HK1214888A1 - 液浸構件和曝光裝置 - Google Patents

液浸構件和曝光裝置

Info

Publication number
HK1214888A1
HK1214888A1 HK16102605.5A HK16102605A HK1214888A1 HK 1214888 A1 HK1214888 A1 HK 1214888A1 HK 16102605 A HK16102605 A HK 16102605A HK 1214888 A1 HK1214888 A1 HK 1214888A1
Authority
HK
Hong Kong
Prior art keywords
liquid
exposure device
immersion member
immersion
exposure
Prior art date
Application number
HK16102605.5A
Other languages
English (en)
Inventor
佐藤真路
小田中健洋
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1214888A1 publication Critical patent/HK1214888A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
HK16102605.5A 2012-12-27 2016-03-07 液浸構件和曝光裝置 HK1214888A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261746470P 2012-12-27 2012-12-27
PCT/JP2013/084800 WO2014104159A1 (ja) 2012-12-27 2013-12-26 液浸部材及び露光装置

Publications (1)

Publication Number Publication Date
HK1214888A1 true HK1214888A1 (zh) 2016-08-05

Family

ID=51021235

Family Applications (3)

Application Number Title Priority Date Filing Date
HK19101833.8A HK1259429A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置
HK16102605.5A HK1214888A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置
HK16102948.1A HK1215102A1 (zh) 2012-12-27 2016-03-15 液浸構件和曝光裝置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK19101833.8A HK1259429A1 (zh) 2012-12-27 2016-03-07 液浸構件和曝光裝置

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK16102948.1A HK1215102A1 (zh) 2012-12-27 2016-03-15 液浸構件和曝光裝置

Country Status (8)

Country Link
US (4) US9720331B2 (zh)
EP (2) EP2940715B1 (zh)
JP (3) JP6319099B2 (zh)
KR (1) KR102256768B1 (zh)
CN (2) CN108873614A (zh)
HK (3) HK1259429A1 (zh)
TW (2) TWI671599B (zh)
WO (1) WO2014104159A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3247762A (en) * 1963-05-17 1966-04-26 Microcard Reader Corp Opaque microphotograph reader
NL2009692A (en) 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
EP3057122B1 (en) 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
EP3724722A1 (en) 2017-12-15 2020-10-21 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure
JP6610726B2 (ja) * 2018-07-11 2019-11-27 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法

