JP2000343015A - 塗布装置 - Google Patents
塗布装置Info
- Publication number
- JP2000343015A JP2000343015A JP11160912A JP16091299A JP2000343015A JP 2000343015 A JP2000343015 A JP 2000343015A JP 11160912 A JP11160912 A JP 11160912A JP 16091299 A JP16091299 A JP 16091299A JP 2000343015 A JP2000343015 A JP 2000343015A
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- coating
- nozzle
- substrate
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 680
- 239000011248 coating agent Substances 0.000 title claims abstract description 642
- 239000007788 liquid Substances 0.000 claims abstract description 511
- 239000000758 substrate Substances 0.000 claims description 113
- 238000012545 processing Methods 0.000 claims description 39
- 238000007599 discharging Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 238000012546 transfer Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000010408 film Substances 0.000 description 50
- 238000002360 preparation method Methods 0.000 description 14
- 238000000926 separation method Methods 0.000 description 14
- 230000007246 mechanism Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 102100028780 AP-1 complex subunit sigma-2 Human genes 0.000 description 1
- 102100033041 Carbonic anhydrase 13 Human genes 0.000 description 1
- 101100321670 Fagopyrum esculentum FA18 gene Proteins 0.000 description 1
- 101100055680 Homo sapiens AP1S2 gene Proteins 0.000 description 1
- 101000867860 Homo sapiens Carbonic anhydrase 13 Proteins 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 102100031083 Uteroglobin Human genes 0.000 description 1
- 108090000203 Uteroglobin Proteins 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11160912A JP2000343015A (ja) | 1999-06-08 | 1999-06-08 | 塗布装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11160912A JP2000343015A (ja) | 1999-06-08 | 1999-06-08 | 塗布装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000343015A true JP2000343015A (ja) | 2000-12-12 |
| JP2000343015A5 JP2000343015A5 (enrdf_load_stackoverflow) | 2005-03-17 |
Family
ID=15725018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11160912A Abandoned JP2000343015A (ja) | 1999-06-08 | 1999-06-08 | 塗布装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000343015A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008311327A (ja) * | 2007-06-13 | 2008-12-25 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法 |
| JP2009020378A (ja) * | 2007-07-13 | 2009-01-29 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法 |
| JP2010139876A (ja) * | 2008-12-12 | 2010-06-24 | Hoya Corp | フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置 |
| WO2015141513A1 (ja) * | 2014-03-19 | 2015-09-24 | 東レ株式会社 | 塗布装置、塗布方法、及びディスプレイ用部材の製造方法 |
| JP2018513010A (ja) * | 2015-04-21 | 2018-05-24 | ユミコア・アクチエンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフトＵｍｉｃｏｒｅ ＡＧ ＆ Ｃｏ．ＫＧ | 基材の内側表面をコーティングするための方法、デバイス及び装置 |
-
1999
- 1999-06-08 JP JP11160912A patent/JP2000343015A/ja not_active Abandoned
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008311327A (ja) * | 2007-06-13 | 2008-12-25 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法 |
| JP2009020378A (ja) * | 2007-07-13 | 2009-01-29 | Hoya Corp | マスクブランクの製造方法及びフォトマスクの製造方法 |
| TWI402614B (zh) * | 2007-07-13 | 2013-07-21 | Hoya Corp | 空白光罩之製造方法及光罩之製造方法 |
| JP2010139876A (ja) * | 2008-12-12 | 2010-06-24 | Hoya Corp | フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置 |
| WO2015141513A1 (ja) * | 2014-03-19 | 2015-09-24 | 東レ株式会社 | 塗布装置、塗布方法、及びディスプレイ用部材の製造方法 |
| JP2018513010A (ja) * | 2015-04-21 | 2018-05-24 | ユミコア・アクチエンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフトＵｍｉｃｏｒｅ ＡＧ ＆ Ｃｏ．ＫＧ | 基材の内側表面をコーティングするための方法、デバイス及び装置 |
| US10569296B2 (en) | 2015-04-21 | 2020-02-25 | Umicore Ag & Co. Kg | Method, device and apparatus for coating an inner surface of a substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040421 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040421 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20061012 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20061024 |
|
| A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20061212 |