JP2000328158A - Copper alloy sheet excellent in press punchability - Google Patents

Copper alloy sheet excellent in press punchability

Info

Publication number
JP2000328158A
JP2000328158A JP11133389A JP13338999A JP2000328158A JP 2000328158 A JP2000328158 A JP 2000328158A JP 11133389 A JP11133389 A JP 11133389A JP 13338999 A JP13338999 A JP 13338999A JP 2000328158 A JP2000328158 A JP 2000328158A
Authority
JP
Japan
Prior art keywords
plane
copper alloy
ray diffraction
alloy sheet
diffraction intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11133389A
Other languages
Japanese (ja)
Other versions
JP4056175B2 (en
Inventor
Tetsuzo Ogura
哲造 小倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP13338999A priority Critical patent/JP4056175B2/en
Publication of JP2000328158A publication Critical patent/JP2000328158A/en
Application granted granted Critical
Publication of JP4056175B2 publication Critical patent/JP4056175B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain an alloy sheet maintaining the excellent strength and electri cal conductivity of a Cu-Fe-P alloy and excellent in press punchability by allowing it to have a specified compsn. and allowing the respective X-ray diffrac tion intensity from the 200} plane, 311} plane and 220} plane in the sheet surface, i.e., I 200}, I 311} and I 220} to satisfy specified relation. SOLUTION: This alloy sheet contains, by weight, 0.005 to 0.5% Fe and 0.005 to 0.2% P, and the balance Cu with inevitable impurities. Among the X-ray diffraction intensity, the inequality of [I 200} +I 311}]/I 220}<0.4 is satisfied. Preferably, either or both of 0.01 to 10% Zn and 0.01 to 55% Sn may be incorporated therein. This alloy sheet moreover contains one or >= two kinds of elements selected from each element of B, C, S, Ca or, the like, respectively of 0.0001 to 0.1% (by <=0.1% in total in the case >= two kinds are added) and each element of Be, Mg, Al, or the like, respectively of 0.001 to 1% by <=1% in total.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は銅合金板、特にリー
ドフレーム、端子、コネクタ、スイッチ、リレーなどの
電子部品に用いるに好適なプレス打ち抜き性が優れた銅
合金板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper alloy plate, and more particularly to a copper alloy plate having excellent press punching properties suitable for use in electronic components such as lead frames, terminals, connectors, switches, relays and the like.

【0002】[0002]

【従来の技術】各種電子部品に、各種銅及び銅合金が用
いられている。近年、電子部品の軽薄短小化の流れが急
速に進展している。それに伴い、リードフレーム、端
子、コネクタ、スイッチ、リレーなどに用いられる銅合
金板は、高強度、高導電率はもちろんのこと、微細な形
状にスタンピング加工されるため優れたプレス打抜き性
が要求されることが多くなってきている。なかでもCu
−Fe−P系合金は、高強度、高耐熱性及び高導電率を
兼備する合金としてこれらの用途に広く用いられてい
る。しかし、これらの特性とプレス打抜き性との両立は
難しいのが現状であった。
2. Description of the Related Art Various copper and copper alloys are used for various electronic components. 2. Description of the Related Art In recent years, the trend toward lighter, smaller, and smaller electronic components has been rapidly advancing. Along with this, copper alloy plates used for lead frames, terminals, connectors, switches, relays, etc. are required not only to have high strength and high electrical conductivity, but also to be stamped into a fine shape and to have excellent press punching properties. Is increasing. Above all, Cu
-Fe-P alloys are widely used in these applications as alloys having both high strength, high heat resistance and high electrical conductivity. However, at the present time, it is difficult to achieve both these characteristics and press punching properties.

【0003】[0003]

【発明が解決しようとする課題】従来、プレス打抜き性
向上の方法として、Pb、Caなどの微量成分添加、あ
るいは破断の起点となる化合物を分散させるなど、化学
成分に着目することが常套手段であった。しかしこのよ
うな方法は、微量成分の制御が困難であったり、他の特
性を劣化させたり、コストアップにつながるなどの問題
を有していた。本発明は従来技術の上記問題点に鑑みて
なされたもので、Cu−Fe−P系合金の優れた強度、
導電率等を保持しながら、優れたプレス打抜き性を持つ
銅合金板を得ることを目的とする。
Conventionally, as a method for improving the press punching property, it is customary to pay attention to chemical components such as adding a minor component such as Pb or Ca, or dispersing a compound which is a starting point of fracture. there were. However, such a method has problems that it is difficult to control a trace component, deteriorate other characteristics, and increase the cost. The present invention has been made in view of the above problems of the prior art, excellent strength of Cu-Fe-P based alloy,
An object of the present invention is to obtain a copper alloy sheet having excellent press punching properties while maintaining conductivity and the like.