Family Cites Families (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69738910D1 (de) 1996-11-28 2008-09-25 Nikon Corp Ausrichtvorrichtung und belichtungsverfahren
WO1998040791A1 (en) 1997-03-10 1998-09-17 Koninklijke Philips Electronics N.V. Positioning device having two object holders
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
EP1364257A1 (en) 2001-02-27 2003-11-26 ASML US, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP2005536775A (ja) 2002-08-23 2005-12-02 株式会社ニコン 投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
US7110081B2 (en) * 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1420302A1 (en) * 2002-11-18 2004-05-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101308826B1 (ko) 2003-09-03 2013-09-13 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
CN102290364B (zh) 2004-06-09 2016-01-13 尼康股份有限公司 基板保持装置、具备其之曝光装置、元件制造方法
JP4444743B2 (ja) * 2004-07-07 2010-03-31 キヤノン株式会社 露光装置及びデバイス製造方法
SG155929A1 (en) 2004-09-17 2009-10-29 Nikon Corp Exposure apparatus, exposure method, and method for manufacturing device
EP1681597B1 (en) * 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5005226B2 (ja) * 2005-01-31 2012-08-22 株式会社ニコン 露光装置及びデバイス製造方法、液体保持方法
JP4844186B2 (ja) 2005-03-18 2011-12-28 株式会社ニコン プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法
JP4884708B2 (ja) * 2005-06-21 2012-02-29 株式会社ニコン 露光装置及びデバイス製造方法
JP4567651B2 (ja) * 2005-11-16 2010-10-20 エーエスエムエル ネザーランズ ビー．ブイ． 露光装置及びデバイス製造方法
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
TWI393171B (zh) 2006-01-19 2013-04-11 尼康股份有限公司 A moving body driving method and a moving body driving system, a pattern forming method and a pattern forming apparatus, an exposure method and an exposure apparatus, and an element manufacturing method
KR101486086B1 (ko) * 2006-05-10 2015-01-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP2008034801A (ja) * 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
SG151198A1 (en) * 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US8610873B2 (en) * 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) * 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2010157724A (ja) * 2008-12-29 2010-07-15 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2011086804A (ja) * 2009-10-16 2011-04-28 Nikon Corp 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP2013053850A (ja) 2010-01-07 2013-03-21 Saitama Medical Univ 円偏光変換装置
US9223225B2 (en) 2010-01-08 2015-12-29 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
JP2011206121A (ja) 2010-03-29 2011-10-20 Ntn Corp 歯科ハンドピース用流体動圧軸受装置および歯科ハンドピース
JP2012084879A (ja) * 2010-10-14 2012-04-26 Nikon Corp 液浸露光装置、液浸露光方法、デバイス製造方法、プログラム、及び記録媒体
JP2012138511A (ja) * 2010-12-27 2012-07-19 Nikon Corp 露光装置の制御方法、露光装置、デバイス製造方法、プログラム、及び記録媒体
JP5241862B2 (ja) * 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
JP2013236000A (ja) * 2012-05-10 2013-11-21 Nikon Corp 液浸部材、露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) * 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) * 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
HK1259429A1 (zh) 2019-11-29
US9823582B2 (en) 2017-11-21
JP6566073B2 (ja) 2019-08-28
TW201832016A (zh) 2018-09-01
US9720331B2 (en) 2017-08-01
US20140300875A1 (en) 2014-10-09
HK1215102A1 (zh) 2016-08-12
CN104995714A (zh) 2015-10-21
EP2940715B1 (en) 2018-12-26
KR102256768B1 (ko) 2021-05-26
KR20150099777A (ko) 2015-09-01
US20160070177A1 (en) 2016-03-10
US10133189B2 (en) 2018-11-20
CN108873614A (zh) 2018-11-23
EP2940715A4 (en) 2016-09-21
JP2019185066A (ja) 2019-10-24
JP6319099B2 (ja) 2018-05-09
EP3528050A1 (en) 2019-08-21
TW201430504A (zh) 2014-08-01
US20180052397A1 (en) 2018-02-22
US20190049855A1 (en) 2019-02-14
JP2018106207A (ja) 2018-07-05
CN104995714B (zh) 2018-06-26
TWI671599B (zh) 2019-09-11
EP2940715A1 (en) 2015-11-04
WO2014104159A1 (ja) 2014-07-03
JPWO2014104159A1 (ja) 2017-01-12

Similar Documents

Publication Publication Date Title
HK1215327A1 (zh) 液浸部件及曝光裝置
HRP20190524T1 (hr) 1,2,4-triazoli kao modulatori nuklearnog transporta i njihova uporaba
HK1215102A1 (zh) 液浸構件和曝光裝置
HK1207694A1 (zh) 襯底支承裝置及曝光裝置
EP2881797A4 (en) ELECTROPHOTOGRAPHIC ELEMENT AND ELECTROPHOTOGRAPHIC DEVICE
GB2511184B (en) Fixing device
EP2829480A4 (en) FEEDING AND COUNTERING DEVICE FOR MEDICINAL PRODUCTS
EP2842000A4 (en) DEVELOPMENT DEVICE
EP2862025A4 (en) FIXING DEVICE
EP2813750A4 (en) BEAM CONTROL MEMBER AND LIGHTING DEVICE
HK1257550A1 (zh) 液浸構件及曝光裝置
EP2781182A4 (en) PHOTOGRAPHIC DEVICE AND PHOTOGRAPHIC SYSTEM
HK1204682A1 (zh) 液浸構件及曝光裝置
HK1208914A1 (zh) 液浸構件及曝光裝置
HK1211133A1 (zh) 具備防振裝置的曝光裝置
EP2860965A4 (en) IMAGING ELEMENT AND IMAGING DEVICE
EP2975600A4 (en) FIXING DEVICE
GB201317955D0 (en) Metering device and parts therefor
EP2829355A4 (en) DEVICE FOR POSITIONING AND FIXING OBJECT
EP2813748A4 (en) LIGHT SOURCE DEVICE AND REFLECTOR SUPPORT STRUCTURE
HK1221778A1 (zh) 曝光裝置及曝光方法
EP2931085A4 (en) COLLAPSIBLE AND FLEXIBLE SHOULDER CARRYING DEVICE
EP2841999A4 (en) DEVELOPMENT DEVICE
EP2833406A4 (en) PICTURE ELEMENT AND PICTURE DEVICE
HK1247672A1 (zh) 照明裝置及曝光裝置

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221222