001-10-23 | Hewlett-Packard Company | Fully integrated thermal inkjet printhead having multiple ink feed holes per nozzle |
| DK0841167T3 (da) | 1996-11-11 | 2005-01-24 | Canon Kk | Fremgangsmåde til fremstilling af gennemgående hul og anvendelse af den nævnte fremgangsmåde til fremstilling af et siliciumsubstrat, der har et gennemgående hul, og en anordning, der anvender et sådant substrat, fremgangsmåde til fremstilling..... |
| US6019907A (en) * | 1997-08-08 | 2000-02-01 | Hewlett-Packard Company | Forming refill for monolithic inkjet printhead |
| US6154234A (en) * | 1998-01-09 | 2000-11-28 | Hewlett-Packard Company | Monolithic ink jet nozzle formed from an oxide and nitride composition |
| US6391527B2 (en) * | 1998-04-16 | 2002-05-21 | Canon Kabushiki Kaisha | Method of producing micro structure, method of production liquid discharge head |
-
2001
- 2001-03-15 US US09/811,052 patent/US6517735B2/en not_active Expired - Fee Related
-
2002
- 2002-03-08 EP EP02251654A patent/EP1241009B1/en not_active Expired - Lifetime
- 2002-03-08 DE DE60204251T patent/DE60204251T2/de not_active Expired - Lifetime
- 2002-03-15 JP JP2002071598A patent/JP4278335B2/ja not_active Expired - Fee Related
- 2002-10-29 HK HK02107817.4A patent/HK1046388B/en not_active IP Right Cessation
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