JP2000079366A5 - - Google Patents

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Publication number
JP2000079366A5
JP2000079366A5 JP1999173020A JP17302099A JP2000079366A5 JP 2000079366 A5 JP2000079366 A5 JP 2000079366A5 JP 1999173020 A JP1999173020 A JP 1999173020A JP 17302099 A JP17302099 A JP 17302099A JP 2000079366 A5 JP2000079366 A5 JP 2000079366A5
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JP
Japan
Prior art keywords
liquid
substrate
processed
film
discharge nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999173020A
Other languages
English (en)
Japanese (ja)
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JP2000079366A (ja
JP3842487B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP17302099A priority Critical patent/JP3842487B2/ja
Priority claimed from JP17302099A external-priority patent/JP3842487B2/ja
Publication of JP2000079366A publication Critical patent/JP2000079366A/ja
Publication of JP2000079366A5 publication Critical patent/JP2000079366A5/ja
Application granted granted Critical
Publication of JP3842487B2 publication Critical patent/JP3842487B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP17302099A 1998-06-19 1999-06-18 成膜装置 Expired - Fee Related JP3842487B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17302099A JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP17302198 1998-06-19
JP10-173021 1998-06-19
JP18513398 1998-06-30
JP10-185133 1998-06-30
JP17302099A JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006162657A Division JP2006314998A (ja) 1998-06-19 2006-06-12 成膜方法
JP2006162656A Division JP2006314997A (ja) 1998-06-19 2006-06-12 成膜方法

Publications (3)

Publication Number Publication Date
JP2000079366A JP2000079366A (ja) 2000-03-21
JP2000079366A5 true JP2000079366A5 (enExample) 2004-08-12
JP3842487B2 JP3842487B2 (ja) 2006-11-08

Family

ID=27323717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17302099A Expired - Fee Related JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Country Status (1)

Country Link
JP (1) JP3842487B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006314997A (ja) * 1998-06-19 2006-11-24 Toshiba Corp 成膜方法
JP2001276702A (ja) * 2000-03-28 2001-10-09 Toshiba Corp 成膜装置及び成膜方法
JP3655576B2 (ja) * 2001-07-26 2005-06-02 株式会社東芝 液膜形成方法及び半導体装置の製造方法
JP4253305B2 (ja) * 2001-07-26 2009-04-08 株式会社東芝 液膜形成方法及び固体膜の形成方法
JP3808741B2 (ja) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 処理装置
TW594421B (en) 2002-01-30 2004-06-21 Toshiba Corp Film forming method/device, image-forming method and semiconductor device manufacturing method
KR101145350B1 (ko) 2003-02-06 2012-05-14 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치 및 표시장치의 제조 방법
JP4335746B2 (ja) * 2004-05-27 2009-09-30 アルプス電気株式会社 スプレーコート装置及びこれを用いたスプレーコート方法
JP4971734B2 (ja) * 2006-09-20 2012-07-11 ケイミュー株式会社 被塗装体の部分塗装装置
JP5439451B2 (ja) * 2011-09-26 2014-03-12 株式会社東芝 塗布装置及び塗布方法
FI125906B (en) 2012-01-30 2016-03-31 Stora Enso Oyj A method and arrangement for transferring electrically conductive material in fluid form onto a printable substrate
JP6437016B2 (ja) 2015-02-03 2018-12-19 本田技研工業株式会社 塗布装置
DE102015015092A1 (de) * 2015-11-20 2017-05-24 Dürr Systems Ag Beschichtungsvorrichtung und entsprechendes Beschichtungsverfahren
DE102015015090A1 (de) 2015-11-20 2017-05-24 Dürr Systems Ag Beschichtungsverfahren und entsprechende Beschichtungsanlage
CN108580174B (zh) * 2018-06-30 2024-09-17 中国科学院上海硅酸盐研究所 一种钙钛矿太阳能电池中钙钛矿吸光层的涂布工艺及装置

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