JP2012084879A - Immersion exposure device, immersion exposure method, device manufacturing method, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To suppress an exposure defect.SOLUTION: An exposure device EX is an immersion exposure device for exposing a substrate P with exposing light EL via fluid LQ. An exposure device EX comprises an optical system including an optical member capable of radiating the exposing light EL, an immersion member 4 placed in at least a part of periphery of an optical path K of the exposing light EL which passes the optical member and the fluid LQ between the optical member and an object, and a deformation device 7 capable of deforming a surface of the immersion member 4 facing a surface of the object.

Description

  The present invention relates to an immersion exposure apparatus, an immersion exposure method, a device manufacturing method, a program, and a recording medium.

  As an exposure apparatus used in a photolithography process, there is known an immersion exposure apparatus that exposes a substrate with exposure light via a liquid in an immersion space, as disclosed in, for example, the following patent document.

US Patent Application Publication No. 2009/0046261

  In the immersion exposure apparatus, exposure failure may occur depending on the liquid holding state between an optical member that emits exposure light and an object such as a substrate. As a result, a defective device may occur.

  An object of an aspect of the present invention is to suppress the occurrence of exposure failure. Another aspect of the present invention is to suppress the occurrence of defective devices.

  According to the first aspect of the present invention, an immersion exposure apparatus that exposes a substrate with exposure light through a liquid, an optical system including an optical member capable of emitting exposure light, an optical member, and an optical member A liquid immersion member disposed in at least a part of the periphery of the optical path of the exposure light passing through the liquid between the liquid and the object, and a deformation device capable of deforming a surface of the liquid immersion member facing the surface of the object. An immersion exposure apparatus is provided.

  According to the second aspect of the present invention, there is provided an immersion exposure apparatus that exposes a substrate with exposure light through a liquid, the optical member capable of emitting exposure light, and at least one around the optical axis of the optical member. A second member having at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, a third member supporting the second member, and the second member displaced with respect to the third member. An immersion exposure apparatus is provided that includes a first displacement device that moves the second member and a second displacement device that displaces the third member relative to the optical member.

  According to a third aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the immersion exposure apparatus according to the first and second aspects, and developing the exposed substrate. Is done.

  According to a fourth aspect of the present invention, there is provided an immersion exposure method for exposing a substrate with exposure light through a liquid, the optical path of the exposure light passing between an optical member capable of emitting exposure light and the substrate. Disposing the liquid immersion member at least around the periphery of the substrate, deforming the surface of the liquid immersion member facing the substrate surface, and filling the optical path of the exposure light between the optical member and the substrate with the liquid. An immersion exposure method is provided that includes forming an immersion space as described above and exposing the substrate with exposure light through the liquid in the immersion space.

  According to a fifth aspect of the present invention, there is provided an immersion exposure method for exposing a substrate with exposure light through a liquid, the exposure light passing through the liquid between the optical member capable of emitting the exposure light and the substrate. Disposing a second member having at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a third member for supporting the second member, at least part of the periphery of the optical path The second member is displaced with respect to the third member, the third member is displaced with respect to the optical member, and the optical path of the exposure light between the optical member and the substrate is filled with liquid. An immersion exposure method is provided that includes forming an immersion space and exposing the substrate with exposure light through the liquid in the immersion space.

  According to a sixth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the immersion exposure method according to the fourth and fifth aspects; and developing the exposed substrate. Is done.

  According to a seventh aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid, an optical member capable of emitting exposure light, and an optical Disposing a liquid immersion member on at least a part of the periphery of the optical path of exposure light passing through the liquid between the member and the substrate; deforming a surface of the recording liquid immersion member facing the substrate; A program for forming an immersion space so that an optical path of exposure light between the optical member and the substrate is filled with liquid, and exposing the substrate with exposure light through the liquid in the immersion space Is provided.

  According to an eighth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light through a liquid, the optical member capable of emitting exposure light, the substrate, A second member having at least one of a supply port for supplying the liquid and a recovery port for recovering the liquid is disposed at least in the periphery of the optical path of the exposure light that passes through the liquid; Disposing a third member to be supported, displacing the second member with respect to the third member, displacing the third member with respect to the optical member, and exposure light between the optical member and the substrate There is provided a program for executing the formation of the immersion space so that the optical path of the substrate is filled with the liquid and exposing the substrate with the exposure light through the liquid in the immersion space.

  According to the ninth aspect of the present invention, there is provided a recording medium in which the program according to the seventh and eighth aspects is recorded and is readable by a computer.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows the liquid immersion member and deformation | transformation apparatus which concern on 1st Embodiment. It is a figure which shows the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows the deformation | transformation apparatus and liquid immersion member which concern on 1st Embodiment. It is a figure which shows the exposure apparatus which concerns on a 1st modification. It is a figure which shows the liquid immersion member and deformation | transformation apparatus which concern on 2nd Embodiment. It is a figure which shows the liquid immersion member and deformation | transformation apparatus which concern on 3rd Embodiment. It is a figure which shows the attenuation part which concerns on 3rd Embodiment. It is a figure which shows the exposure apparatus which concerns on 4th Embodiment. It is a figure which shows the exposure apparatus which concerns on a 2nd modification. It is a figure which shows an example of a device manufacturing method.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. Moreover, about the same component, the same code | symbol may be attached | subjected and the overlapping description may be abbreviate | omitted. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. The rotation (inclination) directions around the X, Y, and Z axes are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, water (pure water) is used as the liquid LQ.

  In FIG. 1, an exposure apparatus EX includes a mask stage 1, a substrate stage 2, an interferometer system 3, an illumination system IL, a projection system PL, a liquid immersion member 4, a chamber device 5, a body 6, a deformation device 7, a control device 8, And a storage device ME. The mask stage 1 is movable while holding the mask M. The substrate stage 2 is movable while holding the substrate P. The interferometer system 3 optically measures the positions of the mask stage 1 and the substrate stage 2. The illumination system IL illuminates the mask M with the exposure light EL. The projection system PL projects an image of the pattern of the mask M illuminated with the exposure light EL onto the substrate P. The liquid immersion member 4 can form the liquid immersion space LS so that at least a part of the optical path K of the exposure light EL is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The chamber device 5 accommodates at least the projection system PL. The body 6 supports at least the projection system PL. The deformation device 7 can deform the surface of the liquid immersion member 4 that faces the surface of the object. The control device 8 controls the overall operation of the exposure apparatus EX. The storage device ME is connected to the control device 8 and stores various types of information related to exposure.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a multilayer film formed on the base material. The multilayer film is a film in which a plurality of films including at least a photosensitive film are stacked. The photosensitive film is a film formed of a photosensitive material. The multilayer film may include, for example, an antireflection film and a protective film (topcoat film) that protects the photosensitive film.

  The control device 8 of the present embodiment includes a computer system having a CPU and the like. The control device 8 of the present embodiment includes an interface capable of executing communication with a device external to the computer system. An input device capable of inputting an input signal may be connected to the control device 8. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from a device external to the computer system. The control device 8 may include a display device such as a liquid crystal display or may be connected to the display device.

  The storage device ME includes, for example, a memory such as a RAM, a recording medium such as a hard disk and a CD-ROM. An operating system (OS) that controls the computer system is installed in the storage device ME of the present embodiment. The storage device ME stores a program that causes the control device 8 to control the exposure apparatus EX that exposes the substrate P with the exposure light EL via the liquid LQ. Various kinds of information including programs recorded in the storage device ME can be read by the control device (computer system) 8. The control device 8 may include a logic circuit such as an ASIC that executes various processes required for controlling each part of the exposure apparatus EX. The function of the control device 8 may be realized by software, may be realized by hardware, or may be realized by a combination of hardware and software.

  The chamber device 5 includes a chamber member 5A and an environment control device 5B. The chamber member 5A forms a substantially closed inner space CS. The environment control device 5B controls the environment (temperature, humidity, cleanliness, pressure, etc.) of the internal space CS. The body 6 is disposed in the internal space CS. The body 6 has a first column 9 and a second column 10. The first column 9 is provided on the support surface FL. The second column 10 is provided on the first column 9. The first column 9 includes a first support member 11 and a first surface plate 13 supported by the first support member 11 via a vibration isolator 12. The second column 10 includes a second support member 14 provided on the first surface plate 13 and a second surface plate 16 supported by the second support member 14 via a vibration isolator 15. In the present embodiment, the third surface plate 18 is disposed on the support surface FL via the vibration isolator 17.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light that is ultraviolet light (vacuum ultraviolet light) is used as the exposure light EL.

  The mask stage 1 has a mask holding unit 19. The mask holding unit 19 holds the mask M so that it can be released. The mask stage 1 is movable on the guide surface 16G of the second surface plate 16 while holding the mask M. The mask stage 1 can move while holding the mask M with respect to the illumination region IR by the operation of the drive system 20. The drive system 20 includes a planar motor having a mover 20 </ b> A disposed on the mask stage 1 and a stator 20 </ b> B disposed on the second surface plate 16. A flat motor capable of moving the mask stage 1 is disclosed in, for example, US Pat. No. 6,452,292. The mask stage 1 can be moved in six directions, that is, the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drive system 20.

  The projection system PL irradiates the predetermined projection region PR with the exposure light EL. The projection system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. The projection system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. The projection system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis AX of the projection system PL is parallel to the Z axis. Projection system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. Projection system PL may form either an inverted image or an erect image.

  A plurality of optical elements of the projection system PL are held by a holding member (lens barrel) 21. The holding member 21 has a flange 21F. Projection system PL is supported by first surface plate 13 via flange 21F. A vibration isolator may be provided between the first surface plate 13 and the holding member 21.

  Of the plurality of optical elements of the projection system PL, the terminal optical element 22 closest to the image plane of the projection system PL has an exit surface 23 that emits the exposure light EL toward the image plane of the projection system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 23 can be irradiated. In the present embodiment, the exit surface 23 faces the −Z direction and is parallel to the XY plane. The exit surface 23 may include at least one of a convex surface and a concave surface with respect to the −Z side, or may include a flat surface.

  In the present embodiment, the optical axis AX of the terminal optical element 22 is substantially parallel to the Z axis. The optical axis defined by the optical element adjacent to the terminal optical element 22 may be regarded as the optical axis of the terminal optical element 22. In the present embodiment, the image plane of the projection system PL is substantially parallel to the XY plane including the X axis and the Y axis. In the present embodiment, the image plane of the projection system PL is a substantially horizontal plane. The image plane of the projection system PL may not be parallel to the XY plane, and may include a curved surface.

  The substrate stage 2 has a substrate holding unit 24. The substrate holding unit 24 holds the substrate P in a releasable manner. The substrate stage 2 is movable on the guide surface 18G of the third surface plate 18. The substrate stage 2 can move while holding the substrate P with respect to the projection region PR by the operation of the drive system 25. The drive system 25 includes a planar motor having a mover 25 </ b> A disposed on the substrate stage 2 and a stator 25 </ b> B disposed on the third surface plate 18. A flat motor capable of moving the substrate stage 2 is disclosed in, for example, US Pat. No. 6,452,292. The substrate stage 2 can be moved in six directions, that is, the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drive system 25.

  The substrate stage 2 has an upper surface 26 disposed around the substrate holding unit 24. The upper surface 26 can be opposed to the emission surface 23. In the present embodiment, the substrate stage 2 is provided at least around the substrate holder 24 as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. The cover member holding part 27 is disposed in part. The cover member holding part 27 holds the lower surface of the cover member T so that it can be released. In the present embodiment, the upper surface 26 of the substrate stage 2 includes the upper surface of the cover member T. In the present embodiment, the upper surface 26 is flat. The upper surface 26 may include at least one of a flat surface and a curved surface.

  The exposure apparatus EX of the present embodiment includes a surface sensor 28 that can detect the surface of an object facing the liquid immersion member 4. The surface sensor 28 of the present embodiment can optically detect positional information on the surface of the substrate P with respect to the Z-axis, θX, and θY directions. The surface sensor 28 is provided with height information on the surface of the substrate P at each of a plurality of detection points (for example, as disclosed in US Pat. No. 5,448,332, US Patent Application Publication No. 2007/0247640). A so-called multipoint position detection system that detects position information in the Z-axis direction) is included. The surface sensor 28 can detect not only the position information of the surface of the substrate P but also the position information of the upper surface 26 of the substrate stage 2, for example.

  Note that at least a part of the surface sensor 28 may be an apparatus outside the exposure apparatus EX. The surface sensor 28 may include an autofocus mechanism. This autofocus mechanism may be used for a focusing process for focusing the projection system PL on the exposure target surface. When performing the focusing process, the control device 8 may control the autofocus mechanism.

  The interferometer system 3 includes a first interferometer unit 3A and a second interferometer unit 3B. The first interferometer unit 3A can optically measure the position of the mask stage 1 (mask M) in the XY plane. The second interferometer unit 3B can optically measure the position of the substrate stage 2 (substrate P) in the XY plane. When executing the exposure processing of the substrate P or when executing the predetermined measurement processing, the control device 8 operates the drive systems 20 and 25 based on the measurement result of the interferometer system 3 to thereby perform the mask stage 1 (mask M) and position control of the substrate stage 2 (substrate P) are executed.

  The liquid immersion member 4 is configured so that the optical path K of the exposure light EL between the object disposed at a position where the exposure light EL emitted from the emission surface 23 can be irradiated and the emission surface 23 is filled with the liquid LQ. The liquid LQ is held between the two and the liquid immersion space LS is formed. In the present embodiment, the position where the exposure light EL emitted from the emission surface 23 can be irradiated includes the projection region PR. In the present embodiment, the position where the exposure light EL emitted from the emission surface 23 can be irradiated includes a position facing the emission surface 23. In the present embodiment, an object that can be placed at a position facing the exit surface 23, in other words, an object that can be placed in the projection region PR, includes at least one of the substrate stage 2 and the substrate P held by the substrate stage 2. Including. In the present embodiment, the liquid immersion member 4 is at least one around the optical path K of the exposure light EL that passes through the terminal optical element 22 and the liquid LQ between the terminal optical element 22 and the object disposed in the projection region PR. Placed in the section.

  The liquid immersion member 4 has a lower surface 4b that can face the surface (upper surface) of an object disposed in the projection region PR. The lower surface 4b can hold the liquid LQ with the surface (upper surface) of the object. In the present embodiment, the liquid immersion space LS is formed by holding the liquid LQ between the ejection surface 23 and the lower surface 4b on one side and the surface (upper surface) of the object on the other side.