【0004】[0004]

【課題を解決するための手段】本発明者は、前記課題を
解決するためにCu−Fe−P系合金板について鋭意研
究した結果、結晶方位の集積度を制御することによりプ
レス打抜き性を向上できることを見い出し、本発明をな
すに至った。すなわち、本発明に係る銅合金板は、F
e:0.005〜0.5wt%、P:0.005〜0.
2wt%を含み、残部Cuと不可避不純物からなり、さ
らに板表面における{200}面からのX線回折強度を
I{200}、{311}面からのX線回折強度をI{311}、
{220}面からのX線回折強度をI{220}としたと
き、下記式を満たすことを特徴とする。 [I{200}+I{311}]/I{220}<0.4
Means for Solving the Problems The inventor of the present invention has made intensive studies on Cu-Fe-P alloy sheets to solve the above-mentioned problems, and as a result, has improved press punching properties by controlling the degree of integration of crystal orientations. They have found what they can do and accomplished the present invention. That is, the copper alloy sheet according to the present invention has F
e: 0.005 to 0.5 wt%, P: 0.005 to 0.
2 wt%, the balance being Cu and unavoidable impurities. Further, the X-ray diffraction intensity from the {200} plane on the plate surface is I {200}, and the X-ray diffraction intensity from the {311} plane is I {311}.
When the X-ray diffraction intensity from the {220} plane is I {220}, the following formula is satisfied. [I {200} + I {311}] / I {220} <0.4

【0005】なお、上記の銅合金板は、Zn:0.01
〜10wt%、Sn:0.01〜5wt%のいずれか一
方又は双方を含有することができる。さらに、上記の銅
合金板は、B、C、S、Ca、V、Ga、Ge、Nb、
Mo、Hf、Ta、Bi、Pbの各元素0.0001〜
0.1wt%(2種以上添加する場合は合計で0.1w
t%以下)、Be、Mg、Al、Si、Ti、Cr、M
n、Ni、Co、Zr、Ag、Cd、In、Sb、T
e、Auの各元素0.001〜1wt%のうちから選ば
れた、1種又は2種以上の元素を合計で1wt%以下含
有することができる。
[0005] The above copper alloy plate is made of Zn: 0.01.
-10 wt%, Sn: 0.01-5 wt%, or both. Further, the above-mentioned copper alloy plate is made of B, C, S, Ca, V, Ga, Ge, Nb,
Mo, Hf, Ta, Bi, and Pb elements 0.0001 to
0.1wt% (When adding two or more, 0.1w% in total
t% or less), Be, Mg, Al, Si, Ti, Cr, M
n, Ni, Co, Zr, Ag, Cd, In, Sb, T
One or more elements selected from 0.001 to 1 wt% of each element of e and Au can be contained in a total of 1 wt% or less.

【0006】[0006]

【発明の実施の形態】次に、本発明に係る銅合金の成分
及び結晶方位等の限定理由について説明する。 (Fe及びP)これらの成分は、共存した状態でFeと
Pの金属間化合物を形成することにより、導電率を大幅
に低下させることなく強度を向上させる効果がある。F
eが0.005wt%未満又は/及びPが0.005w
t%未満ではその効果がなく、Feが0.5wt%を超
え又は/及びPが0.2wt%を超えると熱間加工性が
著しく低下する。従って、両成分はFe:0.005〜
0.5wt%、P:0.005〜0.2wt%とする。
なお、Fe、Pは結晶方位指数([I{200}+I{311}]
/I{220})を下げ、プレス打ち抜き性を向上させる作
用がある。
Next, the reasons for limiting the components and crystal orientation of the copper alloy according to the present invention will be described. (Fe and P) These components form an intermetallic compound of Fe and P in a coexisting state, and thus have the effect of improving the strength without significantly lowering the conductivity. F
e is less than 0.005 wt% or / and P is 0.005 w
If the content is less than t%, the effect is not obtained. If the content of Fe exceeds 0.5% by weight and / or the content of P exceeds 0.2% by weight, the hot workability is significantly reduced. Therefore, both components are Fe: 0.005 to
0.5 wt%, P: 0.005 to 0.2 wt%.
Note that Fe and P are crystal orientation indices ([I {200} + I {311}]).
/ I {220}) to improve press punchability.

【0007】(Zn)Znは、はんだ耐熱剥離性及び耐
マイグレーション性を向上させる作用があるが、0.0
1wt%未満ではその効果が十分ではない。10wt%
を超えると導電率が低下するだけでなく、はんだ付け性
が低下するとともに、耐応力腐食割れ感受性が高くなり
好ましくない。従って、Znは0.01〜10wt%と
する。なお、Znは結晶方位指数を下げ、プレス打ち抜
き性を向上させる作用をもつ。 (Sn)Snは、固溶強化により強度を向上させる成分
である。0.01wt%未満ではその効果が十分ではな
く、5wt%を超えるとその効果が飽和するとともに、
熱間及び冷間加工性が劣化する。従って、Snは0.0
1〜5wt%とする。なお、Snは結晶方位指数を下
げ、プレス打ち抜き性を向上させる作用をもつ。
(Zn) Zn has an effect of improving the heat-resistant peeling resistance and the migration resistance.
If it is less than 1 wt%, the effect is not sufficient. 10wt%
If it exceeds, not only the conductivity will decrease but also the solderability will decrease and the sensitivity to stress corrosion cracking will increase, which is not preferred. Therefore, Zn is set to 0.01 to 10% by weight. Note that Zn has a function of lowering the crystal orientation index and improving the press punching property. (Sn) Sn is a component that improves strength by solid solution strengthening. If the content is less than 0.01 wt%, the effect is not sufficient, and if it exceeds 5 wt%, the effect is saturated, and
Hot and cold workability deteriorates. Therefore, Sn is 0.0
1 to 5 wt%. Note that Sn has a function of lowering the crystal orientation index and improving the press punching property.

