JP2001091849A - 顕微鏡用液浸対物レンズ - Google Patents

顕微鏡用液浸対物レンズ

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Publication number
JP2001091849A
JP2001091849A JP26668399A JP26668399A JP2001091849A JP 2001091849 A JP2001091849 A JP 2001091849A JP 26668399 A JP26668399 A JP 26668399A JP 26668399 A JP26668399 A JP 26668399A JP 2001091849 A JP2001091849 A JP 2001091849A
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objective lens
liquid
sample
microscope
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JP4504479B2 (ja
Inventor
Shinichiro Aizaki
紳一郎 合▲崎▼
Tomio Endo
富男 遠藤
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Olympus Corp
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Olympus Optical Co Ltd
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Abstract

(57)【要約】 【課題】観察標本の制限を受けることなく精度の高い標
本観察を実現でき、しかも、適用顕微鏡の大型化を招く
ことのない顕微鏡用液浸対物レンズを提供する。 【解決手段】複数のレンズからなる対物レンズ本体10
0の標本20側の先端に対向させて外筒13の先端カバ
ー18の窓部181を配置し、この窓部181と対物レ
ンズ本体100との間に標本20の浸される液体22と
同じ屈折率を有する液体19を充填し、窓部181の標
本20に対する相対位置を固定したまま、対物レンズ本
体100を光軸方向で移動可能にする。

Description

【発明の詳細な説明】
【0001】
【発明の属する技術分野】本発明は、液体中の標本観察
に用いられる顕微鏡用液浸対物レンズに関するものであ
る。
【0002】
【従来の技術】例えば、顕微鏡により液体中の標本を観
察しようとした場合、浸液層にある程度の厚みがある
と、標本が浸液中のどの位置に存在するかによって、対
物レンズと標本との間に存在する浸液の厚みが様々に変
化することが知られている。
【0003】このため、このような標本観察に、通常の
対物レンズを使用すると、標本が浸液中のどの深さに位
置するかによって、対物レンズの球面収差が変化してし
まい、全ての標本について良好な観察像を得るのが困難
となる。
【0004】そこで、従来では、液体中の標本を観察す
る場合には、標本を液体で満した容器中に収容するとと
もに、容器中の液体に対物レンズの先端を直接浸して観
察を行なうような方法がとられている。
【0005】一方、顕微鏡やレーザ走査型顕微鏡により
3次元的な構造を有する標本を観察する場合、対物レン
ズまたは標本を載置するステージを光軸方向に移動させ
ながらピント調整や3次元的なレーザ走査などが行なわ
れている。
【0006】しかしながら、このような顕微鏡やレーザ
走査型顕微鏡において、上述したように対物レンズの先
端を容器中の液体に直接浸した状態で、対物レンズを移
動させるようにすると、対物レンズの動きに起因して振
動が発生し、この振動が液体を伝わって標本に達するこ
とがある。この場合、液体中に浸して観察される標本
は、液体中を移動しやすかったり、非常に柔らかいもの
が多いことから、振動による影響を標本は、受けやすか
った。特に、電気生理学やパッチクランプなどのマイク
ロマニピュレーションを行なう標本の場合は、対物レン
ズからの振動の影響を受けやすく、精度の高い標本観察
ができなくなるという問題があった。
【0007】そこで、従来、特開平7−333511号
公報に開示されるように観察部を対物レンズに対して移
動可能に支持し、観察部の位置を変化させることで標本
上の焦点面の位置を移動できるようにしたものや、特開
平6−39220号公報、特開平10−39222号公
報に開示されるように、液体で満され密封された特殊容
器内に標本を収容し、この特殊容器を特殊容器内の液体
と屈折率の等しい液体を収容した液体中に収容するとと
もに、このような特殊容器と対物レンズとの間に、特殊
容器内の液体と屈折率の等しい液体を滞留させたり、こ
のような液体を変形可能な特殊容器に収容したものを介
