JP2014093479A - Liquid immersion member, exposure apparatus, exposure method, device manufacturing method, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing occurrence of an exposure defect.SOLUTION: A liquid immersion member 5 includes a first member 21 which is arranged at at least a part of a periphery of an optical member, and a second member 22 which is arranged below the first member 21 at at least a part of a periphery of an optical path K of exposure light, and has a second upper surface 252 opposed to a first lower surface 261 of the first member 21 across a gap and a second lower surface 262 that a body can face. The second member 22 includes a first part 221 and a second part 222 arranged outside the first part 221 about the optical path K. The second part 222 is moved in a first direction substantially parallel with the optical axis of the optical member through the operation of a driving apparatus 27 in at least a part of a period in which the body moves in a plane substantially parallel with the optical axis.

Description

  The present invention relates to a liquid immersion member, an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

 As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

U.S. Pat. No. 7,864,292

 In the immersion exposure apparatus, for example, if the liquid flows out of a predetermined space or remains on an object such as a substrate, an exposure failure may occur. As a result, a defective device may occur.

   An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. An immersion member that forms an immersion space on the first member, the first member disposed at least part of the periphery of the optical member, and disposed at least part of the periphery of the optical path of the exposure light below the first member And a second member having a second upper surface facing the first lower surface of the first member with a gap and a second lower surface capable of facing the object, the second member including the first portion and the optical path A second portion disposed outside the first portion, wherein the second portion is driven during at least a part of a period in which the object moves in a plane substantially perpendicular to the optical axis of the optical member. An immersion member is provided that is moved in a first direction substantially parallel to the optical axis upon actuation of the device. That.

 According to the second aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the exposure apparatus including the liquid immersion member of the first aspect.

 According to a third aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the second aspect and developing the exposed substrate.

 According to a fourth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first member, a second upper surface disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface of the first member via a gap, and a second object capable of facing the second member. On a substrate movable under the optical member using an immersion member comprising a first member having a lower surface and a second member including a second member disposed outside the first member with respect to the optical path Forming a liquid immersion space in the substrate, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and in a plane substantially perpendicular to the optical axis of the optical member. During at least part of the period during which the substrate moves, And moving the second portion to the optical axis substantially a first direction parallel exposure method comprising is provided.

 According to a fifth aspect of the present invention, there is provided a device manufacturing method comprising exposing a substrate using the exposure method of the fourth aspect and developing the exposed substrate.

 According to a sixth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member disposed at least part of the periphery of the optical member, and disposed at least part of the periphery of the optical path of the exposure light below the first member and opposed to the first lower surface of the first member via a gap. Using a liquid immersion member comprising a first portion having a second upper surface and a second lower surface to which an object can face, and a second member including a second portion disposed outside the first portion with respect to the optical path Forming a liquid immersion space on a substrate movable under the optical member; exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space; and Period when the substrate moves in a plane substantially perpendicular to the optical axis In at least some, program for executing, and it moves in the optical axis substantially a first direction parallel to the second portion by the operation of the driving device is provided.

 According to the seventh aspect of the present invention, there is provided a computer-readable recording medium recording the program of the sixth aspect.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on this embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on this embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on this embodiment. FIG. 5 is a side sectional view showing a part of the liquid immersion member according to the present embodiment. It is the figure which looked at the liquid immersion member concerning this embodiment from the lower part. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on this embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the exposure apparatus which concerns on this embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the present embodiment. It is a figure for demonstrating an example of operation | movement of the liquid immersion member which concerns on this embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

 FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

   The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

   In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL The projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, the liquid immersion member 5 that forms the liquid immersion space LS of the liquid LQ, and the overall operation of the exposure apparatus EX are controlled. And a storage device 7 that is connected to the control device 6 and stores various types of information related to exposure.

   The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). One or both of a detection system that detects the alignment mark of the substrate P and a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

 In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

   The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

   The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

   The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. The drive system 11 may include a linear motor.

   The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

   The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis.

 With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

   The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

  The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal. Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

 The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the liquid immersion member 5 according to this embodiment will be described. The liquid immersion member may be referred to as a nozzle member. 2 is a cross-sectional view of the liquid immersion member 5 parallel to the XZ plane, FIG. 3 is a cross-sectional view of the liquid immersion member 5 parallel to the YZ plane, and FIG. 4 is a partially enlarged view of FIG. These are the figures which looked at the liquid immersion member 5 from the lower side (-Z side).

  The immersion member 5 forms an immersion space LS for the liquid LQ on an object that can move below the last optical element 13.

 An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the liquid immersion member 5 and can be opposed to the liquid immersion member 5. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one. In the exposure of the substrate P, the immersion space LS is formed so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

   In the following description, it is assumed that the object is the substrate P. As described above, the object may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3.

 The immersion space LS may be formed so as to straddle two objects. For example, the immersion space LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2. The immersion space LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The immersion space LS is formed so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. At least a part of the immersion space LS is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the immersion space LS is formed in a space between the immersion member 5 and the substrate P (object).

  The liquid immersion member 5 includes a first member 21 disposed on at least a part of the periphery of the terminal optical element 13, and a second member 22 disposed on at least a part of the periphery of the optical path K below the first member 21. Is provided. The first member 21 is disposed so as not to contact the terminal optical element 13 and the second member 22. The second member 22 is disposed so as not to contact the terminal optical element 13 and the first member 21.

 The liquid immersion member 5 includes a liquid supply part 33 that can supply the liquid LQ for forming the liquid immersion space LS, and a liquid recovery part 23 that can recover at least a part of the liquid LQ in the liquid immersion space LS.

 The last optical element 13 has an exit surface 12 facing the −Z direction, and an outer surface 29 disposed around the exit surface 12. The outer side surface 29 is a non-emission surface that does not emit the exposure light EL. The exposure light EL passes through the emission surface 12 and does not pass through the outer surface 29.

 The first member 21 is disposed at a position farther from the substrate P (object) than the second member 22. At least a part of the second member 22 is disposed between the first member 21 and the substrate P (object). At least a part of the second member 22 is disposed between the terminal optical element 13 and the substrate P (object). The second member 22 may not be disposed between the terminal optical element 13 and the substrate P (object).

 The first member 21 is connected to the lower surface 24 facing the -Z direction, the inner surface 30 facing the outer surface 29 of the last optical element 13, the upper surface 31 connected to the upper end of the inner surface 30, and facing the + Z direction, and the inner surface An upper surface 36 that is connected to the lower end of 30 and faces the + Z direction, connects an inner edge of the lower surface 24 and an inner edge of the upper surface 36, and an inner surface 43 at least partially facing the outer surface 29 of the terminal optical element 13. Have. The inner side surface 30 is opposed to the outer side surface 29 via a gap. The inner side surface 43 is opposed to the outer side surface 29 via a gap.

 The second member 22 includes an upper surface 25 facing the + Z direction, a lower surface 26 facing the −Z direction, an inner surface 41 facing the optical path K, and an outer surface 42 facing the opposite side of the inner surface 41. The inner side surface 41 connects the inner edge of the upper surface 25 and the inner edge of the lower surface 26. The outer side surface 42 connects the outer edge of the upper surface 25 and the outer edge of the lower surface 26. The second member 22 can face the lower surface 24. At least a part of the upper surface 25 of the second member 22 faces the lower surface 24 with a gap therebetween. At least a part of the upper surface 25 faces the emission surface 12 with a gap. Note that the upper surface 25 may not face the emission surface 12.

  In the present embodiment, the inner edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) are edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) facing the optical path K (optical axis AX). The outer edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) are edges of the lower surfaces 24 and 26 (upper surfaces 25 and 36) outside the inner edge with respect to the radial direction with respect to the optical path K (optical axis AX). The inner edge is closer to the optical path K than the outer edge.

 The substrate P (object) can face the lower surface 26. At least a part of the upper surface of the substrate P faces the lower surface 26 with a gap. At least a part of the upper surface of the substrate P faces the emission surface 12 with a gap.

  The first member 21 is disposed around the last optical element 13. The first member 21 is an annular member. A gap is formed between the first member 21 and the last optical element 13. The first member 21 does not face the emission surface 12. A part of the first member 21 may face the emission surface 12. That is, a part of the first member 21 may be disposed between the emission surface 12 and the upper surface of the substrate P (object).

  The second member 22 is disposed around the optical path K of the exposure light EL. The second member 22 is an annular member. A gap is formed between the second member 22 and the first member 21.

  The lower surface 24 of the first member 21 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The lower surface 24 is disposed at a position where it can come into contact with the liquid LQ. The lower surface 24 does not collect the liquid LQ. The lower surface 24 is a non-recovery part and cannot recover the liquid LQ. The lower surface 24 of the first member 21 can hold the liquid LQ with the second member 22.

  The upper surface 25 of the second member 22 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The upper surface 25 is disposed at a position where it can come into contact with the liquid LQ. The upper surface 25 does not collect the liquid LQ. The upper surface 25 is a non-recovery part and cannot recover the liquid LQ. The upper surface 25 of the second member 22 can hold the liquid LQ with the first member 21.

  The lower surface 26 of the second member 22 is disposed so as to surround the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The lower surface 26 is disposed at a position where it can come into contact with the liquid LQ. The lower surface 26 does not collect the liquid LQ. The lower surface 26 is a non-recovery part and cannot recover the liquid LQ. The lower surface 26 of the second member 22 can hold the liquid LQ with the substrate P (object).

  The exit surface 12 and the outer surface 29 of the last optical element 13 disposed at a position that can come into contact with the liquid LQ do not collect the liquid LQ. The ejection surface 12 and the outer surface 29 are non-recovery parts and cannot recover the liquid LQ. The exit surface 12 of the last optical element 13 can hold the liquid LQ with the substrate P (object).