  The deformation device 7 can deform the lower surface 4b of the liquid immersion member 4 that can face the surface of the object. The deformation device 7 supports the liquid immersion member 4. In the present embodiment, the deformation device 7 is supported by the first surface plate 13. In the present embodiment, the liquid immersion member 4 is supported by the first surface plate 13 via the deformation device 7. In this embodiment, the liquid immersion member 4 is supported so as to be suspended from the first surface plate 13 via the deformation device 7.

  The deformation device 7 of this embodiment is supported on the first surface plate 13 via the reaction plate 70. The reaction plate 70 is supported on the lower surface of the first surface plate 13. At least a part of the deformation device 7 is connected to the reaction plate 70.

  In the present embodiment, the deformation device 7 includes a plurality of first movable parts 71 that generate a force in a predetermined direction. The first movable portion 71 is disposed between the reaction plate 70 and the liquid immersion member 4. In the present embodiment, at least a part of the first movable portion 71 is connected to the reaction plate 70. Further, at least a part of the first movable portion 71 is connected to the liquid immersion member 4.

  In the present embodiment, the first movable portion 71 is disposed below the reaction plate 70. The liquid immersion member 4 is disposed below the reaction plate 70 and the first movable portion 71. In the present embodiment, the upper end side of the first movable part 71 is connected to the reaction plate 70, and the lower end side of the first movable part 71 is connected to the liquid immersion member 4.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. During exposure of the substrate P, the control device 8 controls the mask stage 1 and the substrate stage 2 to perform predetermined scanning in the XY plane that intersects the optical axis AX (optical path of the exposure light EL) with the mask M and the substrate P. Move in the direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 8 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection system PL and synchronizes with the movement of the substrate P in the Y-axis direction with respect to the illumination region IR of the illumination system IL. Then, the substrate P is irradiated with the exposure light EL through the projection system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction. Thereby, the pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed with the exposure light EL.

  2A is a plan view of the liquid immersion member 4 and the deformation device 7 as viewed from above, FIG. 2B is a plan view of the deformation device 7 as viewed from below, and FIG. FIG. 3B is a plan view of the liquid immersion member 4 as viewed from below, and FIG. 4 is a cross-sectional view taken along line AA ′ of FIG. In the following description, the case where the substrate P is arranged in the projection region PR will be described as an example. However, another object such as the substrate stage 2 (cover member T) may be arranged in the projection region PR. .

  In the present embodiment, the liquid immersion member 4 is an annular member. A part of the liquid immersion member 4 of the present embodiment is disposed around the terminal optical element 22. A part of the liquid immersion member 4 of the present embodiment is disposed around the optical path K of the exposure light EL that passes through the liquid LQ between the terminal optical element 22 and the object.

  The liquid immersion member 4 may not be an annular member. For example, the liquid immersion member 4 may be disposed in a part of the periphery of the terminal optical element 22 and the optical path K. The liquid immersion member 4 may not be disposed at least at a part of the periphery of the terminal optical element 22. For example, the liquid immersion member 4 may be disposed at least part of the periphery of the optical path K between the emission surface 23 and the substrate P (object) and may not be disposed around the terminal optical element 22. The liquid immersion member 4 may not be disposed at least at a part around the optical path K between the emission surface 23 and the substrate P (object). For example, the liquid immersion member 4 may be disposed at least at a part of the periphery of the terminal optical element 22 and may not be disposed around the optical path K between the emission surface 23 and the substrate P (object).

  The liquid immersion member 4 has a lower surface 4b that can face the surface (upper surface) of an object arranged in the projection region PR, and an upper surface 4a that faces a direction different from the lower surface 4b. The lower surface 4b of the liquid immersion member 4 can hold the liquid LQ in a space SP between the surface of the substrate P (object). In the present embodiment, when the exposure light EL is irradiated on the substrate P, the immersion space LS is formed so that a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ. At least a part of the interface (meniscus, edge) LG of the liquid LQ is formed between the lower surface 4 b of the liquid immersion member 4 and the surface of the substrate P. That is, the exposure apparatus EX of the present embodiment employs a local liquid immersion method. The outside of the immersion space LS, that is, the outside of the interface LG is a gas space GS.

  As shown in FIG. 4, the liquid immersion member 4 of this embodiment includes a plate portion 30 and a main body portion 31. In this embodiment, the plate part 30 and the main-body part 31 are integral. In addition, the plate part 30 may be a member different from the main body part 31, or may not be provided.

  In the present embodiment, the plate portion 30 has an upper surface 30a and a lower surface 30b. The upper surface 30 a is disposed so as to face at least a part of the emission surface 23. The lower surface 30b can be arranged to face the surface of the substrate P.

  The liquid immersion member 4 has an opening 32 at a position facing the emission surface 23. The opening 32 includes a hole connecting the upper surface 30a and the lower surface 30b. The upper surface 30 a is disposed around the upper end of the opening 32, and the lower surface 30 b is disposed around the lower end of the opening 32. The exposure light EL emitted from the emission surface 23 can pass through the opening 32 and irradiate the substrate P.

  The upper surface 30a of the present embodiment is a plane substantially parallel to the XY plane. Note that at least a part of the upper surface 30a may be inclined with respect to the XY plane, or may include a curved surface. The lower surface 30b of the present embodiment is a plane that is substantially parallel to the XY plane. Note that at least a part of the lower surface 30b may be inclined with respect to the XY plane, or may include a curved surface. The lower surface 30b holds the liquid LQ with the surface of the substrate P. The outer shape of the lower surface 30b of this embodiment is an octagon. The outer shape of the lower surface 30b may be an arbitrary polygon, ellipse, circle, or a shape having a line including at least one of a straight line and a free curve as an outline.

  In the present embodiment, at least a part of the plate portion 30 is disposed so as to face the emission surface 23, but the plate portion 30 may not be opposed to the emission surface 23.

  The main body portion 31 is arranged so that at least a part thereof faces the side surface 22 a of the terminal optical element 22. The side surface 22 a of the present embodiment is disposed around the emission surface 23. The side surface 22a of the present embodiment is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K. The radiation direction with respect to the optical path K includes the radiation direction with respect to the optical axis AX of the projection system PL and includes a direction perpendicular to the Z axis.

  In the present embodiment, the main body 31 has an upper surface 31 a that faces in a different direction from the lower surface 4 b of the liquid immersion member 4. In the present embodiment, the upper surface 4 a of the liquid immersion member 4 includes the upper surface 31 a of the main body portion 31. In the present embodiment, the upper surface 31 a is disposed around the terminal optical element 22. In the present embodiment, the upper surface 31a is annular. The upper surface 31 a surrounds the terminal optical element 22. Note that the plurality of upper surfaces 31 a may be discretely arranged around the terminal optical element 22. In the present embodiment, the upper surface 31a includes a plane whose normal direction is substantially parallel to the optical axis AX. Note that the upper surface 31a may include an inclined surface with respect to the optical axis AX, or may include a curved surface. The upper surface 4a of the liquid immersion member 4 may include a plurality of upper surfaces 31a having steps in a direction parallel to the optical axis AX.

  In addition, although the injection | emission surface 23 of this embodiment is arrange | positioned above the lower surface 4b of the liquid immersion member 4, you may arrange | position substantially flush with at least one part of the lower surface 4b. Further, at least a part of the emission surface 23 may be disposed below the lower surface 4b.

  In the present embodiment, the liquid immersion member 4 includes a supply port 33, a recovery port 34, a recovery channel 35, and a discharge part 36. The supply port 33 can supply the liquid LQ. The recovery port 34 can recover the liquid LQ. The liquid LQ recovered from the recovery port 34 flows through the recovery flow path 35. The discharge part 36 discharges at least a part of the fluid flowing through the recovery flow path 35.

  The supply port 33 of this embodiment supplies the liquid LQ to the optical path K in at least part of the exposure of the substrate P. The supply port 33 is disposed in the vicinity of the optical path K so as to face the optical path K. The supply port 33 of the present embodiment supplies the liquid LQ to the space SR between the emission surface 23 and the upper surface 30a. At least a part of the liquid LQ supplied from the supply port 33 to the space SR is supplied to the optical path K and supplied onto the substrate P through the opening 32. Note that at least a part of the supply port 33 may face the side surface 22a.

  The liquid immersion member 4 of this embodiment includes a supply flow path 38 connected to the supply port 33. At least a part of the supply channel 38 is formed inside the liquid immersion member 4. The supply port 33 of the present embodiment includes an opening formed at one end of the supply flow path 38. In the present embodiment, the other end of the supply flow path 38 is connected to the liquid delivery device. The liquid delivery device is not shown. At least a part of the liquid delivery apparatus may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX. The liquid delivery device supplies clean and temperature-adjusted liquid LQ to the supply port 33 via the supply flow path 38.

  The recovery port 34 can recover at least a part of the liquid LQ between the liquid immersion member 4 and the substrate P (object). The recovery port 34 recovers at least a part of the liquid LQ on the substrate P in the exposure of the substrate P. In the present embodiment, the recovery port 34 faces the −Z direction. In at least a part of the exposure of the substrate P, the substrate P is arranged so that at least a part of the surface thereof faces the recovery port 34.

  The liquid immersion member 4 of this embodiment includes a porous member 39. The porous member 39 of the present embodiment has a recovery port 34. In the present embodiment, an opening 41 is formed at the lower end of the main body 31. The opening 41 faces downward (−Z direction). The porous member 39 of this embodiment is disposed in the opening 41. The opening 41 (porous member 39) is disposed at least at a part around the lower surface 30b.

  The porous member 39 has a lower surface 39b, an upper surface 39a facing in a direction different from the lower surface 39b, and a plurality of holes (openings or pores) 40 connecting the lower surface 39b and the upper surface 39a. The porous member 39 of the present embodiment is a plate-like member. The upper surface 39a faces the + Z direction, and the lower surface 39b faces the -Z direction. A lower surface 39 b is disposed around the lower end of the hole 40, and an upper surface 39 a is disposed around the upper end of the hole 40.

  The recovery port 34 of the present embodiment includes an opening at the lower end (the lower surface 39 b side) of the hole 40 of the porous member 39. The hole 40 of this embodiment is long in the Z-axis direction. The size (hole diameter) of the hole 40 is substantially uniform in the Z-axis direction. The size (hole diameter) of the hole 40 may change continuously from one of the upper surface 39a and the lower surface 39b to the other, or may change stepwise.

  In the present embodiment, the lower surface 39 b of the porous member 39 is disposed on at least a part of the periphery of the lower surface 30 b of the plate portion 30. In the present embodiment, the lower surface 39 b of the porous member 39 is annular and is disposed so as to surround the lower surface 30 b of the plate portion 30. In the present embodiment, the lower surface 4 b of the liquid immersion member 4 includes the lower surface 30 b of the plate portion 30 and the lower surface 39 b of the porous member 39. A plurality of porous members 39 may be discretely arranged around the lower surface 30b (optical path K).

  In the present embodiment, the lower surface 4 b faces the space SP on the lower side (−Z side) of the liquid immersion member 4. In the present embodiment, the space SP includes a space between the lower surface 4b of the liquid immersion member 4 and the surface of the object facing the lower surface 4b. When the immersion space LS is formed on the object facing the lower surface 4b of the immersion member 4, the space SP includes an immersion space (liquid space) LS and a gas space GS. The fluid F in the space SP can flow into the recovery port 34. The fluid F includes at least one of the liquid LQ and the gas G.

  At least a part of the recovery channel 35 is formed inside the liquid immersion member 4. The recovery channel 35 includes a space between the main body 31 and the porous member 39. The upper surface 39 a of the porous member 39 is disposed so as to face the recovery flow path 35.

  The fluid F in the space SP can flow through the holes 40 of the porous member 39. The hole 40 is connected to the recovery channel 35. At least a part of the liquid LQ on the object facing the lower surface 39 b is recovered from the hole 40. The liquid LQ recovered from the hole 40 flows through the recovery channel 35. In the present embodiment, at least a part of the gas G in the gas space GS is recovered from the hole 40 together with the liquid LQ in the immersion space LS. That is, the recovery port 34 of the present embodiment can recover the liquid LQ together with the gas G. Note that the recovery port 34 may recover substantially only the liquid LQ.

  The recovery flow path 35 of this embodiment is connected to the flow path in the flow path member 37. In the present embodiment, at least a part of the fluid F recovered from the recovery port 34 flows through the flow path in the flow path member 37 after flowing through the recovery flow path 35.

  In the present embodiment, the discharge part 36 includes a flow path member 37. The discharge unit 36 of the present embodiment discharges the mixed phase fluid containing the liquid LQ and the gas G in the recovery flow path 35. In the present embodiment, the multiphase fluid recovered from the recovery port 34 flows through the recovery flow path 35, is then discharged from the discharge portion 36, and flows through the flow path in the flow path member 37. The discharge unit 36 may separate and discharge the liquid LQ and the gas G in the recovery channel 35. When the fluid F recovered into the recovery channel 35 does not substantially contain the gas G, the discharge unit 36 may discharge the liquid LQ and not substantially discharge the gas G.

  Note that at least one of the liquid LQ and the gas G in the recovery channel 35 may flow in a channel other than the channel in the channel member 37. One of the liquid LQ and the gas G in the recovery channel 35 may flow in the channel in the channel member 37, and the other may flow in a channel different from the channel in the channel member 37. At least one of the liquid LQ and the gas G in the recovery channel 35 may be discharged to the outside of the liquid immersion member 4 via a channel different from the channel in the channel member 37.

  The deformation device 7 can deform the lower surface 4 b of the liquid immersion member 4. The deformation device 7 can deform the lower surface 4 b of the liquid immersion member 4 by applying a force to the liquid immersion member 4. For example, the deformation device 7 can apply a force to the liquid immersion member 4 at least when the substrate P is exposed.

  The deformation device 7 of the present embodiment applies a force to the liquid immersion member 4 at a plurality of positions. The deformation device 7 of the present embodiment includes a plurality of first movable parts 71 that can generate a force in a predetermined direction. The deformation device 7 of the present embodiment can apply a force to the liquid immersion member 4 at a plurality of positions using the plurality of first movable portions 71.

  The plurality of first movable portions 71 of the present embodiment are disposed between the reaction plate 70 and the liquid immersion member 4. The plurality of first movable parts 71 are supported by the reaction plate 70. The reaction plate 70 of this embodiment has a fixed relative position with respect to the projection system PL. The reaction plate 70 may have a variable relative position with respect to the projection system PL. In addition, the plurality of first movable parts 71 are connected to each of the plurality of positions of the liquid immersion member 4.

  In the present embodiment, the upper ends of each of the plurality of first movable parts 71 are connected to a plurality of positions of the reaction plate 70, and the lower ends are connected to a plurality of positions of the liquid immersion member 4. That is, the reaction plate 70 of the present embodiment has a plurality of connection positions with the first movable portion 71, and the surface of the liquid immersion member 4 has a plurality of connection positions with the first movable portion 71.