【0008】(副成分)B、C、S、Ca、V、Ga、
Ge、Nb、Mo、Hf、Ta、Bi、Pbの各元素は
プレス打抜き性を一層向上させる役割を有する。これら
の元素は、0.0001wt%未満ではその効果がな
く、0.1wt%を超えると熱間加工性が劣化する。ま
た、Be、Mg、Al、Si、Ti、Cr、Mn、N
i、Co、Zr、Ag、Cd、In、Sb、Te、Au
の各元素はプレス打抜き性を向上させる役割を有し、加
えてFe−P化合物との共存により強度を一層向上させ
る。これらの元素は、0.001wt%未満ではその効
果がなく、1wt%を超えると熱間及び冷間加工性が劣
化するとともに導電率も低下する。従って、上記B〜P
bについては各元素0.0001〜0.1wt%(2種
以上添加する場合は合計で0.1wt%以下)、上記B
e〜Auについては各元素0.001〜1wt%とし、
両方合計で1wt%以下とする。
(Subcomponents) B, C, S, Ca, V, Ga,
Each element of Ge, Nb, Mo, Hf, Ta, Bi, and Pb has a role of further improving the press punching property. If these elements are less than 0.0001% by weight, they have no effect, and if they exceed 0.1% by weight, the hot workability deteriorates. Also, Be, Mg, Al, Si, Ti, Cr, Mn, N
i, Co, Zr, Ag, Cd, In, Sb, Te, Au
Each element has a role of improving the press punching property, and further improves the strength by coexistence with the Fe-P compound. If these elements are less than 0.001 wt%, their effects are not obtained, and if they exceed 1 wt%, the hot and cold workability is deteriorated and the electric conductivity is also lowered. Therefore, the above B to P
For b, each element is 0.0001 to 0.1 wt% (when two or more kinds are added, the total is 0.1 wt% or less).
For e to Au, each element is 0.001 to 1 wt%,
The total of both is set to 1% by weight or less.

【0009】(結晶方位)FeとPを含有する銅合金板
は、再結晶しその粒径が大きくなるに従って板表面への
{200}、{311}面の集積割合が増し、圧延する
と{220}面の集積割合が増してくる。本発明に係る
銅合金板は、例えば熱間圧延、冷間圧延、析出焼鈍、仕
上げ冷間圧延及び歪み取り焼鈍という工程で製造される
が、この製造工程において、例えば析出焼鈍(焼鈍温
度、時間)とその後の冷間圧延工程(加工率)を調整す
ることで、この集積割合を制御することができる。具体
的には焼鈍温度は475℃以下、析出焼鈍後の累計加工
率は55%以上が好ましい条件である。なお、この集積
割合はその後の再結晶を伴わない歪み取り焼鈍によって
は大きく変化しない。また、FeとPの含有量、さらに
はそれ以外の元素の含有量も集積割合に影響する。本発
明では、これらの集積割合がプレス打抜き性と強い相関
を持ち、板表面へのこれらの集積割合を制御することに
よりプレス打抜き性を向上できるとの知見をもとに、前
記式に示すとおり、適正な結晶方位指数の範囲を求めた
ものである。なお、結晶方位指数の値は板の曲げ加工性
にも関係し、この値が余り小さくなると板の曲げ加工性
が悪下することから、この値は0.1以上が望ましい。
(Crystal orientation) A copper alloy sheet containing Fe and P is recrystallized, and as the grain size increases, the accumulation ratio of {200} and {311} planes on the sheet surface increases.集 積 The accumulation ratio of the surface will increase. The copper alloy sheet according to the present invention is manufactured by, for example, hot rolling, cold rolling, precipitation annealing, finish cold rolling, and strain relief annealing. In this manufacturing process, for example, precipitation annealing (annealing temperature, time ) And the subsequent cold rolling step (working rate), the accumulation ratio can be controlled. Specifically, the annealing temperature is preferably 475 ° C. or less, and the cumulative working ratio after the precipitation annealing is preferably 55% or more. It should be noted that this accumulation ratio does not change significantly by subsequent strain relief annealing without recrystallization. Further, the contents of Fe and P, and the contents of other elements also affect the accumulation ratio. In the present invention, based on the knowledge that these accumulation ratios have a strong correlation with the press punching property and that the press punching property can be improved by controlling these accumulation rates on the sheet surface, as shown in the above formula, And an appropriate range of the crystal orientation index. The value of the crystal orientation index is also related to the bending workability of the sheet. If the value is too small, the bending workability of the sheet deteriorates. Therefore, this value is preferably 0.1 or more.

【0010】[0010]

【実施例】次に、本発明の実施例について、比較例とと
もに以下に説明する。表1に示す化学組成の銅合金を、
クリプトル炉にて木炭被覆下で大気溶解し、ブックモー
ルドに鋳造し、50×80×200mmの鋳塊を作製し
た。この鋳塊を930℃に加熱し熱間圧延後、直ちに水
中急冷し厚さ15mmの熱延材とした。この熱延材の表
面の酸化スケールを除去するため、表面をグラインダで
切削した。これを冷間圧延した後、425℃で2時間の
析出焼鈍を施し、さらに60%の冷間加工率の仕上げ冷
間圧延により板厚0.25mmに調整した。この材料に
350℃で20秒の歪み取り焼鈍を施した後、試験に供
した。
Next, examples of the present invention will be described below together with comparative examples. A copper alloy having the chemical composition shown in Table 1 was
The mixture was melted in the air under a charcoal coating in a crypt furnace and cast into a book mold to produce an ingot of 50 × 80 × 200 mm. This ingot was heated to 930 ° C., hot-rolled, and immediately quenched in water to obtain a hot-rolled material having a thickness of 15 mm. The surface was cut with a grinder to remove oxide scale on the surface of the hot rolled material. After cold rolling, this was subjected to precipitation annealing at 425 ° C. for 2 hours, and further adjusted to a sheet thickness of 0.25 mm by finish cold rolling at a cold working rate of 60%. This material was subjected to a strain relief annealing at 350 ° C. for 20 seconds and then subjected to a test.

