ITMI952019A0 - - Google Patents
Info
- Publication number
- ITMI952019A0 ITMI952019A0 ITMI952019A ITMI952019A ITMI952019A0 IT MI952019 A0 ITMI952019 A0 IT MI952019A0 IT MI952019 A ITMI952019 A IT MI952019A IT MI952019 A ITMI952019 A IT MI952019A IT MI952019 A0 ITMI952019 A0 IT MI952019A0
- Authority
- IT
- Italy
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/26—Nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/42—Nitriles
- C08F220/44—Acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/56—Acrylamide; Methacrylamide
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
- C08F226/08—N-Vinyl-pyrrolidine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
- C08F226/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
- C08F226/10—N-Vinyl-pyrrolidone
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/005—Stabilisers against oxidation, heat, light, ozone
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/48—Stabilisers against degradation by oxygen, light or heat
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Plural Heterocyclic Compounds (AREA)
- Anti-Oxidant Or Stabilizer Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Silicon Polymers (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Hydrogenated Pyridines (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH298994 | 1994-10-04 | ||
CH303994 | 1994-10-10 | ||
CH36495 | 1995-02-08 |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI952019A0 true ITMI952019A0 (it) | 1995-10-03 |
ITMI952019A1 ITMI952019A1 (it) | 1997-04-03 |
IT1281195B1 IT1281195B1 (it) | 1998-02-17 |
Family
ID=27172042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT95MI002019A IT1281195B1 (it) | 1994-10-04 | 1995-10-03 | 2-idrossifeniltriazina di elevata durata, loro preparazione e uso per la stabilizzazione a lungo termine di materiali organici |
Country Status (17)
Country | Link |
---|---|
US (2) | US5672704A (it) |
JP (1) | JP4126400B2 (it) |
KR (2) | KR960014109A (it) |
CN (1) | CN1070186C (it) |
AT (1) | AT405515B (it) |
AU (1) | AU698297B2 (it) |
BE (1) | BE1008871A5 (it) |
BR (1) | BR9504276A (it) |
CA (1) | CA2159694A1 (it) |
CZ (1) | CZ255695A3 (it) |
DE (1) | DE19536730A1 (it) |
ES (1) | ES2106684B1 (it) |
FR (1) | FR2725204B1 (it) |
GB (1) | GB2293823B (it) |
IT (1) | IT1281195B1 (it) |
NL (1) | NL1001338C2 (it) |
SK (1) | SK123095A3 (it) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH692739A5 (de) * | 1996-03-26 | 2002-10-15 | Ciba Sc Holding Ag | Polymerzusammensetzungen enthaltend 2-Hydroxyphenyl-1,3,5-triazine als UV-Absorber sowie neue 2-Hydroxyphenyl-1,3,5-triazine |
DE59712179D1 (de) * | 1996-09-17 | 2005-03-03 | Ciba Sc Holding Ag | Verwendung liposomogener UV-Absorber zum Schutz des Haars |
DE19735901A1 (de) * | 1997-08-19 | 1999-02-25 | Beiersdorf Ag | Kosmetische oder dermatologische Lichtschutzmittel, welche als Festkörper vorliegende UV-Filtersubstanzen und polymere UV-Filtersubstanzen auf Siliconbasis enthalten |
DE19735900A1 (de) * | 1997-08-19 | 1999-02-25 | Beiersdorf Ag | Kosmetische oder dermatologische Lichtschutzmittel, welche gelöste Triazinderivate und polymere UV-Filtersubstanzen auf Siliconbasis enthalten |
