JPH10301146A5 - - Google Patents

Info

Publication number
JPH10301146A5
JPH10301146A5 JP1997123283A JP12328397A JPH10301146A5 JP H10301146 A5 JPH10301146 A5 JP H10301146A5 JP 1997123283 A JP1997123283 A JP 1997123283A JP 12328397 A JP12328397 A JP 12328397A JP H10301146 A5 JPH10301146 A5 JP H10301146A5
Authority
JP
Japan
Prior art keywords
silicon
region
forming
group
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997123283A
Other languages
English (en)
Japanese (ja)
Other versions
JP4024341B2 (ja
JPH10301146A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP12328397A priority Critical patent/JP4024341B2/ja
Priority claimed from JP12328397A external-priority patent/JP4024341B2/ja
Priority to US09/065,692 priority patent/US6133075A/en
Publication of JPH10301146A publication Critical patent/JPH10301146A/ja
Priority to US09/617,105 priority patent/US6524896B1/en
Priority to US10/357,333 priority patent/US6864127B2/en
Publication of JPH10301146A5 publication Critical patent/JPH10301146A5/ja
Application granted granted Critical
Publication of JP4024341B2 publication Critical patent/JP4024341B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP12328397A 1997-04-25 1997-04-25 半導体装置の作製方法 Expired - Fee Related JP4024341B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP12328397A JP4024341B2 (ja) 1997-04-25 1997-04-25 半導体装置の作製方法
US09/065,692 US6133075A (en) 1997-04-25 1998-04-24 Semiconductor device and method of fabricating the same
US09/617,105 US6524896B1 (en) 1997-04-25 2000-07-14 Semiconductor device and method of fabricating the same
US10/357,333 US6864127B2 (en) 1997-04-25 2003-02-04 Semiconductor device and method of fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12328397A JP4024341B2 (ja) 1997-04-25 1997-04-25 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JPH10301146A JPH10301146A (ja) 1998-11-13
JPH10301146A5 true JPH10301146A5 (enExample) 2005-03-03
JP4024341B2 JP4024341B2 (ja) 2007-12-19

Family

ID=14856743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12328397A Expired - Fee Related JP4024341B2 (ja) 1997-04-25 1997-04-25 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4024341B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW386238B (en) 1997-01-20 2000-04-01 Semiconductor Energy Lab Semiconductor device and method of manufacturing the same
JPH1140498A (ja) 1997-07-22 1999-02-12 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
JP4860021B2 (ja) * 1999-01-11 2012-01-25 株式会社半導体エネルギー研究所 半導体装置の作製方法
TW515104B (en) * 2000-11-06 2002-12-21 Semiconductor Energy Lab Electro-optical device and method of manufacturing the same
CN101553755A (zh) * 2006-12-12 2009-10-07 夏普株式会社 液晶显示装置
JP4668247B2 (ja) * 2007-07-26 2011-04-13 三菱電機株式会社 液晶表示装置の製造方法
JP5288662B2 (ja) * 2012-08-07 2013-09-11 株式会社半導体エネルギー研究所 表示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3070062B2 (ja) * 1990-03-29 2000-07-24 ソニー株式会社 液晶表示装置及びその製造方法
JP3431682B2 (ja) * 1993-03-12 2003-07-28 株式会社半導体エネルギー研究所 半導体回路の作製方法
JP2649325B2 (ja) * 1993-07-30 1997-09-03 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3067949B2 (ja) * 1994-06-15 2000-07-24 シャープ株式会社 電子装置および液晶表示装置
JP3539821B2 (ja) * 1995-03-27 2004-07-07 株式会社半導体エネルギー研究所 半導体装置の作製方法

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