IN2014CN02338A - - Google Patents

Info

Publication number
IN2014CN02338A
IN2014CN02338A IN2338CHN2014A IN2014CN02338A IN 2014CN02338 A IN2014CN02338 A IN 2014CN02338A IN 2338CHN2014 A IN2338CHN2014 A IN 2338CHN2014A IN 2014CN02338 A IN2014CN02338 A IN 2014CN02338A
Authority
IN
India
Prior art keywords
printing plate
repeating units
lithographic printing
general formula
units represented
Prior art date
Application number
Other languages
English (en)
Inventor
Yuriko Ishiguro
Shota Suzuki
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of IN2014CN02338A publication Critical patent/IN2014CN02338A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
IN2338CHN2014 2011-09-30 2012-08-31 IN2014CN02338A (cg-RX-API-DMAC7.html)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011218547A JP5604398B2 (ja) 2011-09-30 2011-09-30 平版印刷版原版及び平版印刷版の作製方法
PCT/JP2012/072254 WO2013047089A1 (ja) 2011-09-30 2012-08-31 平版印刷版原版及び平版印刷版の作製方法

Publications (1)

Publication Number Publication Date
IN2014CN02338A true IN2014CN02338A (cg-RX-API-DMAC7.html) 2015-06-19

Family

ID=47995136

Family Applications (1)

Application Number Title Priority Date Filing Date
IN2338CHN2014 IN2014CN02338A (cg-RX-API-DMAC7.html) 2011-09-30 2012-08-31

Country Status (6)

Country Link
US (1) US9352602B2 (cg-RX-API-DMAC7.html)
EP (1) EP2762975B1 (cg-RX-API-DMAC7.html)
JP (1) JP5604398B2 (cg-RX-API-DMAC7.html)
CN (1) CN103827753B (cg-RX-API-DMAC7.html)
IN (1) IN2014CN02338A (cg-RX-API-DMAC7.html)
WO (1) WO2013047089A1 (cg-RX-API-DMAC7.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104395834B (zh) * 2012-06-29 2019-07-05 富士胶片株式会社 显影处理废液浓缩方法及显影处理废液的再循环方法
JP6143524B2 (ja) 2013-04-05 2017-06-07 京セラ株式会社 移動通信システム、無線基地局及びユーザ端末
KR102079525B1 (ko) * 2015-08-31 2020-02-20 후지필름 가부시키가이샤 착색층의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
WO2017157577A1 (en) * 2016-03-16 2017-09-21 Agfa Graphics Nv Method for processing a lithographic printing plate
CN108297565B (zh) * 2016-08-27 2020-10-27 乐凯华光印刷科技有限公司 一种具有纳微米结构保护层的在机显影免处理热敏版
CN109843596B (zh) * 2017-03-31 2020-05-05 富士胶片株式会社 平版印刷版原版及其制造方法、平版印刷版原版层叠体以及平版印刷方法
JP6759323B2 (ja) * 2018-03-28 2020-09-23 太陽インキ製造株式会社 感光性樹脂組成物、２液型感光性樹脂組成物、ドライフィルムおよびプリント配線板
WO2019187818A1 (ja) * 2018-03-29 2019-10-03 富士フイルム株式会社 平版印刷版作製用現像処理装置、及び、平版印刷版の作製方法
JPWO2020158380A1 (ja) * 2019-01-30 2021-11-25 富士フイルム株式会社 洗出し装置および洗出し方法