  In the present embodiment, the plurality of first movable parts 71 are arranged at different positions in a plane intersecting the optical axis AX (in the XY plane in the present embodiment). In the present embodiment, the plurality of first movable parts 71 are discretely arranged around the optical path K. In the present embodiment, the plurality of connection positions with the first movable portion 71 on the surface of the liquid immersion member 4 are different in a plane intersecting the optical axis AX (in the XY plane).

  When each of the plurality of first movable parts 71 is operated, a force is applied to the liquid immersion member 4 for each connection position of the liquid immersion member 4 with the first movable part 71. As a result, the deformation device 7 can apply force to the liquid immersion member 4 at a plurality of positions corresponding to a plurality of connection positions of the plurality of first movable parts 71 and the liquid immersion member 4.

  The reaction plate 70 of the present embodiment has a lower surface 70b to which the liquid immersion member 4 can face and an upper surface 70a that faces in a direction different from the lower surface 70b. At least a part of the lower surface 70 b of the reaction plate 70 of the present embodiment faces the upper surface 31 a of the main body 31 of the liquid immersion member 4. In the present embodiment, the upper surface 70 a side of the reaction plate 70 is connected to the first surface plate 13. In addition, the upper end side of the first movable portion 71 is connected to the lower surface 70 b of the reaction plate 70.

  The reaction plate 70 of this embodiment is an annular member. The reaction plate 70 is disposed so as to surround the projection system PL (optical axis AX). The reaction plate 70 may not be annular. For example, a plurality of reaction plates 70 may be discretely arranged around the projection system PL (optical axis AX). Further, the reaction plate 70 may not surround the projection system PL.

  In this embodiment, the lower end side of the 1st movable part 71 is connected to the upper surface 31a of the liquid immersion member 4 (main-body part 31). Note that at least a part of the first movable portion 71 may be connected to the side surface of the liquid immersion member 4 that intersects the upper surface 31a.

  The 1st movable part 71 of this embodiment can change the distance of the upper end and lower end. In other words, the first movable part 71 can be expanded and contracted in a direction connecting the upper end and the lower end of the first movable part 71. The first movable portion 71 of the present embodiment can be expanded and contracted between the reaction plate 70 and the liquid immersion member 4 in a direction parallel to the optical axis AX (Z-axis direction).

  The first movable portion 71 of the present embodiment includes, for example, an electrostrictive element, and can be expanded and contracted in a direction connecting the upper end and the lower end according to supplied power. The control device 8 can control the amount of expansion / contraction of the first movable part 71.

  The control device 8 can change the distance between the connection position between the upper end of the first movable part 71 and the reaction plate 70 and the connection position between the lower end of the first movable part 71 and the liquid immersion member 4. The first movable portion 71 can change the connection position with the liquid immersion member 4 in the Z-axis direction, and each of the plurality of first movable portions 71 has a force in the Z-axis direction (a direction parallel to the optical axis AX). Is applied to the liquid immersion member 4.

  In the present embodiment, as the first movable portion 71 is extended (operated), the liquid immersion member 4 corresponding to the connection position with the first movable portion 71 is locally pushed down, so that the liquid immersion member The lower surface 4b of 4 is deformed. In the present embodiment, as the first movable portion 71 contracts (operations), the liquid immersion member 4 corresponding to the connection position with the first movable portion 71 is locally pulled upward, and the liquid The lower surface 4b of the immersion member 4 is deformed.

  In the present embodiment, each of the plurality of first movable portions 71 is disposed so as to extend in a direction parallel to the optical axis AX, and a force in a direction parallel to the optical axis AX can be applied to the liquid immersion member 4. it can. In addition, at least a part of the plurality of first movable parts 71 may extend in a direction intersecting with the direction parallel to the optical axis AX, or force in the direction intersecting with the direction parallel to the optical axis AX may be applied. The immersion member 4 may be allowed to act. That is, the deformation device 7 may apply a force in a direction parallel to the optical axis AX to the liquid immersion member 4, or apply a force in a direction intersecting the direction parallel to the optical axis AX to the liquid immersion member 4. You may make it act.

  In the present embodiment, each of the plurality of first movable parts 71 is connected to the reaction plate 70 by rotation support, and is connected to the liquid immersion member 4 by rotation support. For one or more of the plurality of first movable parts 71, at least one of the connection part between the first movable part 71 and the reaction plate 70 and the connection part between the first movable part 71 and the liquid immersion member 4 is a rotation support part. But you can. Both the connecting portion between the first movable portion 71 and the reaction plate 70 and the connecting portion between the first movable portion 71 and the liquid immersion member 4 may be rigid joints.

  Moreover, the 1st movable part 71 may be directly connected with the reaction plate 70, and may be indirectly connected with the reaction plate 70 through a predetermined member. Further, the first movable portion 71 may be directly connected to the liquid immersion member 4 or may be indirectly connected to the liquid immersion member 4 via a predetermined member.

  When a fixing member that fixes the liquid immersion member 4 and the reaction plate 70 with a rigid joint is provided, the number of the first movable parts 71 may be one or two or more. Instead of the fixed member, a first movable portion 71 may be provided in which a connection portion with the reaction plate 70 and a connection portion with the liquid immersion member 4 are rigid joints. When all of the plurality of first movable parts 71 are connected to the reaction plate 70 and the liquid immersion member 4 by rotation support, the number of the first movable parts 71 may be 4 or more, 8 or more, 12 or more. But you can. In the present embodiment, twelve first movable parts 71 are arranged at equal intervals along the outer edge of the upper surface 31 a of the main body part 31 of the liquid immersion member 4. The interval between the plurality of first movable parts 71 may not be equal.

  In addition, the deformation | transformation apparatus 7 does not need to expand and contract one or more of the some 1st movable parts 71. FIG. The first movable portion 71 when not expanding and contracting may be used as a support member that supports the liquid immersion member 4. The deformation device 7 may extend and contract the plurality of first movable parts 71 so that the liquid immersion member 4 moves in a direction parallel to the optical axis AX. The deformation device 7 may extend and contract the plurality of first movable parts 71 so that the posture (tilt) of the liquid immersion member 4 with respect to the optical axis AX changes. The deformation device 7 may extend and contract the plurality of first movable parts 71 so that the liquid immersion member 4 rotates in at least one of the rotation directions of the θX direction and the θY direction.

  The deformation device 7 of the present embodiment can vary at least one of the direction and magnitude of the force acting on the liquid immersion member 4 at a plurality of positions. The deformation device 7 of the present embodiment can vary the amount of expansion / contraction of each of the plurality of first movable parts 71 so that at least one of the direction and magnitude of the force applied to the liquid immersion member 4 is different at a plurality of positions. it can.

  The control device 8 according to the present embodiment can control the amount of expansion / contraction of the plurality of first movable parts 71 for each first movable part 71. That is, the control device 8 can control the amount of deformation at each position on the lower surface 4 b of the liquid immersion member 4. The control device 8 may be capable of controlling the expansion / contraction amount of the first movable unit 71 for each group including two or more first movable units 71.

  In the present embodiment, the exposure apparatus EX includes a first displacement sensor 72. The first displacement sensor 72 of the present embodiment can measure the displacement of the liquid immersion member 4 in a predetermined direction. The first displacement sensor 72 of this embodiment can measure the displacement of the liquid immersion member 4 in a direction parallel to the optical axis AX. The first displacement sensor 72 may be capable of measuring the displacement in the direction intersecting the direction parallel to the optical axis AX of the liquid immersion member 4. The first displacement sensor 72 of the present embodiment can measure a local displacement of the liquid immersion member 4 in a direction parallel to the optical axis AX. The first displacement sensor 72 may measure the displacement of the liquid immersion member 4 in at least part of the exposure, or may measure the displacement of the liquid immersion member 4 when exposure is not performed.

  The first displacement sensor 72 is disposed at a position where the displacement in the vicinity of the connection position between the first movable portion 71 and the liquid immersion member 4 can be measured. The first displacement sensor 72 of this embodiment is disposed on the lower surface 70 b of the reaction plate 70. The first displacement sensor 72 of this embodiment is disposed in the vicinity of the first movable part 71.

  The first displacement sensor 72 of this embodiment can optically measure a change in the distance to the measurement object. The first displacement sensor 72 may be capable of measuring a change in capacitance with the measurement object. The first displacement sensor 72 may be disposed on a member other than the reaction plate 70, for example, the liquid immersion member 4. The first displacement sensor 72 is an object that can be placed opposite to the lower surface 4b of the liquid immersion member 4, such as a substrate before or after exposure, a dummy substrate that does not perform exposure, a substrate stage 2, and a measurement stage. It may be arranged on one or more stages.

  When the first displacement sensor 72 is disposed on a member other than the liquid immersion member 4, another member is disposed between the liquid immersion member 4 and the first displacement sensor 72. However, the displacement of the liquid immersion member 4 may be measured through another member. For example, the first displacement sensor 72 may measure the displacement of the liquid immersion member 4 using light that passes through the other member. The first displacement sensor 72 may include a strain gauge disposed on the liquid immersion member 4.

  The exposure apparatus EX of the present embodiment includes a plurality of first displacement sensors 72. The first displacement sensor 72 of this embodiment is provided in a one-to-one correspondence with the first movable portion 71. In the present embodiment, the plurality of first displacement sensors 72 are arranged in the vicinity of the corresponding first movable parts 71. In the present embodiment, the plurality of first displacement sensors 72 measure the displacement of the liquid immersion member 4 in the vicinity of the connection position between the corresponding first movable portion 71 and the liquid immersion member 4.

  The first displacement sensor 72 may measure the displacement of the liquid immersion member 4 between a plurality of connection positions of the plurality of first movable parts 71 and the liquid immersion member 4. Using the measurement results of the plurality of first displacement sensors 72, the displacement of the liquid immersion member 4 at an arbitrary position can be obtained by interpolation or the like. Processing such as computation required for this interpolation may be executed by the control device 8 or may be executed by an arithmetic device other than the control device 8. At least a part of the arithmetic device may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX.

  Note that one first displacement sensor 72 may correspond to two or more first movable parts 71 for one or more of the plurality of first displacement sensors 72. For one or more of the plurality of first movable parts 71, one first movable part 71 may correspond to two or more first displacement sensors 72. The plurality of first displacement sensors 72 may include two or more types of sensors having different measurement principles, such as optical sensors, electrostatic capacitance sensors, and strain gauges. The plurality of first displacement sensors 72 may be divided into two or more of the reaction play 70, the liquid immersion member 4, and the object.

  The deformation device 7 of this embodiment is controlled based on the measurement result of the first displacement sensor 72. The control device 8 acquires the measurement result of the first displacement sensor 72 and controls the deformation device 7 based on the measurement result of the first displacement sensor 72. The control device 8 controls the deformation device 7 based on the measurement result obtained by measuring the displacement of the liquid immersion member 4 while deforming the lower surface 4b of the liquid immersion member 4 in at least a part of the exposure. The control device 8 according to the present embodiment is configured so that the displacement of the first movable portion 71 corresponding to the first displacement sensor 72 is such that the displacement of the liquid immersion member 4 indicated by the measurement result of the first displacement sensor 72 approaches the target value. To control.

  In the present embodiment, the deformation amount of the lower surface 4b of the liquid immersion member 4 is detected based on the measurement result of the first displacement sensor 72. In the present embodiment, the liquid immersion member is obtained using the measurement result of the first displacement sensor 72 based on correspondence data indicating the correspondence between the displacement of each position of the upper surface 4a of the liquid immersion member 4 and the deformation amount of the lower surface 4b. 4 is detected. In the present embodiment, the correspondence data is stored in the storage device ME. The control device 8 of the present embodiment can calculate the deformation amount of the lower surface 4b of the liquid immersion member 4 using the correspondence data stored in the storage device ME and the measurement result of the first displacement sensor 72. .

  In this embodiment, according to the surface shape of the object facing the lower surface 4 b of the liquid immersion member 4, the amount of expansion and contraction corresponding to the target value for each of the first movable parts 71 for each of the first movable parts 71. (Control amount) is set. The deformation device 7 is controlled based on the detection result of the surface sensor 28. The control device 8 controls the deformation device 7 based on the detection result of the surface sensor 28. The control device 8 acquires data (surface shape data) indicating the surface shape of the object facing the lower surface 4b of the liquid immersion member 4, and sets the above expansion / contraction amount based on this data.

  Next, a method for exposing the substrate P using the above-described exposure apparatus EX will be described.

  When the substrate P before exposure is carried into the substrate stage 2 (substrate holding unit 24), the control device 8 detects the surface of the substrate P held by the substrate holding unit 24 using the surface sensor 28. In the present embodiment, the surface sensor 28 detects the surface of the substrate P before the substrate P is disposed at a position facing the liquid immersion member 4. In the present embodiment, the surface sensor 28 detects the surface of the substrate P before the exposure of the substrate P is started.

  In the present embodiment, the surface sensor 28 detects the surface of the substrate P without passing through the liquid LQ (via the gas G). Note that the surface sensor 28 may detect the surface of the substrate P via the liquid LQ. The surface sensor 28 detects the surface of the substrate P at a plurality of positions (detection points) on the surface of the substrate P. The surface sensor 28 detects a position in the Z-axis direction at each of a plurality of positions on the surface of the substrate P. The detection result of the surface sensor 28 is output to the control device 8. The control device 8 acquires surface shape data of the substrate P based on the detection result of the surface sensor 28. For example, the control device 8 obtains the surface shape data of the substrate P by interpolating data obtained by detecting the position in the Z-axis direction at each of a plurality of positions on the surface of the substrate P. The surface shape data of the substrate P is stored, for example, in the storage device ME.

  Further, the control device 8 sets the control amount (expansion / contraction amount) of each of the plurality of first movable parts 71 of the deformation device 7 based on the acquired surface shape data of the substrate P before starting the exposure of the substrate P. To do. The control device 8 sets the control amount (expansion / contraction amount) of each of the plurality of first movable portions 71 such that the lower surface 4b of the liquid immersion member 4 is deformed according to the surface shape of the substrate P.

  A liquid immersion space LS is formed between the last optical element 22 and the liquid immersion member 4 and the substrate stage 2 (substrate P). For example, when the terminal optical element 22 and the liquid immersion member 4 and the substrate P face each other, the immersion space LS so that the optical path K of the exposure light EL between the terminal optical element 22 and the substrate P is filled with the liquid LQ. Is formed.

