JP2014086456A - Liquid immersion member, exposure device, exposure method, device manufacturing method, program, and storage medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of restraining exposure failure.SOLUTION: A liquid immersion member comprises: a first member arranged on at least one part around an optical member; a second member that is arranged on at least one part around an optical path of exposure light below the first member, that has a second upper face opposed to a first lower face of the first member via a gap and a second lower face that can be opposed to an object, and that can move to the first member; and a first supply part for supplying liquid to form a liquid immersion space. A first space on a second upper face side includes: a first portion in which a gap between the first member and the second member is first dimension; and a second portion that is arranged on the optical path outside the first portion, and in which the gap between the first member and the second member is second dimension smaller than the first dimension.

Description

  The present invention relates to a liquid immersion member, an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

 As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

U.S. Pat. No. 7,864,292

 In the immersion exposure apparatus, if foreign matter (bubbles, particles, etc.) is present in the liquid in the optical path of the exposure light, exposure failure may occur. As a result, a defective device may occur.

   An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. An immersion member that forms an immersion space on the first member, the first member disposed at least part of the periphery of the optical member, and disposed at least part of the periphery of the optical path of the exposure light below the first member A second upper surface opposed to the first lower surface of the first member via a gap and a second lower surface capable of facing the object, a second member movable relative to the first member, and an immersion space. A first supply section for supplying a liquid for forming, and the first space on the second upper surface side has a first portion having a first dimension between the first member and the second member, and the optical path. And a second portion having a second dimension, the gap between the first member and the second member being smaller than the first dimension. Liquid immersion member comprising is provided.

  According to the second aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. An immersion member that forms an immersion space on the first member, the first member disposed at least part of the periphery of the optical member, and disposed at least part of the periphery of the optical path of the exposure light below the first member A second upper surface opposed to the first lower surface of the first member via a gap and a second lower surface capable of facing the object, a second member movable relative to the first member, and an immersion space. A first supply unit that supplies a liquid for forming; a guide unit that is disposed on one or both of the first lower surface and the second upper surface and guides at least part of the liquid in the first space on the second upper surface side; An immersion member is provided.

  According to the third aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. An immersion member that forms an immersion space on the first member, the first member disposed at least part of the periphery of the optical member, and disposed at least part of the periphery of the optical path of the exposure light below the first member A second upper surface opposed to the first lower surface of the first member via a gap and a second lower surface capable of facing the object, a second member movable relative to the first member, and an immersion space. A liquid immersion member is provided that includes a first supply unit that supplies a liquid for forming, and a second supply unit that faces the first space on the second upper surface side and supplies the liquid to the first space.

  According to a fourth aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the exposure apparatus comprising the liquid immersion member according to any one of the first, second, and third aspects. An apparatus is provided.

  According to a fifth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the fourth aspect and developing the exposed substrate.

  According to a sixth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first lower surface that is disposed in at least a part of the periphery of the optical path of the exposure light below the first member, and a second upper surface that faces the first lower surface of the first member via a gap, and a second lower surface that can face the substrate. And a first supply part for supplying a liquid for forming an immersion space, and the gap between the first member and the second member is relative to the first portion having the first dimension and the optical path Using a liquid immersion member disposed outside the first portion and having a second portion in which the gap between the first member and the second member is smaller than the first dimension formed in the first space on the second upper surface side, Forming a liquid immersion space on a substrate movable under the member and passing the liquid in the immersion space; And exposing a substrate with exposure light emitted from the emergent surface Te, at least part of the exposure of the substrate, the exposure method comprising moving the second member relative to the first member, is provided.

  According to a seventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first lower surface that is disposed in at least a part of the periphery of the optical path of the exposure light below the first member, and a second upper surface that faces the first lower surface of the first member via a gap, and a second lower surface that can face the substrate. At least one of the liquids in the first space on the second upper surface side, which is disposed on one or both of the first supply portion that supplies the liquid for forming the immersion space, the first lower surface, and the second upper surface. Forming a liquid immersion space on a substrate movable under the optical member by using a liquid immersion member including a guiding part for guiding a part, and ejecting from the ejection surface through the liquid in the liquid immersion space Exposing the substrate with exposed exposure light and at least part of the exposure of the substrate There are, exposure method comprising moving the second member relative to the first member, is provided.

  According to an eighth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and the exposure method is disposed on at least a part of the periphery of the optical member. A first lower surface that is disposed in at least a part of the periphery of the optical path of the exposure light below the first member, and a second upper surface that faces the first lower surface of the first member via a gap, and a second lower surface that can face the substrate. A first supply part that supplies a liquid for forming an immersion space, and a second supply part that faces the first space on the second upper surface side and supplies the liquid to the first space. Using a liquid immersion member, a liquid immersion space is formed on a substrate movable below the optical member, and the substrate is exposed with exposure light emitted from the exit surface through the liquid in the liquid immersion space. And at least part of the exposure of the substrate, the second member is moved relative to the first member. Exposure method comprising it and, is provided.

  According to a ninth aspect of the present invention, exposing the substrate using the exposure method of any one of the sixth, seventh, and eighth aspects, and developing the exposed substrate. A device manufacturing method is provided.

  According to a tenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate, A first member disposed at least at a part of the periphery of the optical member, and a first member disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface of the first member via a gap. 2 a second member having an upper surface and a second lower surface that can be opposed to the substrate, and a first supply part that supplies a liquid for forming an immersion space, and the gap between the first member and the second member is the first A first portion of one dimension and a second portion that is disposed outside the first portion with respect to the optical path and in which the gap between the first member and the second member is smaller than the first dimension is in the first space on the second upper surface side. Using the formed immersion member on a substrate that can be moved under the optical member Forming an immersion space in the body, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and at least part of the exposure of the substrate relative to the first member A program for executing the movement of the second member is provided.

  According to an eleventh aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member disposed at least at a part of the periphery of the optical member, and a first member disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface of the first member via a gap. A second member having a second upper surface and a second lower surface on which the substrate can face, a first supply unit for supplying a liquid for forming an immersion space, and one or both of the first lower surface and the second upper surface. Forming a liquid immersion space on a substrate movable below the optical member, using a liquid immersion member including a guiding portion for guiding at least part of the liquid in the first space on the second upper surface side; Exposure light emitted from the exit surface through the liquid in the immersion space And exposing the substrate, at least part of the exposure of the substrate, a program to be executed and moving the second member relative to the first member, it is provided.

  According to a twelfth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A first member disposed at least at a part of the periphery of the optical member, and a first member disposed below at least a part of the periphery of the optical path of the exposure light and facing the first lower surface of the first member via a gap. A second member having a second upper surface and a second lower surface on which the substrate can face, a first supply unit for supplying a liquid for forming an immersion space, and a first space facing the first space on the second upper surface side; Forming a liquid immersion space on a substrate movable below the optical member by using a liquid immersion member including a second supply unit for supplying liquid to the liquid crystal; and an exit surface through the liquid in the liquid immersion space Exposure of the substrate with exposure light emitted from the In a part program to be executed and moving the second member relative to the first member, it is provided.

  According to a thirteenth aspect of the present invention, there is provided a computer-readable recording medium on which a program according to any one of the tenth, eleventh and twelfth aspects is recorded.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 1st Embodiment. FIG. 3 is a side sectional view showing a part of the liquid immersion member according to the first embodiment. FIG. 6 is a diagram illustrating an example of the operation of the liquid immersion member according to the first embodiment. It is the figure which looked at the liquid immersion member concerning a 1st embodiment from the lower part. FIG. 3 is an exploded perspective view illustrating an example of a liquid immersion member according to the first embodiment. FIG. 3 is an exploded perspective view illustrating an example of a liquid immersion member according to the first embodiment. It is a figure which shows an example of the 1st member which concerns on 1st Embodiment. FIG. 6 is a diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 2nd Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 3rd Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 4th Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 4th Embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a fourth embodiment. It is the figure which looked at the liquid immersion member which concerns on 4th Embodiment from the downward direction. It is a perspective view which shows an example of the liquid immersion member which concerns on 4th Embodiment. It is the figure which looked at the 1st member concerning a 4th embodiment from the lower part. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

   The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

   In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL The projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, the liquid immersion member 5 that forms the liquid immersion space LS of the liquid LQ, and the overall operation of the exposure apparatus EX are controlled. And a storage device 7 that is connected to the control device 6 and stores various types of information related to exposure.

   The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). One or both of a detection system that detects the alignment mark of the substrate P and a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

 In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

   The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

   The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

   The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. The drive system 11 may include a linear motor.

   The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

   The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis.

 With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

   The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

  The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal. Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

 The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the liquid immersion member 5 according to this embodiment will be described. The liquid immersion member may be referred to as a nozzle member. FIG. 2 is a cross-sectional view of the liquid immersion member 5 parallel to the XZ plane. FIG. 3 is an enlarged view of a part of FIG. FIG. 4 is a diagram illustrating an example of the operation of the liquid immersion member 5. FIG. 5 is a view of the liquid immersion member 5 as viewed from below (−Z side). 6 and 7 are exploded perspective views of the liquid immersion member 5.

  The immersion member 5 forms an immersion space LS for the liquid LQ on an object that can move below the last optical element 13.

 An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the liquid immersion member 5 and can be opposed to the liquid immersion member 5. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one. In the exposure of the substrate P, the immersion space LS is formed so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

   In the following description, it is assumed that the object is the substrate P. As described above, the object may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3.

 The immersion space LS may be formed so as to straddle two objects. For example, the immersion space LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2. The immersion space LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The immersion space LS is formed so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. At least a part of the immersion space LS is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the immersion space LS is formed in a space between the immersion member 5 and the substrate P (object).

  The liquid immersion member 5 includes a first member 21 disposed on at least a part of the periphery of the terminal optical element 13, and a second member 22 disposed on at least a part of the periphery of the optical path K below the first member 21. It has. The second member 22 is movable with respect to the first member 21.