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572136B1 (de) 1965-06-03 1969-09-18 Du Pont Fotopolymerisierbares Gemisch
JPS4841708B1 (cg-RX-API-DMAC7.html) 1970-01-13 1973-12-07
DE2064079C2 (de) 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2361041C3 (de) 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
JPS5311314B2 (cg-RX-API-DMAC7.html) 1974-09-25 1978-04-20
DE2822189A1 (de) 1978-05-20 1980-04-17 Hoechst Ag Photopolymerisierbares gemisch
DE2822190A1 (de) 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
DE3036694A1 (de) 1980-09-29 1982-06-03 Hoechst Ag, 6000 Frankfurt Gummielastische, ethylenisch ungesaettigte polyurethane und dieselben enthaltendes durch strahlung polymerisierbares gemisch
DE3048502A1 (de) 1980-12-22 1982-07-22 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2655349B2 (ja) 1989-05-18 1997-09-17 富士写真フイルム株式会社 感光性平版印刷版
JP2582903B2 (ja) 1989-08-31 1997-02-19 富士写真フイルム株式会社 感光材料処理装置
JP2739395B2 (ja) 1991-08-19 1998-04-15 富士写真フイルム株式会社 感光性平版印刷版
JP2907643B2 (ja) 1992-07-16 1999-06-21 富士写真フイルム株式会社 感光性平版印刷版およびその処理方法
JP2992418B2 (ja) 1992-12-22 1999-12-20 富士写真フイルム株式会社 ブラシローラ及び平版印刷版処理装置
JPH10198044A (ja) 1997-01-14 1998-07-31 Mitsubishi Chem Corp 感光性平版印刷版用現像装置及びモルトンローラー
JPH10282679A (ja) 1997-04-08 1998-10-23 Fuji Photo Film Co Ltd ネガ型感光性平版印刷版
JP2001005193A (ja) 1999-06-18 2001-01-12 Fuji Photo Film Co Ltd 感光性平版印刷版の自動現像機
JP3924097B2 (ja) 1999-08-30 2007-06-06 富士フイルム株式会社 感光材料処理装置
JP2001133969A (ja) 1999-11-01 2001-05-18 Fuji Photo Film Co Ltd ネガ型平版印刷版原版
US6706462B2 (en) * 2000-04-18 2004-03-16 Fuji Photo Film Co., Ltd. Photosensitive image-recording material
JP4319363B2 (ja) 2001-01-15 2009-08-26 富士フイルム株式会社 ネガ型画像記録材料
EP1349006B1 (en) 2002-03-28 2013-09-25 Agfa Graphics N.V. Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm.
EP1500498B1 (en) 2003-07-22 2010-12-15 FUJIFILM Corporation Lithographic printing plate precursour and lithographic printing method
WO2005029190A1 (en) 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymer printing plate precursor
WO2005029187A1 (en) 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
JP4300972B2 (ja) 2003-10-22 2009-07-22 コクヨ株式会社 収納トレー
JP4469734B2 (ja) 2005-02-03 2010-05-26 富士フイルム株式会社 平版印刷版原版
JP2006239867A (ja) 2005-02-28 2006-09-14 Fuji Photo Film Co Ltd 平版印刷版原版および平版印刷方法
JP4406617B2 (ja) * 2005-03-18 2010-02-03 富士フイルム株式会社 感光性組成物および平版印刷版原版
JP4792326B2 (ja) 2005-07-25 2011-10-12 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
US7704671B2 (en) * 2005-09-27 2010-04-27 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
JP2007090564A (ja) 2005-09-27 2007-04-12 Fujifilm Corp 平版印刷版原版の製版方法
EP1944174A1 (en) * 2005-11-01 2008-07-16 Konica Minolta Medical & Graphic, Inc. Lithographic printing plate material, lithographic printing plate, method for preparing lithographic printing plate, and method for printing by lithographic printing plate
WO2007057442A2 (en) 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a photopolymer printing plate
EP1788444B1 (en) 2005-11-18 2011-01-26 Agfa Graphics N.V. Method of making a lithographic printing plate
JP4911457B2 (ja) 2005-12-02 2012-04-04 富士フイルム株式会社 平版印刷版の作製方法および平版印刷版原版
JP4820640B2 (ja) 2005-12-20 2011-11-24 富士フイルム株式会社 平版印刷版の作製方法
JP2007206217A (ja) 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版
JP2007206216A (ja) 2006-01-31 2007-08-16 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版
JP2007225702A (ja) 2006-02-21 2007-09-06 Fujifilm Corp 平版印刷版の作製方法
JP2007225701A (ja) 2006-02-21 2007-09-06 Fujifilm Corp 平版印刷版の作製方法
JP2007256685A (ja) 2006-03-23 2007-10-04 Fujifilm Corp 平版印刷版原版、及びその積層体
JP2007328243A (ja) 2006-06-09 2007-12-20 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版
JP5064952B2 (ja) 2006-09-29 2012-10-31 富士フイルム株式会社 平版印刷版用現像処理液及び平版印刷版の製版方法
JP4887173B2 (ja) 2007-02-16 2012-02-29 富士フイルム株式会社 平版印刷版の作製方法
JP2009056717A (ja) 2007-08-31 2009-03-19 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP5002399B2 (ja) * 2007-09-28 2012-08-15 富士フイルム株式会社 平版印刷版原版の処理方法
JP5068682B2 (ja) * 2008-03-14 2012-11-07 富士フイルム株式会社 ネガ型平版印刷版原版
JP5702912B2 (ja) * 2008-11-21 2015-04-15 積水化学工業株式会社 粘着剤及び研磨布固定用両面粘着テープ
JP5581078B2 (ja) * 2009-03-02 2014-08-27 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP2011090295A (ja) * 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
EP2339402A1 (en) 2009-12-28 2011-06-29 Fujifilm Corporation Lithographic printing plate precursor and method of preparing lithographic printing plate
JP5525873B2 (ja) * 2010-03-15 2014-06-18 富士フイルム株式会社 平版印刷版の作製方法
JP5244987B2 (ja) * 2011-02-28 2013-07-24 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP5514781B2 (ja) * 2011-08-31 2014-06-04 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作成方法

