IE54526B1 - Current enhanced photovoltaic device - Google Patents
Current enhanced photovoltaic deviceInfo
- Publication number
- IE54526B1 IE54526B1 IE2913/82A IE291382A IE54526B1 IE 54526 B1 IE54526 B1 IE 54526B1 IE 2913/82 A IE2913/82 A IE 2913/82A IE 291382 A IE291382 A IE 291382A IE 54526 B1 IE54526 B1 IE 54526B1
- Authority
- IE
- Ireland
- Prior art keywords
- intrinsic
- layer
- alloy layer
- amorphous silicon
- doped
- Prior art date
Links
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 202
- 239000000956 alloy Substances 0.000 claims abstract description 202
- 239000004065 semiconductor Substances 0.000 claims abstract description 57
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910000077 silane Inorganic materials 0.000 claims abstract description 51
- 238000000354 decomposition reaction Methods 0.000 claims abstract description 40
- 238000000151 deposition Methods 0.000 claims abstract description 37
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 35
- 239000011737 fluorine Substances 0.000 claims abstract description 35
- 239000007858 starting material Substances 0.000 claims abstract description 34
- 230000008021 deposition Effects 0.000 claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 19
- 239000010703 silicon Substances 0.000 claims abstract description 19
- 238000005530 etching Methods 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 15
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims abstract description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 110
- 239000007789 gas Substances 0.000 claims description 50
- 239000001257 hydrogen Substances 0.000 claims description 49
- 229910052739 hydrogen Inorganic materials 0.000 claims description 49
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims description 48
- 239000000758 substrate Substances 0.000 claims description 48
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 47
- 239000002019 doping agent Substances 0.000 claims description 35
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 32
- 230000003247 decreasing effect Effects 0.000 claims description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 26
- 230000001965 increasing effect Effects 0.000 claims description 24
- 229910052732 germanium Inorganic materials 0.000 claims description 19
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 229910052799 carbon Inorganic materials 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 10
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- 229910052716 thallium Inorganic materials 0.000 claims description 6
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052785 arsenic Inorganic materials 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 229910000676 Si alloy Inorganic materials 0.000 claims 4
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 4
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 2
- 239000000463 material Substances 0.000 description 58
- VDRSDNINOSAWIV-UHFFFAOYSA-N [F].[Si] Chemical compound [F].[Si] VDRSDNINOSAWIV-UHFFFAOYSA-N 0.000 description 11
- 239000013078 crystal Substances 0.000 description 11
- 229910001188 F alloy Inorganic materials 0.000 description 10
- 230000008901 benefit Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 7
- 239000010935 stainless steel Substances 0.000 description 7
- 229910001220 stainless steel Inorganic materials 0.000 description 7
- 239000002178 crystalline material Substances 0.000 description 6
- 238000010348 incorporation Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229910000878 H alloy Inorganic materials 0.000 description 5