 In the state where the immersion space LS is formed, the second member 22 is movable. The second member 22 is movable in a state where the liquid LQ in the immersion space LS is in contact. The second member 22 is movable in a state where the second member 22 is disposed in the immersion space LS.

 The first member 21 is disposed at a position farther from the substrate P (object) than the second member 22. At least a part of the second member 22 is disposed between the first member 21 and the substrate P (object). At least a part of the second member 22 is disposed between the terminal optical element 13 and the substrate P (object). The second member 22 may not be disposed between the terminal optical element 13 and the substrate P (object).

  The first member 21 has a lower surface 23 facing the −Z direction. The second member 22 has an upper surface 25 facing the + Z direction and a lower surface 26 facing the −Z direction.

 The second member 22 can face the lower surface 23. At least a part of the upper surface 25 of the second member 22 faces the lower surface 23 with a gap. At least a part of the upper surface 25 faces the emission surface 12 with a gap. Note that the upper surface 25 may not face the emission surface 12.

 The substrate P (object) can face the lower surface 26. At least a part of the upper surface of the substrate P faces the lower surface 26 with a gap. At least a part of the upper surface of the substrate P faces the emission surface 12 with a gap.

 In the Z-axis direction, the dimension of the gap between the upper surface of the substrate P (object) and the emission surface 12 is larger than the dimension of the gap between the upper surface and the lower surface 26 of the substrate P. Note that the size of the gap between the upper surface of the substrate P (object) and the emission surface 12 may be substantially equal to the size of the gap between the upper surface of the substrate P and the lower surface 26. Note that the size of the gap between the upper surface of the substrate P (object) and the emission surface 12 may be smaller than the size of the gap between the upper surface of the substrate P and the lower surface 26.

  A first space SP1 is formed on the upper surface 25 side. The first space SP1 includes a space between the lower surface 23 and the upper surface 25. A second space SP2 is formed on the lower surface 26 side. The second space SP2 includes a space between the lower surface 26 and the upper surface of the substrate P (object).

  Regarding the Z-axis direction, the dimension of the first space SP1 is smaller than the dimension of the second space SP2. In addition, regarding the Z-axis direction, the dimension of the first space SP1 may be substantially equal to the dimension of the second space SP2, or may be larger than the dimension of the second space SP2.

  The upper surface 25 is liquid repellent with respect to the liquid LQ. In the present embodiment, the upper surface 25 includes the surface of a resin film containing fluorine. The upper surface 25 includes the surface of a film of PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer). The upper surface 25 may include the surface of a PTFE (Poly tetrafluoroethylene) film. The contact angle of the upper surface 25 with respect to the liquid LQ is larger than 90 degrees. In addition, the contact angle of the upper surface 25 with respect to the liquid LQ may be larger than 100 degrees, larger than 110 degrees, or larger than 120 degrees.

  Since the upper surface 25 is liquid repellent with respect to the liquid LQ, it is possible to prevent a gas portion from being generated in the liquid LQ in the first space SP1 and bubbles from being mixed into the liquid LQ.

 The contact angle of the upper surface 25 with respect to the liquid LQ may be larger than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the upper surface 25 with respect to the liquid LQ may be smaller than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the upper surface 25 with respect to the liquid LQ may be substantially equal to the contact angle of the upper surface of the substrate P with respect to the liquid LQ.

 The upper surface 25 may be lyophilic with respect to the liquid LQ. The contact angle of the upper surface 25 with respect to the liquid LQ may be smaller than 90 degrees, smaller than 80 degrees, or smaller than 70 degrees. Thereby, the liquid LQ flows smoothly in the first space SP1.

  The lower surface 23 may be liquid repellent with respect to the liquid LQ. For example, both the lower surface 23 and the upper surface 25 may be liquid repellent with respect to the liquid LQ. The contact angle of the lower surface 23 with respect to the liquid LQ may be greater than 90 degrees, greater than 100 degrees, greater than 110 degrees, or greater than 120 degrees.

 The lower surface 23 may be liquid repellent with respect to the liquid LQ, and the upper surface 25 may be lyophilic with respect to the liquid LQ. The contact angle of the lower surface 23 with respect to the liquid LQ may be larger than the contact angle of the upper surface 25 with respect to the liquid LQ.

  The lower surface 23 may be lyophilic with respect to the liquid LQ. For example, both the lower surface 23 and the upper surface 25 may be lyophilic with respect to the liquid LQ. The contact angle of the lower surface 23 with respect to the liquid LQ may be smaller than 90 degrees, smaller than 80 degrees, or smaller than 70 degrees.

 The lower surface 23 may be lyophilic with respect to the liquid LQ, and the upper surface 25 may be lyophobic with respect to the liquid LQ. The contact angle of the lower surface 23 with respect to the liquid LQ may be smaller than the contact angle of the upper surface 25 with respect to the liquid LQ.

  In the present embodiment, the lower surface 26 is lyophilic with respect to the liquid LQ. The contact angle of the lower surface 26 with respect to the liquid LQ may be smaller than 90 degrees, smaller than 80 degrees, or smaller than 70 degrees. In the present embodiment, the contact angle of the lower surface 26 with respect to the liquid LQ is smaller than the contact angle of the upper surface of the substrate P with respect to the liquid LQ. The contact angle of the lower surface 26 with respect to the liquid LQ may be larger than or substantially equal to the contact angle of the upper surface of the substrate P with respect to the liquid LQ.

  The first member 21 has an inner side surface 28 that faces the side surface 13F of the terminal optical element 13, and an outer surface 29 that faces the optical path K (the optical axis of the terminal optical element 13). The second member 22 has an inner surface 30 that faces the outer surface 29 with a gap.

 The inner side surface 28 of the first member 21 faces the side surface 13F of the last optical element 13 with a gap therebetween. A third space SP3 is formed on the inner surface 28 side. The third space SP3 includes a space between the side surface 13F and the inner side surface 28.

 A side surface 13F of the last optical element 13 is disposed around the exit surface 12. The side surface 13F is a non-emission surface that does not emit the exposure light EL. The exposure light EL passes through the emission surface 12 and does not pass through the side surface 13F.

  In the present embodiment, the lower surface 23 is substantially parallel to the XY plane. The upper surface 25 is also substantially parallel to the XY plane. The lower surface 26 is also substantially parallel to the XY plane. That is, the lower surface 23 and the upper surface 25 are substantially parallel. The upper surface 25 and the lower surface 26 are substantially parallel.

  Note that the lower surface 23 may be non-parallel to the XY plane. The lower surface 23 may be inclined with respect to the XY plane, or may include a curved surface.

 Note that the upper surface 25 may be non-parallel to the XY plane. The upper surface 25 may be inclined with respect to the XY plane or may include a curved surface.

 Note that the lower surface 26 may be non-parallel to the XY plane. The lower surface 26 may be inclined with respect to the XY plane and may include a curved surface.

  The lower surface 23 and the upper surface 25 may be parallel or non-parallel. The upper surface 25 and the lower surface 26 may be parallel or non-parallel. The lower surface 23 and the lower surface 26 may be parallel or non-parallel.

  The first member 21 has an opening 34 through which the exposure light EL emitted from the emission surface 12 can pass. The second member 22 has an opening 35 through which the exposure light EL emitted from the emission surface 12 can pass. At least a part of the last optical element 13 is disposed inside the opening 34. A lower surface 23 is disposed around the lower end of the opening 34. An upper surface 25 is disposed around the upper end of the opening 35. A lower surface 26 is disposed around the lower end of the opening 35.

 In the present embodiment, at least a part of the inner surface 35U of the second member 22 that defines the opening 35 facing the optical path K is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K. Thereby, the 2nd member 22 can move smoothly in the state where 35U of inner surfaces of the 2nd member 22 are arranged in immersion space LS. Further, even when the second member 22 moves in a state where the inner surface 35U of the second member 22 is disposed in the immersion space LS, the pressure of the liquid LQ in the immersion space LS is suppressed from fluctuating.

 The dimension of the opening 34 in the XY plane is larger than the dimension of the opening 35. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the X-axis direction. The dimension of the opening 34 is larger than the dimension of the opening 35 with respect to the Y-axis direction. In the present embodiment, the first member 21 is not disposed directly below the emission surface 12. The opening 34 of the first member 21 is disposed around the emission surface 12. The opening 34 is larger than the exit surface 12. The lower end of the gap formed between the side surface 13F of the last optical element 13 and the first member 21 faces the upper surface 25 of the second member 22. The opening 35 of the second member 22 is disposed so as to face the emission surface 12. In the present embodiment, the shape of the opening 35 in the XY plane is a rectangular shape. The opening 35 is long in the X-axis direction. The shape of the opening 35 may be an ellipse that is long in the X-axis direction or a polygon that is long in the X-axis direction.

 The dimension of the opening 34 may be smaller than the dimension of the opening 35. The dimension of the opening 34 may be substantially equal to the dimension of the opening 35.

  The first member 21 is disposed around the last optical element 13. The first member 21 is an annular member. The first member 21 is disposed so as not to contact the terminal optical element 13. A gap is formed between the first member 21 and the last optical element 13. The first member 21 does not face the emission surface 12. A part of the first member 21 may face the emission surface 12. That is, a part of the first member 21 may be disposed between the emission surface 12 and the upper surface of the substrate P (object). The first member 21 may not be annular. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 (optical path K). For example, a plurality of the first members 21 may be arranged around the last optical element 13 (optical path K).

  The second member 22 is disposed around the optical path K. The second member 22 is an annular member. The second member 22 is disposed so as not to contact the first member 21. A gap is formed between the second member 22 and the first member 21.

  The first member 21 is supported by the apparatus frame 8B via the support member 21S. The first member 21 may be supported by the reference frame 8A via a support member.

  The second member 22 is supported by the apparatus frame 8B via the support member 22S. The support member 22 </ b> S is connected to the second member 22 outside the first member 21 with respect to the optical path K. The first member 21 may be supported on the reference frame 8A via a support member.