Also Published As

Publication number Publication date
JP5604398B2 (ja) 2014-10-08
CN103827753A (zh) 2014-05-28
JP2013080003A (ja) 2013-05-02
EP2762975A4 (en) 2015-05-06
WO2013047089A1 (ja) 2013-04-04
EP2762975B1 (en) 2016-05-25
US20140208971A1 (en) 2014-07-31
CN103827753B (zh) 2017-03-29
EP2762975A1 (en) 2014-08-06
US9352602B2 (en) 2016-05-31

Similar Documents

Publication Publication Date Title
IN2014CN02338A (cg-RX-API-DMAC7.html)
KR102013541B1 (ko) 옥심 에스테르 광개시제
TWI639584B (zh) 肟酯光起始劑
TWI466854B (zh) 光起始劑混合物
KR101032582B1 (ko) 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제
JP5535065B2 (ja) オキシムエステル光重合開始剤
CA2836817C (en) Compounds with oxime ester and/or acyl groups
KR20160030233A (ko) 옥심 에스테르 광개시제
RU2016148302A (ru) Чернила, картридж для чернил, струйное записывающее устройство, печатный материал, фотополимеризуемое соединение, фототверждаемая композиция, материал для получения трехмерного объекта и трехмерный объект
IN2014DN07816A (cg-RX-API-DMAC7.html)
DE60308330D1 (de) Thioxanthonderivate und deren verwendung als kationische photoinitiatoren
CN101321727A (zh) 肟酯光敏引发剂
DE602008003876D1 (de) Tintenzusammensetzung
MY160942A (en) Melanin production inhibitor
CN102361896A (zh) 光致抗蚀剂组合物
JP2014028861A (ja) オキシムエステル光重合開始剤
JP2007231000A (ja) オキシム化合物及びそれを含む感光性組成物
DE602007010194D1 (de) Neue Sulfoniumverbindung, diese enthaltende lichtempfindliche Zusammensetzung und Strukturbildungsverfahren unter Verwendung der lichtempfindlichen Zusammensetzung
JP2010276989A5 (cg-RX-API-DMAC7.html)
SG155137A1 (en) Radiation-sensitive composition used for forming green pixel, color filter, and color liquid crystal display device
ATE465022T1 (de) Tintenzusammensetzung und tintenstrahlaufzeichnungsverfahren damit
CN101341172B (zh) 肟酯光引发剂
DE602009000903D1 (de) Lithografiedruckplattenvorläufer und Druckverfahren damit
ATE422251T1 (de) Lithographischer druckplattenvorläufer
TW201612166A (en) Ultraviolet absorber, composition for forming a resist under layer film, and patterning process