在させるようにすることが考えられている。
【0008】
【発明が解決しようとする課題】ところが、特開平7−
333511号公報のものは、対物レンズの倍率をMと
すると、標本面の移動量に対して観察部ではM倍の移
動量が必要になることから、実際には、観察部を10m
mも移動させることになり、その分、観察部の移動機構
が大型し、新たな振動の発生源になってしまうという問
題があり、また、特開平6−39220号公報、特開平
10−39222号公報のものは、標本を収容する特殊
容器の構造が限定されるため、観察できる標本が制限さ
れてしまうという問題があった。
【0009】本発明は上記事情に鑑みてなされたもの
で、観察標本の制限を受けることなく精度の高い標本観
察を実現でき、しかも、適用顕微鏡の大型化を招くこと
のない顕微鏡用液浸対物レンズを提供することを目的と
する。
【0010】
【課題を解決するための手段】請求項1記載の発明は、
液体に浸された標本を観察する顕微鏡に適用される顕微
鏡用液浸対物レンズにおいて、複数のレンズからなる対
物レンズ本体の前記標本側の先端に対向させて窓部を配
置し、この窓部と前記対物レンズ本体との間に前記標本
の浸される液体と同じ屈折率を有する液体を充填し、前
記窓部の前記標本に対する相対位置を固定したまま、前
記対物レンズ本体を光軸方向に移動可能にしたことを特
徴としている。
【0011】請求項2記載の発明は、液体に浸された標
本を観察する顕微鏡に適用される顕微鏡用液浸対物レン
ズにおいて、複数のレンズからなる対物レンズ本体と、
この対物レンズ本体を収容した内筒と、この内筒を中空
部に沿って収容する外筒と、この外筒の内部に設けら
れ、前記外筒に対して前記内筒を前記対物レンズ本体の
光軸方向で移動させる駆動手段と、前記外筒に設けられ
るとともに、前記対物レンズの光路を遮らない位置に窓
部を有するカバーと、このカバーの窓部と前記対物レン
ズ本体との間に充填され、前記標本の浸される液体と同
じ屈折率を有する液体とを具備し、前記窓部の前記標本
に対する相対位置を固定したまま、前記駆動手段により
前記対物レンズ本体を光軸方向に移動可能にしたことを
特徴としている。
【0012】請求項3記載の発明は、請求項2記載の発
明において、前記カバーは、前記外筒に対して着脱可能
であることを特徴としている。
【0013】この結果、請求項1または2記載の本発明
によれば、標本に対する相対位置を固定した窓部によ
り、対物レンズ本体と標本が浸される液体とを分離する
ことにより、対物レンズ本体の移動に伴う振動が標本に
伝わるのをなくし、また、対物レンズと標本の間が常に
液体で満されているので、対物レンズの移動による球面
収差の変化の発生を防止できる。
【0014】請求項3記載の発明によれば、窓部と対物
レンズ本体との間に充填される液体を標本の浸される液
体の種類に応じて変更できる。
【0015】
【発明の実施の形態】以下、本発明の実施の形態を図面
に従い説明する。
【0016】(第1の実施の形態)図1は、本発明が適
用される顕微鏡用液浸対物レンズの概略構成を示してい
る。図において、1は内筒で、この内筒1の中空部に
は、5枚のレンズ2〜6を光軸方向に沿って配置し対物
レンズ本体100を構成している。この場合、これらレ
ンズ2〜6は、それぞれリング状の保持部材7〜11に
より各別に内筒1の内周面に沿って保持されるととも
に、固定枠12により一括して固定されている。
【0017】一方、13は外筒で、この外筒13は、基
端部側の開口端に固定部15を嵌合している。この固定
部15は、図示しない顕微鏡本体に取付けるためのもの
である。そして、このような外筒13の中空部に所定の
隙間14を介して内筒1を挿装している。この場合、内
筒1は、駆動体16を介して外筒13の固定部15に固
定されている。駆動体16は、対物レンズ本体100を
有する内筒1全体を光軸方向に移動させるもので、ここ
では、対物レンズ本体100の光路を遮らないような中
空部を有するもの、例えばチューブ型の圧電素子、ボイ
スコイル、リニアモータなどが用いられる。この場合、
対物レンズ本体100の光路を遮らないような中空部を
有し、且つ内筒1を光軸方向に移動させるものであれ
ば、これら以外の駆動源を用いてもよい。
【0018】外筒13の先端部には、内筒1先端部との
間に、変形可能な保持部材17を介在させている。この
保持部材17は、外筒13の中空部における内筒1の光
軸方向の妨げないとともに、後述する液体19が外部に
漏れ出すのを阻止するもので、ここでは、シリコンゴム
やOリングが用いられている。この場合、内筒1の光軸
方向の移動を保障するとともに、液漏れを防止できるも
のであれば、これら以外のものを用いてもよい。
【0019】外筒13の先端部側の開口端に先端カバー
18をねじ込みなどにより着脱可能に設けている。この
先端カバー18は、対物レンズ本体100の光路、つま
り、対物レンズ本体100の先端に位置されるレンズ2
