FR2546334B1 - Contact allie pour materiau semi-conducteur a l'arseniure de gallium-aluminium a conduction du type n - Google Patents

Contact allie pour materiau semi-conducteur a l'arseniure de gallium-aluminium a conduction du type n

Info

Publication number
FR2546334B1
FR2546334B1 FR8407878A FR8407878A FR2546334B1 FR 2546334 B1 FR2546334 B1 FR 2546334B1 FR 8407878 A FR8407878 A FR 8407878A FR 8407878 A FR8407878 A FR 8407878A FR 2546334 B1 FR2546334 B1 FR 2546334B1
Authority
FR
France
Prior art keywords
semiconductor material
aluminum arsenide
alloy contact
conductive gallium
gallium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8407878A
Other languages
English (en)
Other versions
FR2546334A1 (fr
Inventor
Werner Schairer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Telefunken Electronic GmbH
Original Assignee
Telefunken Electronic GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telefunken Electronic GmbH filed Critical Telefunken Electronic GmbH
Publication of FR2546334A1 publication Critical patent/FR2546334A1/fr
Application granted granted Critical
Publication of FR2546334B1 publication Critical patent/FR2546334B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
FR8407878A 1983-05-21 1984-05-21 Contact allie pour materiau semi-conducteur a l'arseniure de gallium-aluminium a conduction du type n Expired FR2546334B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3318683A DE3318683C1 (de) 1983-05-21 1983-05-21 Legierter Kontakt für n-leitendes GaAlAs-Halbleitermaterial

Publications (2)

Publication Number Publication Date
FR2546334A1 FR2546334A1 (fr) 1984-11-23
FR2546334B1 true FR2546334B1 (fr) 1986-12-26

Family

ID=6199662

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8407878A Expired FR2546334B1 (fr) 1983-05-21 1984-05-21 Contact allie pour materiau semi-conducteur a l'arseniure de gallium-aluminium a conduction du type n

Country Status (5)

Country Link
US (1) US4613890A (fr)
JP (1) JPS59220967A (fr)
DE (1) DE3318683C1 (fr)
FR (1) FR2546334B1 (fr)
IT (1) IT1176068B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658897B2 (ja) 1984-11-29 1994-08-03 三洋電機株式会社 ｎ型ＧａＡｓ及びｎ型ＧａＡ▲ｌ▼Ａｓ用オーミック電極の製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722141B2 (ja) * 1984-03-07 1995-03-08 住友電気工業株式会社 半導体素子の製造方法
JPS61107726A (ja) * 1984-10-30 1986-05-26 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 化合物半導体への接点の製造方法
US5045408A (en) * 1986-09-19 1991-09-03 University Of California Thermodynamically stabilized conductor/compound semiconductor interfaces
DE3908083A1 (de) * 1989-03-13 1990-09-20 Telefunken Electronic Gmbh Silizium-halbleiterbauelement
US6262440B1 (en) * 1998-06-29 2001-07-17 Philips Electronics North America Corp. Metal electrical contact for high current density applications in LED and laser devices
US20150181650A1 (en) * 2013-12-20 2015-06-25 Research & Business Foundation Sungkyunkwan University Graphene microheater and method of manufacturing the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3574680A (en) * 1968-05-07 1971-04-13 Ibm High-low ohmic contact deposition method
HU163255B (fr) * 1971-09-17 1973-07-28
GB1558764A (en) * 1976-11-15 1980-01-09 Ferranti Ltd Formation of contacts for semiconductor devices
GB1574525A (en) * 1977-04-13 1980-09-10 Philips Electronic Associated Method of manufacturing semiconductor devices and semiconductor devices manufactured by the method
FR2402944A1 (fr) * 1977-09-12 1979-04-06 Thomson Csf Procede de realisation d'un compose superficiel entre un substrat et une espece reactive
FR2413780A1 (fr) * 1977-12-29 1979-07-27 Thomson Csf Procede de realisation d'un contact " metal-semi-conducteur " a barriere de potentiel de hauteur predeterminee, et composant semi-conducteur comportant au moins un contact obtenu par ce procede
US4179534A (en) * 1978-05-24 1979-12-18 Bell Telephone Laboratories, Incorporated Gold-tin-gold ohmic contact to N-type group III-V semiconductors
JPS5516429A (en) * 1978-07-21 1980-02-05 Seiko Instr & Electronics Ltd Electrode for ga1-x a xas
JPS56116619A (en) * 1980-02-20 1981-09-12 Matsushita Electric Ind Co Ltd Electrode formation to gallium aluminum arsenic crystal
JPS5830170A (ja) * 1981-08-15 1983-02-22 Stanley Electric Co Ltd 化合物半導体素子およびその電極形成法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0658897B2 (ja) 1984-11-29 1994-08-03 三洋電機株式会社 ｎ型ＧａＡｓ及びｎ型ＧａＡ▲ｌ▼Ａｓ用オーミック電極の製造方法

Also Published As

Publication number Publication date
IT1176068B (it) 1987-08-12
DE3318683C1 (de) 1984-12-13
IT8420572A0 (it) 1984-04-17
IT8420572A1 (it) 1985-10-17
FR2546334A1 (fr) 1984-11-23
JPS59220967A (ja) 1984-12-12
US4613890A (en) 1986-09-23

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Legal Events

Date Code Title Description
ST Notification of lapse