EP1087947A2 (en) * | 1998-06-22 | 2001-04-04 | Ciba SC Holding AG | Trisaryl-1,3,5-triazine ultraviolet light absorbers containing hindered phenols |
US6239276B1 (en) | 1998-06-22 | 2001-05-29 | Cytec Technology Corporation | Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers |
ZA9810599B (en) * | 1998-06-22 | 1999-07-30 | Cytec Tech Corp | Triazine UV absorber comprising amino resins. |
AU4695699A (en) | 1998-06-22 | 2000-01-10 | Ciba Specialty Chemicals Holding Inc. | Poly-trisaryl-1,3,5-triazine carbamate ultraviolet light absorbers |
US6297377B1 (en) | 1998-06-22 | 2001-10-02 | Cytec Technology Corporation | Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers |
AU5907399A (en) * | 1998-09-04 | 2000-03-27 | Ciba Specialty Chemicals Holding Inc. | Process for making 2,4-dihydroxyphenyl and 2-hydroxy-4-alkoxyphenyl substituted triazine compounds |
TWI259182B (en) | 1998-11-17 | 2006-08-01 | Cytec Tech Corp | Process for preparing triazines using a combination of Lewis acids with reaction promoters |
CA2353908A1 (en) * | 1998-12-23 | 2000-07-06 | Ciba Specialty Chemicals Holding Inc. | Polymeric stabilizers having low polydispersity |
KR20010106124A (ko) | 1999-04-12 | 2001-11-29 | 이와시타 마사히로 | 고분자재료 조성물 |
US6191199B1 (en) * | 1999-05-03 | 2001-02-20 | Ciba Speciatly Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, high extinction photostable hydroxyphenyl-s-triazine UV absorbers and laminated articles derived therefrom |
US6867250B1 (en) | 2000-10-30 | 2005-03-15 | Cytec Technology Corp. | Non-yellowing ortho-dialkyl aryl substituted triazine ultraviolet light absorbers |
US6855269B2 (en) | 2001-11-09 | 2005-02-15 | Cytec Technology Corp. | Phenyl ether-substituted hydroxyphenyl triazine ultraviolet light absorbers |
ATE415448T1 (de) * | 2001-11-30 | 2008-12-15 | Ciba Holding Inc | 2-hydroxyphenyl-s-triazin-vernetzer für polymernetzwerke |
JP2004099115A (ja) * | 2002-07-16 | 2004-04-02 | Misawa Homes Co Ltd | 木質様成形品、製造装置及び製造方法 |
WO2004062371A1 (en) * | 2003-01-09 | 2004-07-29 | Alcon, Inc. | Dual function uv-absorbers for ophthalmic lens materials |
US7279527B2 (en) * | 2005-04-22 | 2007-10-09 | Bridgestone Corporation | Method of converting anionic living end to protected free radical living end and applications thereof |
US8389719B2 (en) * | 2005-06-10 | 2013-03-05 | Ciba Specialty Chemicals Corp. | Hydroxyphenyltriazines with an aromatic carbocyclic fused ring system |
US20080008620A1 (en) * | 2006-06-23 | 2008-01-10 | Alkis Alexiadis | Bimodal light bulb and devices for sterilizing and cleansing |
US7396887B1 (en) * | 2006-12-29 | 2008-07-08 | Bridgestone Corporation | Insitu removal of chelator from anionic polymerization reactions |
US8030410B2 (en) * | 2006-12-29 | 2011-10-04 | Bridgestone Corporation | Method for generating free radical capable polymers using carbonyl-containing compounds |
US7560509B2 (en) * | 2006-12-29 | 2009-07-14 | Bridgestone Corporation | Method of directing grafting by controlling the location of high vinyl segments in a polymer |
