JPS57172726A - Position alignment of mask substrate and wafer - Google Patents
Position alignment of mask substrate and waferInfo
- Publication number
- JPS57172726A JPS57172726A JP56057559A JP5755981A JPS57172726A JP S57172726 A JPS57172726 A JP S57172726A JP 56057559 A JP56057559 A JP 56057559A JP 5755981 A JP5755981 A JP 5755981A JP S57172726 A JPS57172726 A JP S57172726A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- pattern
- image
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Abstract
PURPOSE:To detect and align the mutual positions with high precision even if the mask and the substrate are not sufficiently separated from each other by a method wherein the standard pattern on the wafer is formed into the Fresnel zone pattern as the reflecting image formation element. CONSTITUTION:The light source 5 emitting a single color light illuminates the Fresnel zone pattern 4 on the wafer 3 through the intermediary of the lens 6, the filter 7, the prism 8 and the mask 1. The image of the alignment reference 2 on the lower surface of the mask 1 is formed on the light receiving surface of the photoelectric detecting element 10. If the focus f of said pattern 4 is set up to be equivalent to the distance d between the mask and the substrate, the reflecting light from the pattern 4 is focussed on the lower surface of the mask 1 forming the location data of the wafer 3 on the plane similar to the plane where the alignment reference point 2 is located. With each image being detected 10, the relative location data of the mask and the wafer are available. In this case, the mutual positions are easily detected with high precision, because the optical systems such as the lens 9, the detecting element 10 and the like being fixed, there are no positioning errors due to the movement of the focus.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56057559A JPS57172726A (en) | 1981-04-16 | 1981-04-16 | Position alignment of mask substrate and wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56057559A JPS57172726A (en) | 1981-04-16 | 1981-04-16 | Position alignment of mask substrate and wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57172726A true JPS57172726A (en) | 1982-10-23 |
Family
ID=13059173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56057559A Pending JPS57172726A (en) | 1981-04-16 | 1981-04-16 | Position alignment of mask substrate and wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57172726A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
JPS56157033A (en) * | 1980-04-11 | 1981-12-04 | Western Electric Co | Method and device for positioning mask and wafer |
-
1981
- 1981-04-16 JP JP56057559A patent/JPS57172726A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
JPS56157033A (en) * | 1980-04-11 | 1981-12-04 | Western Electric Co | Method and device for positioning mask and wafer |
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