 The inner side surface 30, the upper surface 36, and the inner side surface 43 of the first member 21 that are disposed at positions that can contact the liquid LQ do not collect the liquid LQ. The inner side surface 30, the upper surface 36, and the inner side surface 43 are non-recovery parts and cannot recover the liquid LQ.

 The inner side surface 41 and the outer side surface 42 of the second member 22 arranged at a position that can come into contact with the liquid LQ do not collect the liquid LQ. The inner side surface 41 and the outer side surface 42 are non-recovery parts and cannot recover the liquid LQ.

  A first space SP1 is formed on the upper surface 25 side. The first space SP1 includes a space that the upper surface 25 faces. The first space SP1 includes a space between the lower surface 24 and the upper surface 25.

 A second space SP2 is formed on the lower surface 26 side. The second space SP2 includes a space that the lower surface 26 faces. The second space SP2 includes a space between the lower surface 26 and the upper surface of the substrate P (object).

 A third space SP3 is formed on the inner surface 30 side. The third space SP3 includes a space that the inner side surface 30 and the inner side surface 43 face. The third space SP3 includes a space between the outer side surface 29 and the inner side surface 30 and the inner side surface 43.

  A fourth space SP4 is formed on the exit surface 12 side. The fourth space SP4 includes a space that the emission surface 12 faces. The fourth space SP4 includes a space between the emission surface 12 and the substrate P (object). The fourth space SP4 includes an optical path K of the exposure light EL between the emission surface 12 and the substrate P (object). The fourth space SP4 includes a space between the emission surface 12 and the substrate P (object) and a space between the emission surface 12 and the upper surface 25.

  In the present embodiment, the second member 22 includes a first portion 221 and a second portion 222 disposed outside the first portion 221 with respect to the optical path K. The first portion 221 is disposed so as to surround the optical path K. The second part 222 is disposed on each of the + X side and the −X side with respect to the first part 221.

  Further, the second member 22 includes a third portion 223 disposed between the first portion 221 and the second portion 222. The third portion 223 is disposed on each of the + X side and the −X side with respect to the first portion 221. The first part 221 and the second part 222 are connected via the third part 223.

  In the present embodiment, the terminal optical element 13 does not move substantially. The first member 21 also does not move substantially.

  The first portion 221 does not move substantially. The first portion 221 does not substantially move with respect to the first member 21. The first portion 221 and the first member 21 do not move relative to each other. The relative position between the first portion 221 and the first member 21 does not change.

  The second portion 222 is movable. The second portion 222 is movable with respect to the last optical element 13 and the first member 21. The second portion 222 and the last optical element 13 are relatively movable. The second portion 222 and the first member 21 are relatively movable. The relative position between the second portion 222 and the last optical element 13 changes. The relative position between the second portion 222 and the first member 21 changes. The second portion 222 is movable below the first member 21. The second portion 222 is movable between the first member 21 and the substrate P (object).

  In the present embodiment, the second portion 222 is movable at least in the Z-axis direction substantially parallel to the optical axis AX of the last optical element 13. The second portion 222 may be movable in the X axis, Y axis, Z axis, θX, θY, and θZ directions.

  The second portion 222 is moved by the operation of the driving device 27. The drive device 27 includes, for example, a motor, and can move the second portion 222 using Lorentz force. The drive device 27 is controlled by the control device 6.

 The second portion 222 is movable in the Z-axis direction by the operation of the driving device 27. The driving device 27 may move the second portion 222 in the X axis, Y axis, Z axis, θX, θY, and θZ directions.

 At least a part of the third portion 223 is deformable. At least a part of the third portion 223 may be softer than the first portion 221 and the second portion 222. At least a part of the third portion 223 may be extendable. At least a part of the third portion 223 may be elastically deformable. At least a portion of the third portion 223 may be flexible. The driving device 27 can deform at least a part of the third portion 223. At least a part of the third portion 223 can be deformed by the operation of the driving device 27. For example, the third portion 223 may be soft enough to be deformed based on the driving force of the driving device 27, may be stretchable, may be elastically deformable, or may be flexible.

  In the present embodiment, at least a part of the third portion 223 can be bent. The driving device 27 can bend at least a part of the third portion 223. As shown in FIG. 5, each of the third portions 223 is long in the Y-axis direction. The third portion 223 may be called a hinge portion.

  When at least a part of the third portion 223 is deformed, the third portion 223 moves with respect to the terminal optical element 13 and the first member 21. The third portion 223 and the last optical element 13 are relatively movable. The third portion 223 and the first member 21 are relatively movable. The relative position between the third portion 223 and the first member 21 changes. The relative position between the third portion 223 and the last optical element 13 changes. The third portion 223 is movable below the first member 21. The third portion 223 is movable between the first member 21 and the substrate P (object).

  The first portion 221 and the second portion 222 are not substantially deformed. The first portion 221 and the second portion 222 are harder than the third portion 223. The driving device 27 cannot deform the first portion 221 and the second portion 222. That is, the first portion 221 and the second portion 222 are hard enough not to be deformed based on the driving force of the driving device 27. The first portion 221 and the second portion 222 cannot be deformed by the operation of the driving device 27.

  The second part 222 is connected to the first part 221 via a deformable third part 223. Therefore, even if the first portion 221 does not substantially move, the driving device 27 can move the second portion 222. Even if the first portion 221 does not substantially move, the second portion 222 can move while being connected to the first portion 221 via the third portion 223.

  In the present embodiment, each of the first portion 221, the second portion 222, and the third portion 223 has an upper surface 25 and a lower surface 26. In the following description, the upper surface 25 of the first portion 221 is appropriately referred to as a first upper surface 251, and the lower surface 26 of the first portion 221 is appropriately referred to as a first lower surface 261. The upper surface 25 of the second portion 222 is appropriately referred to as a second upper surface 252, and the lower surface 26 of the second portion 222 is appropriately referred to as a second lower surface 262. The upper surface 25 of the third portion 223 is appropriately referred to as a third upper surface 253, and the lower surface 26 of the third portion 223 is appropriately referred to as a third lower surface 263.

  In the present embodiment, the liquid immersion member 5 includes a first support member 281 connected to the first portion 221 and a second support member 282 connected to the second portion 222. In the present embodiment, the driving device 27 moves the second support member 282. The second support member 282 is movable by the operation of the driving device 27. When the second support member 282 is moved by the driving device 27, the second portion 222 is moved. In the present embodiment, the driving device 27 moves the second support member 282 at least in the Z-axis direction. When the second support member 282 is moved in the Z-axis direction by the drive device 27, the second portion 222 is moved in the Z-axis direction.

 In the present embodiment, the second support member 282 is connected to a part of the second upper surface 252 of the second portion 222. In the present embodiment, the second support member 282 is connected to each of the second portion 222 disposed on the + X side with respect to the first portion 221 and the second portion 222 disposed on the −X side. The second support member 282 is disposed on each of the + X side and the −X side with respect to the optical path K (the optical axis AX of the terminal optical element 13). The driving device 27 includes a second portion 222 (second support member 282) disposed on the + X side with respect to the first portion 221 (optical path K), and a second portion 222 (second support) disposed on the −X side. Connected to each of the members 282).

  The control device 6 can separately move the second part 222 arranged on the + X side with respect to the first part 221 (optical path K) and the second part 222 arranged on the −X side. For example, the second portion 222 disposed on the −X side is at least partly moved during the period in which the second portion 222 disposed on the + X side with respect to the first portion 221 (optical path K) is moved in the + Z direction. It may be moved in the −Z direction. Movement of the second portion 222 disposed on the −X side during at least part of the period in which the second portion 222 disposed on the + X side with respect to the first portion 221 (optical path K) is moved in the Z-axis direction. May be stopped. In at least part of the period during which the second portion 222 disposed on the + X side with respect to the first portion 221 (optical path K) is moved at the first speed, the second portion 222 disposed on the −X side is It may be moved at a second speed different from the first speed. In at least part of a period during which the second portion 222 arranged on the + X side with respect to the first portion 221 (optical path K) is moved at the first acceleration, the second portion 222 arranged on the −X side is You may move by the 2nd acceleration different from 1 acceleration.

  In the present embodiment, at least a part of the second support member 282 is disposed in the hole 32 formed in the first member 21. The second support member 282 is movable inside the hole 32.

 The hole 32 is formed in the first member 21 so as to connect the upper space and the lower space of the first member 21 with respect to the Z-axis direction. The hole 32 is formed in the first member 21 so as to be connected to the first space SP1. In the present embodiment, the hole 32 is formed in the first member 21 so as to connect the first space SP1 and the third space SP3. The hole 32 is formed so as to connect the lower surface 24 of the first member 21 and the inner surface 30. The lower end of the hole 32 faces the first space SP1. The upper end of the hole 32 faces the third space SP3. In the present embodiment, the hole 32 is a through hole that penetrates the first member 21 so as to connect the first space SP1 and the third space SP3.

 The hole 32 may be formed in the first member 21 so as to connect the first space SP1 and the space where the upper surface 31 faces. That is, the hole 32 may be formed so as to connect the upper surface 31 and the lower surface 24.

  In the present embodiment, a plurality of holes 32 are formed. The holes 32 are arranged on each of the + X side and the −X side with respect to the optical path K (the optical axis AX of the terminal optical element 13). The plurality of second support members 282 are movably disposed in the plurality of holes 32 provided in the first member 21.