  In the control device 8 of this embodiment, the terminal optical element 22 and the liquid immersion member 4 and the substrate P face each other, and an immersion space LS is formed between the terminal optical element 22 and the liquid immersion member 4 and the substrate P. If necessary, the deformation device 7 is operated to deform the lower surface 4b of the liquid immersion member 4.

  In the present embodiment, the first displacement sensor 72 measures the displacement of the upper surface 4a of the liquid immersion member 4 when the lower surface 4b of the liquid immersion member 4 is deformed. The control device 8 according to the present embodiment calculates the deformation amount of the lower surface 4b of the liquid immersion member 4 based on the measurement result of the first displacement sensor 72. Based on the calculated deformation amount of the lower surface 4b of the liquid immersion member 4, the control device 8 of the present embodiment feedback-controls the deformation device 7 so that the deformation amount of the lower surface 4b of the liquid immersion member 4 approaches the target value. To do.

  The control device 8 starts exposure of the substrate P. The control device 8 emits the exposure light EL from the illumination system IL and illuminates the mask M with the exposure light EL. The exposure light EL irradiated to the mask M passes through the plurality of optical elements of the projection optical system PL and is emitted from the exit surface 23 of the terminal optical element 22. Accordingly, the substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS.

  The control device 8 exposes the substrate P while changing the relative positions of the terminal optical element 22 and the liquid immersion member 4 and the substrate P. In the state where the immersion space LS is formed between the terminal optical element 22 and the liquid immersion member 4 and the substrate P, the control device 8 has the substrate P (substrate stage) with respect to the terminal optical element 22 and the liquid immersion member 4. 2), the substrate P is exposed through the liquid LQ in the immersion space LS while moving in the XY plane.

  In the control device 8 of the present embodiment, the gap between the lower surface 4b of the liquid immersion member 4 and the surface of the substrate P is maintained in a target state (for example, a target dimension) in a state where the liquid immersion member 4 and the substrate P face each other. As described above, the deformation device 7 is controlled to deform the lower surface 4 b of the liquid immersion member 4. For example, the control device 8 controls the deformation device 7 so that the lower surface 4b is deformed following the surface shape of the substrate P.

  For example, the control device 8 of the present embodiment uses the surface shape data acquired by using the surface sensor 28 so that the maximum value of the gap in a plurality of portions between the lower surface 4b of the liquid immersion member 4 and the surface of the substrate P is reduced. Based on this, the control amount (expansion / contraction amount) of each of the plurality of first movable parts 71 is set, and the plurality of first movable parts 71 are controlled based on the control amount. Thereby, for example, the outflow of the liquid LQ from between the liquid immersion member 4 and the substrate P can be suppressed, and the liquid immersion space LS can be maintained in a desired state. Further, by reducing the maximum value of the gap, for example, the liquid LQ between the liquid immersion member 4 and the substrate P can be efficiently recovered. Thereby, generation | occurrence | production of exposure defect can be suppressed. The control device 8 may set the above expansion / contraction amount so that the minimum value of the gap in a plurality of portions between the lower surface 4b of the liquid immersion member 4 and the surface of the substrate P approaches the average value of the gap. The control device 8 may set the above-described expansion / contraction amount so that gaps at a plurality of portions between the lower surface 4b of the liquid immersion member 4 and the surface of the substrate P approach uniformly at the lower surface 4b.

  In the present embodiment, information regarding the relative positions of the terminal optical element 22 and the liquid immersion member 4 and the substrate P is measured by the interferometer system 3. In the present embodiment, the interferometer system 3 measures the position of the substrate P (substrate stage 2) that moves in the XY plane.

  The control device 8 deforms based on the information indicating the position of the substrate P measured by the interferometer system 3 and the surface shape data which is information indicating the detection result of the surface of the substrate P detected by the surface sensor 28. The apparatus 7 is controlled to deform the lower surface 4b of the liquid immersion member 4. During the movement of the substrate P, the control device 8 deforms the lower surface 4b so that the gap between the lower surface 4b of the liquid immersion member 4 and the surface of the substrate P is maintained in the target state. Thereby, even if the substrate P is moved in a state where the immersion space LS is formed between the terminal optical element 22 and the liquid immersion member 4 and the substrate P, for example, leakage of the liquid LQ can be suppressed.

  For example, when the substrate P moves in the + Y direction, the distance between the surface near the edge on the + Y side of the substrate P and the lower surface 4b is the distance between the surface near the edge on the −Y side of the substrate P and the lower surface 4b. The lower surface 4b may be deformed so as to be larger, or the lower surface 4b may be deformed so as to be smaller. Further, for example, the lower surface 4b may be deformed according to the moving upper surface (moving speed, acceleration, linear movement distance) of the substrate P.

  In the present embodiment, the substrate P moves in the XY plane with respect to the terminal optical element 22 and the liquid immersion member 4, but the terminal optical element 22 and the liquid immersion member 4 may move, for example. .

  In the present embodiment, the lower surface 4b of the liquid immersion member 4 is deformed according to the surface shape of the substrate P. However, for example, between the liquid immersion member 4 and the substrate stage 2 (cover member T). When the liquid immersion space LS is formed, the lower surface 4b of the liquid immersion member 4 may be deformed according to the surface shape of the cover member T.

  As described above, according to the present embodiment, since the deformation device 7 for deforming the lower surface 4b of the liquid immersion member 4 is provided, the liquid immersion member 4 and the object facing the lower surface 4b of the liquid immersion member 4 are provided. The immersion space LS can be favorably formed between the surface and the surface. Therefore, the occurrence of exposure failure can be suppressed, and the occurrence of defective devices can be suppressed.

  In the present embodiment, the lower surface 4b may be changed during the entire period in which the substrate P (object) is moved in the XY plane with respect to the last optical element 22 and the liquid immersion member 4, or one of the periods may be changed. In the portion, the lower surface 4b may be changed. Further, it is not necessary to change the lower surface 4b during the movement of the substrate P. In the present embodiment, the lower surface 4b may be deformed while moving an object such as the substrate P in the Z-axis direction, or the lower surface 4b is deformed while moving the liquid immersion member 4 in the Z-axis direction. Also good.

  In the present embodiment, the position of the substrate P is detected by detecting the position in the Z-axis direction at each of the plurality of positions on the surface of the substrate P using the surface sensor 28 and interpolating the data obtained by the detection. Although the surface shape data is acquired, the liquid immersion member 4 may be deformed based on this data without interpolating the data obtained by detecting at each of a plurality of positions on the surface of the substrate P. However, the liquid immersion member 4 may be deformed without using this data. The surface of the substrate P may be detected for only one place on the substrate P. The control device 8 may not acquire the surface shape data of the object, and may control the deformation device 7 based on, for example, data indicating a preset expansion / contraction amount. The control device 8 may control the deformation device 7 without using the detection result of the surface sensor 28.

  In the present embodiment, the surface sensor 28 is used to detect the surface of the substrate P before the lower surface 4b is deformed, but the substrate P is detected while detecting the surface of the substrate P with a predetermined surface sensor. And the lower surface 4b may be deformed during the exposure of the substrate P based on the detection result of the predetermined surface sensor. The predetermined surface sensor may detect the surface of the substrate P via the liquid LQ in the immersion space LS, or may detect the surface of the substrate P without passing through the liquid LQ.

  In the present embodiment, the deformation device 7 is feedback-controlled based on the measurement result of the first displacement sensor 72. However, the deformation device 7 is feed-forward controlled based on the measurement result of the first displacement sensor 72. May be. For example, when the deformation amount of the lower surface 4b is detected while the first substrate is deformed, and the second substrate different from the first substrate is exposed based on the detection result, the deformation amount of the lower surface 4b is the target. The deformation device 7 may be feedforward controlled so as to approach the value. The first substrate may be an exposure target substrate or a dummy substrate other than the exposure target. For example, when exposing a plurality of substrates in sequence, the amount of deformation of the lower surface 4b of the liquid immersion member 4 is detected while exposing the first substrate of the plurality of substrates, and this detection result is used to detect other than the first substrate. For one or more of the substrates, the deformation amount of the lower surface 4b of the liquid immersion member 4 may not be detected when the substrate is exposed.

  Moreover, you may use together said feedback control and feedforward control. For example, the deformation amount of the lower surface 4b is controlled with the first accuracy by one of the feedforward control and the feedforward control, and the deformation amount of the lower surface 4b is higher than the first accuracy by the other control. Control may be performed with the second accuracy. For example, the deformation amount of the lower surface 4b is controlled by the first frequency in one of the feedforward control and the feedforward control, and the deformation amount of the lower surface 4b is higher than the first frequency by the other control. You may control by a 2nd frequency.

  The control device 8 measures the displacement of the upper surface 4a of the liquid immersion member 4 with the first displacement sensor 72 in a state where the liquid immersion member 4 is deformed at the time of non-exposure, and controls the deformation device 7 at the time of exposure based on the measurement result. May be. The control device 8 may cause the storage device ME to store data indicating the above measurement results or data indicating the processing results obtained by performing various processes such as interpolation processing on the above measurement results. The control device 8 compares the control amount of the deformation device 7 with the measurement result measured by the first displacement sensor 72 as the displacement of the upper surface 4a of the liquid immersion member 4 corresponding to the control amount. A control amount correction amount may be obtained. The control device 8 may store the correction amount in the storage device ME. The control device 8 may control the deformation device 7 using the above correction amount when the liquid immersion member 4 is deformed. The control device 8 may control the deformation device 7 using the target value of the deformation amount of the lower surface 4b and the above correction amount instead of performing the measurement by the first displacement sensor 72. The control device 8 may control the deformation device 7 so as to correct the distortion of the liquid immersion member 4 when the deformation device 7 is not operated.

  Although the first movable part 71 of the present embodiment includes an electrostrictive element and expands and contracts in accordance with the supplied power, the upper end and the lower end are caused by the force supplied from the outside of the first movable part 71. You may change the space | interval. The force supplied to the first movable portion 71 from the outside may be one type of power, magnetic force, electrostatic force, pressure, force generated in a motor, or the like, or two or more types.

  In addition, although the 1st movable part 71 of this embodiment was arrange | positioned between the reaction plate 70 and the liquid immersion member 4, at least one part of the 1st movable part 71 is the 1st surface plate 13, for example. For example, the liquid immersion member 4 may be disposed between a member different from the reaction plate 70 and the liquid immersion member 4. That is, the 1st movable part 71 may be supported by the member different from the reaction plate 70, such as the 1st surface plate 13, for example. In this case, the reaction plate 70 can be omitted. The first movable portion 71 may be supported by both the reaction plate 70 and members other than the reaction plate 70.

  In addition, the reaction plate 70 of this embodiment may be included in the deformation | transformation apparatus 7, and may be included in an apparatus different from the deformation | transformation apparatus 7. FIG. The reaction plate 70 is a component that generates a force for operating the first movable portion 71, a component that transmits this force to the first movable portion 71, a component that drives the first movable portion 71, and an operation of the first movable portion 71. One or more various parts such as a part for controlling the above may be included. One or more of the various components described above may be disposed on the reaction plate 70.

  In the present embodiment, the liquid immersion member 4 may be provided with a recess so that the deformation amount of the liquid immersion member 4 due to the force that the first movable portion 71 acts on the liquid immersion member 4 increases. The liquid immersion member 4 may be provided with a recess so that the stress acting on the liquid immersion member 4 is locally increased by the above force. In the liquid immersion member 4, a recess may be provided between a plurality of connection positions connected to the first movable portion 71. The recess may extend in the radial direction with respect to the optical path K.

<First Modification>
Next, a first modification will be described. Constituent parts that are the same as or equivalent to those in the above-described embodiment are given the same reference numerals, and descriptions thereof are simplified or omitted.

FIG. 5 shows an exposure apparatus according to the first modification.
The exposure apparatus EX of the present modification includes a reaction plate 70 connected to the first support member 11. In this modification, the reaction plate 70 extends from the first support member 11 to the inside of the first support member 11 in the radial direction with respect to the optical path K. The exposure apparatus EX of this modification includes a plurality of reaction plates 70. The reaction plate 70 extends from each of a plurality of positions around the optical path K toward the optical path K. In this modification, the reaction plate 70 is a member different from the first support member 11. In this modification, the reaction plate 70 is bonded and fixed to the first support member 11.

  The number of reaction plates 70 may be one. The reaction plate 70 may include a beam member supported by the first support member 11 in at least one of the directions intersecting the optical axis AX. The reaction plate 70 may include a member surrounding the optical path K in an annular shape. The reaction plate 70 may be movable with respect to the first support member 11 in at least one of a direction parallel to the optical axis AX and a direction intersecting the optical axis AX. The reaction plate 70 may be the same member as the first support member 11. The reaction plate 70 is a member different from the first support member 11 and may be supported by the first support member 11 and the first surface plate 13. The reaction plate 70 is a part of the first support member 11 and may be supported by the first surface plate 13.

<Second Embodiment>
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  6A is a side view showing the liquid immersion member and the deformation device according to the second embodiment, FIG. 6B is a plan view of the support plate according to the second embodiment as viewed from below, and FIG. c) is the top view which looked at the reaction plate which concerns on 2nd Embodiment from the downward direction.

  The exposure apparatus EX of the present embodiment includes a reaction plate 70, a first movable part 71, a first displacement sensor 72, a third support member 73, a base member 74, an actuator 75, and a second displacement sensor 76. The exposure apparatus EX of the present embodiment can displace the reaction plate 70 in a predetermined direction. The exposure apparatus EX of the present embodiment can displace the reaction plate 70 by the operation of the actuator 75. The actuator 75 of this embodiment is supported by the base member 74. The second displacement sensor 76 of this embodiment can measure the displacement of the reaction plate 70 in a predetermined direction. In the present embodiment, the position of the reaction plate 70 in the predetermined direction is controlled based on the measurement result of the second displacement sensor 76.

  The reaction plate 70 of the present embodiment is suspended from the first surface plate 13 via a base member 74 and an actuator 75. The base member 74 of this embodiment is arranged so that at least a part thereof faces the reaction plate 70. The base member 74 of the present embodiment has an upper surface 74 a that faces the first surface plate 13 and a lower surface 74 b that faces the reaction plate 70. The base member 74 of the present embodiment is fixed to the lower surface of the first surface plate 13 on the upper surface 74a side.

  The base member 74 may be supported by the first support member 11 in the same manner as the reaction plate of the first modification. The base member 74 is a member different from the first support member 11 and may be supported by the first support member 11 and the first surface plate 13. The base member 74 may be a part of the first support member 11. The base member 74 is a part of the first support member 11 and may be supported by the first surface plate 13.