【0011】[0011]

【表1】 [Table 1]

【0012】また、上記工程以外に、種々の結晶方位集
積割合の銅合金板を得るため、No.3の組成の合金に
ついては、析出焼鈍温度を425℃の他に450℃(N
o.3-2)、500℃(No.3-5)の条件にて製作し
た。また析出焼鈍後の冷間加工率も60%の他に30%
(No.3-6)、40%(No.3-7)、50%(No.
3-3)及び70%(No.3-4)の条件にて製作した。い
ずれの条件によっても、最終板厚は0.25mmに調整
した。
In addition to the above steps, in order to obtain copper alloy plates having various crystal orientation accumulation ratios, For the alloy having the composition No. 3, the precipitation annealing temperature was set to 450 ° C. (N
o. 3-2), manufactured under the conditions of 500 ° C (No. 3-5). The cold working rate after precipitation annealing is 30% in addition to 60%.
(No. 3-6), 40% (No. 3-7), 50% (No.
3-3) and 70% (No. 3-4). Under any conditions, the final thickness was adjusted to 0.25 mm.

【0013】これらの供試材について、引張強さ、耐
力、導電率、ばり高さ及び結晶方位を下記要領にて調査
した。その結果を表2及び表3に示す。また、耐応力腐
食割れ性についても下記要領で評価した。 <引張強さ、耐力>JIS Z 2241に記載の方法
に準じた。なお、耐力はオフセット法で永久伸び0.2
%を採用した。試験片は、JIS Z 2201の5号
試験片を用いた。 <導電率>JIS H 0505に記載の方法に準じ
た。電気抵抗の測定はダブルブリッジを用いた。 <ばり高さ>金型クリアランスを10%とし、250s
pmの打抜き速度で、長さ30mm、幅0.5mmのリ
ードを打抜き、ばり高さをSEM観察にて測定した。 <結晶方位>最終製品状態(0.25mm厚さ)の銅合
金板表面にX線を入射させ、各回折面からの強度を測定
した。表面からの測定深さは入射角によって変化する
が、最大で約20〜30μmの深さまでの結晶方位デー
タが得られる。その中から曲げ加工性と相関が強い{2
00}、{311}及び{220}面の回折強度の割合
を比較し、結晶方位指数を求めた。なお、X線照射の条
件は、X線の種類:CuK−α1、管電圧:40kV、
管電流:200mAであり、試料を平面内で回転させな
がら測定した。 <耐応力腐食割れ性>トンプソン氏の方法(D.H.Thomps
on:Materials Research & Standards 1(1961),108)に準
じて試験を行った。試験片寸法を0.25mmt×1
2.7mmw×150mmlとし、図1(a)に示すよ
うにループ状に結んだ後、14wt%のアンモニア水飽
和蒸気中に暴露した。結びを解いたときの試験片両端の
距離を測定し、下記式にて応力緩和率を測定した。20
時間以内に応力緩和率が50%以上になったものを耐応
力腐食割れ性が劣ると評価した。 応力緩和率(%)=[(l−l)/l×100 l:アンモニア暴露前の試験片両端の距離 l:アンモニア暴露後の試験片両端の距離
With respect to these test materials, tensile strength, proof stress, electrical conductivity, flash height, and crystal orientation were examined in the following manner. The results are shown in Tables 2 and 3. The stress corrosion cracking resistance was also evaluated in the following manner. <Tensile strength, yield strength> The method described in JIS Z 2241 was used. The proof stress was set by a permanent elongation of 0.2 by the offset method.
%It was adopted. As the test piece, a No. 5 test piece of JIS Z 2201 was used. <Electric conductivity> The method described in JIS H 0505 was used. The electric resistance was measured using a double bridge. <Burr height> 250s with mold clearance of 10%
A lead having a length of 30 mm and a width of 0.5 mm was punched at a punching speed of pm, and the burrs were measured by SEM observation. <Crystal Orientation> X-rays were incident on the surface of the copper alloy plate in the final product state (0.25 mm thickness), and the intensity from each diffraction surface was measured. Although the measurement depth from the surface changes depending on the incident angle, crystal orientation data up to a depth of about 20 to 30 μm can be obtained. Among them, there is strong correlation with bending workability.
The crystal orientation index was determined by comparing the diffraction intensity ratios of the 00, {311} and {220} planes. The X-ray irradiation conditions were as follows: X-ray type: CuK-α1, tube voltage: 40 kV,
Tube current: 200 mA, measured while rotating the sample in a plane. <Stress corrosion cracking resistance>Thompson's method (DHThomps
on: The test was performed according to Materials Research & Standards 1 (1961), 108). 0.25mmt × 1
As shown in FIG. 1 (a), the size was set to 2.7 mmw × 150 mm, and after being tied in a loop shape, it was exposed to 14 wt% aqueous ammonia saturated steam. The distance between both ends of the test piece when the knot was released was measured, and the stress relaxation rate was measured by the following equation. 20
Those having a stress relaxation rate of 50% or more within the time were evaluated as having poor stress corrosion cracking resistance. Stress relaxation rate (%) = [(l 1 −l 2 ) / l 1 × 100 l 1 : distance between both ends of test specimen before exposure to ammonia l 2 : distance between both ends of test specimen after exposure to ammonia