 The second member 22 is movable with respect to the first member 21. The second member 22 is movable with respect to the last optical element 13. The relative position between the second member 22 and the first member 21 changes. The relative position between the second member 22 and the last optical element 13 changes.

  The second member 22 is movable in the XY plane perpendicular to the optical axis of the last optical element 13. The second member 22 is movable substantially parallel to the XY plane. As shown in FIG. 4, in the present embodiment, the second member 22 is movable at least in the X-axis direction. Note that the second member 22 may be movable in at least one direction of the Y axis, the Z axis, θX, θY, and θZ in addition to the X axis direction.

  In the present embodiment, the terminal optical element 13 does not move substantially. The first member 21 also does not move substantially.

 The second member 22 is movable below at least a part of the first member 21. The second member 22 is movable between the first member 21 and the substrate P (object).

 As the second member 22 moves in the XY plane, the dimension of the gap between the outer surface 29 of the first member 21 and the inner surface 30 of the second member 22 changes. In other words, the size of the space between the outer surface 29 and the inner surface 30 changes as the second member 22 moves in the XY plane. For example, in the example shown in FIG. 4, the second member 22 moves in the −X direction, so that the size of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 is reduced (outside The space between the side surface 29 and the inner side surface 30 is reduced). The movement of the second member 22 in the + X direction increases the size of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 (between the outer surface 29 and the inner surface 30). Space becomes larger). In the present embodiment, the movable range (movable range) of the second member 22 is determined so that the first member 21 (outer surface 29) and the second member 22 (inner surface 30) do not contact each other.

  In the present embodiment, the second member 22 is moved by the driving device 32. The driving device 32 can move the second member 22 relative to the first member 21. The drive device 32 is controlled by the control device 6.

 In the present embodiment, the driving device 32 moves the support member 22S. When the support member 22S is moved by the drive device 32, the second member 22 moves. The drive device 32 includes, for example, a motor, and moves the second member 22 using Lorentz force.

 The drive device 32 is supported by the device frame 8B via the support member 32S. The second member 22 is supported by the device frame 8B via the support member 22S, the drive device 32, and the support member 32S. Even if vibration is generated by the movement of the second member 22, the vibration isolator 10 suppresses the vibration from being transmitted to the reference frame 8A.

  The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12. The second member 22 may be moved in parallel with at least a part of the period in which the exposure light EL is emitted from the emission surface 12 in a state where the immersion space LS is formed.

 The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves. The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS is formed.

 The second member 22 may be moved in the moving direction of the substrate P (object). For example, the second member 22 may be moved in the moving direction of the substrate P in at least a part of the period in which the substrate P is moved. For example, when the substrate P is moved in one direction (for example, + X direction) in the XY plane, the second member 22 moves in one direction (+ X direction) in the XY plane in synchronization with the movement of the substrate P. May be.

  The liquid immersion member 5 includes a liquid supply unit 31 that supplies the liquid LQ for forming the liquid immersion space LS. The liquid supply unit 31 is disposed on the first member 21. In the present embodiment, the liquid supply unit 31 is disposed on the inner side surface 28 of the first member 21. The liquid supply unit 31 includes an opening (liquid supply port) disposed on the inner surface 28 of the first member 21. The liquid supply unit 31 is disposed so as to face the third space SP3. The liquid supply unit 31 is disposed so as to face the side surface 13F. The liquid supply unit 31 supplies the liquid LQ to the third space SP3 between the side surface 13F and the inner side surface 28. In the present embodiment, the liquid supply unit 31 is disposed on each of the + X side and the −X side with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The liquid supply unit 31 may be arranged in the Y-axis direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13), or the exposure light EL including the X-axis direction and the Y-axis direction. A plurality of optical paths may be arranged around the optical path K (the optical axis of the terminal optical element 13). There may be one liquid supply unit 31.

  The liquid supply unit 31 may be disposed on the second member 22. The liquid supply unit 31 may be disposed on the upper surface 25 of the second member 22. The liquid supply unit 31 may be disposed on a part of the upper surface 25 facing the emission surface 12. The liquid supply unit 31 may be disposed on the lower surface 26 of the second member 22. The liquid supply unit 31 may be disposed on the inner surface 35U of the second member 22 so as to face the optical path K. The liquid supply unit 31 may be disposed on both the first member 21 and the second member 22. The liquid supply unit 31 is disposed on the second member 22 and may not be disposed on the first member 21. The liquid supply unit 31 is disposed on the first member 21 and may not be disposed on the second member 22. The liquid supply unit 31 may be arranged on a member different from the first member 21 and the second member 22.

  The liquid immersion member 5 has a liquid supply part 41 that faces the first space SP1 and supplies the liquid LQ to the first space SP1. The liquid supply unit 41 is disposed on the first member 21. In the present embodiment, the liquid supply unit 41 is disposed on the lower surface 23 of the second member 22. The liquid supply unit 41 includes an opening (liquid supply port) disposed on the lower surface 23 of the first member 21. The liquid supply unit 41 is disposed so as to face the upper surface 25. The liquid supply unit 41 supplies the liquid LQ to the first space SP1 between the upper surface 25 and the lower surface 23. In the present embodiment, the liquid supply unit 41 is disposed on each of the + X side and the −X side with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The liquid supply unit 41 may be arranged in the Y axis direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13), or the exposure light EL including the X axis direction and the Y axis direction A plurality of optical paths may be arranged around the optical path K (the optical axis of the terminal optical element 13). There may be one liquid supply unit 41.

  In addition, the liquid supply part 41 may be arrange | positioned at the 2nd member 22 so that 1st space SP1 may be faced. The liquid supply unit 41 may be disposed on the upper surface 25 of the second member 22. The liquid supply unit 41 may include an opening (liquid supply port) disposed on the upper surface 25 of the second member 22. The liquid supply unit 41 may be disposed so as to face the lower surface 23. The liquid supply unit 41 may be disposed on both the first member 21 and the second member 22. The liquid supply unit 41 is disposed on the second member 22 and may not be disposed on the first member 21. The liquid supply unit 41 is disposed on the first member 21 and may not be disposed on the second member 22. The liquid supply unit 41 may be disposed on a member different from the first member 21 and the second member 22 so as to face the first space SP1.

  In the following description, the liquid supply unit 31 is appropriately referred to as a first supply unit 31, and the liquid supply unit 41 is appropriately referred to as a second supply unit 41.

  With respect to the radiation direction with respect to the optical path K, the second supply unit 41 is disposed outside the first supply unit 31. The second supply unit 41 is arranged outside the first supply unit 31 with respect to the optical path K so as to face the first space SP1. Both the first supply unit 31 and the second supply unit 41 may be disposed on the first member 21 or may be disposed on the second member 22. For example, the 1st supply part 31 is arrange | positioned in a part (or inner surface 35U) of the upper surface 25 which can oppose the injection | emission surface 12, and the 2nd supply part 41 faces 1st space SP1 (it faces the lower surface 23). B) The optical path K may be disposed on a part of the upper surface 25 outside the first supply unit 31.

  In the present embodiment, the first supply unit (liquid supply port) 31 is connected to the liquid supply device 31 </ b> S via a supply flow path 31 </ b> R formed inside the first member 21. The liquid supply device 31 </ b> S can supply the clean and temperature-adjusted liquid LQ to the first supply unit 31. The first supply unit 31 supplies the liquid LQ from the liquid supply device 31S in order to form the immersion space LS.

  In the present embodiment, the second supply part (liquid supply port) 41 is connected to the liquid supply device 31 </ b> S via a supply flow path 31 </ b> R formed inside the first member 21. That is, in the present embodiment, the supply flow path 31R includes a main flow path connected to the liquid supply device 31S, a first branch flow path branched from the main flow path and connected to the first supply unit 31, and a main flow path. And a second branch flow path that is branched and connected to the second supply unit 41. In the present embodiment, the liquid LQ from the liquid supply device 31S is supplied to each of the first supply unit 31 and the second supply unit 41. In the present embodiment, the liquid LQ supplied from the second supply unit 41 is the same liquid as the liquid LQ supplied from the first supply unit 31.

  A first supply channel connected to the first supply unit 31 and a second supply channel connected to the second supply unit 41 and different from the first supply channel are provided inside the first member 21. Both may be provided. Note that the liquid supply device 31S may supply the liquid LQ to both the first supply channel and the second supply channel. Note that the first liquid supply device may supply the liquid LQ to the first supply channel, and a second liquid supply device different from the first liquid supply device may supply the liquid LQ to the second supply channel. The first and second liquid supply devices may supply the same type of liquid. The first and second liquid supply devices may supply different types of liquids. That is, the type of liquid supplied from the first supply unit 31 and the type of liquid supplied from the second supply unit 41 may be different. For example, the viscosity of the liquid supplied from the second supply unit 41 may be higher or lower than the viscosity of the liquid supplied from the first supply unit 31.

  In the present embodiment, an opening 40 is formed between the inner edge of the lower surface 23 and the upper surface 25. The optical path space SPK including the optical path K between the emission surface 12 and the substrate P (object) and the first space SP1 between the lower surface 23 and the upper surface 25 are connected via the opening 40. The optical path space SPK includes a space between the exit surface 12 and the substrate P (object) and a space between the exit surface 12 and the upper surface 25. The opening 40 is disposed so as to face the optical path K. The third space SP3 between the side surface 13F and the inner side surface 28 and the first space SP1 are connected via the opening 40.

  At least a part of the liquid LQ from the first supply unit 31 is supplied (inflows) to the first space SP <b> 1 between the lower surface 23 and the upper surface 25 through the opening 40. At least part of the liquid LQ supplied from the first supply unit 31 to form the immersion space LS is supplied onto the substrate P (object) facing the emission surface 12 through the opening 34 and the opening 35. The Thereby, the optical path K is filled with the liquid LQ. At least a part of the liquid LQ from the first supply unit 31 is supplied to the second space SP2 between the lower surface 26 and the upper surface of the substrate P (object).