- 229910021419 crystalline silicon Inorganic materials 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000002939 deleterious effect Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- 238000005275 alloying Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910000078 germane Inorganic materials 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 241000723368 Conium Species 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 1
- 229910052986 germanium hydride Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
- H10F10/172—Photovoltaic cells having only PIN junction potential barriers comprising multiple PIN junctions, e.g. tandem cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/330,571 US4379943A (en) | 1981-12-14 | 1981-12-14 | Current enhanced photovoltaic device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IE822913L IE822913L (en) | 1983-06-14 |
| IE54526B1 true IE54526B1 (en) | 1989-11-08 |
Family
ID=23290352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IE2913/82A IE54526B1 (en) | 1981-12-14 | 1982-12-08 | Current enhanced photovoltaic device |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US4379943A (en, 2012) |
| JP (2) | JPS58145171A (en, 2012) |
| AU (1) | AU543910B2 (en, 2012) |
| BR (1) | BR8207108A (en, 2012) |
| CA (1) | CA1189601A (en, 2012) |
| DE (1) | DE3244626A1 (en, 2012) |
| FR (1) | FR2518318B1 (en, 2012) |
| GB (1) | GB2111303B (en, 2012) |
| IE (1) | IE54526B1 (en, 2012) |
| IL (1) | IL67248A (en, 2012) |
| IN (1) | IN156202B (en, 2012) |
| IT (1) | IT1153374B (en, 2012) |
| MX (1) | MX152173A (en, 2012) |
| NL (1) | NL8204754A (en, 2012) |
| PH (1) | PH19556A (en, 2012) |
| SE (1) | SE457125B (en, 2012) |
| ZA (1) | ZA828716B (en, 2012) |
Families Citing this family (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4379943A (en) * | 1981-12-14 | 1983-04-12 | Energy Conversion Devices, Inc. | Current enhanced photovoltaic device |
| US4485125A (en) * | 1982-03-19 | 1984-11-27 | Energy Conversion Devices, Inc. | Method for continuously producing tandem amorphous photovoltaic cells |
| US4521447A (en) * | 1982-10-18 | 1985-06-04 | Sovonics Solar Systems | Method and apparatus for making layered amorphous semiconductor alloys using microwave energy |
| AU560521B2 (en) * | 1982-10-18 | 1987-04-09 | Energy Conversion Devices Inc. | Layered amorphous semiconductor alloys |
| NL8204056A (nl) * | 1982-10-21 | 1984-05-16 | Oce Nederland Bv | Fotogeleidend element voor toepassing in elektrofotografische kopieerprocessen. |
| JPH0614552B2 (ja) * | 1983-02-02 | 1994-02-23 | 富士ゼロックス株式会社 | 光電変換素子の製造方法 |
| JPS59143362A (ja) * | 1983-02-03 | 1984-08-16 | Fuji Xerox Co Ltd | パツシベ−シヨン膜 |
| GB2137810B (en) * | 1983-03-08 | 1986-10-22 | Agency Ind Science Techn | A solar cell of amorphous silicon |
| US4471155A (en) * | 1983-04-15 | 1984-09-11 | Energy Conversion Devices, Inc. | Narrow band gap photovoltaic devices with enhanced open circuit voltage |
| JPS59207620A (ja) * | 1983-05-10 | 1984-11-24 | Zenko Hirose | アモルフアスシリコン成膜装置 |
| ES8602301A1 (es) * | 1983-07-18 | 1985-11-01 | Energy Conversion Devices Inc | Una aleacion amorfa mejorada de separacion de bandas estrecha, para aplicaciones fotovoltaicas |
| US4782376A (en) * | 1983-09-21 | 1988-11-01 | General Electric Company | Photovoltaic device with increased open circuit voltage |
| US4642144A (en) * | 1983-10-06 | 1987-02-10 | Exxon Research And Engineering Company | Proximity doping of amorphous semiconductors |
| US4583492A (en) * | 1983-12-19 | 1986-04-22 | United Technologies Corporation | High rate, low temperature silicon deposition system |
| JPS60155676A (ja) * | 1984-01-24 | 1985-08-15 | Canon Inc | プラズマｃｖｄ装置 |
| US4531015A (en) * | 1984-04-12 | 1985-07-23 | Atlantic Richfield Company | PIN Amorphous silicon solar cell with nitrogen compensation |
| US4542256A (en) * | 1984-04-27 | 1985-09-17 | University Of Delaware | Graded affinity photovoltaic cell |