 The second support member 282 is movable in the Z-axis direction inside the hole 32. When the second support member 282 is moved in the Z-axis direction by the drive device 27, the second portion 222 is moved in the Z-axis direction.

 In the present embodiment, the driving device 27 is connected to the second support member 282 on the inner surface 30 side. That is, in the present embodiment, the driving device 27 is connected to the second support member 282 in the space above the first member 21. The driving device 27 may be directly connected to the second support member 282 or indirectly connected to the second support member 282. For example, the mover of the driving device 27 may be directly connected to the second support member 282. The mover of the driving device 27 and the second support member 282 may be connected via a member different from the second support member 282.

  In the present embodiment, the first member 21 and the second member 22 do not contact each other. The first member 21 (the inner surface of the hole 32) and the second support member 282 are not in contact with each other. A gap is formed between the first member 21 and the second member 22. A gap is formed between the first member 21 and the second support member 282. The second member 22 (second portion 222 and third portion 223) is movable on the lower surface 24 side of the first member 21 so as not to contact the first member 21. The second support member 282 is movable inside the hole 32 so as not to contact the first member 21. The driving device 27 can move the second member 22 (the second portion 222 and the third portion 223) and the support member 28 so that the second member 22, the second support member 282, and the first member 21 do not come into contact with each other. is there.

 A plurality of driving devices 27 may be provided. The driving device 27 may be connected to each of the plurality of second support members 282. For example, when a plurality of second support members 282 are arranged, at least one drive device 27 may be connected to one second support member 282. A plurality of drive devices 27 may be connected to one second support member 282, and the plurality of drive devices 27 may move one second support member 282.

 In the present embodiment, the first support member 281 is connected to a part of the first upper surface 251 of the first portion 221. The first portion 221 is supported by the first member 21 via the first support member 281. In the present embodiment, the upper end of the first support member 281 is connected to a part of the lower surface 24 of the first member 21. A lower end of the first support member 281 is connected to a part of the first upper surface 251 of the first portion 221. The position of the first portion 221 connected to the first support member 281 is substantially fixed. The relative position between the first portion 221 and the first member 21 does not change.

  The first support member 281 is, for example, a rod member. A plurality of first support members 281 are arranged around the optical path K. A channel through which the liquid LQ can flow is formed between the adjacent first support members 281. The first support member 281 is formed in a peripheral wall member that surrounds the optical path K, and at least a part of the peripheral wall member, and an opening through which the liquid LQ can flow between the inner space and the outer space of the peripheral wall member ( Channel).

 In the present embodiment, the first member 21 is supported by the device frame 8B. The first member 21 is supported by the device frame 8B via a support member (not shown). Note that the first member 21 may be supported by the reference frame 8A via a support member (not shown).

 In the present embodiment, the second member 22 is supported by the device frame 8B. In the present embodiment, the drive device 27 is supported by the device frame 8B. The driving device 27 may be supported by the device frame 8B via a support mechanism (not shown). The second member 22 (second portion 222) is supported by the device frame 8B via the second support member 282 and the drive device 27. Thereby, even if vibration is generated by the movement of the second portion 222, the vibration isolator 10 suppresses the vibration from being transmitted to the reference frame 8A. The second member 22 (second portion 222) may be supported by the reference frame 8A via the second support member 282.

 In the present embodiment, the lower surface 24 is substantially parallel to the XY plane. The first upper surface 251 is also substantially parallel to the XY plane. The first lower surface 261 is also substantially parallel to the XY plane. That is, the lower surface 24 and the first upper surface 251 are substantially parallel. The first upper surface 251 and the first lower surface 261 are substantially parallel.

  In the present embodiment, the second upper surface 252 and the second lower surface 262 are substantially parallel. 2 and 4, the second portion 222 is movable so that the first lower surface 261 and the second lower surface 262 are substantially at the same position (height) in the Z-axis direction. . The second portion 222 is movable so that the first lower surface 261 and the second lower surface 262 are arranged in the same plane (in the XY plane).

  Further, in a state where the first lower surface 261 and the second lower surface 262 are disposed at substantially the same position (height) with respect to the Z-axis direction, the third lower surface 263 is also substantially the same as the first lower surface 261 and the second lower surface 262. So that they are at the same position (height). The first lower surface 261, the second lower surface 262, and the third lower surface 263 can be arranged in the same plane (in the XY plane).

  In the present embodiment, the distance between the first upper surface 251 and the first lower surface 261 (the thickness of the first portion 221) and the distance between the second upper surface 252 and the second lower surface 262 (the thickness of the second portion 222) are: Substantially equal. Note that the distance between the first upper surface 251 and the first lower surface 261 (the thickness of the first portion 221) may be greater than the distance between the second upper surface 252 and the second lower surface 262 (the thickness of the second portion 222). It may be good or small.

  In the present embodiment, the distance between the third upper surface 253 and the third lower surface 263 (thickness of the third portion 223) is smaller than the distance between the first upper surface 251 and the first lower surface 261 (thickness of the first portion 221). . The distance between the third upper surface 253 and the third lower surface 263 (thickness of the third portion 223) is smaller than the distance between the second upper surface 252 and the second lower surface 262 (thickness of the second portion 222). The distance between the third upper surface 253 and the third lower surface 263 (thickness of the third portion 223) may be larger than the distance between the first upper surface 251 and the first lower surface 261 (thickness of the first portion 221). And may be substantially equal. The distance between the third upper surface 253 and the third lower surface 263 (thickness of the third portion 223) may be greater than the distance between the second upper surface 252 and the second lower surface 262 (thickness of the second portion 222). And may be substantially equal.

  Note that the lower surface 24 may be non-parallel to the XY plane. The lower surface 24 may be inclined with respect to the XY plane and may include a curved surface.

 Note that the first upper surface 251 may be non-parallel to the XY plane. The first upper surface 251 may be inclined with respect to the XY plane or may include a curved surface.

 Note that the first lower surface 261 may be non-parallel to the XY plane. The first lower surface 261 may be inclined with respect to the XY plane or may include a curved surface.

  The lower surface 24 and the first upper surface 251 may be parallel or non-parallel. The first upper surface 251 and the first lower surface 261 may be parallel or non-parallel. The lower surface 24 and the first lower surface 261 may be parallel or non-parallel.

  The second upper surface 252 and the second lower surface 262 may be parallel.

 In the present embodiment, the inner surface 30 of the first member 21 is inclined with respect to the Z axis (the optical axis AX of the terminal optical element 13). The inner side surface 30 is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner surface 30 and the outer surface 29 are substantially parallel. The inner side surface 30 and the outer side surface 29 may be non-parallel.

 In the present embodiment, the inner side surface 43 of the first member 21 is inclined with respect to the Z axis (the optical axis AX of the terminal optical element 13). The inner side surface 43 is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner side surface 43 and the outer side surface 29 are substantially parallel. The size of the gap between the inner side surface 43 and the outer side surface 29 is smaller than the size of the gap between the inner side surface 30 and the outer side surface 29. The inner side surface 43 and the outer side surface 29 may be non-parallel.

 In the present embodiment, the inner surface 41 of the second member 22 (first portion 221) is substantially parallel to the Z axis (the optical axis AX of the last optical element 13). The angle formed between the inner side surface 41 and the upper surface 25 (first upper surface 251) is substantially 90 degrees. The angle formed by the inner side surface 41 and the lower surface 26 (first lower surface 261) is substantially 90 degrees.

  The inner side surface 41 may be inclined with respect to the Z axis. For example, the inner side surface 41 may be inclined upward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The inner side surface 41 may be inclined downward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13).

 In the present embodiment, the outer surface 42 of the second member 22 (third portion 223) is substantially parallel to the Z axis (the optical axis AX of the terminal optical element 13). The angle formed by the outer side surface 42 and the upper surface 25 (third upper surface 253) is substantially 90 degrees. The angle formed by the outer side surface 42 and the lower surface 26 (third lower surface 263) is substantially 90 degrees.

  In the state where the third lower surface 263 is disposed substantially parallel to the XY plane, the outer surface 42 may be inclined with respect to the Z axis. For example, the outer surface 42 may be inclined upward toward the outer side with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The outer side surface 42 may be inclined downward toward the outside with respect to the radiation direction with respect to the optical path K (the optical axis AX of the terminal optical element 13).

 In the present embodiment, an opening 40 is formed between the inner edge of the lower surface 24 and the upper surface 25. The opening 40 is disposed so as to face the optical path K. The opening 40 may be disposed so as to face the third space SP3.

  The first member 21 has an opening 34 through which the exposure light EL emitted from the emission surface 12 can pass. The second member 22 has an opening 35 through which the exposure light EL emitted from the emission surface 12 can pass. An opening 35 is formed in the first portion 221 of the second member 22. At least a part of the last optical element 13 is disposed inside the opening 34. An upper surface 36 is disposed around the upper end of the opening 34. A lower surface 24 is disposed around the lower end of the opening 34. An upper surface 25 is disposed around the upper end of the opening 35. A lower surface 26 is disposed around the lower end of the opening 35.

 The dimension of the opening 34 in the XY plane is larger than the dimension of the opening 35. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the X-axis direction. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the Y-axis direction. In the present embodiment, the first member 21 is not disposed directly below the emission surface 12. The opening 34 of the first member 21 is disposed around the emission surface 12. The opening 34 is larger than the exit surface 12. An opening 44 at the lower end of the gap formed between the outer surface 29 of the last optical element 13 and the first member 21 faces the upper surface 25 of the second member 22. The opening 35 of the second member 22 is disposed so as to face the emission surface 12. In the present embodiment, the shape of the opening 35 in the XY plane is a rectangular shape. The opening 35 is long in the X-axis direction. The shape of the opening 35 may be an ellipse that is long in the X-axis direction or a polygon that is long in the X-axis direction.