  The liquid immersion member 5 includes a fluid recovery unit 247 that recovers at least a part of the liquid LQ in the liquid immersion space LS. In the present embodiment, the fluid recovery unit 247 includes a first recovery unit 27 that can face the substrate P (object), and a second recovery unit 24 that faces the first space SP1. Each of the first recovery unit 27 and the second recovery unit 24 can recover at least a part of the liquid LQ in the immersion space LS.

 In this embodiment, the 1st supply part 31 is arrange | positioned inside the fluid collection | recovery part 247 regarding the radial direction with respect to the optical path K (optical axis of the terminal optical element 13). That is, in the present embodiment, the first supply unit 31 is arranged inside each of the first recovery unit 27 and the second recovery unit 24 with respect to the radiation direction with respect to the optical path K.

 In the present embodiment, the second supply unit 41 is disposed inside the fluid recovery unit 247 with respect to the radial direction with respect to the optical path K (the optical axis of the terminal optical element 13). That is, in the present embodiment, the second supply unit 41 is disposed inside each of the first recovery unit 27 and the second recovery unit 24 with respect to the radiation direction with respect to the optical path K.

  In the present embodiment, the first recovery unit 27 is disposed on the second member 22. The second recovery unit 24 is disposed on the first member 21. When the second member 22 moves relative to the first member 21, the first recovery unit 27 moves together with the second member 22. When the 2nd member 22 moves with respect to the 1st member 21, the 1st collection | recovery part 27 moves with respect to the 1st member 21 (2nd collection | recovery part 24).

 The substrate P (object) can face at least a part of the first recovery unit 27. The first recovery unit 27 recovers at least a part of the liquid LQ from the second space SP2. The second member 22 can face the second collection unit 24. The second recovery unit 24 recovers at least a part of the liquid LQ from the first space SP1.

  The lower surface 23 of the first member 21 does not collect the liquid LQ. The lower surface 23 is a non-recovery part and cannot recover the liquid LQ. The lower surface 23 of the first member 21 can hold the liquid LQ with the second member 22.

  The upper surface 25 of the second member 22 does not collect the liquid LQ. The upper surface 25 is a non-recovery part and cannot recover the liquid LQ. The upper surface 25 of the second member 22 can hold the liquid LQ with the first member 21.

  The lower surface 26 of the second member 22 does not collect the liquid LQ. The lower surface 26 is a non-recovery part and cannot recover the liquid LQ. The lower surface 26 of the second member 22 can hold the liquid LQ with the substrate P (object).

  The inner side surface 28, the outer side surface 29, and the inner side surface 30 do not collect the liquid LQ. The inner side surface 28, the outer side surface 29, and the inner side surface 30 are non-recovery parts and cannot recover the liquid LQ.

  The first recovery unit 27 is disposed outside the lower surface 26 with respect to the optical path K (the optical axis of the terminal optical element 13). The first recovery unit 27 is disposed at least at a part around the lower surface 26. In the present embodiment, the first recovery unit 27 is disposed around the lower surface 26. The first recovery unit 27 is disposed around the optical path K of the exposure light EL. Note that the first recovery unit 27 may be disposed at a part of the periphery of the lower surface 26. For example, a plurality of first recovery units 27 may be arranged around the lower surface 26. The first recovery unit 27 is disposed so as to face the second space SP2. The first recovery unit 27 recovers at least a part of the liquid LQ in the second space SP2.

  The first recovery unit 27 is disposed outside the first member 21 with respect to the optical path K (the optical axis of the terminal optical element 13). The first recovery unit 27 is disposed outside the first space SP1 with respect to the optical path K (the optical axis of the terminal optical element 13).

  The second recovery unit 24 is disposed outside the lower surface 23 with respect to the optical path K (the optical axis of the terminal optical element 13). The second recovery unit 24 is disposed at least at a part around the lower surface 23. In the present embodiment, the second collection unit 24 is disposed around the lower surface 23. The second recovery unit 24 is disposed around the optical path K of the exposure light EL. Note that the second recovery unit 24 may be disposed at a part of the periphery of the lower surface 23. For example, a plurality of second recovery units 24 may be arranged around the lower surface 23. The second recovery unit 24 is disposed so as to face the first space SP1. The second recovery unit 24 recovers at least a part of the liquid LQ in the first space SP1.

  In the present embodiment, the movement of the liquid LQ from one of the first space SP1 on the upper surface 25 side and the second space SP2 on the lower surface 26 side is suppressed. The first space SP <b> 1 and the second space SP <b> 2 are partitioned by the second member 22. The liquid LQ in the first space SP1 can move to the second space SP2 through the opening 35. The liquid LQ in the first space SP1 cannot move to the second space SP2 without passing through the opening 35. The liquid LQ existing in the first space SP1 outside the opening 35 with respect to the optical path K cannot move to the second space SP2. The liquid LQ in the second space SP2 can move to the first space SP1 through the opening 35. The liquid LQ in the second space SP2 cannot move to the first space SP1 without passing through the opening 35. The liquid LQ present in the second space SP2 outside the opening 35 with respect to the optical path K cannot move to the first space SP1. That is, in this embodiment, the liquid immersion member 5 does not have a flow path that fluidly connects the first space SP1 and the second space SP2 other than the opening 35.

  In the present embodiment, the first recovery unit 27 recovers at least a part of the liquid LQ in the second space SP2, and does not recover the liquid LQ in the first space SP1. The second recovery unit 24 recovers at least a part of the liquid LQ in the first space SP1, and does not recover the liquid LQ in the second space SP2.

 Further, the liquid LQ that has moved outside the first space SP1 (outside the outer surface 29) with respect to the optical path K of the exposure light EL can move onto the substrate P (second space SP2) by the inner surface 30. It is suppressed.

 The second recovery unit 24 includes an opening (fluid recovery port) disposed at least at a part around the lower surface 23 of the first member 21. The second recovery unit 24 is disposed so as to face the upper surface 25. The second recovery unit 24 is connected to the liquid recovery device 24C via a recovery flow path (space) 24R formed inside the first member 21. The liquid recovery device 24C can connect the second recovery unit 24 and the vacuum system. The second recovery unit 24 can recover at least a part of the liquid LQ in the first space SP1. At least a part of the liquid LQ in the first space SP1 can flow into the recovery channel 24R via the second recovery unit 24.

 In the present embodiment, the second recovery unit 24 includes a porous member 36, and the fluid recovery port includes a hole of the porous member 36. In the present embodiment, the porous member 36 includes a mesh plate. The porous member 36 has a lower surface that can be opposed to the upper surface 25, an upper surface that faces the recovery flow path 24R, and a plurality of holes that connect the lower surface and the upper surface. The second recovery unit 24 recovers the liquid LQ through the hole of the porous member 36. The liquid LQ in the first space SP1 recovered from the second recovery part 24 (hole of the porous member 36) flows into the recovery flow path 24R, flows through the recovery flow path 24R, and is recovered by the liquid recovery device 24C. .

  In the present embodiment, substantially only the liquid LQ is recovered via the second recovery part 24, and the recovery of gas is limited. The control device 6 controls the pressure (first space SP1 on the lower surface side of the porous member 36 so that the liquid LQ in the first space SP1 passes through the hole of the porous member 36 and flows into the recovery flow path 24R and does not pass the gas. And the pressure on the upper surface side (pressure in the recovery flow path 24R) are adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  Note that both the liquid LQ and the gas may be collected (sucked) through the porous member 36. The porous member 36 may not be provided on the first member 21. That is, the fluid (one or both of the liquid LQ and the gas) in the first space SP1 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the second collection unit 24 includes the lower surface of the porous member 36. The lower surface of the second recovery unit 24 is disposed around the lower surface 23. In the present embodiment, the lower surface of the second recovery unit 24 is substantially parallel to the XY plane. In the present embodiment, the lower surface and the lower surface 23 of the second collection unit 24 are arranged in the same plane (they are flush).

  The lower surface of the second recovery unit 24 may be disposed on the + Z side with respect to the lower surface 23, or may be disposed on the −Z side. In addition, the lower surface of the 2nd collection | recovery part 24 may incline with respect to the lower surface 23, and may include a curved surface.

  In addition, the 2nd collection | recovery part 24 for collect | recovering the fluids (one or both of liquid LQ and gas) of 1st space SP1 may be arrange | positioned at the 2nd member 22 so that 1st space SP1 may be faced. A recovery channel 24 </ b> R through which the liquid LQ recovered from the second recovery unit 24 disposed on the second member 22 flows may be formed inside the second member 22. The second recovery part 24 disposed on the second member 22 may include a porous member 36. The second recovery unit 24 may be disposed on both the first member 21 and the second member 22. The second recovery unit 24 is disposed on the first member 21 and may not be disposed on the second member 22. The second recovery unit 24 is disposed on the second member 22 and may not be disposed on the first member 21.

 The first recovery unit 27 includes an opening (fluid recovery port) disposed at least at a part around the lower surface 26 of the second member 22. The first recovery unit 27 is disposed so as to face the upper surface of the substrate P (object). The first recovery unit 27 is connected to the liquid recovery device 27C via a recovery flow path (space) 27R formed inside the second member 22. The liquid recovery device 27C can connect the first recovery unit 27 and the vacuum system. The first recovery unit 27 can recover at least a part of the liquid LQ in the second space SP2. At least a part of the liquid LQ in the second space SP2 can flow into the recovery channel 27R via the first recovery unit 27.

 In the present embodiment, the first recovery unit 27 includes a porous member 37, and the fluid recovery port includes a hole of the porous member 37. In the present embodiment, the porous member 37 includes a mesh plate. The porous member 37 has a lower surface on which the upper surface of the substrate P (object) can be opposed, an upper surface facing the recovery flow path 27R, and a plurality of holes connecting the lower surface and the upper surface. The first recovery unit 27 recovers fluid (one or both of liquid LQ and gas) through the holes of the porous member 37. The liquid LQ in the second space SP2 recovered from the first recovery unit 27 (the hole of the porous member 37) flows into the recovery channel 27R, flows through the recovery channel 27R, and is recovered by the liquid recovery device 27C. .

