JP2000331977A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000331977A5 JP2000331977A5 JP1999139536A JP13953699A JP2000331977A5 JP 2000331977 A5 JP2000331977 A5 JP 2000331977A5 JP 1999139536 A JP1999139536 A JP 1999139536A JP 13953699 A JP13953699 A JP 13953699A JP 2000331977 A5 JP2000331977 A5 JP 2000331977A5
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen gas
- dissolved
- water
- ozone
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000004140 cleaning Methods 0.000 description 8
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- AOSFMYBATFLTAQ-UHFFFAOYSA-N 1-amino-3-(benzimidazol-1-yl)propan-2-ol Chemical compound C1=CC=C2N(CC(O)CN)C=NC2=C1 AOSFMYBATFLTAQ-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- CAMXVZOXBADHNJ-UHFFFAOYSA-N ammonium nitrite Chemical compound [NH4+].[O-]N=O CAMXVZOXBADHNJ-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229940079827 sodium hydrogen sulfite Drugs 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11139536A JP2000331977A (ja) | 1999-05-20 | 1999-05-20 | 電子材料の洗浄方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11139536A JP2000331977A (ja) | 1999-05-20 | 1999-05-20 | 電子材料の洗浄方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000331977A JP2000331977A (ja) | 2000-11-30 |
| JP2000331977A5 true JP2000331977A5 (enExample) | 2006-05-25 |
Family
ID=15247573
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11139536A Pending JP2000331977A (ja) | 1999-05-20 | 1999-05-20 | 電子材料の洗浄方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000331977A (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3535820B2 (ja) | 2000-10-06 | 2004-06-07 | エム・エフエスアイ株式会社 | 基板処理方法および基板処理装置 |
| JP4039662B2 (ja) * | 2002-08-13 | 2008-01-30 | 株式会社Ｓｕｍｃｏ | 半導体基板又は素子の洗浄方法 |
| JP2011035300A (ja) * | 2009-08-05 | 2011-02-17 | Asahi Sunac Corp | 洗浄装置、及び洗浄方法 |
| JP2011039339A (ja) * | 2009-08-13 | 2011-02-24 | Canon Inc | 剥離液の再生方法 |
| CN101972753B (zh) * | 2010-07-21 | 2011-12-21 | 河北工业大学 | 镁铝合金化学机械抛光后表面清洗方法 |
| CN102039283B (zh) * | 2010-07-21 | 2012-04-18 | 河北工业大学 | Ti阻挡层材料化学机械抛光后的表面洁净方法 |
-
1999
- 1999-05-20 JP JP11139536A patent/JP2000331977A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5800626A (en) | Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates | |
| US8999069B2 (en) | Method for producing cleaning water for an electronic material | |
| US11817309B2 (en) | Method of producing heated ozone water, heated ozone water, and semiconductor wafer-cleaning liquid | |
| JP5072062B2 (ja) | 水素ガス溶解洗浄水の製造方法、製造装置及び洗浄装置 | |
| WO2005013002A3 (en) | Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing | |
| JP4108798B2 (ja) | オゾン含有超純水供給方法及びオゾン含有超純水供給装置 | |
| KR100319119B1 (ko) | 전자재료용세정수 | |
| JP2000037695A (ja) | オゾン水供給装置 | |
| JP2000331977A5 (enExample) | ||
| DE60104605D1 (de) | Photolytisches Verfahren zur Reinigung von kontaminiertem Wasser | |
| AU4507699A (en) | Method and system for cleaning semiconductor elements | |
| JP2000331977A (ja) | 電子材料の洗浄方法 | |
| TW567096B (en) | Cleaning apparatus and cleaning method | |
| JP2005186067A (ja) | オゾン含有超純水供給方法及び装置 | |
| JP2005152803A (ja) | オゾン水の送水方法 | |
| TWI900891B (zh) | 廢水的處理方法 | |
| KR101079323B1 (ko) | 오존을 이용한 웨이퍼 세정 시스템 | |
| JPH11186207A (ja) | 電子材料用洗浄水 | |
| JP4203776B2 (ja) | 電子材料用洗浄液 | |
| JP2003163198A (ja) | 窒化ガリウムのエッチング方法および窒化ガリウムのエッチング装置 | |
| JP2001310118A (ja) | ガス溶解水供給装置 | |
| JP2001314740A (ja) | ガス溶解洗浄水供給装置 | |
| JPH11158494A (ja) | 電子材料用洗浄水 | |
| CN117303623A (zh) | 一种臭氧型紫外光耦合非臭氧型紫外光处理废水的方法 | |
| TW202513484A (zh) | 廢水的處理方法 |