EP2940715A4 - Liquid-immersion member and exposure device - Google Patents

Liquid-immersion member and exposure device

Info

Publication number
EP2940715A4
EP2940715A4 EP13868247.1A EP13868247A EP2940715A4 EP 2940715 A4 EP2940715 A4 EP 2940715A4 EP 13868247 A EP13868247 A EP 13868247A EP 2940715 A4 EP2940715 A4 EP 2940715A4
Authority
EP
European Patent Office
Prior art keywords
liquid
exposure device
immersion member
immersion
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP13868247.1A
Other languages
German (de)
French (fr)
Other versions
EP2940715A1 (en
EP2940715B1 (en
Inventor
Shinji Sato
Kenyo ODANAKA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to EP18215318.9A priority Critical patent/EP3528050A1/en
Publication of EP2940715A1 publication Critical patent/EP2940715A1/en
Publication of EP2940715A4 publication Critical patent/EP2940715A4/en
Application granted granted Critical
Publication of EP2940715B1 publication Critical patent/EP2940715B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
EP13868247.1A 2012-12-27 2013-12-26 Liquid-immersion member and exposure device Active EP2940715B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP18215318.9A EP3528050A1 (en) 2012-12-27 2013-12-26 Liquid immersion member, exposure apparatus, exposing method, and method of manufacturing device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261746470P 2012-12-27 2012-12-27
PCT/JP2013/084800 WO2014104159A1 (en) 2012-12-27 2013-12-26 Liquid-immersion member and exposure device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
EP18215318.9A Division EP3528050A1 (en) 2012-12-27 2013-12-26 Liquid immersion member, exposure apparatus, exposing method, and method of manufacturing device

Publications (3)

Publication Number Publication Date
EP2940715A1 EP2940715A1 (en) 2015-11-04
EP2940715A4 true EP2940715A4 (en) 2016-09-21
EP2940715B1 EP2940715B1 (en) 2018-12-26

Family

ID=51021235

Family Applications (2)

Application Number Title Priority Date Filing Date
EP18215318.9A Withdrawn EP3528050A1 (en) 2012-12-27 2013-12-26 Liquid immersion member, exposure apparatus, exposing method, and method of manufacturing device
EP13868247.1A Active EP2940715B1 (en) 2012-12-27 2013-12-26 Liquid-immersion member and exposure device

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP18215318.9A Withdrawn EP3528050A1 (en) 2012-12-27 2013-12-26 Liquid immersion member, exposure apparatus, exposing method, and method of manufacturing device

Country Status (8)

Country Link
US (4) US9720331B2 (en)
EP (2) EP3528050A1 (en)
JP (3) JP6319099B2 (en)
KR (1) KR102256768B1 (en)
CN (2) CN104995714B (en)
HK (3) HK1259429A1 (en)
TW (2) TWI671599B (en)
WO (1) WO2014104159A1 (en)

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US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
EP3057122B1 (en) 2013-10-08 2018-11-21 Nikon Corporation Immersion member, exposure apparatus, exposure method, and device manufacturing method
KR102446678B1 (en) 2017-12-15 2022-09-23 에이에스엠엘 네델란즈 비.브이. Fluid handling structures, lithographic apparatus, methods of using the fluid handling structures, and methods of using the lithographic apparatus
JP6610726B2 (en) * 2018-07-11 2019-11-27 株式会社ニコン Immersion member, exposure apparatus and exposure method, and device manufacturing method

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US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
US6452292B1 (en) 2000-06-26 2002-09-17 Nikon Corporation Planar motor with linear coil arrays
WO2002069049A2 (en) 2001-02-27 2002-09-06 Asml Us, Inc. Simultaneous imaging of two reticles
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
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KR101238114B1 (en) 2003-09-03 2013-02-27 가부시키가이샤 니콘 Apparatus and method for providing fluid for immersion lithography
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
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JP4444743B2 (en) * 2004-07-07 2010-03-31 キヤノン株式会社 Exposure apparatus and device manufacturing method
TWI417940B (en) 2004-09-17 2013-12-01 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
SG151198A1 (en) * 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
JP2009088037A (en) * 2007-09-28 2009-04-23 Nikon Corp Exposure method and device manufacturing method, and exposure apparatus
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2010157724A (en) * 2008-12-29 2010-07-15 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2011086804A (en) * 2009-10-16 2011-04-28 Nikon Corp Immersion member, exposure device, exposure method, and method for manufacturing device
JP2013053850A (en) 2010-01-07 2013-03-21 Saitama Medical Univ Circularly polarized light conversion device
KR20120113238A (en) 2010-01-08 2012-10-12 가부시키가이샤 니콘 Liquid-immersion member, exposing device, exposing method, and device manufacturing method
JP2011206121A (en) 2010-03-29 2011-10-20 Ntn Corp Fluid dynamic pressure bearing device for dental handpiece, and dental handpiece
JP2012084879A (en) * 2010-10-14 2012-04-26 Nikon Corp Immersion exposure device, immersion exposure method, device manufacturing method, program, and recording medium
JP2012138511A (en) * 2010-12-27 2012-07-19 Nikon Corp Control method of exposure device, exposure device, device manufacturing method, program, and recording medium
JP5241862B2 (en) * 2011-01-01 2013-07-17 キヤノン株式会社 Exposure apparatus and device manufacturing method
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
JP2013236000A (en) * 2012-05-10 2013-11-21 Nikon Corp Liquid immersion member, exposure device, exposure method, device manufacturing method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) * 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

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Publication number Priority date Publication date Assignee Title
EP1420302A1 (en) * 2002-11-18 2004-05-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090231560A1 (en) * 2008-03-17 2009-09-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
WO2013153939A1 (en) * 2012-04-10 2013-10-17 Nikon Corporation Liquid immersion member and exposure apparatus

Non-Patent Citations (1)

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Title
See also references of WO2014104159A1 *

Also Published As

Publication number Publication date
US20160070177A1 (en) 2016-03-10
CN108873614A (en) 2018-11-23
US20190049855A1 (en) 2019-02-14
WO2014104159A1 (en) 2014-07-03
CN104995714A (en) 2015-10-21
EP3528050A1 (en) 2019-08-21
TWI671599B (en) 2019-09-11
KR20150099777A (en) 2015-09-01
HK1259429A1 (en) 2019-11-29
KR102256768B1 (en) 2021-05-26
HK1214888A1 (en) 2016-08-05
TW201430504A (en) 2014-08-01
JP2018106207A (en) 2018-07-05
JP6566073B2 (en) 2019-08-28
US9720331B2 (en) 2017-08-01
HK1215102A1 (en) 2016-08-12
US9823582B2 (en) 2017-11-21
JP2019185066A (en) 2019-10-24
CN104995714B (en) 2018-06-26
US20140300875A1 (en) 2014-10-09
US20180052397A1 (en) 2018-02-22
US10133189B2 (en) 2018-11-20
JP6319099B2 (en) 2018-05-09
EP2940715A1 (en) 2015-11-04
EP2940715B1 (en) 2018-12-26
TW201832016A (en) 2018-09-01
JPWO2014104159A1 (en) 2017-01-12

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