ITMI921603A0 - Transistor a film sottile per dispositivo di memoria a semiconduttore di fabbricazione - Google Patents
Transistor a film sottile per dispositivo di memoria a semiconduttore di fabbricazioneInfo
- Publication number
- ITMI921603A0 ITMI921603A0 IT92MI1603A ITMI921603A ITMI921603A0 IT MI921603 A0 ITMI921603 A0 IT MI921603A0 IT 92MI1603 A IT92MI1603 A IT 92MI1603A IT MI921603 A ITMI921603 A IT MI921603A IT MI921603 A0 ITMI921603 A0 IT MI921603A0
- Authority
- IT
- Italy
- Prior art keywords
- thin film
- memory device
- film transistor
- semiconductor memory
- manufacturing semiconductor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78642—Vertical transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/6675—Amorphous silicon or polysilicon transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
- H01L29/78621—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/78654—Monocrystalline silicon transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78651—Silicon transistors
- H01L29/7866—Non-monocrystalline silicon transistors
- H01L29/78672—Polycrystalline or microcrystalline silicon transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78696—Thin film transistors, i.e. transistors with a channel being at least partly a thin film characterised by the structure of the channel, e.g. multichannel, transverse or longitudinal shape, length or width, doping structure, or the overlap or alignment between the channel and the gate, the source or the drain, or the contacting structure of the channel
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B10/00—Static random access memory [SRAM] devices
- H10B10/12—Static random access memory [SRAM] devices comprising a MOSFET load element
- H10B10/125—Static random access memory [SRAM] devices comprising a MOSFET load element the MOSFET being a thin film transistor [TFT]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR910024664 | 1991-12-27 | ||
KR1019920006678A KR950001159B1 (ko) | 1991-12-27 | 1992-04-21 | 반도체 메모리장치의 박막트랜지스터 및 그 제조방법 |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI921603A0 true ITMI921603A0 (it) | 1992-06-30 |
ITMI921603A1 ITMI921603A1 (it) | 1993-12-30 |
IT1255398B IT1255398B (it) | 1995-10-31 |
Family
ID=26628882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITMI921603A IT1255398B (it) | 1991-12-27 | 1992-06-30 | Transistor a film sottile per dispositivo di memoria a semiconduttore e suo procedimento di fabbricazione. |
Country Status (9)
Country | Link |
---|---|
US (1) | US5270968A (it) |
JP (1) | JPH0773114B2 (it) |
KR (1) | KR950001159B1 (it) |
CN (1) | CN1032286C (it) |
DE (1) | DE4221420A1 (it) |
FR (1) | FR2685818B1 (it) |
GB (1) | GB2262838B (it) |
IT (1) | IT1255398B (it) |
TW (1) | TW212851B (it) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5418393A (en) * | 1993-11-29 | 1995-05-23 | Motorola, Inc. | Thin-film transistor with fully gated channel region |
US5700727A (en) * | 1995-07-24 | 1997-12-23 | Micron Technology, Inc. | Method of forming a thin film transistor |
KR100223886B1 (ko) * | 1995-12-26 | 1999-10-15 | 구본준 | 반도체소자 및 제조방법 |
US5918122A (en) | 1997-02-11 | 1999-06-29 | Micron Technology, Inc. | Methods of forming integrated circuitry, DRAM cells and capacitors |
US6238971B1 (en) | 1997-02-11 | 2001-05-29 | Micron Technology, Inc. | Capacitor structures, DRAM cell structures, and integrated circuitry, and methods of forming capacitor structures, integrated circuitry and DRAM cell structures |
US5905280A (en) | 1997-02-11 | 1999-05-18 | Micron Technology, Inc. | Capacitor structures, DRAM cell structures, methods of forming capacitors, methods of forming DRAM cells, and integrated circuits incorporating capacitor structures and DRAM cell structures |
