IN2014DN08119A - - Google Patents
Info
- Publication number
- IN2014DN08119A IN2014DN08119A IN8119DEN2014A IN2014DN08119A IN 2014DN08119 A IN2014DN08119 A IN 2014DN08119A IN 8119DEN2014 A IN8119DEN2014 A IN 8119DEN2014A IN 2014DN08119 A IN2014DN08119 A IN 2014DN08119A
- Authority
- IN
- India
- Prior art keywords
- mass
- latex
- butadiene
- precipitate
- chloro
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F236/18—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L11/00—Compositions of homopolymers or copolymers of chloroprene
- C08L11/02—Latex
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C1/00—Treatment of rubber latex
- C08C1/14—Coagulation
- C08C1/15—Coagulation characterised by the coagulants used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F136/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F136/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F136/04—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F136/14—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F136/16—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F136/18—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F36/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F36/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F36/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F36/14—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F36/16—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F36/18—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Moulding By Coating Moulds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012046073 | 2012-03-02 | ||
PCT/JP2013/055755 WO2013129676A1 (ja) | 2012-03-02 | 2013-03-01 | ポリクロロプレンラテックス、ポリクロロプレンラテックス組成物及び成形品 |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DN08119A true IN2014DN08119A (de) | 2015-05-01 |
Family
ID=49082862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN8119DEN2014 IN2014DN08119A (de) | 2012-03-02 | 2013-03-01 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9296849B2 (de) |
EP (1) | EP2824121B1 (de) |
JP (1) | JP6130352B2 (de) |
CN (1) | CN104144954B (de) |
IN (1) | IN2014DN08119A (de) |
MX (1) | MX2014010525A (de) |
MY (1) | MY166865A (de) |
PL (1) | PL2824121T3 (de) |
WO (1) | WO2013129676A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3022030B1 (de) * | 2013-07-16 | 2020-03-18 | Skinprotect Corporation SDN BHD | Elastomerfolienbildende zusammensetzungen und artikel aus der elastomerfolie |
JP5923129B2 (ja) * | 2014-03-26 | 2016-05-24 | デンカ株式会社 | ポリクロロプレンラテックス、ポリクロロプレンラテックス組成物及び浸漬成形体 |
EP3284781B1 (de) * | 2015-04-16 | 2020-10-28 | Showa Denko K.K. | Zusammensetzung für gummi und verwendung davon |
CN107383511A (zh) * | 2017-08-24 | 2017-11-24 | 安徽松泰包装材料有限公司 | 一种耐腐蚀性覆盖膜材料 |
CN113227231B (zh) * | 2018-12-27 | 2023-04-18 | 昭和电工株式会社 | 氯丁二烯聚合物胶乳及其制造方法 |
US20220073657A1 (en) * | 2019-01-10 | 2022-03-10 | Showa Denko K.K. | Isoprene-based polymer latex composition |
WO2020241252A1 (ja) * | 2019-05-31 | 2020-12-03 | 昭和電工株式会社 | 精製クロロプレン系重合体ラテックスの製造方法 |
EP4050046A4 (de) * | 2019-10-25 | 2023-11-22 | Resonac Corporation | Chloroprencopolymerlatex und verfahren zu seiner herstellung |
WO2021141012A1 (ja) * | 2020-01-06 | 2021-07-15 | 昭和電工株式会社 | クロロプレン重合体を含む組成物、成形体、および、成形体の製造方法 |
