JP2002268224A5 - - Google Patents
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- Publication number
- JP2002268224A5 JP2002268224A5 JP2001069052A JP2001069052A JP2002268224A5 JP 2002268224 A5 JP2002268224 A5 JP 2002268224A5 JP 2001069052 A JP2001069052 A JP 2001069052A JP 2001069052 A JP2001069052 A JP 2001069052A JP 2002268224 A5 JP2002268224 A5 JP 2002268224A5
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- positive photosensitive
- acid
- group
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 125000002950 monocyclic group Chemical group 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000003513 alkali Substances 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 0 C*C(CC1C2C3C(*)(*)C(*)(*)C1C3)C2C(C)(C)C Chemical compound C*C(CC1C2C3C(*)(*)C(*)(*)C1C3)C2C(C)(C)C 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical group 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001069052A JP4225699B2 (ja) | 2001-03-12 | 2001-03-12 | ポジ型感光性組成物 |
| KR1020020013291A KR100890232B1 (ko) | 2001-03-12 | 2002-03-12 | 포지티브 감광성 조성물 및 이를 사용한 패턴 형성 방법 |
| TW91104582A TW573228B (en) | 2001-03-12 | 2002-03-12 | Positive photosensitive compositions |
| US10/095,086 US6844132B2 (en) | 2001-03-12 | 2002-03-12 | Positive photosensitive compositions |
| KR1020080095610A KR100933915B1 (ko) | 2001-03-12 | 2008-09-29 | 포지티브 감광성 조성물 및 이를 사용한 패턴 형성 방법 |
| US12/649,828 USRE43560E1 (en) | 2001-03-12 | 2009-12-30 | Positive photosensitive compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001069052A JP4225699B2 (ja) | 2001-03-12 | 2001-03-12 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002268224A JP2002268224A (ja) | 2002-09-18 |
| JP2002268224A5 true JP2002268224A5 (enExample) | 2006-01-19 |
| JP4225699B2 JP4225699B2 (ja) | 2009-02-18 |
Family
ID=18927140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001069052A Expired - Fee Related JP4225699B2 (ja) | 2001-03-12 | 2001-03-12 | ポジ型感光性組成物 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6844132B2 (enExample) |
| JP (1) | JP4225699B2 (enExample) |
| KR (2) | KR100890232B1 (enExample) |
| TW (1) | TW573228B (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4225699B2 (ja) * | 2001-03-12 | 2009-02-18 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP2002357905A (ja) * | 2001-03-28 | 2002-12-13 | Sumitomo Chem Co Ltd | レジスト組成物 |
| US20040192876A1 (en) * | 2002-11-18 | 2004-09-30 | Nigel Hacker | Novolac polymer planarization films with high temparature stability |
| JP2004240387A (ja) * | 2002-12-10 | 2004-08-26 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| BRPI0407605A (pt) * | 2003-02-19 | 2006-02-14 | Ciba Sc Holding Ag | derivados de oxima halogenados e o uso dos mesmos como ácidos latentes |
| US7182738B2 (en) * | 2003-04-23 | 2007-02-27 | Marctec, Llc | Patient monitoring apparatus and method for orthosis and other devices |
| US7358408B2 (en) * | 2003-05-16 | 2008-04-15 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| AU2003286758A1 (en) * | 2003-07-17 | 2005-03-07 | Honeywell International Inc | Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| JP4612999B2 (ja) * | 2003-10-08 | 2011-01-12 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| TWI375121B (en) * | 2004-06-28 | 2012-10-21 | Fujifilm Corp | Photosensitive composition and method for forming pattern using the same |
| JP4507729B2 (ja) * | 2004-07-15 | 2010-07-21 | 日産自動車株式会社 | タイヤ空気圧モニター装置 |
| JP4406590B2 (ja) * | 2004-09-16 | 2010-01-27 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| JP4406591B2 (ja) * | 2004-09-17 | 2010-01-27 | 富士フイルム株式会社 | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| JP4452596B2 (ja) | 2004-09-24 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物及び該感光性組成物を用いたパターン形成方法 |
| US20070092829A1 (en) * | 2005-10-21 | 2007-04-26 | Christoph Noelscher | Photosensitive coating for enhancing a contrast of a photolithographic exposure |
| US7601480B2 (en) * | 2006-12-20 | 2009-10-13 | Az Electronic Materials Usa Corp. | Photoactive compounds |
| JP2009079137A (ja) * | 2007-09-26 | 2009-04-16 | Fujifilm Corp | 膜形成用組成物及び膜の製造方法 |
| US8084193B2 (en) * | 2008-07-12 | 2011-12-27 | International Business Machines Corporation | Self-segregating multilayer imaging stack with built-in antireflective properties |