の光路を遮らない位置に光学ガラスや光学プラスチック
などの平行平板を有する窓部181を設けている。そし
て、先端カバー18の窓部181内側のレンズ2との間
に液体19を充填している。この液体19は、後述する
標本20が浸される液体22と同じ屈折率を有するもの
で、この液体19中に、常に、窓部181とレンズ2の
間が浸される状態になっている。
【0020】そして、このように構成した符号200で
示す液浸対物レンズを用いて標本20を観察するには、
標本20を浸した液体22の入った容器21の液体22
中に先端カバー18の窓部181を浸すようにする。
【0021】次に、以上のように構成した実施の形態の
作用を説明する。
【0022】まず、図示しない顕微鏡本体に、外筒13
の基端部側に設けられた固定部15を取付ける。そし
て、標本20を浸した容器21の液体22中に先端カバ
ー18の窓部181を浸すように配置するとともに、窓
部181の標本20に対する相対位置を固定する。
【0023】この状態から、駆動体16を付勢して内筒
1全体を光軸方向で移動させるとともに、標本20面に
対し対物レンズ本体100を移動させ、対物レンズ本体
100の焦点面を標本20上で変化させながら、液体2
2中に浸された標本20の観察が行なわれる。
【0024】この場合、先端カバー18の窓部181内
側とのレンズ2との間には、標本20の浸された液体2
2と同じ屈折率を有する液体19が充填され、しかも、
標本20を浸した容器21の液体22中に先端カバー1
8の窓部181が浸されるとともに、窓部181の標本
20に対する相対位置が固定されているので、対物レン
ズ本体100を動かしても、このときの対物レンズ本体
100は、常に、窓部181により容器21内の液体2
2と分離されることになり、この移動に伴う振動が液体
22を介し標本20に伝わることがなくなる。また、対
物レンズ100と標本20の間が常に液体22で満され
ているので、対物レンズ100の移動による球面収差の
変化の発生を防止できる。これにより、常に良好な観察
像が得られるとともに、非常に柔らかく、しかも移動し
やすい液体22中の標本20であっても振動による悪影
響を与えることなく、精度の高い標本観察を行なうこと
ができる。
【0025】また、従来の観察部を対物レンズに対して
移動可能に支持し、対物レンズの倍率Mに対し、観察部
でM倍の移動量が必要になるものと比べ、対物レンズ
本体100での移動量は、極めて微小にできるので、か
かる液浸対物レンズを適用した顕微鏡の大型化を確実に
防止できる。
【0026】さらに、従来の密封された特殊容器を用い
るものと比べ、標本20を収容する容器21が制限を受
けることがないので、特殊容器に収容するのが難しい標
本には適用できないなど観察できる標本が制限されるよ
うな不都合を解消できる。
【0027】また、先端カバー18は、外筒13に対し
て着脱可能にしているので、先端カバー18内部の液体
19は、標本20の浸される液体22の種類に応じて変
更することができる。また、外筒13先端部と内筒1と
の間には、保持部材17が介在され、先端カバー18の
窓部181内側のレンズ2との間の液体19が外筒13
内部上方に進入するのを阻止しているので、液体22の
交換も、簡単な洗浄を行なう程度で、前に使用していた
液体22を完全に取り除くことができる。
【0028】なお、上述した実施の形態では、窓部18
1の平行平板の屈折率については言及しなかったが、こ
の平行平板の屈折率を、液体22の屈折率と同じにして
おいたほうが、さらに望ましい。また、上述した構成の
液浸対物レンズ200は、図2に示すようにスライドガ
ラス23上に載置された標本20についても、スライド
ガラス23上で標本20を浸すように置かれた液体22
の表面張力を利用し、液体22中に先端カバー18の窓
部181を浸すようにして使用することもできる。
【0029】(第2の実施の形態)図3は、本発明の第
2の実施の形態の概略構成を示すもので、第1の実施の
形態で述べた液浸対物レンズを光学顕微鏡に適用し、こ
のような光学顕微鏡により、パッチクランプなどのマイ
クロマニピュレーションを行なう例を示している。な
お、図3は、図1と同一部分には、同符号を付してい
る。
【0030】この場合、図示しない顕微鏡本体に、図1
で述べた液浸対物レンズ200の外筒13の基端部側に
設けられた固定部15を取付け、液体22の入った容器
21中の標本20および、この標本20を操作するマイ
クロマニピュレータ31先端を観察するようにしてい
る。
【0031】従って、このようにしても、第1の実施の
形態で述べたように、駆動体16を付勢して、内筒1全
体を光軸方向に移動し、標本20に対し対物レンズ本体
100を移動させても、対物レンズ本体100は、先端
カバー18の窓部181により容器21内の液体22と
分離されているため、移動による振動が液体22を介し