 The dimension of the opening 34 may be smaller than the dimension of the opening 35. The dimension of the opening 34 may be substantially equal to the dimension of the opening 35.

 In the present embodiment, the first member 21 may not be annular. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 (optical path K). For example, a plurality of the first members 21 may be arranged around the last optical element 13 (optical path K).

 In the present embodiment, the first space SP1 and the fourth space SP4 are connected via the opening 40. The third space SP3 and the fourth space SP4 are connected via the opening 44. The first space SP1 and the third space SP3 are connected via the opening 40 and the opening 44. In other words, the first space SP1 and the third space SP3 are connected via the fourth space SP4. The second space SP2 and the fourth space SP4 are connected via an opening 46 between the inner edge of the second member 22 (lower surface 26) and the substrate P (object). The second space SP2 and the third space SP3 are connected via an opening 44, an opening 45 between the inner edge of the second member 22 (upper surface 25) and the emission surface 12, and an opening 46. In other words, the second space SP2 and the third space SP3 are connected via the fourth space SP4.

  The first space SP1 and the second space SP2 are connected through the opening 40, the opening 45, and the opening 46. In other words, the first space SP1 and the second space SP2 are connected via a space (fourth space SP4) that the inner edge of the second member 22 faces. The space that the inner edge of the second member 22 faces includes the space that the inner surface 41 of the second member 22 faces.

 The first space SP1 and the second space SP2 are the opening 47 between the outer edge of the second member 22 (upper surface 25) and the first member 21, and the outer edge of the second member 22 (lower surface 26). It is connected via an opening 48 between the substrate P (object). In other words, the first space SP1 and the second space SP2 are connected via a space (a space between the liquid recovery part 23 and the substrate P) facing the outer edge of the second member 22. The space that the outer edge of the second member 22 faces includes the space that the outer surface 42 of the second member 22 faces.

  The liquid LQ can flow through each of the first space SP1, the second space SP2, the third space SP3, and the fourth space SP4. The second member 22 is movable in an XY plane perpendicular to the optical axis AX of the last optical element 13. The second member 22 is movable substantially parallel to the XY plane. In the present embodiment, the second member 22 is movable at least in the X-axis direction.

 The liquid supply unit 33 is disposed inside the liquid recovery unit 23 with respect to the radial direction with respect to the optical path K (the optical axis AX of the terminal optical element 13). The liquid supply unit 33 includes an opening (liquid supply port) disposed in the liquid immersion member 5. In the present embodiment, the liquid supply unit 33 is disposed on the first member 21. In the present embodiment, the liquid supply unit 33 is disposed on the inner side surface 30 of the first member 21.

 The liquid supply part 33 is arrange | positioned so that 3rd space SP3 may be faced. The liquid supply part 33 is disposed so as to face the outer surface 29. The liquid supply part 33 supplies the liquid LQ to the third space SP3.

 In the present embodiment, the liquid supply unit 33 is disposed on each of the + X side and the −X side with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid supply unit 33 may be disposed in the Y-axis direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13), or the exposure light EL including the X-axis direction and the Y-axis direction. A plurality of optical paths K may be arranged around the optical path K (the optical axis AX of the terminal optical element 13). One liquid supply unit 33 may be provided.

 In the present embodiment, the liquid supply unit 33 is connected to the liquid supply device 33 </ b> S via a supply flow path 33 </ b> R formed inside the first member 21. The liquid supply device 33S can supply the liquid supply unit 33 with the clean and temperature-adjusted liquid LQ. The liquid supply unit 33 supplies the liquid LQ from the liquid supply device 33S in order to form the immersion space LS.

  In the present embodiment, the liquid LQ supplied from the liquid supply unit 33 flows through the upper surface 36 and then is supplied to the upper surface 25 through the opening 34 (opening 44). At least a part of the liquid LQ supplied to the upper surface 25 is supplied (inflows) to the first space SP1 through the opening 40. Further, at least a part of the liquid LQ supplied to the upper surface 25 is supplied to the substrate P (object) facing the emission surface 12 through the opening 35 (opening 45). Thereby, the optical path K is filled with the liquid LQ. Further, at least a part of the liquid LQ supplied onto the substrate P (object) is supplied (inflows) into the second space SP2 through the opening 46.

 The liquid recovery unit 23 is disposed on the first member 21. The liquid recovery unit 23 is disposed outside the lower surface 24 with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 includes an opening (liquid recovery port) disposed in the liquid immersion member 5.

  The liquid recovery unit 23 is disposed outside the lower surface 24 in the radiation direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed outside the liquid supply unit 33 with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13).

 The liquid recovery unit 23 is disposed at least partly around the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed at least at a part around the lower surface 24. As shown in FIG. 5, in the present embodiment, the liquid recovery unit 23 is disposed around the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). The liquid recovery unit 23 is disposed around the lower surface 24.

  The second member 22 faces the entire lower surface 24. At least a part of the second member 22 faces the liquid recovery unit 23. In the present embodiment, at least a part of the second portion 222 faces the liquid recovery unit 23. Note that at least a part of the second portion 222 and the third portion 223 may face the liquid recovery unit 23. Note that at least some of the second portion 222, the third portion 223, and the first portion 221 may face the liquid recovery unit 23. At least a part of the liquid recovery unit 23 is disposed outside the second member 22. A part of the liquid recovery unit 23 is disposed around the second member 22.

 The liquid recovery unit 23 may be disposed in a part of the periphery of the optical path K of the exposure light EL (the optical axis AX of the terminal optical element 13). For example, a plurality of liquid recovery units 23 may be arranged around the optical path K (the optical axis AX of the terminal optical element 13).

  At least a part of the liquid recovery unit 23 is arranged so that the substrate P (object) faces each other. Further, at least a part of the liquid recovery unit 23 is disposed so that the second member 22 faces the liquid recovery unit 23. In the present embodiment, the substrate P (object) can face at least a part of the liquid recovery unit 23. The second member 22 can face at least a part of the liquid recovery unit 23. That is, in the present embodiment, the substrate P (object) and the second member 22 can face the liquid recovery unit 23. The liquid recovery part 23 can face at least a part of the substrate P (object) and at least a part of the second member 22 simultaneously.

 The liquid recovery part 23 can recover the liquid LQ from at least one of the first space SP1 and the second space SP2. That is, the liquid recovery unit 23 can recover at least a part of the liquid LQ from the first space SP1. The liquid recovery part 23 can recover at least a part of the liquid LQ from the second space SP2. The liquid LQ in the first space SP1 can flow into the liquid recovery part 23 through the opening 47. The liquid LQ in the second space SP2 can flow into the liquid recovery unit 23 through the opening 48.

 As described above, the first space SP1 and the second space SP2 are connected. The liquid LQ can move from one of the first space SP1 and the second space SP2 to the other. The liquid LQ in the first space SP1 can move to the second space SP2 through a space (a space between the liquid recovery unit 23 and the substrate P) that the outer edge of the second member 22 faces. The liquid LQ in the second space SP2 can move to the first space SP1 through a space (a space between the liquid recovery unit 23 and the substrate P) that the outer edge of the second member 22 faces.

  Further, the liquid LQ in the first space SP1 can move to the second space SP2 through the space (the fourth space SP4) that the inner edge of the second member 22 faces. The liquid LQ in the second space SP2 can move to the first space SP1 through the space (the fourth space SP4) that the inner edge of the second member 22 faces.

  The liquid recovery unit 23 is connected to the liquid recovery device 37C via a recovery flow path (space) 37R formed inside the first member 21. The liquid recovery device 37C can connect the liquid recovery unit 23 and the vacuum system. At least a part of the liquid LQ from the first space SP1 can flow into the recovery channel 37R via the liquid recovery unit 23. In addition, at least part of the liquid LQ from the second space SP2 can flow into the recovery flow path 37R via the liquid recovery unit 23.

 In the present embodiment, the liquid recovery part 23 includes a porous member 38. The liquid recovery port includes a hole 37 of the porous member 38. In the present embodiment, the porous member 38 includes a mesh plate. The porous member 38 includes a lower surface 39 to which at least one of the upper surface 25 and the substrate P (object) can face, an upper surface facing the recovery flow path 37R, and a plurality of holes 37 connecting the lower surface and the upper surface. The liquid recovery unit 23 recovers the liquid LQ through the hole 37 of the porous member 38. At least a part of the liquid LQ from the first space SP1 and the liquid LQ from the second space SP2 recovered from the liquid recovery part 23 (the hole 37 of the porous member 38) flows into the recovery flow path 37R, and the recovery flow It flows through the path 37R and is recovered by the liquid recovery device 37C.

  In the present embodiment, substantially only the liquid LQ is recovered via the liquid recovery unit 23, and the recovery of gas is limited. The control device 6 controls the pressure on the lower surface side of the porous member 38 (first and second) so that the liquid LQ in the first space SP1 passes through the hole 37 of the porous member 38 and flows into the recovery flow path 37R and does not pass the gas. The difference between the pressure on the second space SP1, SP2 side) and the pressure on the upper surface side (pressure on the recovery flow path 37R) is adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  Note that both the liquid LQ and the gas may be collected (sucked) through the porous member 38. Note that the porous member 38 may not be provided in the first member 21. That is, the fluid (one or both of the liquid LQ and the gas) from at least one of the first space SP1 and the second space SP2 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the liquid recovery part 23 includes the lower surface of the porous member 38. The lower surface of the liquid recovery unit 23 is disposed around the lower surface 24. In the present embodiment, the lower surface of the liquid recovery unit 23 is substantially parallel to the XY plane. In the present embodiment, the lower surface and the lower surface 24 of the liquid recovery unit 23 are disposed in the same plane (they are flush).