CN115335422A (zh) * | 2020-03-26 | 2022-11-11 | 电化株式会社 | 氯丁二烯系嵌段共聚物乳胶 |
WO2023127858A1 (ja) * | 2021-12-27 | 2023-07-06 | 株式会社レゾナック | 硫黄変性ポリクロロプレンラテックス組成物およびその製造方法並びにゴム成形物および浸漬製品 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3979749B2 (ja) | 1999-08-10 | 2007-09-19 | 電気化学工業株式会社 | クロロプレンラテックス組成物およびその製造方法 |
AU2003289466A1 (en) | 2002-12-19 | 2004-07-14 | Denki Kagaku Kogyo Kabushiki Kaisha | Polychloroprene latex, process for the production thereof and aqueous adhesive compositions |
JP2005008859A (ja) | 2003-05-22 | 2005-01-13 | Denki Kagaku Kogyo Kk | ポリクロロプレン系ラテックス組成物、接着剤、塗布剤、及びその製造方法 |
JP2007106994A (ja) * | 2005-09-15 | 2007-04-26 | Showa Denko Kk | クロロプレン系重合体ラテックス及びその製造方法 |
JP5262199B2 (ja) | 2008-03-10 | 2013-08-14 | 東ソー株式会社 | クロロプレンラテックス及びその製造法 |
JP5521205B2 (ja) | 2008-03-10 | 2014-06-11 | 東ソー株式会社 | クロロプレンラテックス及びその製造方法 |
JP5428215B2 (ja) | 2008-06-20 | 2014-02-26 | 東ソー株式会社 | クロロプレンラテックス及びその製造方法 |
JP2010106073A (ja) | 2008-10-28 | 2010-05-13 | Tosoh Corp | クロロプレンラテックス及びその製造方法 |
JP5663827B2 (ja) | 2008-10-28 | 2015-02-04 | 東ソー株式会社 | クロロプレンラテックス及びその製造法 |
JP5428305B2 (ja) * | 2008-11-26 | 2014-02-26 | 東ソー株式会社 | 加硫ゴム製造用クロロプレン重合体ラテックスの製造方法 |
JP2010150420A (ja) | 2008-12-25 | 2010-07-08 | Tosoh Corp | ポリクロロプレン系ラテックス及びその製造法 |
JPWO2011004805A1 (ja) | 2009-07-06 | 2012-12-20 | 電気化学工業株式会社 | ポリクロロプレンラテックス組成物及びその製造方法並びに成形体 |
JP2011122141A (ja) * | 2009-11-10 | 2011-06-23 | Showa Denko Kk | クロロプレン系重合体ラテックス及びその製造方法 |
US9321937B2 (en) * | 2010-08-06 | 2016-04-26 | Denka Company Limited | Polychloroprene latex, rubber-asphalt composition and utilization method thereof, sheet, and waterproof coating film |
US9148957B2 (en) | 2011-03-04 | 2015-09-29 | Sharp Kabushiki Kaisha | Electronic circuit substrate, display device, and wiring substrate |
US8883511B2 (en) * | 2011-03-10 | 2014-11-11 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for evaluating chemical stability of polychloroprene latex |
JP5369135B2 (ja) | 2011-04-11 | 2013-12-18 | 電気化学工業株式会社 | ポリクロロプレンラテックス及びその製造方法 |
-
2013
- 2013-03-01 PL PL13755519T patent/PL2824121T3/pl unknown
- 2013-03-01 MX MX2014010525A patent/MX2014010525A/es unknown
- 2013-03-01 MY MYPI2014002543A patent/MY166865A/en unknown
- 2013-03-01 JP JP2014502425A patent/JP6130352B2/ja active Active
- 2013-03-01 EP EP13755519.9A patent/EP2824121B1/de active Active
- 2013-03-01 US US14/382,478 patent/US9296849B2/en active Active
- 2013-03-01 CN CN201380012252.XA patent/CN104144954B/zh active Active
- 2013-03-01 WO PCT/JP2013/055755 patent/WO2013129676A1/ja active Application Filing
- 2013-03-01 IN IN8119DEN2014 patent/IN2014DN08119A/en unknown
Also Published As
Publication number | Publication date |
---|---|
WO2013129676A1 (ja) | 2013-09-06 |
JP6130352B2 (ja) | 2017-05-17 |
EP2824121B1 (de) | 2018-06-20 |
CN104144954B (zh) | 2017-07-25 |
PL2824121T3 (pl) | 2018-11-30 |
US9296849B2 (en) | 2016-03-29 |
US20150152209A1 (en) | 2015-06-04 |
EP2824121A1 (de) | 2015-01-14 |
EP2824121A4 (de) | 2015-10-07 |
JPWO2013129676A1 (ja) | 2015-07-30 |
MX2014010525A (es) | 2014-11-25 |
CN104144954A (zh) | 2014-11-12 |
MY166865A (en) | 2018-07-24 |
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