標本20に伝わることがなくなり、また、対物レンズ1
00と標本20の間が常に液体22で満されているの
で、対物レンズ100の移動による球面収差の変化の発
生を防止でき、常に良好な観察像が得られ、電気的生理
学やパッチクランプなどのマイクロマニピュレーション
を容易に精度よく行なうことができる。
【0032】(第3の実施の形態)図4は、本発明の第
3の実施の形態の概略構成を示すもので、第1の実施の
形態で述べた液浸対物レンズをレーザ走査型顕微鏡に適
用した例を示している。なお、図4も、図1と同一部分
には、同符号を付している。
【0033】この場合、レーザ光源40からのレーザ光
49は、ビームエクスパンダ41によりビーム径を広げ
られ、ビームスプリッタ42を透過した後、第1のガル
バノミラー43および第2のガルバノミラー44で反射
され、図1で述べた液浸対物レンズ200を介して液体
22の入った容器中21の標本20上に照射される。ま
た、標本20からの光、例えば蛍光、反射光あるいは散
乱光は、液浸対物レンズ200、第2のガルバノミラー
44および第1のガルバノミラー43を通ってビームス
プリッタ42で反射され、共焦点光学系45を通過して
フォトマルチプライヤーチューブ46により検出され
る。この場合、第1のガルバノミラー43、第2のガル
バノミラー44によるレーザ光のx、y方向および液浸
対物レンズ200の対物レンズ本体100のz方向の移
動は、コントローラ47により制御され、標本20上で
のレーザ光が3次元的に走査され、また、フォトマルチ
プライヤーチューブ46からの検出信号は、コントロー
ラ47によりレーザ光の走査信号と同期して記録され画
像が処理された後、モニター48に観察像として表示さ
れる。
【0034】従って、このようにすれば、液浸対物レン
ズ200の対物レンズ本体100は、レーザ光49が平
行光として入射されると、対物レンズ本体100の焦点
位置にレーザ光49を集光するようになるが、この場合
も、駆動体16を付勢し内筒1全体を光軸方向に移動さ
せることで、対物レンズ本体100を動かしても、対物
レンズ本体100は、先端カバー18の窓部181によ
り容器21内の液体22と分離されているため、このと
きの振動が液体22を介し標本20に伝わることがなく
なり、また、対物レンズ100と標本20の間が常に液
体22で満されているので、対物レンズ100の移動に
よる球面収差の変化の発生を防止でき、常に良好な観察
像が得られる。これにより、非常に柔らかく、しかも移
動しやすい液体22中の標本20であっても振動による
悪影響を与えることなく、精度の高い標本観察を行なう
ことができる。
【0035】本発明は、上記実施の形態に記載されてい
るものに限定されず、発明の趣旨を逸脱しない範囲で種
々変更可能であり、例えば、内筒1を光軸方向で駆動す
る駆動体16も中空状のものでなくてもよく、また、内
筒1が外筒13に対して光軸方向で駆動可能であれば、
どのような形状であってもよい。
【0036】
【発明の効果】以上述べたように本発明によれば、観察
標本の制限を受けることなく精度の高い標本観察を実現
でき、しかも、適用顕微鏡の大型化を招くことのない顕
微鏡用液浸対物レンズを提供できる。
【図面の簡単な説明】
【図1】本発明の第1の実施の形態の概略構成を示す
図。
【図2】第1の実施の形態の変形例を説明するための
図。
【図3】本発明の第2の実施の形態の概略構成を示す
図。
【図4】本発明の第3の実施の形態の概略構成を示す
図。
【符号の説明】
1…内筒 2〜6…レンズ 7〜11…保持部材 12…固定枠 13…外筒 14…隙間 15…固定部 16…駆動体 17…保持部材 18…先端カバー 181…窓部 19…液体 20…標本 21…容器 22…液体 23…スライドガラス 31…マイクロマニピュレータ 40…レーザ光源 41…ビームエクスパンダ 42…ビームスプリッタ 43…第1のガルバノミラー 44…第2のガルバノミラー 45…共焦点光学系 46…フォトマルチプライヤーチューブ 47…コントローラ 48…モニター 49…レーザ光 100…対物レンズ本体 200…液浸対物レンズ

Claims (3)

    【特許請求の範囲】
  1. 【請求項1】 液体に浸された標本を観察する顕微鏡に
    適用される顕微鏡用液浸対物レンズにおいて、 複数のレンズからなる対物レンズ本体の前記標本側の先
    端に対向させて窓部を配置し、この窓部と前記対物レン
    ズ本体との間に前記標本の浸される液体と同じ屈折率を
    有する液体を充填し、 前記窓部の前記標本に対する相対位置を固定したまま、
    前記対物レンズ本体を光軸方向で移動可能にしたことを
    特徴とする顕微鏡用液浸対物レンズ。
  2. 【請求項2】 液体に浸された標本を観察する顕微鏡に
    適用される顕微鏡用液浸対物レンズにおいて、 複数のレンズからなる対物レンズ本体と、 この対物レンズ本体を収容した内筒と、 この内筒を中空部に沿って収容する外筒と、 この外筒の内部に設けられ、前記外筒に対して前記内筒