  Note that the lower surface of the liquid recovery unit 23 may be disposed on the + Z side with respect to the lower surface 24, or may be disposed on the −Z side. The lower surface of the liquid recovery unit 23 may be inclined with respect to the lower surface 24, or may include a curved surface.

  In the present embodiment, the recovery operation of the liquid LQ from the liquid recovery unit 23 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 33, so that the terminal optical element 13 on one side and the liquid immersion unit are immersed. An immersion space LS is formed with the liquid LQ between the member 5 and the substrate P (object) on the other side.

  A part of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the liquid immersion member 5 and the substrate P (object). In the example shown in FIGS. 2, 3, and 4, the interface LG is formed between the first member 21 and the substrate P (object).

 Further, a part of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the liquid immersion member 5 and the last optical element 13. In the example shown in FIGS. 2, 3, and 4, the interface LG is formed between the first member 21 and the last optical element 13.

  In the following description, the interface LG of the liquid LQ formed between the first member 21 and the substrate P (object) is appropriately referred to as a first interface LG1, and is defined between the first member 21 and the last optical element 13. The interface LG of the liquid LQ formed in the above is appropriately referred to as a second interface LG2.

 In the state where the immersion space LS is formed, an interface LG of the liquid LQ may be formed between the first member 21 and the second member 22, and the second member 22 and the substrate P (object ) May form the interface LG of the liquid LQ.

  Next, an example of the operation of the second member 22 will be described. The second member 22 is movable independently of the substrate P (object).

 The second portion 222 may be moved in a state where the immersion space LS is formed. The second portion 222 may be moved in a state where the liquid LQ in the immersion space LS is in contact. The second portion 222 may be moved in a state where the liquid LQ exists in the first space SP1 and the second space SP2. The second portion 222 may be moved in a state where a part of the second portion 222 is disposed in the immersion space LS (a state where the second portion 222 is immersed in the liquid LQ of the immersion space LS). The second portion 222 may be moved in a state where the entire second portion 222 is disposed in the immersion space LS (a state used for the liquid LQ in the immersion space LS).

 The second portion 222 may be moved in a state where the second member 22 and the substrate P (object) do not face each other. The second portion 222 may be moved in a state where no object exists below the second member 22.

 The second portion 222 may be moved in a state where the liquid LQ does not exist in the space between the second member 22 and the substrate P (object). The second portion 222 may be moved in a state where the immersion space LS is not formed.

  The second portion 222 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12. The second portion 222 may be moved in parallel with at least a part of a period in which the exposure light EL is emitted from the emission surface 12 in a state where the immersion space LS is formed.

 The second portion 222 may be moved in cooperation with the movement of the substrate P (object). The second portion 222 may be moved in parallel with at least a part of the movement of the substrate P (object). The second member 22 may be moved in at least a part of the period during which the substrate P (object) moves. The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS is formed.

  The second portion 222 may be moved based on the movement condition of the substrate P (object). The second portion 222 may be moved in the Z-axis direction based on the movement condition of the substrate P (object). The control device 6 may move the second portion 222 in parallel with at least a part of the movement of the substrate P (object) based on the movement condition of the substrate P (object). The controller 6 moves the second portion 222 while supplying the liquid LQ from the liquid supply unit 33 and collecting the liquid LQ from the liquid recovery unit 23 so that the immersion space LS is continuously formed. Also good.

 FIG. 6 is a diagram illustrating an example of a state in which the second portion 222 moves. As shown in FIGS. 6A and 6B, the second portion 222 is movable in the Z-axis direction in a state where the immersion space LS is formed. For example, the second member 22 may move in the Z-axis direction while moving in the X-axis direction, or may move in the Z-axis direction while moving in the Y-axis direction.

  In the present embodiment, the second portion 222 is movable within a movable range (movable range) defined with respect to the Z-axis direction. FIG. 6A shows a state in which the second portion 222 is disposed at the end (lower end) on the most −Z side of the movable range. FIG. 6B shows a state in which the second portion 222 is disposed at the end (upper end) on the most + Z side of the movable range.

 In the following description, the position of the lowermost second portion 222 of the movable range is appropriately referred to as a lower end position, and the position of the uppermost second portion 222 is appropriately referred to as an upper end position.

  As shown in FIG. 6A, in the present embodiment, the first lower surface 261 and the second lower surface 262 are substantially the same in the Z-axis direction in a state where the second portion 222 is disposed at the lower end position. It is arranged at the position (height). Further, in a state where the second portion 222 is disposed at the lower end position, the first lower surface 261, the second lower surface 262, and the third lower surface 263 are disposed in the same plane substantially parallel to the XY plane.

  As shown in FIG. 6B, in the present embodiment, in the state where the second portion 222 is disposed at the upper end position, the second lower surface 262 is above the first lower surface 261 with respect to the Z-axis direction (+ Z side). ). Further, in a state where the second portion 222 is disposed at the upper end position, the second lower surface 262 is disposed substantially parallel to the XY plane. Further, in a state where the second portion 222 is disposed at the upper end position, the third lower surface 263 is inclined upward toward the outer side with respect to the optical path K.

  The dimension (distance) of the gap between the second lower surface 262 and the upper surface of the substrate P (object) when the second portion 222 is disposed at the upper end position is the same as that when the second portion 222 is disposed at the lower end position. 2 is larger than the dimension (distance) of the gap between the lower surface 262 and the upper surface of the substrate P (object). The space between the second lower surface 262 and the upper surface of the substrate P (object) when the second portion 222 is disposed at the upper end position is the second lower surface 262 when the second portion 222 is disposed at the lower end position. And larger than the space between the upper surface of the substrate P (object).

  The size (distance) of the gap between the second upper surface 252 and the lower surface 24 and the lower surface 39 when the second portion 222 is disposed at the upper end position is the second dimension when the second portion 222 is disposed at the lower end position. It is smaller than the dimension (distance) of the gap between the upper surface 252 and the lower surface 24 and the lower surface 39. The space between the second upper surface 252 and the lower surface 24 and the lower surface 39 when the second portion 222 is disposed at the upper end position is the same as the second upper surface 252 when the second portion 222 is disposed at the lower end position. It is smaller than the space between the lower surface 24 and the lower surface 39.

  As the second portion 222 moves (rises) in the + Z direction, the dimension of the gap between the second lower surface 262 of the second portion 222 and the upper surface of the substrate P (object) increases. When the second portion 222 moves (rises) in the + Z direction, the size of the gap between the second upper surface 252 of the second portion 222 and the lower surface 24 of the first member 21 (the lower surface 39 of the porous member 38) is reduced.

  As the second portion 222 moves (lowers) in the −Z direction, the dimension of the gap between the second lower surface 262 of the second portion 222 and the upper surface of the substrate P (object) is reduced. As the second portion 222 moves (lowers) in the −Z direction, the dimension of the gap between the second upper surface 252 of the second portion 222 and the lower surface 24 of the first member 21 (the lower surface 39 of the porous member 38) increases. .

 In the present embodiment, as shown in FIG. 6A, in the state where the second portion 222 is disposed at the lower end position, the interface LG1 of the liquid LQ is between the first member 21 and the substrate P (object). Formed between.

 As shown in FIG. 6B, in the state where the second portion 222 is disposed at the upper end position, the interface LG1 of the liquid LQ is between the first member 21 and the second member 22, and the second member 22. And the substrate P (object).

  In the following description, the interface LG1 formed between the first member 21 and the second member 22 is appropriately referred to as an interface LG11, and the interface formed between the second member 22 and the substrate P (object). LG1 is appropriately referred to as interface LG12.

 When the second portion 222 rises, at least a part of the interface LG1 of the liquid LQ between the liquid immersion member 5 and the substrate P (object) moves so as to approach the optical path K. When the second portion 222 is lowered, at least a part of the interface LG1 of the liquid LQ between the liquid immersion member 5 and the substrate P (object) moves away from the optical path K. That is, at least a part of the interface LG1 of the liquid LQ between the liquid immersion member 5 and the substrate P (object) moves in the radial direction with respect to the optical path K by the movement of the second portion 222 in the Z-axis direction.

  Further, when the second portion 22 repeats rising and lowering, in other words, when the second portion 222 reciprocates in the Z-axis direction (when the second portion 222 vibrates in the Z-axis direction), the liquid immersion member 5 and the substrate P (object), at least a part of the interface LG1 of the liquid LQ reciprocates (vibrates) in the radial direction with respect to the optical path K.

  In addition, when the interface LG12 of the liquid LQ is formed between the lower surface 26 (second lower surface 262) and the upper surface of the substrate P (object), the second portion 222 is raised and lowered (the second portion 222 is When vibrating in the Z-axis direction), the interface LG12 of the liquid LQ between the lower surface 26 (second lower surface 262) and the upper surface of the substrate P (object) vibrates in the radiation direction with respect to the optical path K. That is, the movement of the second portion 222 in the Z-axis direction moves the interface LG12 of the liquid LQ between the lower surface 24 (second lower surface 262) and the upper surface of the substrate P (object) in the radial direction with respect to the optical path K.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5 at least during a period in which the substrate stage 2 is separated from the liquid immersion member 5. The control device 6 supplies the liquid LQ from the liquid supply unit 33 and recovers the liquid LQ from the liquid recovery unit 23 to form the immersion space LS on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. In the state where the last optical element 13 and the liquid immersion member 5 and the substrate stage 2 (substrate P) face each other, the liquid LQ is recovered from the liquid recovery unit 23 in parallel with the supply of the liquid LQ from the liquid supply unit 33. As a result, an immersion space LS is formed between the last optical element 13 and the immersion member 5 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ.