  The recovery flow path 27R is disposed outside the inner side surface 30 with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The recovery channel 27R is disposed above the first recovery unit 27. By the movement of the second member 22, the first recovery part 27 and the recovery flow path 27 </ b> R of the second member 22 are moved outside the outer surface 29 of the first member 21.

  The gas is recovered together with the liquid LQ via the first recovery unit 27. Note that only the liquid LQ may be recovered via the porous member 37, and the recovery of the gas may be limited. The porous member 37 may not be provided on the second member 22. That is, the fluid (one or both of the liquid LQ and the gas) in the second space SP2 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the first recovery unit 27 includes the lower surface of the porous member 37. The lower surface of the first recovery unit 27 is disposed around the lower surface 26. In the present embodiment, the lower surface of the first recovery unit 27 is substantially parallel to the XY plane. In the present embodiment, the lower surface of the first recovery unit 27 is disposed on the + Z side with respect to the lower surface 26.

  In addition, the lower surface and the lower surface 26 of the 1st collection | recovery part 27 may be arrange | positioned in the same plane (a plane may be sufficient). The lower surface of the first recovery unit 27 may be disposed on the −Z side with respect to the lower surface 26. In addition, the lower surface of the 1st collection | recovery part 27 may incline with respect to the lower surface 26, and may include a curved surface.

  In the present embodiment, the recovery operation of the liquid LQ from the first recovery unit 27 is executed in parallel with the supply operation of the liquid LQ from the first supply unit 31, so that the terminal optical element 13 on one side and An immersion space LS is formed with the liquid LQ between the immersion member 5 and the substrate P (object) on the other side.

  Further, in the present embodiment, the recovery operation of the fluid from the second recovery unit 24 is performed in parallel with the supply operation of the liquid LQ from the first supply unit 31 and the recovery operation of the fluid from the first recovery unit 27. Executed.

  In the present embodiment, the fluid recovery operation from the first recovery unit 27 is performed in parallel with the operation of supplying the liquid LQ from the first supply unit 31 and the operation of supplying the liquid LQ from the second supply unit 41. , And a fluid recovery operation from the second recovery unit 24 is performed.

  In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS is formed between the second member 22 and the substrate P (object).

  In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS is formed between the first member 21 and the second member 22.

 In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS is formed between the terminal optical element 13 and the first member 21.

  In the following description, the interface LG of the liquid LQ formed between the first member 21 and the second member 22 is appropriately referred to as a first interface LG1. The interface LG formed between the second member 22 and the substrate P (object) is appropriately referred to as a second interface LG2. The interface LG formed between the last optical element 13 and the first member 21 is appropriately referred to as a third interface LG3.

  In the present embodiment, the first interface LG <b> 1 is formed between the lower surface and the upper surface 25 of the second recovery unit 24. The second interface LG2 is formed between the lower surface of the first recovery unit 27 and the upper surface of the substrate P (object).

  In the present embodiment, the first interface LG1 is formed between the lower surface and the upper surface 25 of the second recovery unit 24, and the liquid LQ in the first space SP1 is outside the second recovery unit 24 (for example, the outer surface 29). And the space between the inner surface 30 and the inner surface 30 are suppressed. There is no liquid LQ in the space between the outer side surface 29 and the inner side surface 30. A space between the outer side surface 29 and the inner side surface 30 is a gas space.

 A space between the outer side surface 29 and the inner side surface 30 is connected to the space CS. In other words, the space between the outer surface 29 and the inner surface 30 is open to the atmosphere. When the pressure in the space CS is atmospheric pressure, the space between the outer surface 29 and the inner surface 30 is opened to the atmosphere. Therefore, the second member 22 can move smoothly. Note that the pressure in the space CS may be higher or lower than the atmospheric pressure.

  FIG. 8 is a view of the first member 21 as viewed from the lower surface 23 side. In the present embodiment, a guiding portion 38 that guides at least a part of the liquid LQ in the first space SP1 is disposed on the lower surface 23 of the first member 21. In the present embodiment, the guiding unit 38 can guide at least a part of the liquid LQ from the first supply unit 31. That is, the guide part 38 can guide at least a part of the liquid LQ that has flowed into the first space SP1 from the opening 40. In the present embodiment, the guiding unit 38 can guide at least a part of the liquid LQ supplied from the second supply unit 41 to the first space SP1.

  The guiding unit 38 guides at least a part of the liquid LQ in the first space SP1 from the optical path K of the exposure light EL toward the outside. As shown in FIG. 8, in the present embodiment, the second collection unit 24 is disposed outside the guide unit 38 with respect to the optical path K of the exposure light EL. The guiding unit 38 guides at least a part of the liquid LQ in the first space SP1 to the second recovery unit 24.

  The guiding unit 38 guides at least a part of the liquid LQ in the first space SP1 in a direction parallel to the moving direction of the second member 22. The shape of the guide portion 38 is determined based on the moving direction of the second member 22. The guide portion 38 is provided so as to promote the flow of the liquid LQ in a direction parallel to the moving direction of the second member 22.

 For example, when the second member 22 moves in the X-axis direction, the shape of the guide portion 38 is such that the liquid LQ flows in the first space SP1 in a direction parallel to the X-axis direction and reaches the second recovery unit 24. Is determined. For example, when the second member 22 moves in the + X direction, at least a part of the liquid LQ in the first space SP1 flows in the + X direction by the guide portion 38. When the second member 22 moves in the −X direction, at least a part of the liquid LQ in the first space SP1 flows in the −X direction by the guide portion 38.

  In the present embodiment, the guide unit 38 is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL. The second recovery unit 24 is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL.

  The guide portion 38 includes a convex portion provided on the lower surface 23. In the present embodiment, the guide portion 38 includes a wall portion 38R disposed at least at a part around the optical path K of the exposure light EL, and a slit (opening) 38K formed at a part of the wall portion 38R. . The wall 38R is arranged so as to surround the optical path K of the exposure light EL in the first space SP1. The wall portion 38R is disposed so as to surround the opening 34. The slits 38K are formed on each of the + X side and the −X side with respect to the optical path K so that the flow of the liquid LQ in the direction parallel to the X-axis direction is promoted.

 The guide portion 38 increases the flow rate of the liquid LQ in the first space SP1 in the direction parallel to the moving direction of the second member 22. In the present embodiment, the flow rate of the liquid LQ in the X-axis direction in the first space SP1 is increased by the guide portion 38. That is, the speed of the liquid LQ that flows toward the space between the lower surface and the upper surface 25 of the second recovery unit 24 is increased. Thereby, the position of the first interface LG1 with respect to the first member 21 is prevented from changing, and the shape of the first interface LG1 is prevented from changing. Therefore, the liquid LQ in the first space SP1 is prevented from flowing out of the first space SP1.

 The positions where the slits 38K are formed are not limited to the + X side and the −X side with respect to the optical path K. For example, when the second member 22 also moves parallel to the Y axis, the slits 38K may be added on the + Y side and the −Y side with respect to the optical path K. Even when the second member 22 does not move in parallel with the Y axis, the slits 38K may be added to the + Y side and the −Y side with respect to the optical path K.

 Further, the shape of the guiding portion 38 (such as the position of the slit 38K) may not be determined based on the moving direction of the second member 22. For example, the shape of the guiding portion 38 may be determined so that the liquid LQ flows radially with respect to the optical path K around the entire optical path K.

  The wall portion 38R may not surround the opening 34 (the optical path K of the exposure light EL). For example, the wall portion 38R is disposed on each of the + X side and the −X side of the opening 34 (the optical path K of the exposure light EL), and may not be disposed on each of the + Y side and the −Y side.

  The guide portion 38 may be disposed on the second member 22. The guide portion 38 may be disposed on at least a part of the upper surface 25. The guide portion 38 may include a convex portion provided on the upper surface 25. The guide portion 38 includes a wall portion 38R disposed so as to surround the optical path K (opening 34) of the exposure light EL on the upper surface 25 of the second member 22, and a slit (opening) formed in a part of the wall portion 38R. 38K. The guide portion 38 may be disposed on both the first member 21 and the second member 22, or may be disposed on either the first member 21 or the second member 22. The guide portion 38 may be disposed on one or both of the lower surface 23 and the upper surface 25. The guide portion 38 may include both a convex portion provided on the lower surface 23 and a convex portion provided on the upper surface 25.

  Further, in the present embodiment, the first space SP1 is disposed outside the portion SP1a with respect to the optical path K of the exposure light EL with the portion SP1a having the first dimension between the first member 21 and the second member 22. And a portion SP1b having a second dimension in which the gap between the first member 21 and the second member 22 is smaller than the first dimension. In the present embodiment, the portion SP1b is defined by a wall portion 38R that is disposed so as to surround the optical path K of the exposure light EL in the first space SP1. For example, when the wall portion 38R is disposed on the lower surface 23, the portion SP1a includes a space between the lower surface 23 and the upper surface 25, and the portion SP1b includes the upper surface 25 and the lower surface of the wall portion 38R facing the upper surface 25. Including the space between. When the wall portion 38R is disposed on the upper surface 25, the portion SP1a includes a space between the lower surface 23 and the upper surface 25, and the portion SP1b is between the lower surface 23 and the upper surface of the wall portion 38R facing the lower surface 23. Including the space. The wall portion 38R may be disposed on both the lower surface 23 and the upper surface 25.

  In the present embodiment, the second recovery unit 24 is disposed outside the portion SP1b with respect to the optical path K of the exposure light EL. The first recovery unit 27 is also disposed outside the portion SP1b with respect to the optical path K of the exposure light EL.