| US4514437A (en) * | 1984-05-02 | 1985-04-30 | Energy Conversion Devices, Inc. | Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition |
| JPH0620147B2 (ja) * | 1984-05-11 | 1994-03-16 | 三洋電機株式会社 | 光起電力装置 |
| US4950614A (en) * | 1984-05-15 | 1990-08-21 | Semiconductor Energy Laboratory Co., Ltd. | Method of making a tandem type semiconductor photoelectric conversion device |
| US4878097A (en) * | 1984-05-15 | 1989-10-31 | Eastman Kodak Company | Semiconductor photoelectric conversion device and method for making same |
| US4547621A (en) * | 1984-06-25 | 1985-10-15 | Sovonics Solar Systems | Stable photovoltaic devices and method of producing same |
| JPS6188570A (ja) * | 1984-10-05 | 1986-05-06 | Fuji Electric Co Ltd | アモルフアスシリコン太陽電池の製造方法 |
| JPS6191974A (ja) * | 1984-10-11 | 1986-05-10 | Kanegafuchi Chem Ind Co Ltd | 耐熱性マルチジヤンクシヨン型半導体素子 |
| DE8430810U1 (de) * | 1984-10-19 | 1986-05-07 | Siemens AG, 1000 Berlin und 8000 München | Solarzelle mit graduellem Energiebandabstand mit einem aus amorphem Silizium bestehenden Halbleiterkorper |
| US4891087A (en) * | 1984-10-22 | 1990-01-02 | Texas Instruments Incorporated | Isolation substrate ring for plasma reactor |
| US4616597A (en) * | 1984-10-31 | 1986-10-14 | Rca Corporation | Apparatus for making a plasma coating |
| US4839709A (en) * | 1985-07-12 | 1989-06-13 | Hewlett-Packard Company | Detector and mixer diode operative at zero bias voltage |
| JPS6249672A (ja) * | 1985-08-29 | 1987-03-04 | Sumitomo Electric Ind Ltd | アモルフアス光起電力素子 |
| JPS6273784A (ja) * | 1985-09-27 | 1987-04-04 | Sanyo Electric Co Ltd | 光起電力装置 |
| CA1321660C (en) * | 1985-11-05 | 1993-08-24 | Hideo Yamagishi | Amorphous-containing semiconductor device with high resistivity interlayer or with highly doped interlayer |
| JPH0799777B2 (ja) * | 1986-03-27 | 1995-10-25 | 住友電気工業株式会社 | 非晶質半導体素子 |
| US4799968A (en) * | 1986-09-26 | 1989-01-24 | Sanyo Electric Co., Ltd. | Photovoltaic device |
| US4710589A (en) * | 1986-10-21 | 1987-12-01 | Ametek, Inc. | Heterojunction p-i-n photovoltaic cell |
| JP2575397B2 (ja) * | 1987-07-29 | 1997-01-22 | 三井東圧化学株式会社 | 光電変換素子の製造方法 |
| US4816082A (en) * | 1987-08-19 | 1989-03-28 | Energy Conversion Devices, Inc. | Thin film solar cell including a spatially modulated intrinsic layer |
| US5275665A (en) * | 1988-06-06 | 1994-01-04 | Research Development Corporation Of Japan | Method and apparatus for causing plasma reaction under atmospheric pressure |
| JP2717583B2 (ja) * | 1988-11-04 | 1998-02-18 | キヤノン株式会社 | 積層型光起電力素子 |
| JPH0384966A (ja) * | 1989-08-28 | 1991-04-10 | Matsushita Electric Works Ltd | 光電変換素子 |
| JP3099957B2 (ja) * | 1990-01-17 | 2000-10-16 | 株式会社リコー | 光導電部材 |
| US5155567A (en) * | 1990-01-17 | 1992-10-13 | Ricoh Company, Ltd. | Amorphous photoconductive material and photosensor employing the photoconductive material |
| AU632241B2 (en) * | 1990-09-06 | 1992-12-17 | Mitsui Toatsu Chemicals Inc. | Amorphous silicon solar cell and method for manufacturing the same |
| JP2999280B2 (ja) * | 1991-02-22 | 2000-01-17 | キヤノン株式会社 | 光起電力素子 |
| US5256887A (en) * | 1991-07-19 | 1993-10-26 | Solarex Corporation | Photovoltaic device including a boron doping profile in an i-type layer |
| US5221854A (en) * | 1991-11-18 | 1993-06-22 | United Solar Systems Corporation | Protective layer for the back reflector of a photovoltaic device |
| US5204272A (en) * | 1991-12-13 | 1993-04-20 | United Solar Systems Corporation | Semiconductor device and microwave process for its manufacture |
| FR2703797B1 (fr) * | 1993-04-06 | 1995-06-23 | Matra Mhs | Procede et dispositif de controle de la teneur en bore de borophosphosilicate. |
| US6080644A (en) * | 1998-02-06 | 2000-06-27 | Burr-Brown Corporation | Complementary bipolar/CMOS epitaxial structure and process |
