JP2002254662A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002254662A5 JP2002254662A5 JP2002016080A JP2002016080A JP2002254662A5 JP 2002254662 A5 JP2002254662 A5 JP 2002254662A5 JP 2002016080 A JP2002016080 A JP 2002016080A JP 2002016080 A JP2002016080 A JP 2002016080A JP 2002254662 A5 JP2002254662 A5 JP 2002254662A5
- Authority
- JP
- Japan
- Prior art keywords
- ink supply
- substrate
- supply opening
- forming
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims 14
- 238000000034 method Methods 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 13
- 239000011241 protective layer Substances 0.000 claims 9
- 239000010409 thin film Substances 0.000 claims 8
- 238000005530 etching Methods 0.000 claims 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000000873 masking effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/770,723 US6419346B1 (en) | 2001-01-25 | 2001-01-25 | Two-step trench etch for a fully integrated thermal inkjet printhead |
| US09/770723 | 2001-01-25 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002254662A JP2002254662A (ja) | 2002-09-11 |
| JP2002254662A5 true JP2002254662A5 (cg-RX-API-DMAC7.html) | 2005-04-07 |
| JP3980361B2 JP3980361B2 (ja) | 2007-09-26 |
Family
ID=25089474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002016080A Expired - Fee Related JP3980361B2 (ja) | 2001-01-25 | 2002-01-24 | 完全に一体化されたサーマル・インクジェットプリントヘッドを形成するための2段階のトレンチエッチング |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6419346B1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1226946B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP3980361B2 (cg-RX-API-DMAC7.html) |
| DE (1) | DE60208088T2 (cg-RX-API-DMAC7.html) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6481832B2 (en) | 2001-01-29 | 2002-11-19 | Hewlett-Packard Company | Fluid-jet ejection device |
| US6626523B2 (en) * | 2001-10-31 | 2003-09-30 | Hewlett-Packard Development Company, Lp. | Printhead having a thin film membrane with a floating section |
| US6908784B1 (en) * | 2002-03-06 | 2005-06-21 | Micron Technology, Inc. | Method for fabricating encapsulated semiconductor components |
| KR100484168B1 (ko) | 2002-10-11 | 2005-04-19 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| KR100499132B1 (ko) * | 2002-10-24 | 2005-07-04 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| US6648454B1 (en) | 2002-10-30 | 2003-11-18 | Hewlett-Packard Development Company, L.P. | Slotted substrate and method of making |
| KR100459905B1 (ko) * | 2002-11-21 | 2004-12-03 | 삼성전자주식회사 | 두 개의 잉크챔버 사이에 배치된 히터를 가진 일체형잉크젯 프린트헤드 및 그 제조방법 |
| KR100468160B1 (ko) * | 2002-12-02 | 2005-01-26 | 삼성전자주식회사 | 모노리식 버블 잉크젯 프린트 헤드 및 그 제조방법 |
| KR100477707B1 (ko) * | 2003-05-13 | 2005-03-18 | 삼성전자주식회사 | 모놀리틱 잉크젯 프린트헤드 제조방법 |
| US7036913B2 (en) | 2003-05-27 | 2006-05-02 | Samsung Electronics Co., Ltd. | Ink-jet printhead |
| KR100517515B1 (ko) | 2004-01-20 | 2005-09-28 | 삼성전자주식회사 | 모놀리틱 잉크젯 프린트헤드의 제조방법 |
| GB2410464A (en) * | 2004-01-29 | 2005-08-03 | Hewlett Packard Development Co | A method of making an inkjet printhead |
| US20050260522A1 (en) * | 2004-02-13 | 2005-11-24 | William Weber | Permanent resist composition, cured product thereof, and use thereof |
| US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
| KR100765315B1 (ko) | 2004-07-23 | 2007-10-09 | 삼성전자주식회사 | 기판과 일체로 이루어진 필터링 부재를 구비하는 잉크젯헤드 및 그 제조방법. |
| US8043517B2 (en) * | 2005-09-19 | 2011-10-25 | Hewlett-Packard Development Company, L.P. | Method of forming openings in substrates and inkjet printheads fabricated thereby |
| KR20080046865A (ko) * | 2006-11-23 | 2008-05-28 | 삼성전자주식회사 | 헤드칩 및 이를 포함하는 화상형성장치용 잉크카트리지 |
| EP2091741B1 (en) | 2006-12-07 | 2011-08-24 | Hewlett-Packard Development Company, L.P. | Method of forming openings in substrates |
| US8241510B2 (en) * | 2007-01-22 | 2012-08-14 | Canon Kabushiki Kaisha | Inkjet recording head, method for producing same, and semiconductor device |