 In the present embodiment, the second member 22 can face the entire lower surface 23. For example, as shown in FIG. 2 and the like, when the second member 22 is disposed at the origin where the optical axis of the terminal optical element 13 and the center of the opening 35 substantially coincide with each other, the entire lower surface 23 and the second member The upper surface 25 of 22 opposes. Further, when the second member 22 is disposed at the origin, a part of the emission surface 12 and the upper surface 25 of the second member 22 face each other. Further, when the second member 22 is disposed at the origin, the lower surface of the second collection unit 24 and the upper surface 25 of the second member 22 face each other.

  In the present embodiment, when the second member 22 is disposed at the origin, the center of the opening 34 and the center of the opening 35 substantially coincide with each other.

  Next, an example of the operation of the second member 22 will be described. The second member 22 is movable in cooperation with the movement of the substrate P (object). The second member 22 is movable independently of the substrate P (object). The second member 22 is movable in parallel with at least part of the movement of the substrate P (object). The second member 22 is movable in a state where the immersion space LS is formed. The second member 22 is movable in a state where the liquid LQ exists in the first space SP1 and the second space SP2.

 The second member 22 may move when the second member 22 and the substrate P (object) do not face each other. For example, the second member 22 may move when no object is present below the second member 22. The second member 22 may move when the liquid LQ is not present in the space between the second member 22 and the substrate P (object). For example, the second member 22 may move when the immersion space LS is not formed.

  The second member 22 moves based on, for example, the moving condition of the substrate P (object). The control device 6 moves the second member 22 in parallel with at least a part of the movement of the substrate P (object) based on, for example, the movement condition of the substrate P (object). The control device 6 performs the supply of the liquid LQ from the first supply unit 31 and the recovery of the liquid LQ from the first recovery unit 27 and the second recovery unit 24 so that the immersion space LS is continuously formed. The second member 22 is moved.

 In this embodiment, the 2nd member 22 is movable so that relative movement with respect to the board | substrate P (object) may become small. The second member 22 is movable so that the relative movement between the second member 22 and the substrate P (object) is smaller than the relative movement between the first member 21 and the substrate P (object). For example, the second member 22 may move in synchronization with the substrate P (object).

 The relative movement includes at least one of a relative speed and a relative acceleration. For example, the second member 22 has a lower relative velocity with respect to the substrate P (object) in a state where the immersion space LS is formed, that is, in a state where the liquid LQ exists in the second space SP2. You may move on. Further, the second member 22 is configured such that the relative acceleration with respect to the substrate P (object) becomes small in the state where the immersion space LS is formed, that is, in the state where the liquid LQ exists in the second space SP2. You may move on. Further, the second member 22 is in a state where the immersion space LS is formed, that is, in a state where the liquid LQ is present in the second space SP2, the relative speed with respect to the substrate P (object) is the first speed. You may move so that it may become smaller than the relative speed of the member 21 and the board | substrate P (object). Further, the second member 22 has a relative acceleration with respect to the substrate P (object) in a state where the immersion space LS is formed, that is, in a state where the liquid LQ is present in the second space SP2. You may move so that it may become smaller than the relative acceleration of the member 21 and the board | substrate P (object).

  The second member 22 is movable in the moving direction of the substrate P (object), for example. For example, when the substrate P (object) moves in the + X direction (or −X direction), the second member 22 can move in the + X direction (or −X direction). In addition, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the + X direction, the second member 22 is movable in the + X direction. Further, when the substrate P (object) moves in the + Y direction (or −Y direction) while moving in the −X direction, the second member 22 is movable in the −X direction. That is, in the present embodiment, when the substrate P (object) moves in a certain direction including a component in the X-axis direction, the second member 22 moves in the X-axis direction. For example, the second member 22 may move in the X-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the X-axis direction.

 Note that the second member 22 may be movable in the Y-axis direction. When the substrate P (object) moves in a certain direction including a component in the Y-axis direction, the second member 22 may move in the Y-axis direction. For example, the second member 22 may move in the Y-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the Y-axis direction.

 FIG. 9 is a diagram illustrating an example of a state in which the second member 22 moves. FIG. 9 is a view of the liquid immersion member 5 as viewed from below (−Z side).

 In the following description, the second member 22 is moved in the X-axis direction. As described above, the second member 22 may move in the Y-axis direction, or may move in any direction within the XY plane including the component in the X-axis direction (or Y-axis direction). .

 When the substrate P (object) moves in the X-axis direction (or a predetermined direction in the XY plane including a component in the X-axis direction), the second member 22 is as shown in FIGS. 9A to 9C. Next, it moves in the X-axis direction.

  In the present embodiment, the second member 22 is movable within a movable range (movable range) defined with respect to the X-axis direction. FIG. 9A shows a state in which the second member 22 is arranged at the most −X side end of the movable range. FIG. 9B shows a state where the second member 22 is arranged at the center of the movable range. FIG. 9C shows a state in which the second member 22 is disposed at the end on the most + X side of the movable range.

  In the following description, the position of the second member 22 shown in FIG. 9A is appropriately referred to as a first end position, and the position of the second member 22 shown in FIG. The position of the second member 22 shown in FIG. 9C is appropriately referred to as a second end portion position. As shown in FIG. 9B, the state where the second member 22 is disposed at the center position includes the state where the second member 22 is disposed at the origin.

 In the present embodiment, the dimension of the opening 35 is determined based on the dimension of the movable range of the second member 22 so that the exposure light EL from the emission surface 12 passes through the opening 35. The dimension of the movable range of the second member 22 includes the distance between the first end position and the second end position in the X-axis direction. Even if the second member 22 moves in the X-axis direction, the dimension of the opening 35 in the X-axis direction is determined so that the exposure light EL from the emission surface 12 is not irradiated onto the second member 22.

  In FIG. 9, the dimension W35 of the opening 35 in the X-axis direction is larger than the sum of the dimension Wpr of the exposure light EL (projection region PR) and the dimension (Wa + Wb) of the movable range of the second member 22. The dimension W35 is set to a size that does not block the exposure light EL from the exit surface 12 even when the second member 22 moves between the first end position and the second end position. Thereby, even if the second member 22 moves, the exposure light EL from the emission surface 12 can be irradiated to the substrate P (object) without being blocked by the second member 22.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5 at least during a period in which the substrate stage 2 is separated from the liquid immersion member 5. The control device 6 supplies the liquid LQ from the first supply unit 31 and recovers the liquid LQ from the first recovery unit 27 to form the immersion space LS on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. With the last optical element 13 and the liquid immersion member 5 facing the substrate stage 2 (substrate P), the liquid LQ is recovered from the first recovery unit 27 in parallel with the supply of the liquid LQ from the first supply unit 31. As a result, the immersion space LS is formed between the last optical element 13 and the immersion member 5 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ.

  In the present embodiment, the recovery of the liquid LQ from the second recovery unit 24 is performed in parallel with the supply of the liquid LQ from the first supply unit 31 and the recovery of the liquid LQ from the first recovery unit 27.

  In the present embodiment, the liquid LQ is supplied from the second supply unit 41 in parallel with the supply of the liquid LQ from the first supply unit 31. That is, in the present embodiment, the recovery of the liquid LQ from the first recovery unit 27 and the second supply of the liquid LQ from the first supply unit 31 and the supply of the liquid LQ from the second supply unit 41 are performed in parallel. Recovery of the liquid LQ from the recovery unit 24 is performed.

 The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the emission surface 12 of the last optical element 13 and the substrate P, and the pattern of the mask M Are projected onto the substrate P.

   The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 10 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S that are exposure target areas are arranged in a matrix on the substrate P. The control device 6 moves the substrate P held by the first holding unit in the Y-axis direction (scanning direction) with respect to the exposure light EL emitted from the exit surface 12 of the last optical element 13, and then exits the exit surface. Each of the plurality of shot regions S of the substrate P is sequentially exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the substrate 12 and the substrate P.

 For example, in order to expose one shot region S of the substrate P, the control device 6 performs exposure light EL (projection region of the projection optical system PL) emitted from the emission surface 12 in a state where the immersion space LS is formed. (PR), the substrate P is moved in the Y-axis direction, and the mask M is moved in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. Meanwhile, the exposure light EL is irradiated onto the shot region S via the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P. Thereby, an image of the pattern of the mask M is projected onto the shot area S, and the shot area S is exposed with the exposure light EL emitted from the emission surface 12.

 After the exposure of the shot area S is completed, the control device 6 moves the substrate P to the Y axis in the XY plane in the state where the immersion space LS is formed in order to start the exposure of the next shot area S. In a direction intersecting with (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) and the next shot area S is moved to the exposure start position. Thereafter, the control device 6 starts exposure of the shot area S.

   In the state where the immersion space LS is formed on the substrate P (substrate stage 2), the control device 6 sets the shot region with respect to the position (projection region PR) irradiated with the exposure light EL from the emission surface 12. An operation of exposing the shot area while moving in the Y-axis direction, and after the exposure of the shot area, the next shot area is exposed in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The substrate P is moved in a direction intersecting the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so as to be arranged at the start position. Each of the plurality of shot areas of the substrate P is sequentially exposed while repeating the operation.

   In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in the state where the immersion space LS is formed on the substrate P (substrate stage 2) and before the exposure of the next shot area is started, in the XY plane The operation of moving the substrate P is appropriately referred to as a step movement operation.

  In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y-axis direction from a state in which a certain shot region S is arranged at the exposure start position to a state in which the shot area S is arranged at the exposure end position. In the step movement operation, the substrate P intersects with the Y-axis direction in the XY plane from a state where a certain shot area S is arranged at the exposure end position to a state where the next shot area S is arranged at the exposure start position. Includes movement in the direction.

  The exposure start position includes the position of the substrate P when one end of the shot area S in the Y-axis direction passes through the projection area PR for exposure of the shot area S. The exposure end position includes the position of the substrate P when the other end portion in the Y-axis direction of the shot area S irradiated with the exposure light EL passes through the projection area PR.

 The exposure start position of the shot area S includes a scan movement operation start position for exposing the shot area S. The exposure start position of the shot area S includes a step movement operation end position for arranging the shot area S at the exposure start position.

