IT8420572A0 - Contatto legato per materiale semiconduttivo al gaalas conconduttivita' di tipo "n". - Google Patents

Contatto legato per materiale semiconduttivo al gaalas conconduttivita' di tipo "n".

Info

Publication number
IT8420572A0
IT8420572A0 IT8420572A IT2057284A IT8420572A0 IT 8420572 A0 IT8420572 A0 IT 8420572A0 IT 8420572 A IT8420572 A IT 8420572A IT 2057284 A IT2057284 A IT 2057284A IT 8420572 A0 IT8420572 A0 IT 8420572A0
Authority
IT
Italy
Prior art keywords
gaalas
type conductivity
semiconducting material
contact bonded
bonded
Prior art date
Application number
IT8420572A
Other languages
English (en)
Other versions
IT1176068B (it
IT8420572A1 (it
Inventor
Werner Schairer
Original Assignee
Telefunken Electronic Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefunken Electronic Gmbh filed Critical Telefunken Electronic Gmbh
Publication of IT8420572A0 publication Critical patent/IT8420572A0/it
Publication of IT8420572A1 publication Critical patent/IT8420572A1/it
Application granted granted Critical
Publication of IT1176068B publication Critical patent/IT1176068B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
IT20572/84A 1983-05-21 1984-04-17 Contatto legato per materiale semiconduttivo al gaa as conconduttuvita' di tipo "n" IT1176068B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3318683A DE3318683C1 (de) 1983-05-21 1983-05-21 Legierter Kontakt für n-leitendes GaAlAs-Halbleitermaterial

Publications (3)

Publication Number Publication Date
IT8420572A0 true IT8420572A0 (it) 1984-04-17
IT8420572A1 IT8420572A1 (it) 1985-10-17
IT1176068B IT1176068B (it) 1987-08-12

Family

ID=6199662

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20572/84A IT1176068B (it) 1983-05-21 1984-04-17 Contatto legato per materiale semiconduttivo al gaa as conconduttuvita' di tipo "n"

Country Status (5)

Country Link
US (1) US4613890A (it)
JP (1) JPS59220967A (it)
DE (1) DE3318683C1 (it)
FR (1) FR2546334B1 (it)
IT (1) IT1176068B (it)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722141B2 (ja) * 1984-03-07 1995-03-08 住友電気工業株式会社 半導体素子の製造方法
JPS61107726A (ja) * 1984-10-30 1986-05-26 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 化合物半導体への接点の製造方法
JPH0658897B2 (ja) 1984-11-29 1994-08-03 三洋電機株式会社 n型GaAs及びn型GaA▲l▼As用オーミック電極の製造方法
US5045408A (en) * 1986-09-19 1991-09-03 University Of California Thermodynamically stabilized conductor/compound semiconductor interfaces
DE3908083A1 (de) * 1989-03-13 1990-09-20 Telefunken Electronic Gmbh Silizium-halbleiterbauelement
US6262440B1 (en) * 1998-06-29 2001-07-17 Philips Electronics North America Corp. Metal electrical contact for high current density applications in LED and laser devices
US20150181650A1 (en) * 2013-12-20 2015-06-25 Research & Business Foundation Sungkyunkwan University Graphene microheater and method of manufacturing the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3574680A (en) * 1968-05-07 1971-04-13 Ibm High-low ohmic contact deposition method
HU163255B (it) * 1971-09-17 1973-07-28
GB1558764A (en) * 1976-11-15 1980-01-09 Ferranti Ltd Formation of contacts for semiconductor devices
GB1574525A (en) * 1977-04-13 1980-09-10 Philips Electronic Associated Method of manufacturing semiconductor devices and semiconductor devices manufactured by the method
FR2402944A1 (fr) * 1977-09-12 1979-04-06 Thomson Csf Procede de realisation d'un compose superficiel entre un substrat et une espece reactive
FR2413780A1 (fr) * 1977-12-29 1979-07-27 Thomson Csf Procede de realisation d'un contact " metal-semi-conducteur " a barriere de potentiel de hauteur predeterminee, et composant semi-conducteur comportant au moins un contact obtenu par ce procede
US4179534A (en) * 1978-05-24 1979-12-18 Bell Telephone Laboratories, Incorporated Gold-tin-gold ohmic contact to N-type group III-V semiconductors
JPS5516429A (en) * 1978-07-21 1980-02-05 Seiko Instr & Electronics Ltd Electrode for ga1-x a xas
JPS56116619A (en) * 1980-02-20 1981-09-12 Matsushita Electric Ind Co Ltd Electrode formation to gallium aluminum arsenic crystal
JPS5830170A (ja) * 1981-08-15 1983-02-22 Stanley Electric Co Ltd 化合物半導体素子およびその電極形成法

Also Published As

Publication number Publication date
IT1176068B (it) 1987-08-12
DE3318683C1 (de) 1984-12-13
IT8420572A1 (it) 1985-10-17
FR2546334A1 (fr) 1984-11-23
JPS59220967A (ja) 1984-12-12
FR2546334B1 (fr) 1986-12-26
US4613890A (en) 1986-09-23

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