JP2001085329A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001085329A5 JP2001085329A5 JP1999262862A JP26286299A JP2001085329A5 JP 2001085329 A5 JP2001085329 A5 JP 2001085329A5 JP 1999262862 A JP1999262862 A JP 1999262862A JP 26286299 A JP26286299 A JP 26286299A JP 2001085329 A5 JP2001085329 A5 JP 2001085329A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor film
- amorphous semiconductor
- mask
- metal element
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 description 23
- 239000002184 metal Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 238000002425 crystallisation Methods 0.000 description 7
- 230000008025 crystallization Effects 0.000 description 7
- 238000005247 gettering Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052696 pnictogen Inorganic materials 0.000 description 4
- 230000001737 promoting effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26286299A JP4853845B2 (ja) | 1999-09-17 | 1999-09-17 | 半導体装置の作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26286299A JP4853845B2 (ja) | 1999-09-17 | 1999-09-17 | 半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001085329A JP2001085329A (ja) | 2001-03-30 |
| JP2001085329A5 true JP2001085329A5 (enExample) | 2006-10-26 |
| JP4853845B2 JP4853845B2 (ja) | 2012-01-11 |
Family
ID=17381674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26286299A Expired - Fee Related JP4853845B2 (ja) | 1999-09-17 | 1999-09-17 | 半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4853845B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100437474B1 (ko) * | 2001-04-04 | 2004-06-23 | 삼성에스디아이 주식회사 | 듀얼채널층을 갖는 박막 트랜지스터 및 그의 제조방법 |
| KR100806846B1 (ko) | 2007-01-18 | 2008-02-22 | 성균관대학교산학협력단 | 비정질 실리콘 박막의 결정화 방법 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4056571B2 (ja) * | 1995-08-02 | 2008-03-05 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JPH10303430A (ja) * | 1997-04-26 | 1998-11-13 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
| JP3844561B2 (ja) * | 1997-06-10 | 2006-11-15 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP4180689B2 (ja) * | 1997-07-24 | 2008-11-12 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JPH11329969A (ja) * | 1998-05-18 | 1999-11-30 | Sharp Corp | 半導体装置およびその製造方法 |
| JP3460962B2 (ja) * | 1999-01-21 | 2003-10-27 | シャープ株式会社 | 半導体装置の製造方法 |
-
1999
- 1999-09-17 JP JP26286299A patent/JP4853845B2/ja not_active Expired - Fee Related