    を前記対物レンズ本体の光軸方向で移動させる駆動手段
    と、 前記外筒に設けられるとともに、前記対物レンズの光路
    を遮らない位置に窓部を有するカバーと、 このカバーの窓部と前記対物レンズ本体の間に充填さ
    れ、且つ前記標本の浸される液体と同じ屈折率を有する
    液体とを具備し、 前記窓部の前記標本に対する相対位置を固定したまま、
    前記駆動手段により前記対物レンズ本体を光軸方向に移
    動可能にしたことを特徴とする顕微鏡用液浸対物レン
    ズ。
  3. 【請求項3】 前記カバーは、前記外筒に対して着脱可
    能であることを特徴とする請求項2記載の顕微鏡用液浸
    対物レンズ。
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06511406A (ja) * 1991-10-11 1994-12-22 ロレアル 皮膚またはこれに類似した組織の微細構造をインビボにおいて観察するための装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62121417A (ja) * 1985-11-22 1987-06-02 Hitachi Ltd 液浸対物レンズ装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06511406A (ja) * 1991-10-11 1994-12-22 ロレアル 皮膚またはこれに類似した組織の微細構造をインビボにおいて観察するための装置

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US9772565B2 (en) 2005-02-10 2017-09-26 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
US9164391B2 (en) 2005-02-10 2015-10-20 Asml Netherlands B.V. Immersion liquid, exposure apparatus, and exposure process
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JP4669302B2 (ja) * 2005-02-24 2011-04-13 富士通株式会社 レンズカバー
JP2006235208A (ja) * 2005-02-24 2006-09-07 Fujitsu Ltd レンズカバー
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JP2006278795A (ja) * 2005-03-30 2006-10-12 Nikon Corp 検出装置及び露光装置、並びにデバイス製造方法
JP2006276561A (ja) * 2005-03-30 2006-10-12 Hamamatsu Univ School Of Medicine ファイバ共焦点顕微鏡における生体用対物レンズ
US8259287B2 (en) 2005-04-05 2012-09-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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JP2006343670A (ja) * 2005-06-10 2006-12-21 Olympus Corp 対物プロテクタおよび顕微鏡観察方法
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US7928407B2 (en) 2005-11-23 2011-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8456611B2 (en) 2005-11-29 2013-06-04 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
US7773195B2 (en) 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