US6214727B1 (en) | 1997-02-11 | 2001-04-10 | Micron Technology, Inc. | Conductive electrical contacts, capacitors, DRAMs, and integrated circuitry, and methods of forming conductive electrical contacts, capacitors, DRAMs, and integrated circuitry |
US5981333A (en) | 1997-02-11 | 1999-11-09 | Micron Technology, Inc. | Methods of forming capacitors and DRAM arrays |
US5915167A (en) * | 1997-04-04 | 1999-06-22 | Elm Technology Corporation | Three dimensional structure memory |
KR100259078B1 (ko) | 1997-08-14 | 2000-06-15 | 김영환 | 박막트랜지스터 및 이의 제조방법 |
US6359302B1 (en) | 1997-10-16 | 2002-03-19 | Micron Technology, Inc. | DRAM cells and integrated circuitry, and capacitor structures |
TW400644B (en) * | 1998-10-26 | 2000-08-01 | United Microelectronics Corp | The structure of Dynamic Random Access Memory(DRAM) and the manufacture method thereof |
GB2362755A (en) | 2000-05-25 | 2001-11-28 | Nanogate Ltd | Thin film field effect transistor with a conical structure |
KR100411813B1 (ko) * | 2001-10-11 | 2003-12-24 | 한국전력공사 | 유동제어를 이용한 축열식 전기온돌의 실내온도조절시스템 |
KR100670140B1 (ko) | 2004-08-26 | 2007-01-16 | 삼성에스디아이 주식회사 | 커패시터 |
TWI552345B (zh) * | 2011-01-26 | 2016-10-01 | 半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
CN104795400B (zh) * | 2015-02-12 | 2018-10-30 | 合肥鑫晟光电科技有限公司 | 阵列基板制造方法、阵列基板和显示装置 |
CN114005838B (zh) * | 2021-10-22 | 2024-02-09 | 武汉华星光电技术有限公司 | 一种阵列基板和显示面板 |
WO2023175437A1 (ja) * | 2022-03-18 | 2023-09-21 | 株式会社半導体エネルギー研究所 | 半導体装置、及び、半導体装置の作製方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59208783A (ja) * | 1983-05-12 | 1984-11-27 | Seiko Instr & Electronics Ltd | 薄膜トランジスタ |
JPS601868A (ja) * | 1983-06-17 | 1985-01-08 | Seiko Instr & Electronics Ltd | 薄膜トランジスタ |
US4820652A (en) * | 1985-12-11 | 1989-04-11 | Sony Corporation | Manufacturing process and structure of semiconductor memory devices |
GB2201544A (en) * | 1987-02-27 | 1988-09-01 | Philips Electronic Associated | Vertical thin film transistor |
JPH01231376A (ja) * | 1988-03-11 | 1989-09-14 | Nec Corp | 薄膜トランジスタおよびその製造方法 |
US5210429A (en) * | 1990-06-29 | 1993-05-11 | Sharp Kabushiki Kaisha | Static RAM cell with conductive straps formed integrally with thin film transistor gates |
-
1992
- 1992-04-21 KR KR1019920006678A patent/KR950001159B1/ko not_active IP Right Cessation
- 1992-06-23 FR FR9207651A patent/FR2685818B1/fr not_active Expired - Lifetime
- 1992-06-29 GB GB9213809A patent/GB2262838B/en not_active Expired - Lifetime
- 1992-06-30 CN CN92105269A patent/CN1032286C/zh not_active Expired - Lifetime
- 1992-06-30 US US07/906,369 patent/US5270968A/en not_active Expired - Lifetime
- 1992-06-30 TW TW081105179A patent/TW212851B/zh active
- 1992-06-30 DE DE4221420A patent/DE4221420A1/de not_active Withdrawn
- 1992-06-30 IT ITMI921603A patent/IT1255398B/it active IP Right Grant
- 1992-07-14 JP JP4187031A patent/JPH0773114B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH0773114B2 (ja) | 1995-08-02 |
GB9213809D0 (en) | 1992-08-12 |
TW212851B (it) | 1993-09-11 |
CN1032286C (zh) | 1996-07-10 |
GB2262838B (en) | 1995-09-06 |
KR930015098A (ko) | 1993-07-23 |
FR2685818B1 (fr) | 1994-04-15 |
KR950001159B1 (ko) | 1995-02-11 |
GB2262838A (en) | 1993-06-30 |
US5270968A (en) | 1993-12-14 |
ITMI921603A1 (it) | 1993-12-30 |
DE4221420A1 (de) | 1993-07-01 |
IT1255398B (it) | 1995-10-31 |
JPH0653440A (ja) | 1994-02-25 |
CN1073806A (zh) | 1993-06-30 |
FR2685818A1 (fr) | 1993-07-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted | ||
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970627 |