JP2001518081A5 - - Google Patents

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Publication number
JP2001518081A5
JP2001518081A5 JP1998538799A JP53879998A JP2001518081A5 JP 2001518081 A5 JP2001518081 A5 JP 2001518081A5 JP 1998538799 A JP1998538799 A JP 1998538799A JP 53879998 A JP53879998 A JP 53879998A JP 2001518081 A5 JP2001518081 A5 JP 2001518081A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP1998538799A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001518081A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US1998/004300 external-priority patent/WO1998038859A1/en
Publication of JP2001518081A publication Critical patent/JP2001518081A/ja
Publication of JP2001518081A5 publication Critical patent/JP2001518081A5/ja
Abandoned legal-status Critical Current

Links

JP53879998A 1997-03-04 1998-03-04 スルホニル２価アリールまたはヘテロアリールヒドロキサム酸化合物 Abandoned JP2001518081A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3518297P 1997-03-04 1997-03-04
US60/035,182 1997-03-04
PCT/US1998/004300 WO1998038859A1 (en) 1997-03-04 1998-03-04 Sulfonyl divalent aryl or heteroaryl hydroxamic acid compounds

Publications (2)

Publication Number Publication Date
JP2001518081A JP2001518081A (ja) 2001-10-09
JP2001518081A5 true JP2001518081A5 (https=) 2005-11-10

Family

ID=21881145

Family Applications (4)

Application Number Title Priority Date Filing Date
JP53879698A Abandoned JP2002513407A (ja) 1997-03-04 1998-03-04 Ｎ−ヒドロキシ４−スルホニルブタンアミド化合物
JP53878098A Abandoned JP2002515901A (ja) 1997-03-04 1998-03-04 芳香族スルホニルα−シクロアミノヒドロキサム酸化合物
JP53798598A Abandoned JP2002515900A (ja) 1997-03-04 1998-03-04 芳香族スルホニルアルファ−ヒドロキシヒドロキサム酸化合物
JP53879998A Abandoned JP2001518081A (ja) 1997-03-04 1998-03-04 スルホニル２価アリールまたはヘテロアリールヒドロキサム酸化合物

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP53879698A Abandoned JP2002513407A (ja) 1997-03-04 1998-03-04 Ｎ−ヒドロキシ４−スルホニルブタンアミド化合物
JP53878098A Abandoned JP2002515901A (ja) 1997-03-04 1998-03-04 芳香族スルホニルα−シクロアミノヒドロキサム酸化合物
JP53798598A Abandoned JP2002515900A (ja) 1997-03-04 1998-03-04 芳香族スルホニルアルファ−ヒドロキシヒドロキサム酸化合物

Country Status (19)

Country Link
US (3) US6380258B2 (https=)
EP (4) EP0984959B1 (https=)
JP (4) JP2002513407A (https=)
KR (3) KR20000075954A (https=)
CN (3) CN1253474A (https=)
AT (1) ATE254599T1 (https=)
AU (2) AU750303B2 (https=)
BR (2) BR9808166A (https=)
CA (4) CA2283145A1 (https=)
DE (1) DE69819878T2 (https=)
DK (1) DK0973392T3 (https=)
EA (1) EA199900792A1 (https=)
ES (2) ES2209122T3 (https=)
IL (3) IL131493A (https=)
NO (1) NO315647B1 (https=)
NZ (1) NZ337326A (https=)
PL (1) PL335732A1 (https=)
PT (1) PT973392E (https=)
WO (1) WO1998038859A1 (https=)

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CN101273013B (zh) * 2005-09-27 2013-06-12 盐野义制药株式会社 具有pgd2受体拮抗活性的磺酰胺衍生物
AU2009310952B2 (en) * 2008-10-27 2015-04-30 Mitsubishi Tanabe Pharma Corporation Novel amide derivative and use thereof as medicine
MX337575B (es) 2009-10-09 2016-03-10 Zafgen Corp Compuestos de sulfona y métodos para lafabricación y uso de éstos.
AU2011281037B2 (en) 2010-07-22 2014-11-27 Zafgen, Inc. Tricyclic compounds and methods of making and using same
WO2012103333A1 (en) 2011-01-26 2012-08-02 Zafgen Corporation Tetrazole compounds and methods of making and using same
SG194812A1 (en) 2011-05-06 2013-12-30 Zafgen Inc Partially saturated tricyclic compounds and methods of making and using same
CN103748094B (zh) 2011-05-06 2016-06-29 扎夫根股份有限公司 三环磺酰胺化合物及其制备和使用方法
US9242997B2 (en) 2011-05-06 2016-01-26 Zafgen, Inc. Tricyclic pyrazole sulphonamide compunds and methods of making and using same
CN104892457B (zh) * 2011-07-25 2017-07-28 中国医学科学院医药生物技术研究所 一种异羟肟酸类衍生物、其药物组合物、制备方法及用途
US10531655B2 (en) 2011-12-02 2020-01-14 The Regents Of The University Of California Reperfusion protection solution and uses thereof
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BR112014017673A8 (pt) 2012-01-18 2017-07-11 Zafgen Inc Compostos de sulfonamida tricíclicos e métodos para fazer e usar os mesmos
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