| JP6049250B2 (ja) * | 2010-11-30 | 2016-12-21 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 光酸発生剤 |
| KR101728820B1 (ko) * | 2013-12-12 | 2017-04-20 | 제일모직 주식회사 | 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자 |
| CN120465292B (zh) * | 2025-07-17 | 2025-09-23 | 科一(福建)超纤有限责任公司 | 一种环保型水性合成革的制备方法及其应用 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3949313B2 (ja) * | 1998-03-17 | 2007-07-25 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| EP0952489B1 (en) | 1998-04-22 | 2014-08-13 | FUJIFILM Corporation | Positive photosensitive resin composition |
| JP3922673B2 (ja) | 1998-04-22 | 2007-05-30 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物及びパターン形成方法 |
| TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
| JP3763239B2 (ja) | 1999-01-18 | 2006-04-05 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| SG76651A1 (en) * | 1999-03-31 | 2000-11-21 | Sumitomo Chemical Co | Chemical amplification type positive resist |
| KR100647527B1 (ko) | 1999-04-01 | 2006-11-17 | 후지 샤신 필름 가부시기가이샤 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
| JP2000292926A (ja) | 1999-04-01 | 2000-10-20 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP4124907B2 (ja) * | 1999-04-06 | 2008-07-23 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
| US6596458B1 (en) * | 1999-05-07 | 2003-07-22 | Fuji Photo Film Co., Ltd. | Positive-working photoresist composition |
| JP2001022072A (ja) | 1999-07-07 | 2001-01-26 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2001022070A (ja) | 1999-07-07 | 2001-01-26 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP2000338679A (ja) | 1999-05-31 | 2000-12-08 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| US6479211B1 (en) | 1999-05-26 | 2002-11-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| JP2000338673A (ja) * | 1999-05-26 | 2000-12-08 | Fuji Photo Film Co Ltd | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP3992882B2 (ja) | 1999-06-04 | 2007-10-17 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| JP3812622B2 (ja) | 1999-09-17 | 2006-08-23 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP4269119B2 (ja) | 1999-10-25 | 2009-05-27 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| EP1122605A3 (en) * | 2000-02-04 | 2001-09-19 | JSR Corporation | Radiation-sensitive resin composition |
| JP3821211B2 (ja) | 2000-03-21 | 2006-09-13 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| KR100499304B1 (ko) | 2000-03-21 | 2005-07-04 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 레지스트 재료 및 패턴 형성 방법 |
| JP4300383B2 (ja) | 2000-04-11 | 2009-07-22 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| KR100518993B1 (ko) | 2000-04-27 | 2005-10-06 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 신규한 에스테르 화합물, 고분자 화합물, 레지스트 재료및 패턴 형성 방법 |
| JP4831275B2 (ja) | 2000-04-27 | 2011-12-07 | 信越化学工業株式会社 | 新規なエステル化合物、高分子化合物、レジスト材料、及びパターン形成方法 |
| US6492090B2 (en) | 2000-04-28 | 2002-12-10 | Shin-Etsu Chemical Co., Ltd. | Polymers, resist compositions and patterning process |
| JP4544389B2 (ja) | 2000-04-28 | 2010-09-15 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| US6815143B2 (en) | 2001-01-22 | 2004-11-09 | Shin-Etsu Chemical Co., Ltd. | Resist material and pattern forming method |
| JP3880860B2 (ja) | 2001-01-22 | 2007-02-14 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| KR100795109B1 (ko) | 2001-02-23 | 2008-01-17 | 후지필름 가부시키가이샤 | 포지티브 감광성 조성물 |
| JP4225699B2 (ja) * | 2001-03-12 | 2009-02-18 | 富士フイルム株式会社 | ポジ型感光性組成物 |
| JP2002292925A (ja) | 2001-03-30 | 2002-10-09 | Kyocera Corp | 光プリンタヘッド |
| JP4257823B2 (ja) | 2002-05-27 | 2009-04-22 | パナソニック株式会社 | 半導体装置および容量測定方法 |
-
2001
- 2001-03-12 JP JP2001069052A patent/JP4225699B2/ja not_active Expired - Fee Related
-
2002
- 2002-03-12 TW TW91104582A patent/TW573228B/zh active
- 2002-03-12 KR KR1020020013291A patent/KR100890232B1/ko not_active Expired - Lifetime
- 2002-03-12 US US10/095,086 patent/US6844132B2/en not_active Ceased
-
2008
- 2008-09-29 KR KR1020080095610A patent/KR100933915B1/ko not_active Expired - Lifetime
-
2009
- 2009-12-30 US US12/649,828 patent/USRE43560E1/en not_active Expired - Lifetime
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