 The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the emission surface 12 of the last optical element 13 and the substrate P, and the pattern of the mask M Are projected onto the substrate P.

   The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 7 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S that are exposure target areas are arranged in a matrix on the substrate P. The control device 6 moves the substrate P held by the first holding unit in the Y-axis direction (scanning direction) with respect to the exposure light EL emitted from the exit surface 12 of the last optical element 13, and then exits the exit surface. Each of the plurality of shot regions S of the substrate P is sequentially exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the substrate 12 and the substrate P.

 For example, in order to expose one shot region S of the substrate P, the control device 6 performs exposure light EL (projection region of the projection optical system PL) emitted from the emission surface 12 in a state where the immersion space LS is formed. (PR), the substrate P is moved in the Y-axis direction, and the mask M is moved in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. Meanwhile, the exposure light EL is irradiated onto the shot region S via the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P. Thereby, an image of the pattern of the mask M is projected onto the shot area S, and the shot area S is exposed with the exposure light EL emitted from the emission surface 12.

 After the exposure of the shot area S is completed, the control device 6 moves the substrate P to the Y axis in the XY plane in the state where the immersion space LS is formed in order to start the exposure of the next shot area S. In a direction intersecting with (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) and the next shot area S is moved to the exposure start position. Thereafter, the control device 6 starts exposure of the shot area S.

   In the state where the immersion space LS is formed on the substrate P (substrate stage 2), the control device 6 sets the shot region with respect to the position (projection region PR) irradiated with the exposure light EL from the emission surface 12. An operation of exposing the shot area while moving in the Y-axis direction, and after the exposure of the shot area, the next shot area is exposed in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The substrate P is moved in a direction intersecting the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so as to be arranged at the start position. Each of the plurality of shot areas of the substrate P is sequentially exposed while repeating the operation.

   In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in the state where the immersion space LS is formed on the substrate P (substrate stage 2) and before the exposure of the next shot area is started, in the XY plane The operation of moving the substrate P is appropriately referred to as a step movement operation.

  In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y-axis direction from a state in which a certain shot region S is arranged at the exposure start position to a state in which the shot area S is arranged at the exposure end position. In the step movement operation, the substrate P intersects with the Y-axis direction in the XY plane from a state where a certain shot area S is arranged at the exposure end position to a state where the next shot area S is arranged at the exposure start position. Includes movement in the direction.

  The exposure start position includes the position of the substrate P when one end of the shot area S in the Y-axis direction passes through the projection area PR for exposure of the shot area S. The exposure end position includes the position of the substrate P when the other end portion in the Y-axis direction of the shot area S irradiated with the exposure light EL passes through the projection area PR.

 The exposure start position of the shot area S includes a scan movement operation start position for exposing the shot area S. The exposure start position of the shot area S includes a step movement operation end position for arranging the shot area S at the exposure start position.

 The exposure end position of the shot area S includes a scan movement operation end position for exposing the shot area S. The exposure end position of the shot area S includes a step movement operation start position for placing the next shot area S at the exposure start position after the exposure of the shot area S is completed.

  In the following description, a period during which the scan movement operation is performed for exposure of a certain shot area S is appropriately referred to as a scan movement period. In the following description, a period during which the step movement operation is performed for the start of exposure of the next shot area S from the end of exposure of a certain shot area S is appropriately referred to as a step movement period.

  The scan movement period includes an exposure period from the start of exposure of a certain shot area S to the end of exposure. The step movement period includes a movement period of the substrate P from the end of exposure of a certain shot area S to the start of exposure of the next shot area S.

  In the scan movement operation, the exposure light EL is emitted from the emission surface 12. In the scan movement operation, the exposure light EL is irradiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emission surface 12. In the step movement operation, the exposure light EL is not irradiated onto the substrate P (object).

 The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement mainly in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation from the end of exposure of a certain shot area S to the start of exposure of the next shot area S includes one or both of acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

 In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS may be formed on the substrate stage 2 (cover member T). In at least part of the scan movement operation and the step movement operation, the immersion space LS may be formed so as to straddle the substrate P and the substrate stage 2 (cover member T). When the substrate P is exposed with the substrate stage 2 and the measurement stage 3 approaching or in contact with each other, the immersion space LS is formed in the substrate stage 2 (cover member T) in at least a part of the scan movement operation and the step movement operation. And the measurement stage 3 may be formed.

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7.

  The exposure conditions (exposure control information) include arrangement information of the plurality of shot areas S (positions of the plurality of shot areas S on the substrate P). The exposure condition (exposure control information) includes dimension information (dimension information about the Y-axis direction) of each of the plurality of shot regions S.

 Based on the exposure conditions (exposure control information) stored in the storage device 7, the control device 6 sequentially exposes each of the plurality of shot regions S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement distance, movement direction, and movement locus in the XY plane.

  As an example, in the present embodiment, the control device 6 uses the substrate stage so that the projection region PR of the projection optical system PL and the substrate P relatively move along the movement locus indicated by the arrow Sr in FIG. The projection region PR is irradiated with the exposure light EL while moving 2, and each of the plurality of shot regions S is sequentially exposed with the exposure light EL via the liquid LQ. The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation.

  After each of the plurality of shot areas S of the substrate P is sequentially exposed, the substrate stage 2 is moved to the substrate exchange position, and the exposed substrate P is unloaded from the substrate stage 2 (first holding unit). Processing is performed.

  Thereafter, the above processing is repeated, and a plurality of substrates P are sequentially exposed.

  In the present embodiment, the second portion 222 moves in the Z-axis direction during at least part of the period in which the substrate P (object) moves in the XY plane. The second part 222 moves in at least a part of the exposure processing of the substrate P. For example, the second portion 222 moves in parallel with at least a part of the step movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. For example, the second portion 222 moves in parallel with at least a part of the scanning movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. In parallel with the movement of the second portion 222, the exposure light EL is emitted from the emission surface 12.

  FIG. 8 schematically illustrates an example of the movement trajectory of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed while performing step movement on the substrate P including a component in the + X direction. FIG. The shot areas Sa, Sb, and Sc are arranged in the X-axis direction.

  As shown in FIG. 8, when the shot areas Sa, Sb, Sc are exposed, the substrate P is located under the last optical element 13 from the position d1 to the position d2 adjacent to the position d1 on the + Y side. Path Tp1, path Tp2 from position d2 to position d3 adjacent to + X side with respect to position d2, path Tp3 from position d3 to position d4 adjacent to −Y side with respect to position d3, and from position d4 to The path Tp4 from the position d4 to the position d5 adjacent to the + X side and the path Tp5 from the position d5 to the position d6 adjacent to the position +5 on the + Y side are sequentially moved. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve passing through the position d2.5. The path Tp4 includes a curve passing through the position d4.5. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the + Y direction. The path Tp3 is a path along which the substrate P moves in the −Y direction. The path Tp5 is a path along which the substrate P moves in the + Y direction. The path Tp2 and the path Tp4 are paths along which the substrate P moves in a direction whose main component is the + direction.

  When the substrate P moves along the path Tp1 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sa through the liquid LQ. When the substrate P moves along the path Tp3 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ. When the substrate P moves along the path Tp5 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ. When the substrate P moves along the path Tp2 and the path Tp4, the exposure light EL is not irradiated.

 Each of the movement of the substrate P along the path Tp1, the movement along the path Tp3, and the movement along the path Tp5 includes a scanning movement operation. Each of the operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 includes a step movement operation.

  That is, the period during which the substrate P moves along the path Tp1, the period during which the path Tp3 moves, and the period during which the substrate P moves along the path Tp5 are scan movement periods (exposure periods). Each of the period during which the substrate P moves along the path Tp2 and the period during which the substrate P moves along the path Tp4 is a step movement period.

  In the present embodiment, the upper surface of the substrate P and the second portion 222 are at least a part of the period in which the substrate P moves along the path Tp1, that is, at least a part of the period in which the substrate P moves in the + Y direction. The second portion 222 is moved by the driving device 27 so that the gap with the second lower surface 262 becomes the dimension Hc.

 In addition, after the movement of the path Tp1, the upper surface of the substrate P and the second portion 222 of the second part 222 are at least part of the period in which the substrate P moves on the path Tp2, that is, at least part of the period in which the substrate P moves in the + X direction. The second portion 222 is moved by the drive device 27 so that the gap with the second lower surface 262 becomes a dimension Ht smaller than the dimension Hc.

  Further, after the movement of the path Tp2, the upper surface of the substrate P and the second surface of the substrate P are at least part of the period during which the substrate P moves along the path Tp3, that is, at least part of the period during which the substrate P moves in the −Y direction. The second portion 222 is moved by the driving device 27 so that the gap between the portion 222 and the second lower surface 262 becomes a dimension Hc larger than the dimension Ht. Note that the dimension Hc when the substrate P moves along the path Tp1 and the dimension Hc when the substrate P moves along the path Tp3 may be the same or different.

 Further, after the movement of the path Tp3, at least a part of the period in which the substrate P moves along the path Tp4, that is, at least a part of the period in which the substrate P moves in the + X direction, The second portion 222 is moved by the drive device 27 so that the gap with the second lower surface 262 becomes a dimension Ht smaller than the dimension Hc. The dimension Ht when the substrate P moves along the path Tp2 and the dimension Ht when the substrate P moves along the path Tp4 may be the same or different.