| US20060211272A1 (en) * | 2005-03-17 | 2006-09-21 | The Regents Of The University Of California | Architecture for high efficiency polymer photovoltaic cells using an optical spacer |
| US8791359B2 (en) * | 2006-01-28 | 2014-07-29 | Banpil Photonics, Inc. | High efficiency photovoltaic cells |
| US8426722B2 (en) | 2006-10-24 | 2013-04-23 | Zetta Research and Development LLC—AQT Series | Semiconductor grain and oxide layer for photovoltaic cells |
| US8373060B2 (en) * | 2006-10-24 | 2013-02-12 | Zetta Research and Development LLC—AQT Series | Semiconductor grain microstructures for photovoltaic cells |
| US8158880B1 (en) * | 2007-01-17 | 2012-04-17 | Aqt Solar, Inc. | Thin-film photovoltaic structures including semiconductor grain and oxide layers |
| US20080173349A1 (en) * | 2007-01-22 | 2008-07-24 | United Solar Ovonic Llc | Solar cells for stratospheric and outer space use |
| US20080257405A1 (en) * | 2007-04-18 | 2008-10-23 | Emcore Corp. | Multijunction solar cell with strained-balanced quantum well middle cell |
| US20090272438A1 (en) * | 2008-05-05 | 2009-11-05 | Emcore Corporation | Strain Balanced Multiple Quantum Well Subcell In Inverted Metamorphic Multijunction Solar Cell |
| US8450140B2 (en) * | 2008-06-18 | 2013-05-28 | Tel Solar Ag | Method for large-scale manufacturing of photovoltaic cells for a converter panel and photovoltaic converter panel |
| US7955890B2 (en) * | 2008-06-24 | 2011-06-07 | Applied Materials, Inc. | Methods for forming an amorphous silicon film in display devices |
| US20100037943A1 (en) * | 2008-08-14 | 2010-02-18 | Sater Bernard L | Vertical multijunction cell with textured surface |
| US20100037937A1 (en) * | 2008-08-15 | 2010-02-18 | Sater Bernard L | Photovoltaic cell with patterned contacts |
| US8293079B2 (en) * | 2008-08-28 | 2012-10-23 | Mh Solar Co., Ltd. | Electrolysis via vertical multi-junction photovoltaic cell |
| KR101028310B1 (ko) * | 2009-06-30 | 2011-04-11 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
| US20110083724A1 (en) * | 2009-10-08 | 2011-04-14 | Ovshinsky Stanford R | Monolithic Integration of Photovoltaic Cells |
| TW201123508A (en) * | 2009-12-22 | 2011-07-01 | Univ Nat Chiao Tung | Antireflection layer, method for fabricating antireflection surface, and photovoltaic device applying the same |
| US20110186119A1 (en) * | 2009-12-24 | 2011-08-04 | Atwater Harry A | Light-trapping plasmonic back reflector design for solar cells |
| US9608144B2 (en) | 2011-06-01 | 2017-03-28 | First Solar, Inc. | Photovoltaic devices and method of making |
| US20120325305A1 (en) * | 2011-06-21 | 2012-12-27 | International Business Machines Corporation | Ohmic contact between thin film solar cell and carbon-based transparent electrode |
| KR101770267B1 (ko) * | 2011-10-04 | 2017-08-22 | 엘지전자 주식회사 | 박막 태양전지 모듈 |
| FR2993087B1 (fr) * | 2012-07-06 | 2014-06-27 | Wysips | Dispositif pour ameliorer la qualite d'une image recouverte d'un film photovoltaique semi-transparent |
| CN106062973B (zh) * | 2014-04-11 | 2018-05-04 | 夏普株式会社 | 光电转换装置 |
| WO2016157979A1 (ja) * | 2015-03-31 | 2016-10-06 | 株式会社カネカ | 光電変換装置および光電変換モジュール |
| US10446704B2 (en) * | 2015-12-30 | 2019-10-15 | International Business Machines Corporation | Formation of Ohmic back contact for Ag2ZnSn(S,Se)4 photovoltaic devices |
| CN111668324A (zh) * | 2019-03-07 | 2020-09-15 | 苏州旭创科技有限公司 | 一种集成光栅反射结构的光探测器 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4342044A (en) * | 1978-03-08 | 1982-07-27 | Energy Conversion Devices, Inc. | Method for optimizing photoresponsive amorphous alloys and devices |
| US4226898A (en) * | 1978-03-16 | 1980-10-07 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process |
| US4163677A (en) * | 1978-04-28 | 1979-08-07 | Rca Corporation | Schottky barrier amorphous silicon solar cell with thin doped region adjacent metal Schottky barrier |
