JP2002015405A - 薄膜磁気ヘッドおよびその製造方法 - Google Patents

薄膜磁気ヘッドおよびその製造方法

Info

Publication number
JP2002015405A
JP2002015405A JP2000195125A JP2000195125A JP2002015405A JP 2002015405 A JP2002015405 A JP 2002015405A JP 2000195125 A JP2000195125 A JP 2000195125A JP 2000195125 A JP2000195125 A JP 2000195125A JP 2002015405 A JP2002015405 A JP 2002015405A
Authority
JP
Japan
Prior art keywords
magnetic
layer
film
forming
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000195125A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002015405A5 (enExample
Inventor
Yoshitaka Sasaki
芳高 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP2000195125A priority Critical patent/JP2002015405A/ja
Priority to US09/888,504 priority patent/US6885519B2/en
Publication of JP2002015405A publication Critical patent/JP2002015405A/ja
Priority to US11/075,339 priority patent/US7603764B2/en
Publication of JP2002015405A5 publication Critical patent/JP2002015405A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49041—Fabricating head structure or component thereof including measuring or testing with significant slider/housing shaping or treating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49048—Machining magnetic material [e.g., grinding, etching, polishing]
    • Y10T29/49052—Machining magnetic material [e.g., grinding, etching, polishing] by etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
JP2000195125A 2000-06-28 2000-06-28 薄膜磁気ヘッドおよびその製造方法 Pending JP2002015405A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000195125A JP2002015405A (ja) 2000-06-28 2000-06-28 薄膜磁気ヘッドおよびその製造方法
US09/888,504 US6885519B2 (en) 2000-06-28 2001-06-26 Thin film magnetic head and the manufacturing method
US11/075,339 US7603764B2 (en) 2000-06-28 2005-03-09 Method of manufacturing a thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000195125A JP2002015405A (ja) 2000-06-28 2000-06-28 薄膜磁気ヘッドおよびその製造方法

Publications (2)

Publication Number Publication Date
JP2002015405A true JP2002015405A (ja) 2002-01-18
JP2002015405A5 JP2002015405A5 (enExample) 2005-11-04

Family

ID=18693839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000195125A Pending JP2002015405A (ja) 2000-06-28 2000-06-28 薄膜磁気ヘッドおよびその製造方法

Country Status (2)

Country Link
US (2) US6885519B2 (enExample)
JP (1) JP2002015405A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112786074A (zh) * 2019-11-07 2021-05-11 株式会社东芝 磁头以及磁记录装置

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4191913B2 (ja) * 2001-07-25 2008-12-03 株式会社日立グローバルストレージテクノロジーズ 薄膜磁気ヘッド
WO2003079332A1 (fr) * 2002-03-18 2003-09-25 Hitachi Maxell, Ltd. Support d'enregistrement magnetique et cartouche d'enregistrement magnetique
US7085100B2 (en) * 2002-03-19 2006-08-01 Hitachi Global Storage Technologies Netherlands B.V. Magnetic head having a bilayer pole tip
JP2004086961A (ja) * 2002-08-26 2004-03-18 Hitachi Ltd 磁気ヘッド及び磁気記録装置
US7113366B1 (en) * 2002-11-07 2006-09-26 Western Digital (Fremont), Inc. Double-nosed inductive transducer with reduced off-track writing
JP4079427B2 (ja) * 2003-05-14 2008-04-23 Ｔｄｋ株式会社 薄膜磁気ヘッドおよびその製造方法、ヘッドジンバルアセンブリならびにハードディスク装置
US7130153B2 (en) * 2003-09-29 2006-10-31 Hitachi Global Storage Technologies Netherlands B.V. Stitched write head with staircase P2 defined throat height
US7154706B2 (en) * 2003-11-07 2006-12-26 Headway Technologies, Inc. Thin-film magnetic head and method of manufacturing same
US7187519B2 (en) * 2003-12-03 2007-03-06 Seagate Technology Llc High gradient disc drive writer
US7463448B2 (en) * 2005-04-20 2008-12-09 Headway Technologies, Inc. Thin film magnetic head having upper and lower poles and a gap film within a trench
US20070183093A1 (en) * 2006-02-07 2007-08-09 Quang Le Protective layer for CMP assisted lift-off process and method of fabrication
JP4316580B2 (ja) * 2006-03-28 2009-08-19 株式会社東芝 磁気記録装置およびサーボ情報記録方法
US7523550B2 (en) * 2006-04-25 2009-04-28 Hitachi Global Storage Technologies Netherlands B.V. Process to open connection vias on a planarized surface
US8537494B1 (en) 2007-11-06 2013-09-17 Western Digital (Fremont), Llc PMR head with an angled stitch layer
US8077434B1 (en) 2007-11-19 2011-12-13 Western Digital (Fremont), Llc Perpendicular magnetic recording head having a recessed magnetic base layer
US8568601B2 (en) * 2007-11-29 2013-10-29 HGST Netherlands B.V. Fenceless main pole definition for advanced perpendicular magnetic write head
US9101942B2 (en) * 2009-06-16 2015-08-11 Aurora Algae, Inc. Clarification of suspensions
US8432637B2 (en) 2010-11-10 2013-04-30 HGST Netherlands B.V. Wet etching silicon oxide during the formation of a damascene pole and adjacent structure