  The base member 74 of the present embodiment is fixed at a relative position with respect to the projection system PL at least part of the exposure. The base member 74 may have a variable relative position with respect to the projection system PL. The base member 74 of this embodiment is an annular member. The base member 74 of the present embodiment is a plate-like member. Note that the base member 74 may not be annular or plate-shaped. The base member 74 of this embodiment surrounds the projection system PL in an annular shape around the optical axis AX. A plurality of base members 74 may be discretely arranged around the projection system PL around the optical axis AX. The base member 74 may not surround the projection system PL.

  The actuator 75 of this embodiment extends downward from the lower surface 74 b of the base member 74 toward the reaction plate 70. The lower end side of the actuator 75 of this embodiment is connected to the reaction plate 70.

  The actuator 75 of this embodiment includes an electrostrictive element. The actuator 75 according to the present embodiment expands and contracts in a direction connecting the upper end and the lower end according to the supplied electric power. The control device 8 of the present embodiment can control the expansion / contraction amount of the actuator 75. The actuator 75 may be capable of changing the distance between the upper end and the lower end by a force supplied from the outside of the actuator 75. The force supplied to the actuator 75 from the outside may be one kind of power, magnetic force, electrostatic force, pressure, force generated in a motor or the like, or two or more kinds.

  The actuator 75 may be different from the first movable portion 71 in at least one of stroke and responsiveness. Said stroke is good also as a maximum value of the variation | change_quantity of the length accompanying expansion / contraction. Said responsiveness is good also as the maximum frequency which can switch operation | movement. The actuator 75 may have a longer stroke than the first movable portion 71, may be the same, or may be shorter. The first movable portion 71 may be more responsive than the actuator 75, may be the same, or may be lower. The actuator 75 may adjust the position of the liquid immersion member 4 by adjusting the position of the reaction plate 70. Both the actuator 75 and the first movable portion 71 may adjust the position of the liquid immersion member 4. One of the actuator 75 and the first movable portion 71 adjusts the position of the liquid immersion member 4 with a first accuracy, and the other adjusts the position of the liquid immersion member 4 with a second accuracy higher than the first accuracy. May be adjusted.

  The exposure apparatus EX of the present embodiment includes a plurality of actuators 75. In the present embodiment, the plurality of actuators 75 are discretely arranged around the optical path K. In the present embodiment, each of the plurality of actuators 75 is connected to the lower surface 74b of the base member 74 on the upper end side, and is connected to the upper surface 70a of the reaction plate 70 on the lower end side. The plurality of actuators 75 are different from each other in connection positions with the reaction plate 70 on the upper surface 70 a of the reaction plate 70. In the present embodiment, the amount of expansion / contraction of the plurality of actuators 75 can be controlled for each actuator 75. The control device 8 of the present embodiment can control the amount of expansion / contraction of the plurality of actuators 75 for each actuator 75. The control device 8 may be capable of controlling the amount of expansion / contraction of the actuator 75 for each group including two or more actuators 75.

  In the present embodiment, three actuators 75 are arranged around the optical path K at equal intervals. The exposure apparatus EX of the present embodiment can move the reaction plate 70 in a direction parallel to the optical axis AX and a rotational direction around an axis that intersects the optical axis AX. In the present embodiment, the amount of expansion / contraction of the plurality of actuators 75 can be controlled so that the reaction plate 70 moves in at least one of the Z direction, the θX direction, and the θY direction.

  The number of actuators 75 may be one, two, or four or more. The actuator 75 may deform the reaction plate 70. The amount of expansion / contraction of the plurality of actuators 75 may be controllable for each group including two or more actuators 75. The actuator 75 may be included in the deformation device 7 or may be included in a device different from the deformation device 7. A part in which at least one of the reaction plate 70 and the base member 74 generates a force for operating the actuator 75, a part for transmitting this force to the actuator 75, a part for driving the actuator 75, a part for controlling the operation of the actuator 75, etc. One or more of these various parts may be included. One or more of the above-described various components may be disposed on at least one of the reaction plate 70 and the base member 74.

  The second displacement sensor 76 of this embodiment can measure the displacement of the reaction plate 70 in a predetermined direction. The predetermined direction may be a direction parallel to the optical axis AX or a direction intersecting the optical axis AX. The second displacement sensor 76 of this embodiment can measure a local displacement of the liquid immersion member 4 in a direction parallel to the optical axis AX. The second displacement sensor 76 of the present embodiment is disposed at a position where the displacement in the vicinity of the connection position between the actuator 75 and the reaction plate 70 can be measured. The second displacement sensor 76 of this embodiment is disposed on the lower surface 74 b of the base member 74. The second displacement sensor 76 of this embodiment is disposed in the vicinity of the actuator 75.

  The second displacement sensor 76 of this embodiment can optically measure a change in the distance to the measurement object. The second displacement sensor 76 may be capable of measuring a change in capacitance with the measurement object. The second displacement sensor 76 may be disposed on a member other than the base member 74, for example, the reaction plate 70 or the liquid immersion member 4. When the second displacement sensor 76 is disposed on a member other than the reaction plate 70, another member is disposed between the reaction plate 70 and the second displacement sensor 76, and the second displacement sensor 76 is disposed on the other side. The displacement of the reaction plate 70 may be measured through these members. For example, the second displacement sensor 76 may measure the displacement of the reaction plate 70 using light that passes through the other member.

  The exposure apparatus EX of the present embodiment includes a plurality of second displacement sensors 76. The second displacement sensor 76 of this embodiment is provided in a one-to-one correspondence with the actuator 75. The plurality of second displacement sensors 76 of the present embodiment are each disposed in the vicinity of the corresponding actuator 75. The plurality of second displacement sensors 76 of this embodiment measure the displacement of the liquid immersion member 4 in the vicinity of the connection position between the corresponding actuator 75 and the reaction plate 70. In the present embodiment, the position of the reaction plate 70 in each of a plurality of directions can be measured based on the measurement results of the plurality of second displacement sensors 76. In the present embodiment, the position of the reaction plate 70 in each of the Z direction, the θX direction, and the θY direction can be measured.

  Note that one or more second displacement sensors 76 may correspond to two or more actuators 75 for one or more of the plurality of second displacement sensors 76. For one or more of the plurality of actuators 75, one actuator 75 may correspond to two or more second displacement sensors 76. The plurality of second displacement sensors 76 may include two or more types of sensors having different measurement principles, such as optical sensors, electrostatic capacitance sensors, and strain gauges. The second displacement sensor 76 may have the same measurement principle as the first displacement sensor 72 or may be different. The plurality of second displacement sensors 76 may be divided into two or more of the reaction play 70, the liquid immersion member 4, and the object. The control device 8 of this embodiment acquires the measurement result of the second displacement sensor 76 and controls the actuator 75 based on the measurement result of the second displacement sensor 76.

  The liquid immersion member 4 of the present embodiment is suspended from the reaction plate 70 via the first movable portion 71 and the third support member 73. The first movable portion 71 and the third support member 73 of the present embodiment extend downward from the lower surface 70b of the reaction plate 70 toward the liquid immersion member 4, respectively. The first movable portion 71 and the third support member 73 of this embodiment are connected to the reaction plate 70 on the upper end side. The first movable portion 71 and the third support member 73 of the present embodiment are connected to the liquid immersion member 4 on the lower end side.

  The third support member 73 of this embodiment supports the liquid immersion member 4. The third support member 73 of the present embodiment supports the liquid immersion member 4 so that the distance from the connection position with the reaction plate 70 to the connection position with the liquid immersion member 4 is not substantially changed. The exposure apparatus EX of the present embodiment includes a plurality of third support members 73. In the present embodiment, the plurality of third support members 73 are discretely arranged around the optical path K. In the present embodiment, the plurality of third support members 73 are arranged around the optical path K at equal intervals. In the present embodiment, the third support members 73 are the same in number as the actuators 75 and correspond to the actuators 75 on a one-to-one basis. In the present embodiment, the third support member 73 has the same rotational position around the optical axis AX as the corresponding actuator 75.

  Note that the third support member 73 may be extendable. The number of the third support members 73 may be one, two, four or more, and may be the same as or different from the actuator 75. The intervals between the plurality of third support members 73 may not be equal. One or more of the third support members 73 may be disposed at a rotational position corresponding to the space between the plurality of actuators 75 around the optical axis AX.

  The control device 8 may change the position of at least a part of the reaction plate 70 in a direction intersecting the direction parallel to the optical axis AX, or parallel to the direction parallel to the optical axis AX and the optical axis AX. You may change to the direction which crosses any direction. The control device 8 may translate (displace) the reaction plate 70 in a predetermined direction, rotate (displace) it, or translate and rotate it. Further, the control device 8 may be displaced for each portion of the reaction plate 70, and the reaction plate 70 may be deformed by changing at least one of the displacement amount and the displacement direction for each portion of the reaction plate 70. When the liquid immersion member 4 is connected to the reaction plate 70 at a plurality of positions, the plurality of connection positions supported by the liquid immersion member 4 on the reaction plate 70 are displaced by different amounts in a predetermined direction. The control device 8 may deform the reaction plate 70.

<Third Embodiment>
A third embodiment will be described. FIG. 7A is a plan view of the liquid immersion member and the deformation device according to the third embodiment as viewed from above, and FIG. 7B is a cross-sectional view corresponding to the line BB ′ of FIG. It is.

  The exposure apparatus EX of the present embodiment includes a liquid immersion member 4 and a deformation apparatus 7. The liquid immersion member 4 of the present embodiment has an opening 4c that is disposed around the optical path K of the exposure light irradiated to the object. The opening 4c of the present embodiment includes an opening at the lower end of a hole connecting the upper surface 4a and the lower surface 4b. In the present embodiment, the lower surface 4b is disposed around the opening 4c. The liquid immersion member 4 of the present embodiment can form the liquid immersion space LS so that at least a part of the optical path K of the exposure light EL is filled with the liquid LQ. In the present embodiment, the liquid LQ can be supplied inside the opening 4c. The liquid immersion member 4 of the present embodiment has a supply port 33 capable of supplying the liquid LQ inside the opening 4c. Note that a supply port provided separately from the liquid immersion member 4 may be capable of supplying the liquid LQ between the liquid immersion member 4 and an object disposed opposite to the liquid immersion member 4. In this case, the supply port 33 can be omitted.

  In the present embodiment, the exit surface 23 of the last optical element 22 can be disposed substantially flush with at least a part of the lower surface 4b. In the present embodiment, the emission surface 23 can be disposed substantially flush with the lower surface 4 b between the opening 4 c and the porous member 39. At least a part of the emission surface 23 may be disposed below the lower surface 4b, or may be disposed above the lower surface 4b.

  The deformation device 7 of the present embodiment can cause the liquid immersion member 4 to be acted on in a direction that intersects the direction parallel to the optical axis AX. The deformation device 7 of this embodiment includes a second movable part 77. The second movable portion 77 of the present embodiment can generate a force including at least a component in a direction that intersects a direction parallel to the optical axis AX. The second movable portion 77 may generate a force including a component in a direction parallel to the optical axis AX and a component in a direction crossing the direction parallel to the optical axis AX. The second movable portion 77 of the present embodiment extends in a direction that intersects the direction parallel to the optical axis AX. The second movable portion 77 of the present embodiment is connected to two or more locations of the liquid immersion member 4.

  The second movable portion 77 of the present embodiment can change the distance from the first connection position on the liquid immersion member 4 to the second connection position on the liquid immersion member 4. In the second movable portion 77 of the present embodiment, the relative position between the first connection position on one end side in the extending direction and the second connection position different from the first connection position is parallel to the optical axis AX. It is possible to change in a direction that intersects with any direction. In the present embodiment, a force acts on the liquid immersion member 4 with the operation of the second movable portion 77.

  The second movable part 77 is connected to one part of the liquid immersion member 4 and the liquid immersion member so that a force can be applied to the liquid immersion member 4 by the operation of the second movable part 77. It may be supported by a member other than 4. The second movable portion 77 may be directly connected in contact with the liquid immersion member 4 or may be indirectly connected to the liquid immersion member 4 via another member.

  The second movable portion 77 of this embodiment includes an electrostrictive element. The second movable portion 77 of the present embodiment expands and contracts in a direction connecting one end side thereof and an end side different from the one end in accordance with the supplied electric power. The control device 8 of this embodiment can control the amount of expansion / contraction of the second movable portion 77. The second movable portion 77 may be capable of changing the distance between one end and an end side different from the one end by a force supplied from the outside of the second movable portion 77. The force supplied from the outside to the second movable portion 77 may be one type of power, magnetic force, electrostatic force, pressure, force generated in a motor, or the like, or two or more types.

  The deformation device 7 of the present embodiment can apply a force to the liquid immersion member 4 at a plurality of positions. A plurality of second movable parts 77 are included. Each of the plurality of second movable portions 77 can apply a force to the liquid immersion member 4 at a connection position with the liquid immersion member 4. In the present embodiment, the plurality of second movable parts 77 are discretely arranged around the optical path K. In the present embodiment, twelve second movable parts 77 are arranged around the optical path K at equal intervals. In addition, the number of the 2nd movable parts 77 may be one, and may be two or more. The interval between the plurality of second movable parts 77 may not be equal.

  The deformation device 7 of the present embodiment can vary at least one of the direction and magnitude of the force acting on the liquid immersion member 4 at a plurality of positions. The deformation device 7 according to the present embodiment is configured so that the amount of expansion / contraction of the second movable portion 77 is set so that at least one of the direction and magnitude of the force acting on the liquid immersion member 4 is different at a plurality of positions. Can be different. In addition, the deformation | transformation apparatus 7 does not need to expand / contract 1 or more of several 2nd movable parts 77. FIG.

  The control device 8 of this embodiment can control the amount of expansion / contraction of the plurality of second movable parts 77 for each second movable part 77. That is, the control device 8 of the present embodiment can control the amount of deformation at each position on the lower surface 4 b of the liquid immersion member 4. The control device 8 may be capable of controlling the amount of expansion / contraction of the first movable portion 71 for each group including two or more second movable portions 77.

  The exposure apparatus EX of the present embodiment may include a displacement sensor that can measure the displacement of the liquid immersion member 4 in a predetermined direction. This displacement sensor may be the first displacement sensor 72 described in the above embodiment, or may be a displacement sensor different from the first displacement sensor 72. The control device 8 may control the plurality of second movable parts 77 based on a measurement result of a displacement sensor that can measure the displacement of the liquid immersion member 4 in a predetermined direction.

  By the way, when the liquid immersion member 4 is connected to one second movable portion 77 at the first connection position and the second connection position on the liquid immersion member 4, the liquid immersion member 4 is The force is received from the second movable portion 77 at each of the first connection position and the second connection position.