 The exposure end position of the shot area S includes a scan movement operation end position for exposing the shot area S. The exposure end position of the shot area S includes a step movement operation start position for placing the next shot area S at the exposure start position after the exposure of the shot area S is completed.

  In the following description, a period during which the scan movement operation is performed for exposure of a certain shot area S is appropriately referred to as a scan movement period. In the following description, a period during which the step movement operation is performed for the start of exposure of the next shot area S from the end of exposure of a certain shot area S is appropriately referred to as a step movement period.

  The scan movement period includes an exposure period from the start of exposure of a certain shot area S to the end of exposure. The step movement period includes a movement period of the substrate P from the end of exposure of a certain shot area S to the start of exposure of the next shot area S.

  In the scan movement operation, the exposure light EL is emitted from the emission surface 12. In the scan movement operation, the exposure light EL is irradiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emission surface 12. In the step movement operation, the exposure light EL is not irradiated onto the substrate P (object).

 The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement mainly in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation from the end of exposure of a certain shot area S to the start of exposure of the next shot area S includes one or both of acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

 In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS may be formed on the substrate stage 2 (cover member T). In at least part of the scan movement operation and the step movement operation, the immersion space LS may be formed so as to straddle the substrate P and the substrate stage 2 (cover member T). When the substrate P is exposed with the substrate stage 2 and the measurement stage 3 approaching or in contact with each other, the immersion space LS is formed in the substrate stage 2 (cover member T) in at least a part of the scan movement operation and the step movement operation. And the measurement stage 3 may be formed.

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7.

  The exposure conditions (exposure control information) include arrangement information of the plurality of shot areas S (positions of the plurality of shot areas S on the substrate P). The exposure condition (exposure control information) includes dimension information (dimension information about the Y-axis direction) of each of the plurality of shot regions S.

 Based on the exposure conditions (exposure control information) stored in the storage device 7, the control device 6 sequentially exposes each of the plurality of shot regions S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement distance, movement direction, and movement locus in the XY plane.

  As an example, in the present embodiment, the control device 6 uses the substrate stage so that the projection region PR of the projection optical system PL and the substrate P relatively move along the movement locus indicated by the arrow Sr in FIG. The projection region PR is irradiated with the exposure light EL while moving 2, and each of the plurality of shot regions S is sequentially exposed with the exposure light EL via the liquid LQ. The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation.

  After each of the plurality of shot areas S of the substrate P is sequentially exposed, the substrate stage 2 is moved to the substrate exchange position, and the exposed substrate P is unloaded from the substrate stage 2 (first holding unit). Processing is performed.

  Thereafter, the above processing is repeated, and a plurality of substrates P are sequentially exposed.

  In the present embodiment, the second member 22 moves in at least a part of the exposure processing of the substrate P. For example, the second member 22 moves in parallel with at least a part of the step movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. For example, the second member 22 moves in parallel with at least a part of the scanning movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. In parallel with the movement of the second member 22, the exposure light EL is emitted from the emission surface 12. Note that the second member 22 does not have to move during the scan movement operation. That is, the second member 22 may not move in parallel with the emission of the exposure light EL from the emission surface 12. For example, when the substrate P (substrate stage 2) performs a step movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) is small. Good. Further, when the substrate P (substrate stage 2) performs the scanning movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) becomes small. Also good.

  FIG. 11 schematically illustrates an example of the movement trajectory of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed while performing step movement of the substrate P including a component in the + X direction. FIG. The shot areas Sa, Sb, and Sc are arranged in the X-axis direction.

  As shown in FIG. 11, when the shot areas Sa, Sb, Sc are exposed, the substrate P is located under the last optical element 13 from the position d1 to the position d2 adjacent to the position d1 on the + Y side. Path Tp1, path Tp2 from position d2 to position d3 adjacent to + X side with respect to position d2, path Tp3 from position d3 to position d4 adjacent to −Y side with respect to position d3, and from position d4 to The path Tp4 from the position d4 to the position d5 adjacent to the + X side and the path Tp5 from the position d5 to the position d6 adjacent to the position +5 on the + Y side are sequentially moved. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve passing through the position d2.5. The path Tp4 includes a curve passing through the position d4.5. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the + Y direction. The path Tp3 is a path along which the substrate P moves in the −Y direction. The path Tp5 is a path along which the substrate P moves in the + Y direction. The path Tp2 and the path Tp4 are paths along which the substrate P moves in a direction whose main component is the + direction.

  When the substrate P moves along the path Tp1 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sa through the liquid LQ. When the substrate P moves along the path Tp3 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ. When the substrate P moves along the path Tp5 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ. When the substrate P moves along the path Tp2 and the path Tp4, the exposure light EL is not irradiated.

 Each of the movement of the substrate P along the path Tp1, the movement along the path Tp3, and the movement along the path Tp5 includes a scanning movement operation. Each of the operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 includes a step movement operation.

  That is, the period during which the substrate P moves along the path Tp1, the period during which the path Tp3 moves, and the period during which the substrate P moves along the path Tp5 are scan movement periods (exposure periods). Each of the period during which the substrate P moves along the path Tp2 and the period during which the substrate P moves along the path Tp4 is a step movement period.

 FIG. 12 is a schematic diagram illustrating an example of the operation of the second member 22. FIG. 12 is a view of the second member 22 as viewed from the upper surface 25 side. When the substrate P is at the position d1, the second member 22 is disposed at the position shown in FIG. 12A with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d2, the second member 22 is disposed at the position shown in FIG. 12B with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan movement operation from the position d1 to the position d2 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d2.5, the second member 22 is disposed at the position shown in FIG. 12C with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d3, the second member 22 is disposed at the position shown in FIG. 12D with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d2 to the position d3 of the substrate P, the second member 22 moves in the + X direction that is the same as the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d4, the second member 22 is disposed at the position shown in FIG. 12E with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scanning movement operation from the position d3 to the position d4 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d4.5, the second member 22 is disposed at the position shown in FIG. 12F with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d5, the second member 22 is disposed at the position shown in FIG. 12G with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d4 to the position d5 of the substrate P, the second member 22 moves in the same + X direction as the step movement direction (+ X direction) of the substrate P. When the substrate P is at the position d6, the second member 22 is disposed at the position shown in FIG. 12H with respect to the projection region PR (the optical path K of the exposure light EL). In other words, during the scanning movement of the substrate P from the position d5 to the position d6, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P.

 In the present embodiment, the position of the second member 22 shown in FIGS. 12 (A), 12 (D), and 12 (G) includes the second end position. The position of the second member 22 shown in FIGS. 12B, 12E, and 12H includes the first end position. The position of the second member 22 shown in FIGS. 12C and 12F includes a central position.

 In the following description, the position of the second member 22 shown in FIGS. 12A, 12D, and 12G is the second end position, and FIGS. The position of the second member 22 shown in FIGS. 12 (E) and 12 (H) is the first end position, and the position of the second member 22 shown in FIGS. 12 (C) and 12 (F) is The center position.

  When the substrate P moves along the path Tp1, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 12A to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp2, the second member 22 changes from the state shown in FIG. 12B to the state shown in FIG. 12D through the state shown in FIG. Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp3, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 12D to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp4, the second member 22 changes from the state shown in FIG. 12E to the state shown in FIG. 12G through the state shown in FIG. Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp5, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 12G to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position.

  That is, in the present embodiment, the second member 22 moves in the + X direction so that the relative movement with the substrate P becomes small in at least a part of the period in which the substrate P moves along the path Tp2. In other words, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small during at least a part of the period during which the substrate P includes a + X direction component. To do. Similarly, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small in at least part of the period in which the substrate P moves along the path Tp4.

  In the present embodiment, the second member 22 moves in the −X direction during at least a part of the period in which the substrate P moves along the path Tp3. Thereby, after the movement of the path Tp3 of the substrate P, in the movement of the path Tp4, the exposure light EL can pass through the opening 35 even if the second member 22 moves in the + X direction. The same applies when the substrate P moves along the paths Tp1 and Tp5.

 That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, the second member 22 is positioned at the first end position so that the relative speed with respect to the substrate P is reduced during the step movement operation. The second member 22 moves from the second end position so that the second member 22 can move again in the + X direction during the next step movement operation during the scan movement operation. Return to the first end position. In other words, since the second member 22 moves in the −X direction during at least a part of the period during which the substrate P performs the transscan movement operation, the size of the opening 35 is minimized.

  In the present embodiment, even when the second member 22 is disposed at the first end position (second end position), at least a part of the first collection unit 27 faces the substrate P (object). to continue. Thereby, for example, in the step movement operation, the first recovery unit 27 can recover the liquid LQ on the substrate P (object).

 In the example described with reference to FIGS. 11 and 12, the second member 22 is arranged at the second end position when the substrate P is at the positions d1, d3, and d5. When the board | substrate P exists in position d1, d3, d5, the 2nd member 22 may be arrange | positioned between a 2nd edge part position and a center position, and may be arrange | positioned in a center position.

 In the example described with reference to FIGS. 11 and 12, the second member 22 is disposed at the first end position when the substrate P is at the positions d2, d4, and d6. When the board | substrate P exists in position d2, d4, d6, the 2nd member 22 may be arrange | positioned between a 1st edge part position and a center position, and may be arrange | positioned in a center position.

  In the present embodiment, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed at a position different from the center position. That is, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed, for example, between the first end position and the center position, or the second end position. You may arrange | position between center positions.

  As described above, according to the present embodiment, since the second member 22 that is movable below the first member 21 is provided, an object such as the substrate P is in an XY state while the immersion space LS is formed. Even if it moves in the plane, for example, the liquid LQ is prevented from flowing out of the space between the liquid immersion member 5 and the object, or the liquid LQ remaining on the object. In addition, generation of bubbles (gas portion) in the liquid LQ in the immersion space LS is also suppressed.