| KR20090024381A (ko) * | 2007-09-04 | 2009-03-09 | 삼성전자주식회사 | 잉크젯 프린트 헤드 |
| JP5854693B2 (ja) * | 2010-09-01 | 2016-02-09 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| EP2828081B1 (en) * | 2012-07-24 | 2019-10-09 | Hewlett-Packard Company, L.P. | Fluid ejection device with particle tolerant thin-film extension |
| JP6103879B2 (ja) * | 2012-10-24 | 2017-03-29 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| WO2014098855A1 (en) | 2012-12-20 | 2014-06-26 | Hewlett-Packard Development Company, L.P. | Fluid ejection device with particle tolerant layer extension |
| WO2015163888A1 (en) | 2014-04-24 | 2015-10-29 | Hewlett-Packard Development Company, L.P. | Fluidic ejection device with layers having different light sensitivities |
| EP3429856B1 (en) * | 2016-07-26 | 2022-01-12 | Hewlett-Packard Development Company, L.P. | Fluid ejection device with a portioning wall |
| JP7066418B2 (ja) * | 2018-01-17 | 2022-05-13 | キヤノン株式会社 | 液体吐出ヘッドおよびその製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0367303A1 (en) | 1986-04-28 | 1990-05-09 | Hewlett-Packard Company | Thermal ink jet printhead |
| US4789425A (en) * | 1987-08-06 | 1988-12-06 | Xerox Corporation | Thermal ink jet printhead fabricating process |
| US5648806A (en) | 1992-04-02 | 1997-07-15 | Hewlett-Packard Company | Stable substrate structure for a wide swath nozzle array in a high resolution inkjet printer |
| DK0841167T3 (da) | 1996-11-11 | 2005-01-24 | Canon Kk | Fremgangsmåde til fremstilling af gennemgående hul og anvendelse af den nævnte fremgangsmåde til fremstilling af et siliciumsubstrat, der har et gennemgående hul, og en anordning, der anvender et sådant substrat, fremgangsmåde til fremstilling..... |
| US6022482A (en) * | 1997-08-04 | 2000-02-08 | Xerox Corporation | Monolithic ink jet printhead |
| JP3408130B2 (ja) * | 1997-12-19 | 2003-05-19 | キヤノン株式会社 | インクジェット記録ヘッドおよびその製造方法 |
-
2001
- 2001-01-25 US US09/770,723 patent/US6419346B1/en not_active Expired - Lifetime
-
2002
- 2002-01-18 DE DE60208088T patent/DE60208088T2/de not_active Expired - Lifetime
- 2002-01-18 EP EP02250340A patent/EP1226946B1/en not_active Expired - Lifetime
- 2002-01-24 JP JP2002016080A patent/JP3980361B2/ja not_active Expired - Fee Related
- 2002-06-27 US US10/185,532 patent/US20020167553A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002254662A5 (cg-RX-API-DMAC7.html) | ||
| KR100506436B1 (ko) | 액체 토출 기록 헤드 및 이를 제조하기 위한 방법 | |
| KR100519764B1 (ko) | 잉크젯 프린트헤드의 압전 액츄에이터 및 그 형성 방법 | |
| US8173030B2 (en) | Liquid drop ejector having self-aligned hole | |
| US8377828B2 (en) | Method of manufacturing a substrate for a liquid discharge head | |
| KR100474423B1 (ko) | 버블 잉크젯 프린트 헤드 및 그 제조방법 | |
| EP1226946A3 (en) | Two-step trench etch for a fully integrated thermal inkjet printhead | |
| US7325310B2 (en) | Method for manufacturing a monolithic ink-jet printhead | |
| KR100560593B1 (ko) | 액체 토출 헤드의 제조방법 | |
| US7481942B2 (en) | Monolithic ink-jet printhead and method of manufacturing the same | |
| JP2002283580A5 (cg-RX-API-DMAC7.html) | ||
| JP2003165225A5 (cg-RX-API-DMAC7.html) | ||
| EP1241009A3 (en) | Ink feed trench etch technique for a fully integrated thermal inkjet printhead | |
| US8172370B2 (en) | Planar heater stack and method for making planar heater stack | |
| EP3160751A1 (en) | Fluid ejection structure | |
| KR20080060003A (ko) | 잉크젯 프린트 헤드의 제조방법 | |
| JP2016117174A (ja) | シリコン基板の加工方法、及び液体吐出ヘッド | |
| JP7134831B2 (ja) | 液体吐出ヘッドの製造方法 | |
| JP2007098813A5 (cg-RX-API-DMAC7.html) | ||
| JP4993731B2 (ja) | 液体吐出ヘッドの製造方法 | |
| JP5959979B2 (ja) | 貫通口を有する基板、液体吐出ヘッド用基板及び液体吐出ヘッドの製造方法 | |
| US20070134928A1 (en) | Silicon wet etching method using parylene mask and method of manufacturing nozzle plate of inkjet printhead using the same | |
| US10632754B2 (en) | Perforated substrate processing method and liquid ejection head manufacturing method | |
| JP4298286B2 (ja) | インクジェット記録ヘッドの製造方法 | |
| JP6032955B2 (ja) | 液体吐出ヘッドの製造方法 |