  The liquid immersion member 4 according to the present embodiment has a concave portion 80 and a concave portion 81 between locations where force is received from the second movable portion 77. One of the recess 80 and the recess 81 is provided, and the other may not be provided. In the present embodiment, the plurality of recesses 81 are discretely arranged around the optical path K. The second movable portion 77 of this embodiment is disposed inside the recess 81. One or more of the plurality of second movable portions 77 may be disposed outside the recess 81.

  The concave portion 80 of the present embodiment is provided along an imaginary line that passes through at least a part of the second movable portion 77 and extends in the radial direction with respect to the optical path K. The concave portion 80 of the present embodiment is provided in a one-to-one correspondence with the second movable portion 77. The recessed part 80 of this embodiment is connected with the recessed part 81 in which the corresponding 2nd movable part 77 is arrange | positioned.

  The recess 80 is provided along an imaginary line passing between the first second movable part 77 and the second second movable part 77 adjacent to the first second movable part 77. Also good. At least a part of the recess 80 may extend in the circumferential direction around the optical axis AX. One or more of the recesses 80 may communicate with the recesses 81 other than the recess 81 where the corresponding second movable portion 77 is disposed, or may not communicate with the recess 81. The recess 80 may not be provided for one or more of the plurality of second movable portions 77.

  In the present embodiment, the flow path member 37 described in the above embodiment is provided. In the present embodiment, the fluid recovered from the recovery port 34 of the liquid immersion member 4 flows through the flow path member 37. In the present embodiment, the fluid recovered from the recovery port 34 includes at least a part of the liquid LQ between the liquid immersion member 4 and the substrate P. The recovery port 34 of the present embodiment can recover at least a part of the gas G between the liquid immersion member 4 and the substrate P together with the liquid LQ between the liquid immersion member 4 and the substrate P.

  The flow path member 37 of the present embodiment has a first end connected to the discharge portion 36 and a second end different from the first end. In the present embodiment, the second end of the flow path member 37 is connected to a suction device capable of sucking fluid. The suction device may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX. The suction device may include a decompression unit such as a vacuum pump.

  The exposure apparatus EX of the present embodiment includes a first connection member 83 connected to the flow path member 37. The first connection member 83 includes an attenuation portion 84 that can attenuate vibration. The attenuation unit 84 of the present embodiment can attenuate the vibration of the flow path member 37. The attenuation portion 84 of the present embodiment is disposed between one end of the first connection member 83 and an end different from the one end. The first connection member 83 of the present embodiment is connected to the reaction plate 70 on one end side, and is connected to the flow path member 37 on an end side different from the one end. The first connection member 83 of the present embodiment supports the flow path member 37. One end side of the first connection member 83 may be connected to one or more of the reaction plate 70, the base member 74, the first surface plate 13, and other members. The first connecting member 83 may not support the flow path member 37.

FIG. 8A to FIG. 8C are diagrams illustrating examples of the attenuation unit.
8A includes a main body portion 85, a first attachment portion 86, a second attachment portion 87, a vibrator 88, a sealing film 89, and a viscous body 90. The attenuation portion 84A of the first example illustrated in FIG. One of the first attachment portion 86 and the second attachment portion 87 is connected to a vibration source that may generate vibration, for example, and the other is connected to a support that can support the attenuation portion 84A, for example. The first attachment portion 86 is connected to the flow path member 37, for example, and the second attachment portion 87 is connected to the reaction plate 70, for example. The main body portion 85 is supported by the support via the second attachment portion 87. The main body 85 houses the vibrator 88. The vibrator 88 includes a shaft portion 88a and a resistance portion 88b protruding in a direction crossing the axial direction of the shaft portion 88a. The vibrator 88 is connected to a first attachment portion 86 disposed outside the main body portion 85. A viscous body 90 is filled between the inner wall of the main body 85 and the vibrator 88. The viscous body 90 of this example includes one or more of gas, liquid, sol, and gel. The viscous body 90 may include a solid. The viscous body 90 may contain one or more of water, rubber, and grease. The sealing film 89 seals the viscous body 90 inside the main body portion 85. The sealing film 89 may have enough elasticity to be deformable by vibration transmitted to the attenuation portion 84A. In the damping portion 84A of this example, when vibration is transmitted from the first mounting portion 86, the vibrator 88 moves. The movement of the vibrator 88 is hindered by the viscosity of the viscous body 90, and the vibration transmitted from the first mounting portion 86 is attenuated.

  A second example attenuation portion 84B shown in FIG. 8B includes a main body portion 91, a first attachment portion 86, a second attachment portion 87, a moving element 92, a first contact body 93, a second contact body 94, and an attachment. A force portion 95 is included. The mover 92 is fixed to the first attachment portion 86. A part of the mover 92 is disposed inside the main body 91. The mover 92 is a plate member whose surface layer includes, for example, polytetrafluoroethylene (PTFE) or diamond-like carbon (DLC). The first contact body 93 and the second contact body 94 sandwich the portion of the mover 92 disposed inside the main body 91, and the first contact body 93 attached to the main body 91 is the mover 92. The second contact body 94 is in contact with one side, and the second contact body 94 is in contact with the other side of the moving element 92. The first contact body 93 is urged toward the second contact body 94 by the urging unit 95. The urging portion 95 includes, for example, a leaf spring and a fixture for attaching the leaf spring to the main body portion 91. The second contact body 94 is fixed to the main body portion 91. In the damping part 84B of the present example, when vibration is transmitted from the first mounting part 86, the mover 92 moves. Due to the frictional force between the moving element 92 and the first contact body 93 and the frictional force between the moving element 92 and the second contact body 94, the movement of the vibrator 88 is hindered and transmitted from the first mounting portion 86. Vibration is attenuated.

  The attenuation part 84C of the third example shown in FIG. 8C includes a main body part 96, a first attachment part 86, a second attachment part 87, a magnetic body 97, an attachment tool 98, and a magnet array 99. The main body portion 96 is supported by the second attachment portion 87. The magnetic body 97 has, for example, a plate shape, and a part thereof is disposed inside the main body portion 96. The magnetic body 97 extends in a direction intersecting with the direction from the main body portion 96 toward the second attachment portion 87. The magnetic body 97 is attached to the first attachment portion 86 by the attachment tool 98 outside the main body portion 96. The magnetic body 97 is supported by the first mounting portion 86. The magnet array 99 is arranged so as to sandwich the magnetic body 97 inside the main body 96. The magnet array 99 is arranged away from the magnetic body 97. In the magnet array 99, the direction of the magnetic force is repeatedly reversed in the extending direction of the magnetic body 97, and the direction of the magnetic force is aligned in the direction sandwiching the magnetic body 97. It is fixed to the main body 91. In the damping part 84C of this example, when vibration is transmitted from the first mounting part 86, the magnetic body 97 moves. The magnetic force between the magnetic body 97 and the magnet array 99 prevents the movement of the magnetic body 97, and the vibration transmitted from the first mounting portion 86 is attenuated.

  The attenuation unit 84 of the present embodiment can attenuate vibration transmitted from the flow path member 37 by using one or more of viscous force, frictional force, magnetic force, electrostatic force, and pressure. The attenuation unit 84 may include one type of the attenuation unit 84A, the attenuation unit 84B, and the attenuation unit 84C, or may include two or more types. The attenuating unit 84 can attenuate one of a component that vibrates in a direction parallel to the optical axis AX and a component that vibrates in a direction that intersects the direction parallel to the optical axis AX. However, both may be attenuated.

  Returning to the description of FIG. 7, the liquid immersion member 4 of the present embodiment has a protruding portion 82 protruding from the liquid immersion member 4 in the radial direction with respect to the optical path K. The protruding portion 82 of the present embodiment has an upper surface 82 a that faces in a direction different from the lower surface 4 b of the liquid immersion member 4. The upper surface 82a of the protruding portion 82 of the present embodiment has a step with at least a part of the upper surface 4a of the liquid immersion member 4. In the present embodiment, the upper surface 82 a of the protruding portion 82 is disposed below at least a part of the upper surface 4 a of the liquid immersion member 4. The upper surface 82 a of the protrusion 82 may be flush with the upper surface 4 a of the liquid immersion member 4, or may be disposed above at least a part of the upper surface 4 a of the liquid immersion member 4. The liquid immersion member 4 of the present embodiment has a plurality of protrusions 82. The protrusions 82 of the present embodiment are arranged at equal intervals around the optical path K. In addition, the number of the protrusions 82 may be one, and the intervals between the plurality of protrusions 82 may not be equal.

  The exposure apparatus EX of the present embodiment includes a third support member 73 that supports the liquid immersion member 4. The third support member 73 of the present embodiment is connected to the upper surface 82a of the protruding portion 82. The third support member 73 may be connected to the upper surface 4 a of the liquid immersion member 4 other than the upper surface 82 a of the protruding portion 82. In this case, the protrusion 82 can be omitted.

  The exposure apparatus EX of the present embodiment includes a second connection member 100 connected to the liquid immersion member 4. The second connection member 100 of this embodiment is connected to the upper surface 4 a of the liquid immersion member 4. The second connection member 100 of the present embodiment includes a damping part 101 that can attenuate vibration. The attenuation unit 101 of the present embodiment can attenuate the vibration of the liquid immersion member 4. The attenuation part 101 of this embodiment is disposed between one end of the second connection member 100 and an end different from the one end. The attenuation part 101 may have the same structure as the attenuation part 84 of the first connection member 83 or may have a different structure.

  The second connection member 100 of the present embodiment is connected to the lower surface 70b of the reaction plate 70 at one end side, and is connected to the liquid immersion member 4 at an end side different from the one end. One end side of the second connection member 100 may be connected to one or more of the reaction plate 70, the base member 74, the first surface plate 13, and other members.

  The second connecting member 100 may support the liquid immersion member 4, and the third support member 73 may not support the liquid immersion member 4. The third support member 73 may include an attenuation part, and the second connection member 100 may not include the attenuation part 101. At least one of the third support member 73 and the second connection member 100 may not be provided. When the third support member 73 is not provided, the projecting portion 82 can be omitted.

  Further, a movable part capable of applying a force including a component in a direction parallel to the optical axis AX to the liquid immersion member 4 may be connected. The movable portion may be the first movable portion 71 described above, or may be different from the first movable portion 71. The first movable portion 71 may be connected to the protruding portion 82 or may be connected to the liquid immersion member 4 in a portion excluding the protruding portion 82. The first movable portion 71 may be disposed instead of one or more of the third support members 73. The first movable portion 71 and the third support member 73 may be connected to the liquid immersion member 4.

  The exposure apparatus EX of the present embodiment includes a third connection member 102 connected to the reaction plate 70. The third connection member 102 of the present embodiment includes a damping portion 103 that can dampen vibration. The damping unit 103 of the present embodiment can attenuate the vibration of the reaction plate 70. The attenuation part 103 of the present embodiment is disposed between one end and the other end of the second connection member 100. The attenuation part 103 may have the same structure as the attenuation part 84 of the first connection member 83 or may have a different structure. The attenuation unit 103 may have the same structure as the attenuation unit 101 of the second connection member 100 or may have a different structure.

  The third connection member 102 of the present embodiment is connected to the lower surface of the first surface plate 13 on one end side, and is connected to the upper surface 70a of the reaction plate 70 at an end different from the one end. One end side of the third connection member 102 may be connected to a member other than the first surface plate 13. The third connecting member 102 may support the reaction plate 70 or may not support it. The third connection member 102 may not include the attenuation unit 103. In this case, the third connection member 102 can be omitted.

<Fourth embodiment>
A fourth embodiment will be described. FIGS. 9A and 9B are side sectional views showing an exposure apparatus according to the fourth embodiment. FIG. 9A shows the exposure apparatus before the displacement of the member, and FIG. 9B shows the exposure apparatus after the displacement of the member.

  The exposure apparatus EX of the present embodiment includes a second member 150, a third member 151, a first displacement device 152, and a second displacement device 153. The second member 150 of this embodiment is disposed at least at a part around the optical axis AX of the optical system including the terminal optical element 22. The second member 150 of the present embodiment can form an immersion space between the second member 150 and an object that is disposed to face the exit surface 23 of the last optical element 22. The third member 151 of this embodiment supports the second member 150. The terminal optical element 22 may be included in the projection system PL described in the above embodiment, or may be included in an optical system different from the projection system PL.

  The first displacement device 152 of the present embodiment can displace the second member 150 with respect to the third member 151. The first displacement device 152 of the present embodiment changes the relative position between the second member 150 and the third member 151 in at least one of a direction parallel to the optical axis AX and a direction intersecting the direction parallel to the optical axis AX. Can be made. The second displacement device 153 of the present embodiment can displace the third member 151 with respect to the last optical element 22. The second displacement device 153 of the present embodiment changes the relative position between the third member 151 and the last optical element 22 in at least one of a direction parallel to the optical axis AX and a direction crossing the direction parallel to the optical axis AX. Can be made.

  In the present embodiment, the first displacement device 152 and the second displacement device 153 are controlled by the control device 8 described in the above embodiment. At least one of the first displacement device 152 and the second displacement device 153 may be controllable by a control unit different from the control device 8. This control unit may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX.

  The second member 150 of the present embodiment surrounds the optical axis AX in an annular shape. The second member 150 may be discretely arranged around the terminal optical element 22 or may not be arranged at least at a part around the optical axis AX. The second member 150 of the present embodiment includes a main body 154 disposed around the optical axis AX and an outer edge 155 disposed outside the main body 154 with respect to the radial direction with respect to the optical path K. The main body portion 154 of the present embodiment protrudes from the outer edge portion 155 downward. The second member 150 of the present embodiment is connected to the third member 151 at the outer edge portion 155. The second member 150 of this embodiment is connected to the third member 151 via the first displacement device 152. The outer edge portion 155 of this embodiment is connected to the first displacement device 152.

  The second member 150 of the present embodiment has a lower surface 150b that faces the object irradiated with the exposure light EL, and an upper surface 150a that faces a direction different from the lower surface 150b. The second member 150 of the present embodiment has an opening 156 disposed around the optical axis AX. The opening 156 of the present embodiment includes a hole that connects the upper surface 150a and the lower surface 150b. In the present embodiment, the exposure light EL can irradiate an object that faces the second member 150 through the inside of the opening 156. In the present embodiment, the exit surface 23 of the last optical element 22 is disposed above the lower end of the opening 156. The exit surface 23 may be flush with the lower end of the opening 156, or at least a part of the exit surface 23 may be disposed below the lower end of the opening 156.