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US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US10649349B2 (en) 2006-12-07 2020-05-12 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US10268127B2 (en) 2006-12-07 2019-04-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9645506B2 (en) 2006-12-07 2017-05-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10185231B2 (en) 2006-12-07 2019-01-22 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US9013672B2 (en) 2007-05-04 2015-04-21 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8011377B2 (en) 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
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JP2009200492A (ja) * 2008-02-19 2009-09-03 Asml Netherlands Bv リソグラフィ装置及び方法
US8705009B2 (en) 2009-09-28 2014-04-22 Asml Netherlands B.V. Heat pipe, lithographic apparatus and device manufacturing method
JP2013519909A (ja) * 2010-02-12 2013-05-30 ライカ マイクロシステムス ツェーエムエス ゲーエムベーハー 対象物を走査する装置とその方法および顕微鏡
US10209624B2 (en) 2010-04-22 2019-02-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
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US9846372B2 (en) 2010-04-22 2017-12-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP2013054175A (ja) * 2011-09-02 2013-03-21 Olympus Corp 非線形光学顕微鏡
JP2015079220A (ja) * 2013-10-18 2015-04-23 株式会社ニコン カバー部材、顕微鏡、観察方法および観察器具
JP5938702B1 (ja) * 2014-07-30 2016-06-22 パナソニックIpマネジメント株式会社 保護部材
WO2016017049A1 (ja) * 2014-07-30 2016-02-04 パナソニックIpマネジメント株式会社 保護部材
US9500861B2 (en) 2014-07-30 2016-11-22 Panasonic Intellectual Property Management Co., Ltd. Protective member and method for using protective member
JP2016151701A (ja) * 2015-02-18 2016-08-22 オリンパス株式会社 蛍光顕微鏡
JP2017032758A (ja) * 2015-07-31 2017-02-09 オリンパス株式会社 倒立型顕微鏡および倒立型顕微鏡システム
US10330908B2 (en) 2016-03-08 2019-06-25 Olympus Corporation Immersion objective
JP2017161651A (ja) * 2016-03-08 2017-09-14 オリンパス株式会社 液浸対物レンズ
CN107831589A (zh) * 2017-12-04 2018-03-23 中国计量大学 一种基于球形微纳液滴透镜的聚焦可控超分辨显微装置
CN107831589B (zh) * 2017-12-04 2024-02-02 中国计量大学 一种基于球形微纳液滴透镜的聚焦可控超分辨显微装置
JP7145051B2 (ja) 2018-11-21 2022-09-30 株式会社エビデント 倒立型顕微鏡
JP2020086044A (ja) * 2018-11-21 2020-06-04 オリンパス株式会社 倒立型顕微鏡
CN113189760A (zh) * 2020-04-29 2021-07-30 卡尔蔡司显微镜有限责任公司 通过防止液体接触保护显微镜部件的保护设备和方法
CN114002839A (zh) * 2021-09-29 2022-02-01 深圳高性能医疗器械国家研究院有限公司 一种可倒置使用的浸液物镜及具有该浸液物镜的显微镜

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