【0014】[0014]

【表2】 [Table 2]

【0015】[0015]

【表3】 [Table 3]

【0016】表2に示す本発明例のNo.1〜18はい
ずれの特性も良好である。このうち、No.1とNo.
2はFeとPが低めであり、強度がやや低く、結晶方位
指数が高めで、ばりがやや大きい。逆に、No.4と5
はFeとPが高めであるため、強度がやや高く、結晶方
位指数が低めで、ばりが小さい。またNo.3-2、3-3は
結晶方位指数が高めであり、ばりがやや大きくなってい
る。一方、表3に示す比較例のNo.19はFeとPが
低いため、強度が低く、結晶方位指数が高いため、ばり
が大きい。比較例No.20はFeとPが高いため、熱
間圧延で割れが発生した。比較例No.21はZnが多
いため、耐応力腐食割れ性が低く、導電率も低くなって
いる。比較例No.22、No.23はSn又はPb含
有量が高く、熱間圧延で割れが発生した。No.24は
Fe含有量が高く、熱間圧延で微小割れが発生するとと
もに、導電率も低くなっている。No.3-5、3-6、3-7
は結晶方位指数が高く、ばりが大きい。
[0016] In Table 2, No. Each of Nos. 1 to 18 has good characteristics. Among them, No. 1 and No.
In No. 2, Fe and P are relatively low, the strength is slightly low, the crystal orientation index is high, and the burrs are slightly large. Conversely, no. 4 and 5
Since Fe and P are high, the strength is slightly high, the crystal orientation index is low, and the burrs are small. No. 3-2 and 3-3 have higher crystal orientation indices, and the burrs are slightly larger. On the other hand, in Comparative Example No. 3 shown in Table 3, No. 19 has low strength because Fe and P are low, and has large burrs because the crystal orientation index is high. Comparative Example No. In No. 20, since Fe and P were high, cracks occurred during hot rolling. Comparative Example No. Since No. 21 has a large amount of Zn, it has low stress corrosion cracking resistance and low electric conductivity. Comparative Example No. 22, no. No. 23 had a high Sn or Pb content, and cracks occurred during hot rolling. No. No. 24 has a high Fe content, causes microcracks during hot rolling, and has a low conductivity. No. 3-5, 3-6, 3-7
Has a high crystal orientation index and large burrs.

【0017】[0017]

【発明の効果】本発明によれば、優れた強度及び導電率
等を保持しながら、優れたプレス打抜き性を持つリード
フレーム、端子、コネクタ、スイッチ、リレーなどの電
子部品用の銅合金板を得ることができる。
According to the present invention, a copper alloy plate for an electronic component such as a lead frame, a terminal, a connector, a switch, and a relay having excellent press punching property while maintaining excellent strength and conductivity is provided. Obtainable.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 耐応力腐食割れ性試験の方法を説明する図で
ある。
FIG. 1 is a diagram illustrating a method of a stress corrosion cracking resistance test.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22C 9/06 C22C 9/06 9/10 9/10 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C22C 9/06 C22C 9/06 9/10 9/10