US7737218B2 (en) * | 2006-12-29 | 2010-06-15 | Bridgestone Corporation | Method for generating free radical capable polymers using tin or silicon halide compounds |
US20080157641A1 (en) * | 2006-12-31 | 2008-07-03 | Rachael Wren Grout | Multi-use Free Standing Seating and Storage Unit |
CN101743261B (zh) * | 2007-07-13 | 2013-04-03 | 昭和电工株式会社 | 含有三嗪环的高分子化合物和使用该高分子化合物的有机发光元件 |
EP2387600B1 (en) | 2009-01-19 | 2014-04-02 | Basf Se | Organic black pigments and their preparation |
JP5613481B2 (ja) * | 2009-07-29 | 2014-10-22 | 富士フイルム株式会社 | 新規なトリアジン誘導体、紫外線吸収剤 |
JP2012114125A (ja) * | 2010-11-19 | 2012-06-14 | Fujifilm Corp | 太陽電池封止材及びそれを用いた太陽電池モジュール |
WO2013083565A1 (en) * | 2011-12-05 | 2013-06-13 | Arizona Chemical Company, Llc | Uv-protecting rosin |
US20150210651A1 (en) | 2012-08-23 | 2015-07-30 | Bayer Materialscience Ag | Vapour deposition of organic uv absorbers onto plastic substrates |
US10577467B2 (en) | 2012-12-20 | 2020-03-03 | 3M Innovative Properties Company | Fluoropolymer composition including an oligomer having an ultraviolet absorbing group |
CN104955910A (zh) | 2013-02-01 | 2015-09-30 | 拜耳材料科技股份有限公司 | 可uv固化的涂料组合物 |
US9593088B2 (en) | 2013-02-01 | 2017-03-14 | Covestro Deutschland Ag | Method for producing a polymerizable UV absorber |
US10125251B2 (en) | 2014-06-25 | 2018-11-13 | 3M Innovative Properties Company | Fluoropolymer composition including at least one oligomer |
US11110689B2 (en) | 2014-06-25 | 2021-09-07 | 3M Innovative Properties Company | Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer |
SG11201610790XA (en) * | 2014-06-25 | 2017-01-27 | 3M Innovative Properties Co | Copolymers including a triazine group and compositions including them |
WO2016210140A1 (en) | 2015-06-25 | 2016-12-29 | 3M Innovative Properties Company | Copolymer including ultraviolet light-absorbing group and compositions including the same |
KR102682268B1 (ko) * | 2017-05-25 | 2024-07-04 | 가부시키가이샤 아데카 | 트리아진 화합물, 경화성 조성물, 경화물의 제조 방법 및 그 경화물 |
CN107935952B (zh) * | 2017-12-01 | 2019-11-15 | 北京天罡助剂有限责任公司 | 一种三嗪-5的制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH484695A (de) * | 1962-10-30 | 1970-01-31 | Ciba Geigy | Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Ultraviolettschutzmittel ausserhalb der Textilindustrie |
NL130993C (it) * | 1963-02-07 | |||
CH469053A (de) * | 1963-07-26 | 1969-02-28 | Ciba Geigy | Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviolettstrahlung für nichttextile organische Materialien |
CH485484A (de) * | 1964-12-04 | 1970-02-15 | Ciba Geigy | Verwendung von neuen Hydroxyphenyl-1,3,5-triazinen als Schutzmittel gegen Ultraviollettstrahlung für organische Materialien ausserhalb der Textilindustrie |
CH481954A (de) * | 1965-11-09 | 1969-11-30 | Ciba Geigy | Verfahren zur Herstellung von gegen die Einwirkung ultravioletter Strahlen geschützten Polymeren |
US3641213A (en) * | 1969-02-27 | 1972-02-08 | American Cyanamid Co | Synergistic uv absorber combination for polypropylene-polyvinylpyridine blend |
ES2100878T3 (es) * | 1989-12-05 | 1997-07-01 | Ciba Geigy Ag | Material organico estabilizado. |