  The second member 150 of the present embodiment includes a supply port 157 that supplies the liquid LQ and a recovery port 158 that recovers the liquid LQ. The supply port 157 of this embodiment can supply the liquid LQ inside the opening 156. The supply port 157 of the present embodiment is disposed inside the opening 156. The supply port 157 of the present embodiment is connected to a supply flow path provided inside the second member 150. The supply port 157 of this embodiment includes an opening at one end of the supply flow path. The liquid supply device of this embodiment is connected to a liquid supply device (not shown) at an end different from the supply port 157. The liquid supply device supplies clean and temperature-adjusted liquid LQ via the supply flow channel. Supply to the supply port 157 is possible.

  The recovery port 158 of this embodiment can recover at least a part of the liquid LQ between the object facing the second member 150 and the second member 150. The recovery port 158 of this embodiment is disposed on the lower surface 150 b of the second member 150.

  The recovery port 158 may be capable of recovering gas together with the liquid LQ from the space between the object facing the second member 150 and the second member 150. The second member 150 may be the liquid immersion member 4 described in the above embodiment, or may be a member different from the liquid immersion member 4. The second member 150 may not have at least one of the supply port 157 and the recovery port 158. A member different from the second member 150 may be able to supply the liquid LQ between the terminal optical element 22 and the substrate P, or may be able to recover the liquid LQ from between the terminal optical element 22 and the substrate P. Said another member may be contained in the exposure apparatus EX, and may be contained in the apparatus outside the exposure apparatus EX.

  In the present embodiment, at least a part of the third member 151 is disposed outside the second member 150 with respect to the radiation direction with respect to the optical path K. In the present embodiment, a plurality of third members 151 are discretely arranged around the second member 150. In the present embodiment, the two second members 150 are arranged symmetrically with respect to the optical axis AX. Note that the number of the third members 151 may be one, or may be three or more. The plurality of second members 150 may be disposed asymmetrically with respect to the optical axis AX.

  The third member 151 of the present embodiment includes a first portion 159 and a second portion 160. The third member 151 of this embodiment is an L-shaped beam member. The first portion 159 of the present embodiment extends in the radial direction with respect to the optical path K. The second portion 160 of the present embodiment is continuous with the first portion 159, bends upward from the first portion 159, and extends upward. The third member 151 of this embodiment is connected to the first displacement device 152 at least at a part of the first portion 159. The third member 151 of the present embodiment is connectable to the second displacement device 153 at least at a part of the second portion 160. Note that at least one of the first portion 159 and the second portion 160 may include at least one of a linearly extending portion and a curvedly extending portion. The third member 151 may not be an L-shaped member, and may be, for example, an arbitrary-shaped beam-shaped member or an arbitrary-shaped plate-shaped member.

  The first portion 159 of the present embodiment has a connection portion 161 that is connected to the first displacement device 152. In the present embodiment, the outer edge portion 155 connected to the first displacement device 152 in the second member 150 is disposed above the connection portion 161 connected to the first displacement device 152 in the third member 151. In the present embodiment, as shown in FIG. 9A, the lower surface 150b of the second member 150 and the surface of the third member 151 that faces the substrate P (hereinafter referred to as the lower surface) can be flush with each other. Note that at least part of the lower surface of the third member 151 may be disposed below or above the lower surface 150b of the second member 150.

  The third member 151 of the present embodiment is supported so as to be rotatable around an axis that intersects the optical axis AX. The third member 151 may be supported so as to be rotatable around an axis parallel to the optical axis AX. The third member 151 may be movably supported in at least one of a direction parallel to the optical axis AX and a direction intersecting the direction parallel to the optical axis AX.

  The third member 151 of this embodiment is supported by the base member 162. The relative position of the base member 162 of this embodiment with respect to the last optical element 22 is fixed. In the present embodiment, the base member 162 is fixed to the first surface plate 13 shown in FIG. The relative position of the base member 162 with respect to the terminal optical element 22 may be variable. The base member 162 may be connected to a member different from the first surface plate 13.

  The base member 162 of this embodiment is disposed above at least a part of the third member 151. In the present embodiment, the fifth support member 163 extends from the base member 162 toward the third member 151. The fifth support member 163 is supported by the base member 162. In the present embodiment, the first portion 159 of the third member 151 is supported by the fifth support member 163. The third member 151 of the present embodiment is supported by a fulcrum 163a so as to be rotatable around an axis parallel to a plane orthogonal to the optical axis AX.

  The first displacement device 152 of the present embodiment includes a third movable part 164. In the present embodiment, the control device 8 can control the third movable portion 164. A part of the third movable part 164 of the present embodiment is connected to the outer edge part 155 of the second member 150, and the other part is connected to the connection part 161 of the third member 151. The third movable portion 164 of the present embodiment can change the relative position between the portion connected to the second member 150 and the portion connected to the third member 151. The first displacement device 152 of the present embodiment can displace the second member 150 relative to the third member 151 by the operation of the third movable portion 164. The third movable portion 164 may include one type of a voice coil motor (VCM), an electromagnet, and a piezoelectric element, or may include two or more types. The number of the third movable parts 164 may be one or plural.

  The exposure apparatus EX of the present embodiment includes a fourth support member 165 that supports the second member 150 with an urging force that cancels at least part of the weight of the second member 150. The fourth support member 165 of this embodiment is disposed below the outer edge portion 155 of the second member 150 and above the first portion 159 of the third member 151. The fourth support member 165 of this embodiment is connected to the outer edge portion 155 of the second member 150 on one end side, and is connected to the first portion 159 of the third member 151 on an end side different from the one end. The fourth support member 165 of this embodiment includes an elastic member such as rubber or a spring. The fourth support member 165 of this embodiment is elastically deformed by the weight of the second member 150 and cancels at least a part of the weight of the second member 150 by the elastic repulsion force.

  Note that the first displacement device 152 may support at least a part of the weight of the second member 150. The first displacement device 152 may support the entire weight of the second member 150, and in this case, the fourth support member 165 can be omitted. Further, the base member 162 may support at least a part of the weight of the second member 150. A support member that supports the second member 150 with an urging force that cancels at least part of the weight of the second member 150 may be supported by the base member 162. This support member may be provided instead of the fourth support member 165, or may be provided together with the fourth support member 165. This support member may have the same structure as the fourth support member 165 or a different structure.

  The second displacement device 153 of the present embodiment can rotate the third member 151 around an axis that intersects the optical axis AX. The second displacement device 153 of this embodiment can apply a force to the third member 151. The second displacement device 153 of the present embodiment can cause the third member 151 to apply a rotational force (moment) that rotates the third member 151 around an axis that intersects the optical axis AX. The second displacement device 153 of the present embodiment can rotate the third member 151 with an axis passing through the fulcrum 163a as a rotation axis. In the present embodiment, the distance (moment lever) from the position at which the second displacement device 153 applies a rotational force to the third member 151 to the rotation axis is determined from the connection position between the second member 150 and the third member 151. It is shorter than the distance to the rotation axis.

  The third member 151 may have a configuration in which a part of the posture of the third member 151 does not change as the third member 151 rotates. The third member 151 may include a mechanism that maintains a partial posture of the third member 151 before and after the rotation of the third member 151, for example, a parallel link mechanism. In the third member 151, the portion where the posture does not change before and after the rotation of the third member 151 may include the connection portion 161.

  The second displacement device 153 of this embodiment includes a fourth movable part 166. The fourth movable portion 166 of this embodiment can advance and retreat with respect to the third member 151. In the present embodiment, the drive unit 167 moves the fourth movable unit 166 forward and backward. For example, the fourth movable portion 166 is an air cylinder rod, and the drive portion 167 is an air cylinder body that drives the air cylinder rod with pressure. Note that the driving force of the driving unit 167 driving the fourth movable unit 166 may be one type of power, magnetic force, electrostatic force, pressure, force generated in a motor, or the like, or two or more types. The driving unit 167 may be included in the second displacement device 153 or may be included in a device outside the second displacement device 153.

  When the fourth movable portion 166 of the present embodiment advances toward the third member 151, the fourth movable portion 166 is connected to the third member 151 and presses the third member 151 to apply a rotational force to the third member 151. The fourth movable portion 166 of the present embodiment can be retracted to a position where it is not in contact with the third member 151. The control device 8 of the present embodiment can control the amount of movement that accompanies the advancement / retraction of the fourth movable portion 166.

  In the present embodiment, the displacement amount of the second member 150 due to the operation of the second displacement device 153 is larger than the displacement amount of the second member 150 due to the operation of the first displacement device 152. The amount of displacement of the second member 150 may be the amount of movement of the second member 150 in a direction parallel to the optical axis AX, or the amount of movement of the second member 150 in a direction intersecting the direction parallel to the optical axis AX. It is good. In the present embodiment, the maximum amount of movement (displacement amount) by which the fourth movable portion 166 moves toward the third member 151 is determined from the connection position between the third movable portion 164 and the second member 150. The distance to the connection position between 164 and the third member 151 is larger than the maximum value of the amount of change (displacement) that changes as the third movable portion 164 operates. The displacement amount by the second displacement device 153 may be equal to or less than the displacement amount by the first displacement device 152.

  In the present embodiment, the responsiveness of the first displacement device 152 is higher than the responsiveness of the second displacement device 153. In the present embodiment, the frequency at which the first displacement device 152 can displace the second member 150 is the frequency at which the second displacement device 153 can displace the second member 150 via the third member 151. Higher than. The responsiveness of the first displacement device 152 may be equal to or less than the responsiveness of the second displacement device 153.

  The exposure apparatus EX of the present embodiment includes an urging member 168 that causes the third member 151 to apply a rotational force that rotates the third member 151 around an axis that intersects the optical axis AX. The biasing member 168 of the present embodiment can rotate the third member 151 around the direction opposite to the direction in which the third member 151 rotates by the second displacement device 153.

  The biasing member 168 of this embodiment is supported by the base member 162. The biasing member 168 of this embodiment extends from the base member 162 to the first portion 159 of the third member 151. The biasing member 168 of the present embodiment is connected to the first portion 159 on the inner side of the fulcrum 163a with respect to the radial direction with respect to the optical path K. The biasing member 168 of the present embodiment biases the third member 151 with a force in a direction that causes the third member 151 to approach the base member 162. The biasing member 168 may be connected to the first portion 159 or connected to the second portion 160 outside the fulcrum 163a with respect to the radiation direction with respect to the optical path K.

  The exposure apparatus EX of the present embodiment includes a displacement regulating member 169 that can regulate the displacement of the third member 151. The displacement regulating member 169 of the present embodiment can be advanced and retracted toward the third member 151. In the present embodiment, the displacement restricting member 169 is possible by the adjustment shim 170. The adjustment shim 170 of this embodiment is supported by the rigid body 171. The adjustment shim 170 of this embodiment can advance and retract the third member 151 with the rigid body 171 as a support.

  The displacement restricting member 169 of the present embodiment is connected to the third member 151 when the displacement restricting member 169 advances toward the third member 151. The displacement regulating member 169 of the embodiment can be retracted from the third member 151 until it is not in contact with the third member 151. The displacement regulating member 169 of the present embodiment regulates the displacement of the portion of the third member 151 connected to the displacement regulating member 169. The displacement regulating member 169 of the present embodiment regulates the displacement of the third member 151 at a position different from the fulcrum 163a. In the present embodiment, the displacement of the third member 151 is restricted at a position different from the fulcrum 163a and the fulcrum 163a, and the rotation of the third member 151 around the fulcrum 163a is suppressed.

  In the present embodiment, when the fourth movable portion 166 of the second displacement device 153 presses the third member 151, the third member 151 rotates around the fulcrum 163a by the pressing force of the fourth movable portion 166, and the second member It moves so that 150 approaches the substrate P. Here, an arrangement in which the lower surface 150b of the second member 150 and the lower surface of the third member 151 are substantially flush is referred to as a first arrangement. In the present embodiment, when the second member 150 approaches the substrate P as compared with the first arrangement, the surface including the lower surface of the second member 150 and the lower surface of the third member 151 is convex toward the substrate P. Transforms into

  In the present embodiment, when the fourth movable portion 166 of the second displacement device 153 moves in the direction away from the third member 151, the third member 151 rotates around the fulcrum 163a by the urging force of the urging member 168. The two members 150 move away from the substrate P. In the present embodiment, as shown in FIG. 9B, when the second member 150 is separated from the substrate P as compared with the first arrangement, the lower surface of the second member 150 and the lower surface of the third member 151 The surface including the surface deforms in a concave shape toward the substrate P.

  Next, a method for exposing the substrate P using the above-described exposure apparatus EX will be described.

  In the present embodiment, the immersion space LS is formed between the terminal optical element 22 and the second member 150 and the substrate stage 2 (substrate P). In the present embodiment, the control device 8 starts exposure of the substrate P in a state where the immersion space LS is formed. The control device 8 of the present embodiment moves the substrate P (substrate stage 2) in the XY plane while moving the substrate P (substrate stage 2) with respect to the terminal optical element 22 and the second member 150 in a state where the immersion space LS is formed. The substrate P is exposed through the liquid LQ in the immersion space LS.

  The control device 8 of the present embodiment displaces the second member 150 as necessary in a state where the immersion space LS is formed. In this embodiment, the control apparatus 8 displaces the 2nd member 150 as needed, for example so that the gap of the lower surface 150b of the 2nd member 150 and the surface of the board | substrate P may approach target value. The gap between the lower surface 150b and the surface of the substrate P is obtained, for example, by detecting the surface of the substrate P held by the substrate holding unit 24.

  The control device 8 of the present embodiment is supported by the third member 151 by operating the second displacement device 153 and displacing the third member 151 with respect to the last optical element 22 as necessary. The two members 150 are displaced with respect to the substrate P. In the state where the immersion space LS is formed, the control device 8 of the present embodiment operates the first displacement device 152 to displace the second member 150 relative to the third member 151 as necessary.

  In the present embodiment, by managing the gap between the lower surface 150b and the surface of the substrate P, for example, the outflow of the liquid LQ from between the second member 150 and the substrate P can be suppressed, and the immersion space LS is desired. It can be maintained in a state. Further, for example, the liquid LQ between the second member 150 and the substrate P can be efficiently recovered, and the occurrence of exposure failure can be suppressed. Further, for example, the displacement amount of the second member 150 by one displacement device of the first displacement device 152 and the second displacement device 153 is made larger than the displacement amount of the second member 150 by the other displacement device, and the other displacement By making the responsiveness of the device higher than the responsiveness of one displacement device, it is possible to secure a wide width for displacing the second member 150 and to ensure a high responsiveness to displace the second member 150. can do.