  In addition, after the movement of the path Tp4, the upper surface of the substrate P and the second part are at least part of the period in which the substrate P moves along the path Tp5, that is, at least part of the period in which the substrate P moves in the + Y direction. The second portion 222 is moved by the drive device 27 so that the gap between the second lower surface 262 and the second lower surface 262 becomes a dimension Hc larger than the dimension Ht. The dimension Hc when the substrate P moves along the path Tp1 (path Tp3) and the dimension Hc when the substrate P moves along the path Tp5 may be the same or different.

  That is, in the present embodiment, in at least a part of the step movement period, the second portion 222 is disposed at the lower end position, for example, as illustrated in FIG. In at least a part of the scan movement period, the second member 222 is disposed at the upper end position, for example, as shown in FIG.

 FIG. 9 is a schematic diagram illustrating an example of the operation of the second portion 222.

 When the substrate P is at the position d1, as shown in FIG. 9A, the second portion 222 on the + X side and the second portion 222 on the −X side with respect to the first portion 221 are arranged at the lower end positions, respectively. The

  During the period in which the substrate P moves along the path Tp1, the second portion 222 on the + X side with respect to the first portion 221 moves (rises) in the + Z direction.

 When the substrate P is at the position d2, as shown in FIG. 9B, the second portion 222 on the + X side with respect to the first portion 221 is disposed at the upper end position. That is, during the scanning movement operation of the substrate P from the position d1 to the position d2, the second portion 222 moves (rises) from the lower end position to the upper end position. In synchronization with the scanning movement of the substrate P, the second portion 222 rises. As the second portion 222 rises, the interface LG1 (interface LG12) of the liquid LQ moves so as to approach the optical path K.

 In the period in which the substrate P moves along the path Tp2, the second portion 222 on the + X side moves (lowers) in the −Z direction with respect to the first portion 221.

 When the substrate P is at the position d2.5, as shown in FIG. 9C, the second portion 222 on the + X side with respect to the first portion 221 is arranged at the center position between the upper end position and the lower end position. .

 When the substrate P is at the position d3, as shown in FIG. 9D, the second portion 222 on the + X side with respect to the first portion 221 is disposed at the lower end position. That is, during the step movement operation of the substrate P from the position d2 to the position d3, the second portion 222 moves (lowers) from the upper end position to the lower end position. In synchronization with the step movement of the substrate P, the second portion 222 is lowered. As the second portion 222 descends, the interface LG1 (interface LG12) of the liquid LQ moves away from the optical path K.

  During the period in which the substrate P moves along the path Tp3, the second portion 222 on the + X side with respect to the first portion 221 moves (rises) in the + Z direction.

 When the substrate P is at the position d4, as shown in FIG. 9E, the second portion 222 on the + X side with respect to the first portion 221 is disposed at the upper end position. That is, during the scanning movement operation of the substrate P from the position d3 to the position d4, the second portion 222 moves (rises) from the lower end position to the upper end position. In synchronization with the scanning movement of the substrate P, the second portion 222 rises. As the second portion 222 rises, the interface LG1 (interface LG12) of the liquid LQ moves so as to approach the optical path K.

 During the period in which the substrate P moves along the path Tp4, the second portion 222 on the + X side moves (lowers) in the −Z direction with respect to the first portion 221.

 When the substrate P is at the position d4.5, as shown in FIG. 9F, the second portion 222 on the + X side with respect to the first portion 221 is arranged at the center position between the upper end position and the lower end position. .

 When the substrate P is at the position d5, as shown in FIG. 9G, the second portion 222 on the + X side with respect to the first portion 221 is disposed at the lower end position. That is, during the step movement operation of the substrate P from the position d4 to the position d5, the second portion 222 moves (lowers) from the upper end position to the lower end position. In synchronization with the step movement of the substrate P, the second portion 222 is lowered. As the second portion 222 descends, the interface LG1 (interface LG12) of the liquid LQ moves away from the optical path K.

  During the period in which the substrate P moves along the path Tp5, the second portion 222 on the + X side moves (rises) in the + Z direction with respect to the first portion 221.

 When the substrate P is at the position d6, as shown in FIG. 9H, the second portion 222 on the + X side with respect to the first portion 221 is disposed at the upper end position. That is, during the scanning movement operation from the position d5 to the position d6 of the substrate P, the second portion 222 moves (rises) from the lower end position to the upper end position. In synchronization with the scanning movement of the substrate P, the second portion 222 rises. As the second portion 222 rises, the interface LG1 (interface LG12) of the liquid LQ moves so as to approach the optical path K.

  That is, in the present embodiment, the second portion 222 has a dimension between the second portion 222 and the substrate P (object) in at least a part of a period (scan movement period) in which the substrate P moves along the path Tp1 (Tp3, Tp5). Move in the + Z direction so that (space) becomes larger.

  In the present embodiment, the second portion 222 has a dimension (space) between the second portion 222 and the substrate P (object) in at least a part of a period (step movement period) in which the substrate P moves along the path Tp2 (Tp4). ) Move in the −Z direction so that it becomes smaller.

 That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, the first portion 221 is arranged so that the dimension (space) between the substrate P and the substrate P becomes small during the step movement operation. On the other hand, the second portion 222 on the + X side moves in the −Z direction from the upper end position to the lower end position, and during the scan movement operation, the second portion 222 can move again in the −Z direction in the next step movement operation. The second portion 222 returns from the lower end position to the upper end position.

 In the example described with reference to FIGS. 8 and 9, the second portion 222 is disposed at the lower end position when the substrate P is at the positions d1, d3, and d5. When the board | substrate P exists in position d1, d3, d5, the 2nd part 222 may be arrange | positioned between a lower end position and a center position, and may be arrange | positioned in a center position.

 In the example described with reference to FIGS. 8 and 9, when the substrate P is at the positions d2, d4, and d6, the second portion 222 is disposed at the upper end position. When the substrate P is at the positions d2, d4, and d6, the second portion 222 may be disposed between the upper end position and the center position, or may be disposed at the center position.

  In the present embodiment, when the substrate P is at the positions d2.5 and d4.5, the second portion 22 may be disposed at a position different from the center position. That is, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed, for example, between the upper end position and the center position, or between the lower end position and the center position. It may be arranged.

  In the example described with reference to FIGS. 8 and 9, when the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, the second portion on the + X side with respect to the first portion 221 is used. The case where the portion 222 moves in the Z-axis direction has been described. When the substrate P repeats the scan movement operation and the step movement operation including the component in the −X direction, the second portion 222 on the −X side moves in the Z-axis direction with respect to the first portion 221.

  In the case where the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, not only the second portion 222 on the + X side with respect to the first portion 221 but also the second portion 222 on the −X side. May also move in the Z-axis direction.

  When the substrate P repeats the scan movement operation and the step movement operation including the component in the −X direction, not only the −X side second part 222 but also the + X side second part with respect to the first part 221. 222 may also move in the Z-axis direction.

  In the present embodiment, the example in which the second portion 222 moves in synchronization with the substrate P in a state where the immersion space LS is formed on the substrate P has been described. The second portion 222 may move in the Z-axis direction in synchronization with the substrate stage 2 in a state where the immersion space LS is formed on the substrate stage 2. The second portion 222 may move in the Z-axis direction in synchronization with the measurement stage 3 in a state where the immersion space LS is formed on the measurement stage 3.

  As described above, according to the present embodiment, since the second member 22 (second portion 222) that can move below the first member 21 is provided, the substrate is formed in a state where the immersion space LS is formed. Even if P (object) moves in the XY plane, for example, the liquid LQ is prevented from flowing out of the space between the liquid immersion member 5 and the object, or the liquid LQ remaining on the object. In addition, generation of bubbles (gas portion) in the liquid LQ in the immersion space LS is also suppressed.

  In the present embodiment, for example, as illustrated in FIG. 10, even when the second lower surface 262 is inclined with respect to the XY plane (first lower surface 261) in a state where the second portion 222 is disposed at the upper end position. Good. In the example shown in FIG. 10, the second lower surface 262 is inclined upward toward the outer side with respect to the optical path K. Note that the second lower surface 262 may be inclined downward with respect to the optical path K toward the outside. Further, the second upper surface 252 may be inclined with respect to the XY plane (the first lower surface 261) in a state where the second portion 222 is disposed at the upper end position. The second upper surface 252 may be inclined upward or outward with respect to the optical path K.

  Note that the second lower surface 262 may be inclined with respect to the XY plane (first lower surface 261) in a state where the second portion 222 is disposed at the lower end position.

 In the state where the second portion 222 is disposed at the upper end position, the second lower surface 262 is disposed above the first lower surface 261 (+ Z side), and the second portion 222 is disposed at the lower end position. The second lower surface 262 may be disposed on the upper side (+ Z side) of the first lower surface 261.

 In the state where the second portion 222 is disposed at the upper end position, the second lower surface 262 is disposed above the first lower surface 261 (+ Z side), and the second portion 222 is disposed at the lower end position. The second lower surface 262 may be disposed on the lower side (−Z side) than the first lower surface 261.

 In the state where the second portion 222 is disposed at the upper end position, the first lower surface 261 and the second lower surface 262 are disposed at substantially the same position (height) in the Z-axis direction, and the second portion 222 is In the state of being arranged at the lower end position, the second lower surface 262 may be arranged on the lower side (−Z side) than the first lower surface 261.

 In the state where the second portion 222 is disposed at the upper end position, the second lower surface 262 is disposed below the first lower surface 261 (−Z side), and the second portion 222 is disposed at the lower end position. In this state, the second lower surface 262 may be disposed on the lower side (−Z side) than the first lower surface 261.