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4190872A (en) * 1978-12-21 1980-02-26 International Business Machines Corporation Thin film inductive transducer
JPH061769B2 (ja) 1983-08-10 1994-01-05 株式会社日立製作所 アルミナ膜のパターニング方法
JPS60133516A (ja) * 1983-12-22 1985-07-16 Hitachi Ltd 薄膜磁気ヘツドの製造方法
JP2947621B2 (ja) * 1990-12-28 1999-09-13 アルプス電気株式会社 薄膜磁気ヘッド
JP2715808B2 (ja) * 1992-06-09 1998-02-18 株式会社日立製作所 薄膜磁気ヘッドの製造方法
US5739991A (en) * 1994-02-01 1998-04-14 Sanyo Electric Co., Ltd. Composite thin film head having magnetoresistive and inductive head portions with nonmagnetic thin film interposed between core and shield portions of core layer
US5438747A (en) * 1994-03-09 1995-08-08 International Business Machines Corporation Method of making a thin film merged MR head with aligned pole tips
JP3555204B2 (ja) 1994-11-25 2004-08-18 日本ビクター株式会社 薄膜磁気ヘッド
US5600519A (en) * 1995-03-06 1997-02-04 International Business Machines Corporation Controlled saturation thin film magnetic write head
US5705443A (en) * 1995-05-30 1998-01-06 Advanced Technology Materials, Inc. Etching method for refractory materials
US5814238A (en) * 1995-10-12 1998-09-29 Sandia Corporation Method for dry etching of transition metals
US5751528A (en) * 1996-04-15 1998-05-12 Read-Rite Corporation Multilayer exchange coupled magnetic poles with approximate zero magnetostriction
JP2953401B2 (ja) 1996-10-04 1999-09-27 日本電気株式会社 磁気抵抗効果型複合ヘッドの製造方法
US5831801A (en) * 1997-01-21 1998-11-03 Yamaha Corporation Thin film magnetic head with special pole configuration
US5804085A (en) * 1997-01-30 1998-09-08 Quantum Corporation Process for producing a pole-trimmed writer in a magnetoresistive read/write head and a data transducer made thereby
US5875542A (en) * 1997-04-18 1999-03-02 Read-Rite Corporation Method of making thin film merged magnetoresistive heads
JP3369444B2 (ja) * 1997-09-12 2003-01-20 ティーディーケイ株式会社 薄膜磁気ヘッド
JPH11134612A (ja) 1997-11-04 1999-05-21 Hitachi Ltd 薄膜磁気ヘッド及び記録再生分離型ヘッドの製造方法
JPH11213331A (ja) 1997-11-19 1999-08-06 Tdk Corp 薄膜磁気ヘッドおよびその製造方法
US6323132B1 (en) * 1998-01-13 2001-11-27 Applied Materials, Inc. Etching methods for anisotropic platinum profile
JP2000020916A (ja) * 1998-07-01 2000-01-21 Hitachi Ltd 誘導型薄膜磁気ヘッド
JP2000048318A (ja) 1998-07-30 2000-02-18 Tdk Corp 薄膜磁気ヘッド及びその製造方法
JP3360132B2 (ja) 1998-10-20 2002-12-24 東京エレクトロン株式会社 薄膜磁気ヘッドの製造方法
JP3617953B2 (ja) * 2000-09-18 2005-02-09 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112786074A (zh) * 2019-11-07 2021-05-11 株式会社东芝 磁头以及磁记录装置
CN112786074B (zh) * 2019-11-07 2022-06-28 株式会社东芝 磁头以及磁记录装置

Also Published As

Publication number Publication date
US6885519B2 (en) 2005-04-26
US7603764B2 (en) 2009-10-20
US20020030929A1 (en) 2002-03-14
US20050172479A1 (en) 2005-08-11

Similar Documents

Publication Publication Date Title
JP3617953B2 (ja) 薄膜磁気ヘッドの製造方法
US7392578B2 (en) Thin film magnetic head and manufacturing method thereof
US7921544B2 (en) Method of manufacturing a thin film magnetic head structure
JP3594864B2 (ja) 薄膜磁気ヘッドの製造方法
US7603764B2 (en) Method of manufacturing a thin film magnetic head
US6624971B1 (en) Thin film magnetic head and method of manufacturing the same
US6490127B1 (en) Thin film magnetic head with diverging pole connection portions
JP3859398B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP3373181B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP3539630B2 (ja) 薄膜磁気ヘッドの製造方法
US6667849B2 (en) Thin film magnetic head and the manufacturing method
US7085099B2 (en) Thin film magnetic head having spiral coils and manufacturing method thereof
US7379268B2 (en) Thin-film magnetic head including non-magnetic layer for maintaining flatness of the top surface of pole portion layer
US6868600B2 (en) Method of manufacturing a thin film magnetic head
JP3499490B2 (ja) 薄膜磁気ヘッドの製造方法
JP3587375B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP2002123907A (ja) 薄膜磁気ヘッドの製造方法
JP3869595B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP2001110009A (ja) 薄膜磁気ヘッドおよびその製造方法
JP2002170208A (ja) 薄膜磁気ヘッドおよびその製造方法
JP3150301B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP3874599B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JPH11213331A (ja) 薄膜磁気ヘッドおよびその製造方法
JP2004047084A (ja) 薄膜磁気ヘッドの製造方法
JP2001351204A (ja) 薄膜磁気ヘッドおよびその製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050809

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050809

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050809

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20060807

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060814

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061013

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20061013

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070403