<Second Modification>
Next, a second modification will be described.
FIG. 10 shows an exposure apparatus according to the second modification.
The exposure apparatus EX of the present modification includes a base 180 connected to the first support member 11. The base member 180 of this modification extends from the first support member 11 to the inside of the first support member 11 with respect to the radial direction with respect to the optical path K. The exposure apparatus EX of the present modification includes a plurality of base members 180. The base member 180 of the present modification extends from the respective positions around the optical path K toward the optical path K. The base member 180 of this modification is a member different from the first support member 11. The base member 180 of this modification is bonded and fixed to the first support member 11.

  The number of base members 180 may be one. The base member 180 may include a beam member supported by the first support member 11 in at least one of the directions intersecting the optical axis AX. The base member 180 may include a member that surrounds the optical path K in an annular shape. The base member 180 may be movable with respect to the first support member 11 in at least one of a direction parallel to the optical axis AX and a direction intersecting the optical axis AX. The base member 180 may be the same member as the first support member 11. The base member 180 is a member different from the first support member 11 and may be supported by the first support member 11 and the first surface plate 13. The base member 180 is a part of the first support member 11 and may be supported by the first surface plate 13.

  The 2nd member 150 of this modification does not have a supply port which can supply liquid LQ. The exposure apparatus EX of the present modification includes a supply member 181 that can supply the liquid LQ. The supply member 181 of this modification has a supply port 182 for supplying the liquid LQ. The supply member 181 of this modification has a flow path for the liquid LQ therein. In this modification, one end of the flow path inside the supply member 181 is connected to the supply port 182. In this modification, one end of the flow path inside the supply member 181 is connected to a liquid delivery device (not shown). The liquid delivery device supplies the clean and temperature-adjusted liquid LQ to the supply port 182 through the flow path inside the supply member 181.

  The second member 150 may have a supply port that can supply the liquid LQ. The supply member 181 may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX. The external device may be the liquid delivery device described above. At least a part of the liquid delivery apparatus may be included in the exposure apparatus EX or may be included in an apparatus outside the exposure apparatus EX.

<Device manufacturing method>
Next, a device manufacturing method will be described. FIG. 11 is a flowchart showing an example of the device manufacturing method of the present embodiment. For a microdevice such as a semiconductor device, a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, a step 203 for producing a substrate as a substrate of the device, a substrate The substrate is manufactured through a substrate processing step 204 for performing various substrate processes such as a film forming process, an exposure process, a developing process, and an etching process, a step 205 for assembling a device, a step 206 for inspecting a manufactured device, and the like. Substrate processing step 204 includes exposing the substrate with exposure light according to the above-described embodiment and developing the exposed substrate. The device assembly step 205 of this embodiment includes processing processes such as a dicing process, a bonding process, and a package process. In the present embodiment, when the program stored in the storage device ME is read into the control device 8, each part of the exposure apparatus EX cooperates to form the immersion space LS, and the exposure of the substrate P or the like. Various processes are executed.

  In each of the above-described embodiments, the “radiation direction with respect to the optical path K” may be regarded as the radiation direction with respect to the optical axis of the projection system PL in the vicinity of the projection region PR. The projection system PL may be a projection optical system in which the optical path on the incident side (object plane side) of the last optical element 22 is also filled with the liquid LQ, as disclosed in, for example, pamphlet of International Publication No. 2004/019128. In addition, the components described in the above embodiments may be applied to an exposure apparatus and an exposure method that do not use the projection system PL. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The liquid LQ may be a liquid other than water. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and is applied to a film such as a photosensitive material (photoresist) that forms the surface of the projection system PL or the substrate P. And stable. The liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  The exposure apparatus EX may be, for example, a step-and-repeat type projection exposure apparatus (stepper) that collectively exposes the pattern of the mask M while the mask M and the substrate P are stationary, and sequentially moves the substrate P stepwise. The exposure apparatus EX uses a projection optical system to transfer a reduced image of the first pattern onto the substrate P with the first pattern and the substrate P being substantially stationary in the step-and-repeat exposure. An exposure apparatus (stitch-type batch) that performs batch exposure on the substrate P by partially overlapping the first pattern with the projection optical system while the second pattern and the substrate P are substantially stationary. Exposure apparatus). The exposure apparatus EX may be a step-and-stitch type exposure apparatus that partially transfers at least two patterns on the substrate P, and moves the substrate P sequentially. The exposure apparatus EX synthesizes a pattern of two masks on a substrate via a projection optical system as disclosed in, for example, US Pat. No. 6,611,316, and performs one scanning exposure on the substrate. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. The exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like. The exposure apparatus EX is an exposure apparatus (lithography) that exposes a line and space pattern on a substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. System).

  The exposure apparatus EX is, for example, a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, and US Pat. No. 6,262,796. An exposure apparatus may be used. For example, when the exposure apparatus EX includes two substrate stages, an object that can be arranged to face the emission surface 23 is one substrate stage, a substrate held by the substrate holding unit of the one substrate stage, It includes at least one of the substrates held by the substrate holding part of the other substrate stage and the other substrate stage. The exposure apparatus EX includes, for example, a substrate stage for holding a substrate and a reference on which a reference mark is formed as disclosed in US Pat. No. 6,897,963 and US Pat. Appl. Pub. No. 2007/0127006. An exposure apparatus may be provided that includes a measurement stage on which at least one of a member and various photoelectric sensors is mounted and does not hold a substrate to be exposed. In this case, the object that can be arranged to face the emission surface 23 includes at least one of a substrate stage, a substrate held by a substrate holding part of the substrate stage, and a measurement stage. The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The base material of the substrate P may include a semiconductor wafer for manufacturing a semiconductor device, for example, a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or a mask or reticle original plate (synthetic quartz used in an exposure apparatus). , Silicon wafer) or the like. The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern onto the substrate P, or may be an exposure apparatus for manufacturing a liquid crystal display element or a display, such as a thin film magnetic head, an image sensor (CCD), A micromachine, a MEMS, a DNA chip, or a reticle or mask may be used as an exposure apparatus for manufacturing.

  As the mask M, for example, as disclosed in US Pat. No. 6,778,257, a variable shaped mask (electronic mask, which forms a transmissive pattern, a reflective pattern, or a light emitting pattern based on electronic data of a pattern to be exposed. An active mask or an image generator may also be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  The requirements of the above embodiments can be combined as appropriate. In some cases, one or more of the components described in the embodiments are not used. As long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the embodiments and modifications are incorporated herein by reference.

DESCRIPTION OF SYMBOLS 4 ... Liquid immersion member, 7 ... Deformation device, 8 ... Control device, 22 ... Terminal optical element, 28 ... Surface sensor, 33 ... Supply port, 34 ... Recovery port 35... Recovery channel, 36... Discharge unit, 37... Channel member, 70... Reaction plate, 71. ... Second displacement sensor, 77 ... Second movable part, 80, 81 ... Recess, 83 ... First connecting member, 84 ... Attenuating part, 150 ... Second member, 151 ... third member, 152 ... first displacement device, 153 ... second displacement device, AX ... optical axis, EL ... exposure light, EX ... exposure device, G ... Gas, K ... optical path, LQ ... liquid, LS ... immersion space, ME ... storage device, P ... substrate, PL ... projection system

Claims (39)

An immersion exposure apparatus that exposes a substrate with exposure light through a liquid,
An optical system including an optical member capable of emitting the exposure light;
A liquid immersion member disposed on at least a part of an optical path of exposure light passing through the liquid between the optical member and the optical member and the object;
A liquid immersion exposure apparatus comprising: a deformation device capable of deforming a surface of the liquid immersion member facing a surface of the object.   The immersion exposure apparatus according to claim 1, wherein the deformation device applies a force to the immersion member at a plurality of positions.   The immersion exposure apparatus according to claim 2, wherein the deformation apparatus can change at least one of a direction and a magnitude of the force at the plurality of positions.   The immersion exposure apparatus according to claim 2, further comprising a first displacement sensor capable of measuring a displacement in a predetermined direction of the immersion member.   The immersion exposure apparatus according to claim 4, wherein the deformation device is controlled based on a measurement result of the first displacement sensor.   The immersion exposure apparatus according to claim 2, wherein the deformation apparatus includes a plurality of first movable parts that generate the force in a predetermined direction. One end side of the plurality of first movable parts is connected to the liquid immersion member,
The immersion exposure apparatus according to claim 6, further comprising a first member to which the other ends of the plurality of first movable parts are connected.   The immersion exposure apparatus according to claim 7, wherein the first member can be displaced in a predetermined direction.   The immersion exposure apparatus according to claim 8, further comprising a second displacement sensor capable of measuring a displacement of the first member in the predetermined direction.   The immersion exposure apparatus according to claim 9, wherein the position of the first member in the predetermined direction is controlled based on a measurement result of the second displacement sensor.   The one end side is connected to the first member and the other end side is connected to the liquid immersion member, and further includes a support member including an attenuation portion that attenuates vibration. Immersion exposure equipment. A recovery port for recovering at least part of the liquid between the liquid immersion member and the object;
A flow path member through which the liquid recovered from the recovery port of the liquid immersion member flows;
The immersion exposure apparatus according to claim 6, further comprising: a connection member that includes an attenuation unit that connects the flow path member and the first member and attenuates vibration.   The immersion exposure apparatus according to claim 12, wherein the recovery port recovers the liquid together with a gas.   The liquid immersion exposure apparatus according to any one of claims 6 to 13, wherein the first movable portion causes a force in a direction parallel to the optical axis of the optical system to act on the liquid immersion member.   The deformation device includes a plurality of second movable parts that cause the liquid immersion member to act on the liquid immersion member in a direction crossing a direction parallel to the optical axis of the optical system. Immersion exposure equipment.   The liquid immersion exposure apparatus according to claim 15, wherein the liquid immersion member has a concave portion between portions receiving force from the plurality of second movable parts. A flow path member through which the liquid recovered from the recovery port of the liquid immersion member flows;
An immersion exposure apparatus according to claim 1, further comprising: a connection member that includes an attenuation unit that supports the flow path member and attenuates vibration.   The liquid immersion exposure apparatus according to claim 1, wherein the deformation device causes a force in a direction parallel to an optical axis of the optical system to act on the liquid immersion member.   The liquid immersion exposure apparatus according to claim 18, wherein the deformation device causes the liquid immersion member to apply a force in a direction intersecting a direction parallel to the optical axis.   The immersion exposure apparatus according to any one of claims 1 to 19, further comprising a surface sensor capable of detecting a surface of the object facing the immersion member.   21. The immersion exposure apparatus according to claim 20, wherein the deformation device is controlled based on a detection result of the surface sensor. An immersion exposure apparatus that exposes a substrate with exposure light through a liquid,
An optical member capable of emitting exposure light;
A second member that is disposed at least partly around the optical axis of the optical member and has at least one of a supply port for supplying the liquid and a recovery port for recovering the liquid;
A third member that supports the second member;
A first displacement device for displacing the second member relative to the third member;
An immersion exposure apparatus comprising: a second displacement device that displaces the third member relative to the optical member.   23. The immersion exposure apparatus according to claim 22, wherein the first displacement device has higher responsiveness than the second displacement device.   The immersion exposure apparatus according to claim 22 or 23, wherein a displacement amount by the second displacement device is larger than a displacement amount by the first displacement device.   The immersion exposure apparatus according to any one of claims 22 to 24, further comprising a support member that supports the second member with an urging force that cancels at least part of the weight of the second member. The third member is rotatably supported around an axis that intersects the optical axis of the optical member,
The second displacement device causes a rotational force around the axis to act on the third member at a position closer to the axis than a distance from a connection position between the second member and the third member to the axis. Item 26. The immersion exposure apparatus according to any one of Items 22 to 25. Exposing the substrate using the immersion exposure apparatus according to any one of claims 1 to 26;
Developing the exposed substrate. A device manufacturing method. An immersion exposure method for exposing a substrate with exposure light through a liquid,
Disposing an immersion member in at least a part of the periphery of the optical path of the exposure light passing between the optical member capable of emitting the exposure light and the substrate;
Deforming the surface of the liquid immersion member that faces the surface of the substrate;
Forming an immersion space so that an optical path of the exposure light between the optical member and the substrate is filled with the liquid;
Exposing the substrate with the exposure light through the liquid in the immersion space.   29. The liquid immersion exposure method according to claim 28, comprising detecting a surface of the substrate before deforming a surface of the liquid immersion member.   30. The liquid immersion exposure method according to claim 28 or 29, comprising detecting the surface of the substrate before disposing the substrate at a position facing the liquid immersion member.   The liquid immersion exposure method according to any one of claims 28 to 30, wherein the substrate is exposed while detecting a surface of the substrate.   The liquid immersion exposure method according to any one of claims 28 to 31, wherein the liquid immersion member is deformed based on a result obtained by interpolating data obtained by detecting the surface at a plurality of positions of the substrate. .   29. The substrate is exposed while changing a relative position between the substrate and the optical member, and the surface is deformed based on information indicating the relative position and information indicating a detection result of the surface of the substrate. The liquid immersion exposure method according to any one of -32. Detecting the amount of deformation of the surface of the liquid immersion member;
34. The immersion exposure method according to claim 28, further comprising: controlling a deformation amount of the surface based on a detection result of the deformation amount. An immersion exposure method for exposing a substrate with exposure light through a liquid,
At least part of the periphery of the optical path of the exposure light passing through the liquid between the optical member capable of emitting the exposure light and the substrate has at least one of a supply port for supplying the liquid and a recovery port for recovering the liquid Arranging a second member;
Disposing a third member to support the second member;
Displacing the second member relative to the third member;
Displacing the third member with respect to the optical member;
Forming an immersion space so that an optical path of the exposure light between the optical member and the substrate is filled with the liquid;
Exposing the substrate with the exposure light through the liquid in the immersion space. Exposing the substrate using the immersion exposure method according to any one of claims 28 to 35;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light through a liquid,
Disposing an immersion member in at least a part of the periphery of the optical path of the exposure light passing between the optical member capable of emitting the exposure light and the substrate;
Deforming the surface of the liquid immersion member that faces the surface of the substrate;
Forming an immersion space so that an optical path of the exposure light between the optical member and the substrate is filled with the liquid;
Exposing the substrate with the exposure light through the liquid in the immersion space. A program that causes a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light through a liquid,
At least part of the periphery of the optical path of the exposure light passing through the liquid between the optical member capable of emitting the exposure light and the substrate has at least one of a supply port for supplying the liquid and a recovery port for recovering the liquid Arranging a second member;
Disposing a third member to support the second member;
Displacing the second member relative to the third member;
Displacing the third member with respect to the optical member;
Forming an immersion space so that an optical path of the exposure light between the optical member and the substrate is filled with the liquid;
Exposing the substrate with the exposure light through the liquid in the immersion space.   39. A recording medium on which the program according to claim 37 or 38 is recorded and readable by a computer.

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