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 Fe:0.005〜0.5wt%、P:
0.005〜0.2wt%を含み、残部Cuと不可避不
純物からなり、さらに板表面における{200}面から
のX線回折強度をI{200}、{311}面からのX線回
折強度をI{311}、{220}面からのX線回折強度を
I{220}としたとき、下記式を満たすことを特徴とする
プレス打抜き性が優れた銅合金板。 [I{200}+I{311}]/I{220}<0.4
1. Fe: 0.005 to 0.5 wt%, P:
Containing 0.005 to 0.2 wt%, the balance being Cu and unavoidable impurities. Further, the X-ray diffraction intensity from the {200} plane on the plate surface is I {200}, and the X-ray diffraction intensity from the {311} plane is I {311}, a copper alloy sheet having excellent press punching properties, characterized by satisfying the following equation, where X-ray diffraction intensity from the {220} plane is I {220}. [I {200} + I {311}] / I {220} <0.4
【請求項2】 Fe:0.005〜0.5wt%、P:
0.005〜0.2wt%、Zn:0.01〜10wt
%を含み、残部Cuと不可避不純物からなり、さらに板
表面における{200}面からのX線回折強度をI{20
0}、{311}面からのX線回折強度をI{311}、{2
20}面からのX線回折強度をI{220}としたとき、下
記式を満たすことを特徴とするプレス打抜き性が優れた
銅合金板。 [I{200}+I{311}]/I{220}<0.4
2. Fe: 0.005 to 0.5 wt%, P:
0.005 to 0.2 wt%, Zn: 0.01 to 10 wt
%, The balance consisting of Cu and unavoidable impurities, and the X-ray diffraction intensity from the {200} plane
0}, the X-ray diffraction intensity from the {311} plane is expressed as I {311}, {2
A copper alloy sheet having excellent press punching properties, characterized by satisfying the following formula, where the X-ray diffraction intensity from a 20 ° plane is I {220}. [I {200} + I {311}] / I {220} <0.4
【請求項3】 Fe:0.005〜0.5wt%、P:
0.005〜0.2wt%、Sn:0.01〜5wt%
を含み、残部Cuと不可避不純物からなり、さらに板表
面における{200}面からのX線回折強度をI{20
0}、{311}面からのX線回折強度をI{311}、{2
20}面からのX線回折強度をI{220}としたとき、下
記式を満たすことを特徴とするプレス打抜き性が優れた
銅合金板。 [I{200}+I{311}]/I{220}<0.4
3. Fe: 0.005 to 0.5 wt%, P:
0.005 to 0.2 wt%, Sn: 0.01 to 5 wt%
And the balance consisting of Cu and unavoidable impurities. Further, the X-ray diffraction intensity from the {200} plane on the plate surface is I {20
0}, the X-ray diffraction intensity from the {311} plane is expressed as I {311}, {2
A copper alloy sheet having excellent press punching properties, characterized by satisfying the following formula, where the X-ray diffraction intensity from a 20 ° plane is I {220}. [I {200} + I {311}] / I {220} <0.4
【請求項4】 Fe:0.005〜0.5wt%、P:
0.005〜0.2wt%、Zn:0.01〜10wt
%、Sn:0.01〜5wt%を含み、残部Cuと不可
避不純物からなり、さらに板表面における{200}面
からのX線回折強度をI{200}、{311}面からのX
線回折強度をI{311}、{220}面からのX線回折強
度をI{220}としたとき、下記式を満たすことを特徴と
するプレス打抜き性が優れた銅合金板。 [I{200}+I{311}]/I{220}<0.4
4. Fe: 0.005 to 0.5 wt%, P:
0.005 to 0.2 wt%, Zn: 0.01 to 10 wt
%, Sn: 0.01 to 5 wt%, the balance consisting of Cu and unavoidable impurities, and further, the X-ray diffraction intensity from the {200} plane on the plate surface is expressed by I {200} and X from the {311} plane.
A copper alloy sheet having excellent press punching properties, wherein the following formula is satisfied, where X-ray diffraction intensity is I {311} and X-ray diffraction intensity from the {220} plane is I {220}. [I {200} + I {311}] / I {220} <0.4
【請求項5】 B、C、S、Ca、V、Ga、Ge、N
b、Mo、Hf、Ta、Bi、Pbの各元素0.000
1〜0.1wt%、Be、Mg、Al、Si、Ti、C
r、Mn、Ni、Co、Zr、Ag、Cd、In、S
b、Te、Auの各元素0.001〜1wt%のうちか
ら選ばれた、1種又は2種以上の元素を合計で1wt%
以下含有することを特徴とする請求項1〜4のいずれか
に記載されたプレス打抜き性が優れた銅合金板。
5. B, C, S, Ca, V, Ga, Ge, N
each element of b, Mo, Hf, Ta, Bi, Pb 0.000
1-0.1 wt%, Be, Mg, Al, Si, Ti, C
r, Mn, Ni, Co, Zr, Ag, Cd, In, S
One, two or more elements selected from 0.001 to 1 wt% of each element of b, Te and Au are 1 wt% in total.
The copper alloy sheet having excellent press punching properties according to any one of claims 1 to 4, wherein the copper alloy sheet contains:
JP13338999A 1999-05-13 1999-05-13 Copper alloy plate for lead frames, terminals, connectors, switches or relays with excellent press punchability Expired - Lifetime JP4056175B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13338999A JP4056175B2 (en) 1999-05-13 1999-05-13 Copper alloy plate for lead frames, terminals, connectors, switches or relays with excellent press punchability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13338999A JP4056175B2 (en) 1999-05-13 1999-05-13 Copper alloy plate for lead frames, terminals, connectors, switches or relays with excellent press punchability

Publications (2)

Publication Number Publication Date
JP2000328158A true JP2000328158A (en) 2000-11-28
JP4056175B2 JP4056175B2 (en) 2008-03-05

Family

ID=15103610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13338999A Expired - Lifetime JP4056175B2 (en) 1999-05-13 1999-05-13 Copper alloy plate for lead frames, terminals, connectors, switches or relays with excellent press punchability

Country Status (1)

