JP2000502463A - はんだマスク組成物 - Google Patents

はんだマスク組成物

Info

Publication number
JP2000502463A
JP2000502463A JP09522988A JP52298897A JP2000502463A JP 2000502463 A JP2000502463 A JP 2000502463A JP 09522988 A JP09522988 A JP 09522988A JP 52298897 A JP52298897 A JP 52298897A JP 2000502463 A JP2000502463 A JP 2000502463A
Authority
JP
Japan
Prior art keywords
zwitterion
bis
sulfonium
bisphenol
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP09522988A
Other languages
English (en)
Japanese (ja)
Inventor
ソ，イン，エイチ．
ダービー，ニコラス
ウォーレン，マルコム，ダブリュ．
シュミット，ドナルド，エル．
ローズ，ジェネ，ディー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Chemical Co
Original Assignee
Dow Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Chemical Co filed Critical Dow Chemical Co
Publication of JP2000502463A publication Critical patent/JP2000502463A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
JP09522988A 1995-12-21 1996-12-18 はんだマスク組成物 Pending JP2000502463A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US902395P 1995-12-21 1995-12-21
US60/009,023 1995-12-21
PCT/US1996/020268 WO1997022910A1 (en) 1995-12-21 1996-12-18 Solder mask compositions

Publications (1)

Publication Number Publication Date
JP2000502463A true JP2000502463A (ja) 2000-02-29

Family

ID=21735136

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09522988A Pending JP2000502463A (ja) 1995-12-21 1996-12-18 はんだマスク組成物

Country Status (4)

Country Link
EP (1) EP0868685A1 (ko)
JP (1) JP2000502463A (ko)
KR (1) KR20000064468A (ko)
WO (1) WO1997022910A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7235344B2 (en) 2004-06-30 2007-06-26 Intel Corporation Energy harvesting molecules and photoresist technology
KR100852540B1 (ko) * 2004-06-30 2008-08-18 인텔 코포레이션 에너지 수확 분자 및 포토레지스트 기술
JP4474256B2 (ja) 2004-09-30 2010-06-02 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3636052A (en) 1969-10-15 1972-01-18 Dow Chemical Co Hydroxyarylpolymethylenesulfonium zwitterions
US3660088A (en) 1970-09-16 1972-05-02 Grace W R & Co Photo-resist process
US3723386A (en) 1971-03-29 1973-03-27 Dow Chemical Co Polymers from hydroxyarylmethylenesulfonium zwitterions
BE793732A (fr) 1972-01-10 1973-05-02 Grace W R & Co Composition contenant un polyene et un polythiol
US4001154A (en) 1973-09-04 1977-01-04 The Dow Chemical Company Primer adhesive composition
US4089877A (en) 1975-10-28 1978-05-16 The Dow Chemical Company Process for producing hydroxyarylpolymethylenesulfonium salts
US4199163A (en) 1978-08-24 1980-04-22 James Nelson One-piece steerable sled
US4508916A (en) 1979-04-11 1985-04-02 Minnesota Mining And Manufacturing Company Curable substituted urethane acrylates
US4344993A (en) * 1980-09-02 1982-08-17 The Dow Chemical Company Perfluorocarbon-polymeric coatings having low critical surface tensions
US4436806A (en) 1981-01-16 1984-03-13 W. R. Grace & Co. Method and apparatus for making printed circuit boards
JPS5834445A (ja) 1981-08-26 1983-02-28 Japan Synthetic Rubber Co Ltd 感光材
US4361640A (en) 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder
US5006436A (en) 1988-09-20 1991-04-09 Atochem North America, Inc. UV curable compositions for making tentable solder mask coating
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof

Also Published As

Publication number Publication date
KR20000064468A (ko) 2000-11-06
EP0868685A1 (en) 1998-10-07
WO1997022910A1 (en) 1997-06-26

Similar Documents

Publication Publication Date Title
US5486447A (en) Negative resists with high thermal stability comprising end capped polybenzoxazole and bisazide
JPS6396162A (ja) ポリアミド
JPH05339356A (ja) 光重合性不飽和化合物及びアルカリ現像型感光性樹脂組成物
JP4541944B2 (ja) 感光性ポリイミド樹脂組成物
EP0354018A2 (en) An electrodeposition coating composition and image-forming method using the same
EP0422110A1 (en) DIELECTRICS WITH PHOTODEFINING INTERMEDIATE LEVEL.
US5302490A (en) Radiation sensitive compositions comprising blends of an aliphatic novolak resin and an aromatic novolak resin
JPH1064333A (ja) 導電性銅ペースト組成物及びそれを用いたプリント回路基板の製造方法
US3923522A (en) Photosensitive composition
JP4523703B2 (ja) 感光性難燃樹脂組成物
JP2000502463A (ja) はんだマスク組成物
EP0471326B1 (en) Positive type photoresist composition
JP2835539B2 (ja) 感光性熱硬化性樹脂組成物およびパターン形成方法
GB2032939A (en) Coating Compositions
JP2002256063A (ja) 光硬化性レジスト組成物
JP2005037754A (ja) 感光性樹脂組成物、それを用いた感光性フィルム、及びその製造方法
JPH11305430A (ja) アルカリ現像型感光性樹脂組成物
JPH087436B2 (ja) 感光性ジアゾキノン化合物及びそれを用いたポジ型感光性樹脂組成物
JP2001142209A (ja) ポジ型感光性樹脂組成物及び半導体装置
JPH07115048A (ja) 剥離方法
EP0424866B1 (en) Liquid solder mask composition
WO1999054788A1 (fr) Composition de resine photosensible
JP3241452B2 (ja) 不飽和基含有カルボン酸樹脂組成物およびソルダーレジスト樹脂組成物
JPH08123034A (ja) ポジ型感光性樹脂組成物
JPS62158710A (ja) 光硬化性組成物