JP2000331977A - 電子材料の洗浄方法 - Google Patents

電子材料の洗浄方法

Info

Publication number
JP2000331977A
JP2000331977A JP11139536A JP13953699A JP2000331977A JP 2000331977 A JP2000331977 A JP 2000331977A JP 11139536 A JP11139536 A JP 11139536A JP 13953699 A JP13953699 A JP 13953699A JP 2000331977 A JP2000331977 A JP 2000331977A
Authority
JP
Japan
Prior art keywords
ozone
dissolved
cleaning
water
electronic material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11139536A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000331977A5 (enExample
Inventor
Hiroshi Morita
博志 森田
Osamu Ota
治 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kurita Water Industries Ltd
Original Assignee
Kurita Water Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kurita Water Industries Ltd filed Critical Kurita Water Industries Ltd
Priority to JP11139536A priority Critical patent/JP2000331977A/ja
Publication of JP2000331977A publication Critical patent/JP2000331977A/ja
Publication of JP2000331977A5 publication Critical patent/JP2000331977A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP11139536A 1999-05-20 1999-05-20 電子材料の洗浄方法 Pending JP2000331977A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11139536A JP2000331977A (ja) 1999-05-20 1999-05-20 電子材料の洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11139536A JP2000331977A (ja) 1999-05-20 1999-05-20 電子材料の洗浄方法

Publications (2)

Publication Number Publication Date
JP2000331977A true JP2000331977A (ja) 2000-11-30
JP2000331977A5 JP2000331977A5 (enExample) 2006-05-25

Family

ID=15247573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11139536A Pending JP2000331977A (ja) 1999-05-20 1999-05-20 電子材料の洗浄方法

Country Status (1)

Country Link
JP (1) JP2000331977A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016723A1 (ja) * 2002-08-13 2004-02-26 Sumitomo Mitsubishi Silicon Corporation 半導体基板洗浄用オゾン水技術
JP3535820B2 (ja) 2000-10-06 2004-06-07 エム・エフエスアイ株式会社 基板処理方法および基板処理装置
CN101972753A (zh) * 2010-07-21 2011-02-16 河北工业大学 镁铝合金化学机械抛光后表面清洗方法
JP2011035300A (ja) * 2009-08-05 2011-02-17 Asahi Sunac Corp 洗浄装置、及び洗浄方法
CN102039283A (zh) * 2010-07-21 2011-05-04 河北工业大学 Ti阻挡层材料化学机械抛光后的表面洁净方法
RU2439641C1 (ru) * 2009-08-13 2012-01-10 Кэнон Кабусики Кайся Способ обработки жидкости

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3535820B2 (ja) 2000-10-06 2004-06-07 エム・エフエスアイ株式会社 基板処理方法および基板処理装置
WO2004016723A1 (ja) * 2002-08-13 2004-02-26 Sumitomo Mitsubishi Silicon Corporation 半導体基板洗浄用オゾン水技術
US7678200B2 (en) 2002-08-13 2010-03-16 Sumitomo Mitsubishi Silicon Corporation Technique on ozone water for use in cleaning semiconductor substrate
JP2011035300A (ja) * 2009-08-05 2011-02-17 Asahi Sunac Corp 洗浄装置、及び洗浄方法
RU2439641C1 (ru) * 2009-08-13 2012-01-10 Кэнон Кабусики Кайся Способ обработки жидкости
CN101972753A (zh) * 2010-07-21 2011-02-16 河北工业大学 镁铝合金化学机械抛光后表面清洗方法
CN102039283A (zh) * 2010-07-21 2011-05-04 河北工业大学 Ti阻挡层材料化学机械抛光后的表面洁净方法

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