Country Link
JP (1) JP4056175B2 (en)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002180165A (en) * 2000-12-18 2002-06-26 Dowa Mining Co Ltd Copper based alloy having excellent press blanking property and its production method
FR2865478A1 (en) * 2004-01-23 2005-07-29 Kobe Steel Ltd Copper alloy with high mechanical strength and high conductivity for use as the conducting frame of an integrated circuit of a semiconductor device and other electric and electronics components
FR2880358A1 (en) * 2005-01-06 2006-07-07 Trefimetaux Copper alloy containing iron and phosphorus in low quantities for use in electronic applications, notably power transistor circuits
JP2006299409A (en) * 2005-03-22 2006-11-02 Dowa Mining Co Ltd High-strength/high-conductivity copper alloy having excellent workability, and copper alloy member using the same
JP2006316320A (en) * 2005-05-12 2006-11-24 Kobe Steel Ltd Copper alloy sheet with deformed cross-section, and method for producing the same
CN1327016C (en) * 2002-05-14 2007-07-18 同和矿业株式会社 Copper base alloy with improved punchin and impacting performance and its preparing method
JP2007186799A (en) * 2007-03-22 2007-07-26 Dowa Holdings Co Ltd Copper or copper-based alloy with excellent press-workability and manufacturing method therefor
WO2008010378A1 (en) 2006-07-21 2008-01-24 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheets for electrical/electronic part
WO2008041584A1 (en) 2006-10-02 2008-04-10 Kabushiki Kaisha Kobe Seiko Sho Copper alloy plate for electrical and electronic components
WO2009019990A1 (en) 2007-08-07 2009-02-12 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet
JP2009068114A (en) * 2008-10-30 2009-04-02 Dowa Holdings Co Ltd Copper alloy excellent in press-punching property and its production method
JP2010065275A (en) * 2008-09-10 2010-03-25 Mitsui Mining & Smelting Co Ltd Heat-resistant copper alloy with high electroconductivity, and production method therefor
JP4495251B1 (en) * 2009-03-12 2010-06-30 三井金属鉱業株式会社 Copper alloy containing phosphorus and iron and power distribution member using the copper alloy
JP2012172244A (en) * 2011-02-24 2012-09-10 Mitsubishi Shindoh Co Ltd Copper alloy sheet with deformed cross section excellent in press workability, and method for producing the same
WO2013183860A1 (en) * 2012-06-04 2013-12-12 Park Hyo Joo Copper alloy member and preparation method therefor
CN104152742A (en) * 2014-09-04 2014-11-19 安徽鑫科新材料股份有限公司 High-performance tin-phosphor bronze wire and production method thereof
JP2014234534A (en) * 2013-05-31 2014-12-15 Jx日鉱日石金属株式会社 Copper alloy sheet excellent in conductivity and deflection coefficient
US20150361584A1 (en) * 2014-06-13 2015-12-17 Jx Nippon Mining & Metals Corporation Rolled copper foil for producing two-dimensional hexagonal lattice compound and method of producing two-dimensional hexagonal lattice compound
CN105886828A (en) * 2016-04-20 2016-08-24 湖北精益高精铜板带有限公司 Microalloy copper foil and machining method thereof
WO2016179731A1 (en) * 2015-05-12 2016-11-17 苏州列治埃盟新材料技术转移有限公司 Novel alloy bar made from new multi-component environmentally-friendly leadless alloy material and preparation method for novel alloy bar
USRE47195E1 (en) 2011-02-18 2019-01-08 Jx Nippon Mining & Metals Corporation Copper foil for producing graphene and method of producing graphene using the same

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6699337B2 (en) * 2000-12-18 2004-03-02 Dowa Mining Co., Ltd. Copper-base alloys having improved punching properties on press and a process for producing them
JP4729680B2 (en) * 2000-12-18 2011-07-20 Dowaメタルテック株式会社 Copper-based alloy with excellent press punchability
JP2002180165A (en) * 2000-12-18 2002-06-26 Dowa Mining Co Ltd Copper based alloy having excellent press blanking property and its production method
CN1327016C (en) * 2002-05-14 2007-07-18 同和矿业株式会社 Copper base alloy with improved punchin and impacting performance and its preparing method
FR2865478A1 (en) * 2004-01-23 2005-07-29 Kobe Steel Ltd Copper alloy with high mechanical strength and high conductivity for use as the conducting frame of an integrated circuit of a semiconductor device and other electric and electronics components
FR2880358A1 (en) * 2005-01-06 2006-07-07 Trefimetaux Copper alloy containing iron and phosphorus in low quantities for use in electronic applications, notably power transistor circuits
JP2006299409A (en) * 2005-03-22 2006-11-02 Dowa Mining Co Ltd High-strength/high-conductivity copper alloy having excellent workability, and copper alloy member using the same
JP2006316320A (en) * 2005-05-12 2006-11-24 Kobe Steel Ltd Copper alloy sheet with deformed cross-section, and method for producing the same
US9644250B2 (en) 2006-07-21 2017-05-09 Kobe Steel, Ltd. Copper alloy sheet for electric and electronic part
WO2008010378A1 (en) 2006-07-21 2008-01-24 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheets for electrical/electronic part
US9631260B2 (en) 2006-07-21 2017-04-25 Kobe Steel, Ltd. Copper alloy sheets for electrical/electronic part
EP2339039A3 (en) * 2006-07-21 2014-01-22 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet for electric and electronic part
KR101136265B1 (en) 2006-07-21 2012-04-23 가부시키가이샤 고베 세이코쇼 Copper alloy sheets for electrical/electronic part
EP2339039A2 (en) 2006-07-21 2011-06-29 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet for electric and electronic part
EP2339038A2 (en) 2006-07-21 2011-06-29 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet for electric and electronic part
US8063471B2 (en) 2006-10-02 2011-11-22 Kobe Steel, Ltd. Copper alloy sheet for electric and electronic parts
EP2388349A1 (en) 2006-10-02 2011-11-23 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Copper alloy sheet for electric and electronic parts
WO2008041584A1 (en) 2006-10-02 2008-04-10 Kabushiki Kaisha Kobe Seiko Sho Copper alloy plate for electrical and electronic components
EP2388347A1 (en) 2006-10-02 2011-11-23 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Copper alloy sheet for electric and electronic parts
EP2388348A1 (en) 2006-10-02 2011-11-23 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Copper alloy sheet for electric and electronic parts
JP2007186799A (en) * 2007-03-22 2007-07-26 Dowa Holdings Co Ltd Copper or copper-based alloy with excellent press-workability and manufacturing method therefor
WO2009019990A1 (en) 2007-08-07 2009-02-12 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet
EP2695956A2 (en) 2007-08-07 2014-02-12 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet
EP2695958A2 (en) 2007-08-07 2014-02-12 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet
EP2695957A2 (en) 2007-08-07 2014-02-12 Kabushiki Kaisha Kobe Seiko Sho Copper alloy sheet
JP2010065275A (en) * 2008-09-10 2010-03-25 Mitsui Mining & Smelting Co Ltd Heat-resistant copper alloy with high electroconductivity, and production method therefor
JP2009068114A (en) * 2008-10-30 2009-04-02 Dowa Holdings Co Ltd Copper alloy excellent in press-punching property and its production method
CN102076875B (en) * 2009-03-12 2013-06-26 三井住友金属矿山伸铜株式会社 Copper alloy containing phosphorus and iron and electrical member using the copper alloy
JP4495251B1 (en) * 2009-03-12 2010-06-30 三井金属鉱業株式会社 Copper alloy containing phosphorus and iron and power distribution member using the copper alloy
WO2010103646A1 (en) * 2009-03-12 2010-09-16 三井金属鉱業株式会社 Copper alloy containing phosphorus and iron and electrical member using the copper alloy
USRE47195E1 (en) 2011-02-18 2019-01-08 Jx Nippon Mining & Metals Corporation Copper foil for producing graphene and method of producing graphene using the same
JP2012172244A (en) * 2011-02-24 2012-09-10 Mitsubishi Shindoh Co Ltd Copper alloy sheet with deformed cross section excellent in press workability, and method for producing the same
WO2013183860A1 (en) * 2012-06-04 2013-12-12 Park Hyo Joo Copper alloy member and preparation method therefor
JP2014234534A (en) * 2013-05-31 2014-12-15 Jx日鉱日石金属株式会社 Copper alloy sheet excellent in conductivity and deflection coefficient
US20150361584A1 (en) * 2014-06-13 2015-12-17 Jx Nippon Mining & Metals Corporation Rolled copper foil for producing two-dimensional hexagonal lattice compound and method of producing two-dimensional hexagonal lattice compound
US9840757B2 (en) * 2014-06-13 2017-12-12 Jx Nippon Mining & Metals Corporation Rolled copper foil for producing two-dimensional hexagonal lattice compound and method of producing two-dimensional hexagonal lattice compound
CN104152742A (en) * 2014-09-04 2014-11-19 安徽鑫科新材料股份有限公司 High-performance tin-phosphor bronze wire and production method thereof
WO2016179731A1 (en) * 2015-05-12 2016-11-17 苏州列治埃盟新材料技术转移有限公司 Novel alloy bar made from new multi-component environmentally-friendly leadless alloy material and preparation method for novel alloy bar
CN105886828A (en) * 2016-04-20 2016-08-24 湖北精益高精铜板带有限公司 Microalloy copper foil and machining method thereof