| DE2904171A1 (de) * | 1979-02-05 | 1980-08-14 | Siemens Ag | Verfahren zum herstellen von aus amorphem silizium bestehenden halbleiterkoerpern durch glimmentladung |
| JPS55125680A (en) | 1979-03-20 | 1980-09-27 | Yoshihiro Hamakawa | Photovoltaic element |
| JPS5936836B2 (ja) * | 1979-05-28 | 1984-09-06 | シャープ株式会社 | 非晶質薄膜太陽電池 |
| JPS561579A (en) * | 1979-06-18 | 1981-01-09 | Shunpei Yamazaki | Semiconductor device |
| DE2938260A1 (de) * | 1979-09-21 | 1981-03-26 | Messerschmitt-Bölkow-Blohm GmbH, 8000 München | Halbleiterbauelement fuer die umsetzung von licht in elektrische energie |
| JPS5688377A (en) | 1979-12-19 | 1981-07-17 | Mitsubishi Electric Corp | Solar battery and manufacture thereof |
| US4270018A (en) * | 1979-12-26 | 1981-05-26 | Gibbons James F | Amorphous solar cells |
| JPS5694674A (en) * | 1979-12-27 | 1981-07-31 | Nec Corp | Thin-film solar cell |
| JPS56116673A (en) * | 1980-02-19 | 1981-09-12 | Sharp Corp | Amorphous thin film solar cell |
| IT1138204B (it) * | 1980-09-09 | 1986-09-17 | Energy Conversion Devices Inc | Metodo per incrementare la banda proibita di leghe amorfe fotosensibili e dispositivi ottenuti con tale metodo |
| US4490453A (en) * | 1981-01-16 | 1984-12-25 | Canon Kabushiki Kaisha | Photoconductive member of a-silicon with nitrogen |
| US4379943A (en) * | 1981-12-14 | 1983-04-12 | Energy Conversion Devices, Inc. | Current enhanced photovoltaic device |
-
1981
- 1981-12-14 US US06/330,571 patent/US4379943A/en not_active Expired - Lifetime
-
1982
- 1982-11-12 IL IL67248A patent/IL67248A/xx unknown
- 1982-11-26 ZA ZA828716A patent/ZA828716B/xx unknown
- 1982-12-01 GB GB08234224A patent/GB2111303B/en not_active Expired
- 1982-12-01 PH PH28209A patent/PH19556A/en unknown
- 1982-12-02 DE DE19823244626 patent/DE3244626A1/de active Granted
- 1982-12-03 FR FR8220287A patent/FR2518318B1/fr not_active Expired
- 1982-12-06 IT IT24631/82A patent/IT1153374B/it active
- 1982-12-07 JP JP57214586A patent/JPS58145171A/ja active Granted
- 1982-12-08 IE IE2913/82A patent/IE54526B1/en not_active IP Right Cessation
- 1982-12-08 BR BR8207108A patent/BR8207108A/pt unknown
- 1982-12-08 NL NL8204754A patent/NL8204754A/nl not_active Application Discontinuation
- 1982-12-09 IN IN1433/CAL/82A patent/IN156202B/en unknown
- 1982-12-09 CA CA000417315A patent/CA1189601A/en not_active Expired
- 1982-12-09 SE SE8207034A patent/SE457125B/sv not_active IP Right Cessation
- 1982-12-09 MX MX195532A patent/MX152173A/es unknown
- 1982-12-13 AU AU91452/82A patent/AU543910B2/en not_active Ceased
-
1991
- 1991-12-26 JP JP3357672A patent/JPH07123169B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB2111303A (en) | 1983-06-29 |
| NL8204754A (nl) | 1983-07-01 |
| SE8207034D0 (sv) | 1982-12-09 |
| IT8224631A0 (it) | 1982-12-06 |
| IT8224631A1 (it) | 1984-06-06 |
| FR2518318B1 (fr) | 1987-10-02 |
| IL67248A0 (en) | 1983-03-31 |
| ZA828716B (en) | 1983-10-26 |
| DE3244626C2 (en, 2012) | 1989-09-28 |
| SE8207034L (sv) | 1983-06-15 |
| FR2518318A1 (fr) | 1983-06-17 |
| IT1153374B (it) | 1987-01-14 |
| IL67248A (en) | 1986-03-31 |
| AU543910B2 (en) | 1985-05-09 |
| JPS58145171A (ja) | 1983-08-29 |
| AU9145282A (en) | 1983-06-23 |
| IE822913L (en) | 1983-06-14 |
| JPH07123169B2 (ja) | 1995-12-25 |
| CA1189601A (en) | 1985-06-25 |
| IN156202B (en, 2012) | 1985-06-01 |
| US4379943A (en) | 1983-04-12 |
| SE457125B (sv) | 1988-11-28 |
| GB2111303B (en) | 1985-07-03 |
| JPH0434314B2 (en, 2012) | 1992-06-05 |
| DE3244626A1 (de) | 1983-06-16 |
| MX152173A (es) | 1985-06-04 |
| JPH06188440A (ja) | 1994-07-08 |
| PH19556A (en) | 1986-05-21 |
| BR8207108A (pt) | 1983-10-11 |
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Legal Events
| Date | Code | Title | Description |
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| MM4A | Patent lapsed |