JP3842487B2 - 成膜装置 - Google Patents

成膜装置 Download PDF

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Publication number
JP3842487B2
JP3842487B2 JP17302099A JP17302099A JP3842487B2 JP 3842487 B2 JP3842487 B2 JP 3842487B2 JP 17302099 A JP17302099 A JP 17302099A JP 17302099 A JP17302099 A JP 17302099A JP 3842487 B2 JP3842487 B2 JP 3842487B2
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JP
Japan
Prior art keywords
liquid
unit
substrate
film
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17302099A
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English (en)
Japanese (ja)
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JP2000079366A (ja
JP2000079366A5 (enExample
Inventor
信一 伊藤
勝弥 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP17302099A priority Critical patent/JP3842487B2/ja
Publication of JP2000079366A publication Critical patent/JP2000079366A/ja
Publication of JP2000079366A5 publication Critical patent/JP2000079366A5/ja
Application granted granted Critical
Publication of JP3842487B2 publication Critical patent/JP3842487B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP17302099A 1998-06-19 1999-06-18 成膜装置 Expired - Fee Related JP3842487B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17302099A JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP17302198 1998-06-19
JP10-173021 1998-06-19
JP18513398 1998-06-30
JP10-185133 1998-06-30
JP17302099A JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2006162657A Division JP2006314998A (ja) 1998-06-19 2006-06-12 成膜方法
JP2006162656A Division JP2006314997A (ja) 1998-06-19 2006-06-12 成膜方法

Publications (3)

Publication Number Publication Date
JP2000079366A JP2000079366A (ja) 2000-03-21
JP2000079366A5 JP2000079366A5 (enExample) 2004-08-12
JP3842487B2 true JP3842487B2 (ja) 2006-11-08

Family

ID=27323717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17302099A Expired - Fee Related JP3842487B2 (ja) 1998-06-19 1999-06-18 成膜装置

Country Status (1)

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JP (1) JP3842487B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006314997A (ja) * 1998-06-19 2006-11-24 Toshiba Corp 成膜方法
JP2001276702A (ja) * 2000-03-28 2001-10-09 Toshiba Corp 成膜装置及び成膜方法
JP3655576B2 (ja) * 2001-07-26 2005-06-02 株式会社東芝 液膜形成方法及び半導体装置の製造方法
JP4253305B2 (ja) * 2001-07-26 2009-04-08 株式会社東芝 液膜形成方法及び固体膜の形成方法
JP3808741B2 (ja) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 処理装置
TW594421B (en) 2002-01-30 2004-06-21 Toshiba Corp Film forming method/device, image-forming method and semiconductor device manufacturing method
KR101145350B1 (ko) 2003-02-06 2012-05-14 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치 및 표시장치의 제조 방법
JP4335746B2 (ja) * 2004-05-27 2009-09-30 アルプス電気株式会社 スプレーコート装置及びこれを用いたスプレーコート方法
JP4971734B2 (ja) * 2006-09-20 2012-07-11 ケイミュー株式会社 被塗装体の部分塗装装置
JP5439451B2 (ja) * 2011-09-26 2014-03-12 株式会社東芝 塗布装置及び塗布方法
FI125906B (en) 2012-01-30 2016-03-31 Stora Enso Oyj A method and arrangement for transferring electrically conductive material in fluid form onto a printable substrate
JP6437016B2 (ja) 2015-02-03 2018-12-19 本田技研工業株式会社 塗布装置
DE102015015092A1 (de) * 2015-11-20 2017-05-24 Dürr Systems Ag Beschichtungsvorrichtung und entsprechendes Beschichtungsverfahren
DE102015015090A1 (de) 2015-11-20 2017-05-24 Dürr Systems Ag Beschichtungsverfahren und entsprechende Beschichtungsanlage
CN108580174B (zh) * 2018-06-30 2024-09-17 中国科学院上海硅酸盐研究所 一种钙钛矿太阳能电池中钙钛矿吸光层的涂布工艺及装置

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Publication number Publication date
JP2000079366A (ja) 2000-03-21

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