IT1137326B - Procedimento e apparecchiatura per l'allineamento di maschere/fette di silicio - Google Patents

Procedimento e apparecchiatura per l'allineamento di maschere/fette di silicio

Info

Publication number
IT1137326B
IT1137326B IT21022/81A IT2102281A IT1137326B IT 1137326 B IT1137326 B IT 1137326B IT 21022/81 A IT21022/81 A IT 21022/81A IT 2102281 A IT2102281 A IT 2102281A IT 1137326 B IT1137326 B IT 1137326B
Authority
IT
Italy
Prior art keywords
slices
alignment
procedure
equipment
silicon masks
Prior art date
Application number
IT21022/81A
Other languages
English (en)
Other versions
IT8121022A0 (it
Inventor
Martin Feldman
Alan David White
Donald Lawrence White
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of IT8121022A0 publication Critical patent/IT8121022A0/it
Application granted granted Critical
Publication of IT1137326B publication Critical patent/IT1137326B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT21022/81A 1980-04-11 1981-04-09 Procedimento e apparecchiatura per l'allineamento di maschere/fette di silicio IT1137326B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/139,544 US4326805A (en) 1980-04-11 1980-04-11 Method and apparatus for aligning mask and wafer members

Publications (2)

Publication Number Publication Date
IT8121022A0 IT8121022A0 (it) 1981-04-09
IT1137326B true IT1137326B (it) 1986-09-10

Family

ID=22487191

Family Applications (1)

Application Number Title Priority Date Filing Date
IT21022/81A IT1137326B (it) 1980-04-11 1981-04-09 Procedimento e apparecchiatura per l'allineamento di maschere/fette di silicio

Country Status (9)

Country Link
US (1) US4326805A (it)
JP (1) JPS56157033A (it)
BE (1) BE888344A (it)
CA (1) CA1154175A (it)
DE (1) DE3114682A1 (it)
FR (1) FR2482285A1 (it)
GB (1) GB2073950B (it)
IT (1) IT1137326B (it)
NL (1) NL189632C (it)

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JP5027468B2 (ja) * 2006-09-15 2012-09-19 日本ミクロコーティング株式会社 プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
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CN114217370B (zh) * 2021-12-16 2024-09-20 西安工业大学 宽带消色差聚焦与偏振调控的微结构波带片及设计方法

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Also Published As

Publication number Publication date
FR2482285A1 (fr) 1981-11-13
FR2482285B1 (it) 1985-02-01
JPS56157033A (en) 1981-12-04
DE3114682C2 (it) 1987-05-21
GB2073950B (en) 1984-04-18
NL189632B (nl) 1993-01-04
IT8121022A0 (it) 1981-04-09
GB2073950A (en) 1981-10-21
CA1154175A (en) 1983-09-20
JPH0132649B2 (it) 1989-07-10
US4326805A (en) 1982-04-27
NL8101776A (nl) 1981-11-02
NL189632C (nl) 1993-06-01
BE888344A (fr) 1981-07-31
DE3114682A1 (de) 1981-12-24

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