 That is, the dimension (space) of the gap between the second lower surface 262 and the upper surface of the substrate P (object) in the state where the second portion 222 is disposed at the upper end position is the state where the second portion 222 is disposed at the lower end position. As long as it is larger than the dimension (space) of the gap between the second lower surface 262 and the upper surface of the substrate P (object).

 That is, the dimension (space) of the gap between the second lower surface 262 and the upper surface of the substrate P (object) when the second portion 222 is disposed at the upper end position is the state where the second portion 222 is disposed at the lower end position. The first lower surface 261 (or the upper surface of the object) in a state where the second portion 222 is disposed at the upper end position so as to be larger than the dimension (space) of the gap between the second lower surface 262 and the upper surface of the substrate P (object) in FIG. ) And the position of the second lower surface 262 relative to the first lower surface 261 (or the upper surface of the object) in a state where the second portion 222 is disposed at the lower end position.

  In the present embodiment, the first portion 221 may be movable. For example, the first part 221 may be moved in the Z-axis direction with a smaller movement amount (movement distance) than the second part 222. The first portion 221 may be moved by an actuator that operates by Lorentz force. The actuator may be disposed, for example, between the first support member 281 and the first member 21, or may be disposed between the first support member 281 and the first portion 221. The actuator may move the first portion 221 in the X axis, Y axis, Z axis, θX, θY, and θZ directions with respect to the first member 21. When the first portion 221 is moved in the X-axis direction (Y-axis direction), the second portion 222 may be moved in the Z-axis direction while being moved in the X-axis direction (Y-axis direction). Further, the first portion 221 may be softly supported with respect to the first member 21. The first portion 221 may be supported so as to swing with respect to the first member 21. For example, the first support member 281 may include a spring member, a bellows member, or a flexure.

  In the present embodiment, the first portion 221 and the second portion 222 may not be connected via the third portion 223. There may be a gap between the first portion 221 and the second portion 222.

  In the above-described embodiment, at least a part of the first member 21 may face the exit surface 12 of the last optical element 13.

  In the above-described embodiment, the first member 21 may be provided with a suction port that sucks at least one of the liquid LQ and the gas from the space between the first member 21 and the last optical element 13.

  In each of the above-described embodiments, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  In accordance with the above-described embodiment, the program recorded in the storage device 7 causes the control device 6 to configure the first member disposed at least in the periphery of the optical member, and the optical path of the exposure light below the first member. A first portion having a second upper surface disposed in at least a part of the periphery and opposed to the first lower surface of the first member with a gap and a second lower surface capable of facing an object, respectively, and an outer side of the first portion with respect to the optical path Forming a liquid immersion space on a substrate movable under the optical member using a liquid immersion member including a second member including a second portion disposed on the optical member; and And exposing the substrate with the exposure light emitted from the exit surface, and at least part of a period during which the substrate moves in a plane substantially perpendicular to the optical axis of the optical member, A first portion substantially parallel to the optical axis And moving the direction, it may be executed.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. As disclosed in Japanese Patent Publication No. 2004/019128, the optical path on the incident side (object surface side) of the last optical element 13 may be a projection optical system filled with the liquid LQ.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 11, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, International Publication No. 2001/035168. A lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 12, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, 23 ... Liquid recovery unit 24. Lower surface 25. Upper surface 26. Lower surface 32. Hole 33 33 Liquid supply unit 34. Opening 35. Opening 221 First portion 222 222 Second portion 223 3 parts, 251 ... first upper surface, 252 ... second upper surface, 253 ... third upper surface, 261 ... first lower surface, 262 ... second lower surface, 263 ... third lower surface, 281 ... first support member, 282 ... second Support member, EL ... exposure light, EX ... exposure device, IL ... illumination system, K ... light path, LQ ... liquid, LS ... immersion space, P ... substrate.

Claims (29)

A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member;
A second lower surface, which is disposed at least part of the periphery of the optical path of the exposure light below the first member and faces the first lower surface of the first member via a gap, and the second lower surface capable of facing the object. A second member having
The second member includes a first portion, and a second portion disposed outside the first portion with respect to the optical path,
In at least a part of a period in which the object moves in a plane substantially perpendicular to the optical axis of the optical member, the second portion is moved in a first direction substantially parallel to the optical axis by the operation of the driving device. The immersion member to be moved.  2. The liquid immersion member according to claim 1, wherein the second member includes a third portion that is disposed between the first portion and the second portion and is deformed by the operation of the driving device.   The liquid immersion member according to claim 2, wherein the first portion and the second portion are not substantially deformed. The gap between the upper surface of the object and the second lower surface of the second portion is set to the first dimension in at least a part of a period in which the object moves in a second direction substantially parallel to the second axis in the plane. The second part is moved so that
After the movement in the second direction, in at least a part of a period in which the object moves in a third direction substantially parallel to a third axis orthogonal to the second axis in the plane, The liquid immersion member according to any one of claims 1 to 3, wherein the second portion is moved so that a gap between the second portion and the second lower surface is a second dimension smaller than the first dimension. .   The liquid immersion member according to any one of claims 1 to 4, wherein the second portion is moved in the first direction based on a moving condition of the object.   6. The liquid interface between the second lower surface and the upper surface of the object is moved in a radial direction with respect to the optical path by the movement of the second portion with respect to the first direction. Liquid immersion member. A first support member connected to the first portion;
A second support member connected to the second portion,
The liquid immersion member according to any one of claims 1 to 6, wherein the second portion moves by moving the second support member. A through hole formed in the first member so as to be connected to the first space facing the second upper surface;
At least a portion of the second support member is disposed in the through hole;
The liquid immersion member according to claim 7, wherein the second support member is moved inside the through hole.   The liquid immersion member according to claim 7 or 8, wherein the first portion is supported by the first member via the first support member.   The liquid immersion member according to claim 1, wherein the first portion does not substantially move.   The liquid immersion member according to claim 1, wherein the first member does not substantially move. A supply unit for supplying a liquid for forming the immersion space;
A recovery unit for recovering at least a part of the liquid in the immersion space,
At least a part of the second member is moved in the first direction in parallel with the supply of the liquid from the supply unit and the recovery of the liquid from the recovery unit. The liquid immersion member described. The collection unit is disposed on the first member,
The liquid immersion member according to claim 12, wherein at least a part of the liquid from at least one of the first space facing the second upper surface and the second space facing the second lower surface is recovered.   The liquid immersion member according to claim 13, wherein at least a part of the second member faces the recovery unit.   The liquid recovery member according to claim 12, wherein the recovery unit includes a porous member.   The liquid supply member according to any one of claims 12 to 15, wherein the supply unit is disposed on the first member. The first member has a first opening through which the exposure light can pass,
The liquid immersion member according to claim 1, wherein the second member has a second opening through which the exposure light can pass.   The liquid immersion member according to claim 17, wherein the second opening is formed in the first portion.   The liquid immersion member according to any one of claims 1 to 18, wherein the second portion is movable during at least a part of a period in which the exposure light is emitted from the emission surface. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the liquid immersion member according to any one of claims 1 to 19. The object includes the substrate;
In a state where the immersion space is formed, the substrate moves in the plane substantially perpendicular to the optical axis of the optical member and then moves in the second path,
In the first path, the movement of the substrate includes movement in a second direction substantially parallel to the second axis in the plane;
In the second path, the movement of the substrate includes movement in a third direction substantially parallel to a third axis perpendicular to the second axis in the plane,
The second portion is moved such that the gap between the upper surface of the substrate and the second lower surface of the second portion is a first dimension in at least a part of a period during which the substrate moves along the first path;
The gap between the upper surface of the substrate and the second lower surface of the second portion becomes a second dimension smaller than the first dimension in at least a part of a period during which the substrate moves in the second path. The exposure apparatus according to claim 20, wherein the second portion is moved.   The exposure light is irradiated to the shot region of the substrate through the liquid in the immersion space when the substrate moves along the first path, and the exposure light is not irradiated when moved along the second path. Item 22. The exposure apparatus according to Item 21. The substrate moves along the third path after moving along the second path,
In the third path, the movement of the substrate includes movement in a third direction opposite to the first direction;
The second member is arranged so that a gap between the upper surface of the substrate and the second lower surface becomes a third dimension larger than the second dimension in at least a part of a period during which the substrate moves along the third path. The exposure apparatus according to claim 21 or 22, wherein the exposure apparatus is moved.   The exposure apparatus according to any one of claims 20 to 23, wherein the object includes a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 20 to 24;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member; and a gap between the first lower surface of the first member disposed on at least a part of the periphery of the optical path of the exposure light below the first member. And a second member including a first portion having a second upper surface facing each other and a second lower surface to which the object can face, and a second portion disposed outside the first portion with respect to the optical path. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member provided;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
In at least a part of the period in which the substrate moves in a plane substantially perpendicular to the optical axis of the optical member, the second portion is moved in a first direction substantially parallel to the optical axis by the operation of the driving device. Moving the exposure method. Exposing the substrate using the exposure method of claim 26;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed on at least a part of the periphery of the optical member; and a gap between the first lower surface of the first member disposed on at least a part of the periphery of the optical path of the exposure light below the first member. And a second member including a first portion having a second upper surface facing each other and a second lower surface to which the object can face, and a second portion disposed outside the first portion with respect to the optical path. Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member provided;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
In at least a part of the period in which the substrate moves in a plane substantially perpendicular to the optical axis of the optical member, the second portion is moved in a first direction substantially parallel to the optical axis by the operation of the driving device. A program for moving and executing.  A computer-readable recording medium on which the program according to claim 28 is recorded.

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