Also Published As

Publication number Publication date
JP4056175B2 (en) 2008-03-05

Similar Documents

Publication Publication Date Title
JP4056175B2 (en) Copper alloy plate for lead frames, terminals, connectors, switches or relays with excellent press punchability
KR101027840B1 (en) Copper alloy plate material for electrical/electronic equipment and process for producing the same
JP3800279B2 (en) Copper alloy sheet with excellent press punchability
WO2011125554A1 (en) Cu-ni-si-co copper alloy for electronic material and process for producing same
JP2002180165A (en) Copper based alloy having excellent press blanking property and its production method
JPH11335756A (en) Copper alloy sheet for electronic parts
JP2006009137A (en) Copper alloy
JP2000080428A (en) Copper alloy sheet excellent in bendability
JP3383615B2 (en) Copper alloy for electronic materials and manufacturing method thereof
JP3797882B2 (en) Copper alloy sheet with excellent bending workability
JP2593107B2 (en) Manufacturing method of high strength and high conductivity copper base alloy
JP2004315940A (en) Cu-Ni-Si ALLOY AND ITS PRODUCTION METHOD
JP2000328157A (en) Copper alloy sheet excellent in bending workability
JP5297855B2 (en) Copper alloy sheet and manufacturing method thereof
JPH0784631B2 (en) Copper alloy for electronic devices
JP4166147B2 (en) Method for producing copper alloy plate for high-strength electrical and electronic parts
JP5261691B2 (en) Copper-base alloy with excellent press punchability and method for producing the same
JP3800269B2 (en) High strength copper alloy with excellent stamping workability and silver plating
JP2001181759A (en) Copper alloy for electronic material excellent in surface characteristic and producing method therefor
JP3049137B2 (en) High strength copper alloy excellent in bending workability and method for producing the same
JP3980808B2 (en) High-strength copper alloy excellent in bending workability and heat resistance and method for producing the same
JP2008024995A (en) Copper alloy plate for electrical/electronic component having excellent heat resistance
JPH0987814A (en) Production of copper alloy for electronic equipment
JPH0718356A (en) Copper alloy for electronic equipment, its production and ic lead frame
JP3807475B2 (en) Copper alloy plate for terminal and connector and manufacturing method thereof

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040526

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060718

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060915

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20060916

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061121

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070119

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070313

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20070501

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20071211

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20071211

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101221

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101221

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111221

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121221

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131221

Year of fee payment: 6

EXPY Cancellation because of completion of term