ES2077052T3 (es) * | 1989-12-21 | 1995-11-16 | Ciba Geigy Ag | Procedimiento para la incorporacion de o-hidroxifenil-s-triazinas a polimeros organicos. |
US5189084A (en) * | 1989-12-21 | 1993-02-23 | Ciba-Geigy Corporation | Process for incorporating o-hydroxyphenyl-s-triazines in organic polymers |
EP0530135A1 (de) * | 1991-06-03 | 1993-03-03 | Ciba-Geigy Ag | UV-Absorber enthaltendes photographisches Material |
EP0520938B1 (de) * | 1991-06-03 | 1997-09-24 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
EP0531258B1 (de) * | 1991-09-05 | 1997-09-10 | Ciba SC Holding AG | UV-Absorber enthaltendes photographisches Material |
-
1995
- 1995-09-28 US US08/535,406 patent/US5672704A/en not_active Expired - Lifetime
- 1995-10-02 CA CA002159694A patent/CA2159694A1/en not_active Abandoned
- 1995-10-02 CZ CZ952556A patent/CZ255695A3/cs unknown
- 1995-10-02 SK SK1230-95A patent/SK123095A3/sk unknown
- 1995-10-02 GB GB9520046A patent/GB2293823B/en not_active Expired - Fee Related
- 1995-10-02 DE DE19536730A patent/DE19536730A1/de active Granted
- 1995-10-03 AT AT0163695A patent/AT405515B/de not_active IP Right Cessation
- 1995-10-03 AU AU33049/95A patent/AU698297B2/en not_active Ceased
- 1995-10-03 IT IT95MI002019A patent/IT1281195B1/it active IP Right Grant
- 1995-10-03 FR FR9511598A patent/FR2725204B1/fr not_active Expired - Fee Related
- 1995-10-04 ES ES09501914A patent/ES2106684B1/es not_active Expired - Fee Related
- 1995-10-04 BE BE9500822A patent/BE1008871A5/fr not_active IP Right Cessation
- 1995-10-04 BR BR9504276A patent/BR9504276A/pt not_active IP Right Cessation
- 1995-10-04 CN CN95117220A patent/CN1070186C/zh not_active Expired - Fee Related
- 1995-10-04 JP JP28261895A patent/JP4126400B2/ja not_active Expired - Lifetime
- 1995-10-04 KR KR1019950034446A patent/KR960014109A/ko not_active Application Discontinuation
- 1995-10-04 NL NL1001338A patent/NL1001338C2/xx not_active IP Right Cessation
-
1997
- 1997-05-29 US US08/865,148 patent/US5869588A/en not_active Expired - Lifetime
-
2003
- 2003-04-14 KR KR1020030023506A patent/KR100496131B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1070186C (zh) | 2001-08-29 |
US5672704A (en) | 1997-09-30 |
NL1001338C2 (nl) | 1996-04-12 |
CA2159694A1 (en) | 1996-04-05 |
SK123095A3 (en) | 1996-06-05 |
GB2293823A (en) | 1996-04-10 |
AU3304995A (en) | 1996-04-18 |
FR2725204B1 (fr) | 1997-06-06 |
KR100496131B1 (ko) | 2005-06-17 |
CN1130625A (zh) | 1996-09-11 |
BR9504276A (pt) | 1996-10-01 |
ES2106684B1 (es) | 1998-07-01 |
ES2106684A1 (es) | 1997-11-01 |
AU698297B2 (en) | 1998-10-29 |
GB9520046D0 (en) | 1995-12-06 |
JP4126400B2 (ja) | 2008-07-30 |
ITMI952019A1 (it) | 1997-04-03 |
NL1001338A1 (nl) | 1996-04-04 |
GB2293823B (en) | 1997-01-22 |
FR2725204A1 (fr) | 1996-04-05 |
IT1281195B1 (it) | 1998-02-17 |
KR960014109A (ko) | 1996-05-22 |
BE1008871A5 (fr) | 1996-08-06 |
US5869588A (en) | 1999-02-09 |
AT405515B (de) | 1999-09-27 |
DE19536730A1 (de) | 1996-04-11 |
ATA163695A (de) | 1999-01-15 |
CZ255695A3 (en) | 1996-04-17 |
JPH08259545A (ja) | 1996-10-08 |
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