  Further, according to the present embodiment, since the second supply unit 41 that supplies the liquid LQ to the first space SP1 is provided, a gas portion (including bubbles) is generated in the liquid LQ of the first space SP1, It is possible to prevent foreign matters (including one or both of bubbles and particles) from entering the liquid LQ in the one space SP1. In addition, since the second supply unit 41 is provided, it is possible to prevent foreign matter from entering the liquid LQ in the optical path space SPK.

 That is, by supplying the liquid LQ from the second supply unit 41 to the first space SP1, the first space SP1 can be continuously filled with the liquid LQ. Thereby, generation | occurrence | production of a gas part (a bubble is included) is suppressed in 1st space SP1. Moreover, since generation | occurrence | production of a gas part in 1st space SP1 is suppressed, it is suppressed that a gas part enters into optical path space SPK from the 1st space SP1. Further, the liquid LQ is supplied from the second supply unit 41 to the first space SP1, so that the first space SP1 from the external space of the liquid immersion member 5 (for example, the gas space between the outer surface 29 and the inner surface 30). It is possible to prevent foreign matter from invading. Even if a foreign object enters the first space SP1 from the external space of the liquid immersion member 5, the liquid LQ is supplied from the second supply unit 41, so that the foreign material is inside the second supply unit 41 (optical path space). The movement to the SPK side) is suppressed. In the present embodiment, the second collection unit 24 is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL. Accordingly, the foreign matter present in the liquid LQ is recovered from the second recovery unit 24 together with the liquid LQ supplied from the second supply unit 41. Thereby, it is suppressed that a foreign material enters into the optical path space SPK. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Further, according to the present embodiment, since the guide portion 38 is provided, the liquid LQ can be guided to a desired portion (direction) in the first space SP1. For example, the guiding part 38 guides at least a part of the liquid LQ in the first space SP1 so as to be directed outward from the optical path K of the exposure light EL, so that, for example, foreign matters are prevented from entering the optical path space SPK. That is, for example, even if a foreign substance exists in the liquid LQ of the first space SP1, the liquid LQ flows outward from the optical path K (optical path space SPK) by the guiding portion 38, and therefore the foreign substance enters the optical path space SPK. Is suppressed. In the present embodiment, the second recovery unit 24 is disposed outside the guiding unit 38 with respect to the optical path K (optical path space SPK) of the exposure light EL, and is at least one of the liquid LQ guided by the guiding unit 38. The part is recovered by the second recovery part 24. Accordingly, the foreign matter present in the liquid LQ is recovered from the second recovery unit 24 together with the liquid LQ guided by the guide unit 38. Thereby, it is possible to effectively prevent foreign matters from entering the optical path space SPK.

 Further, according to the present embodiment, the wall portion 38R (convex portion) forms the portion SP1a and the portion SP1b in the first space SP1. By providing the wall portion 38R (part SP1b), the liquid LQ in the first space SP1 (part SP1a) is prevented from flowing into the space outside the first space SP1 (part SP1a) with respect to the optical path K. Is done. Further, foreign matter that has entered the first space SP1 from the space outside the first space SP1 (part SP1b) (the outer space of the liquid immersion member 5) with respect to the optical path K flows into the first space SP1 (part SP1a). It is suppressed.

 In the present embodiment, the guiding unit 38 is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL. Therefore, the liquid LQ supplied from the second supply unit 41 is promoted to flow toward the outside of the optical path K.

 In the present embodiment, the first supply unit 31 that supplies the liquid LQ for forming the immersion space LS is disposed on the first member 21, and the first liquid LQ on the substrate P (object) is collected. The collection unit 27 is disposed on the second member 22 disposed with a gap between the first member 21 and the first member 21. Thereby, even if the temperature of the 2nd member 22 changes by recovering the fluid (one or both of liquid LQ and gas) from the 1st recovery part 27, the temperature of the 1st member 21 may change. It is suppressed. Therefore, a change in the temperature of the liquid LQ supplied from the first supply unit 31 is suppressed.

 In the present embodiment, the liquid LQ supplied from the first supply unit 31 flows so as to contact the inner surface 28 and the lower surface 23 of the first member 21. The temperature change of the first member 21 is suppressed by the liquid LQ. Further, the temperature of the first member 21 is adjusted by the liquid LQ. Further, the liquid LQ supplied from the first supply unit 31 flows so as to contact the upper surface 25 and the lower surface 26 of the second member 22. The temperature change of the second member 22 is suppressed by the liquid LQ. Further, the temperature of the second member 22 is adjusted by the liquid LQ.

 In the present embodiment, since the second member 22 includes the first recovery unit 27, the second interface LG2 formed between the lower surface of the first recovery unit 27 and the upper surface of the substrate P (object). It is suppressed that a shape changes. As a result, the liquid LQ in the immersion space LS is prevented from flowing out of the space between the immersion member 5 and the substrate P (object) or the liquid LQ remaining on the substrate P (object). .

  In the present embodiment, the liquid immersion space LS is formed by moving the second member 22 so that the relative movement (relative speed, relative acceleration) with respect to the substrate P (object) becomes small. Even when the object moves at a high speed, the liquid LQ is prevented from flowing out, the liquid LQ is left on the substrate P (object), or bubbles are generated in the liquid LQ.

  In the present embodiment, since the first member 21 is disposed at least at a part of the periphery of the terminal optical element 13, the object moves or the second member is in a state where the immersion space LS is formed. Even when 22 moves, it is suppressed that a pressure fluctuates between the last optical element 13 and the first member 21 and that the shape of the third interface LG3 of the liquid LQ greatly fluctuates. Therefore, for example, the generation of bubbles in the liquid LQ and the excessive force acting on the last optical element 13 are suppressed. In the present embodiment, since the first member 21 does not substantially move, the pressure varies greatly between the last optical element 13 and the first member 21, or the shape of the first interface LG1 of the liquid LQ is Large fluctuations are suppressed.

  In the present embodiment, the supply of the liquid LQ from the second supply unit 41 may not be performed in parallel with the supply of the liquid LQ from the first supply unit 31. In the present embodiment, at least from the start of exposure of the first shot region S to the end of exposure of the last shot region S on the substrate P, in parallel with the supply of the liquid LQ from the first supply unit 31, The liquid LQ is recovered from the first recovery unit 41. The supply of the liquid LQ from the second supply unit 41 may be performed continuously from the start of exposure of the first shot area S to the end of exposure of the last shot area S of the substrate P, or intermittently. It may be done. Further, the supply amount (liquid supply amount per unit time) of the liquid LQ from the second supply unit 41 changes from the start of exposure of the first shot region S to the end of exposure of the last shot region S of the substrate P. May be.

For example, the liquid supply condition of the second supply unit 41 may be controlled based on the movement condition of the second member 22 relative to the first member 21. The movement condition of the second member 22 includes at least one of the movement speed, acceleration, and movement distance of the second member 22 relative to the first member 21.

 For example, when the moving speed of the second member 22 is higher than the first speed (specified speed), the liquid LQ is supplied from the second supply unit 41, and the moving speed of the second member 22 is higher than the first speed. If it is low (or the moving speed of the second member 22 is zero), the supply of the liquid LQ from the second supply unit 41 may be stopped. Further, when the moving speed of the second member 22 is higher than the first speed (specified speed), the liquid LQ is supplied from the second supply unit 41 with the first supply amount, and the moving speed of the second member 22 is increased. When the speed is lower than the first speed (or when the moving speed of the second member 22 is zero), the liquid LQ is supplied from the second supply section 41 with the second supply amount that is smaller than the first supply amount. Good. Further, when the acceleration of the second member 22 is higher than the first acceleration (specified acceleration), the liquid LQ is supplied from the second supply unit 41 with the first supply amount, and the acceleration of the second member 22 is the first acceleration. When the acceleration is lower than the acceleration (or when the acceleration of the second member 22 is zero), the liquid LQ may be supplied from the second supply unit 41 with a second supply amount smaller than the first supply amount. Further, when the movement distance of the second member 22 (movement distance in the X-axis direction in the present embodiment) is longer than the first distance (specified distance), the liquid LQ is supplied from the second supply unit 41 with the first supply amount. When the supply is performed and the moving distance of the second member 22 is shorter than the first distance, the liquid LQ may be supplied from the second supply unit 41 with a second supply amount smaller than the first supply amount. .

 In the present embodiment, the guide unit 38 may not be disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL. The guide unit 38 may be disposed inside the second supply unit 41 with respect to the optical path K of the exposure light EL. Even in this case, at least a part of the liquid LQ (liquid LQ flowing into the first space SP1 from the opening 40) in the optical path space SPK flows toward the outside of the optical path K (optical path space SPK) by the guiding portion 38. it can. Further, the liquid LQ from the second supply unit 41 suppresses the entry of foreign matter or the like from the external space (the space between the outer surface 29 and the inner surface 30) of the liquid immersion member 5 into the first space SP1. .

  In the present embodiment, the guiding unit 38 may not guide the liquid LQ so as to go outward from the optical path K of the exposure light EL. The guiding unit 38 may guide the liquid LQ so that the foreign matter in the first space SP1 is prevented from entering the optical path space SPK. The guide unit 38 suppresses the liquid LQ in the first space SP1 from flowing into the optical path space SPK, and for example, the liquid LQ in the first space SP1 so that the liquid LQ in the first space SP1 flows around the opening 34. May be induced.

  In the present embodiment, the second recovery unit 24 may not be disposed outside the guiding unit 28 with respect to the optical path K of the exposure light EL. The second recovery unit 24 may be disposed inside the guiding unit 28 with respect to the optical path K of the exposure light EL. The guiding unit 38 is not disposed outside the guiding unit 38 with respect to the optical path K of the exposure light EL (for example, the second collecting unit 24 disposed inside the guiding unit 38). The liquid LQ may be induced in the liquid crystal.

  In the present embodiment, the second collection unit 24 may not be disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL. The second recovery unit 24 may be disposed inside the second supply unit 41 with respect to the optical path K of the exposure light EL.

  In the present embodiment, the first supply unit 31 may be omitted. The immersion space LS may be formed by the liquid LQ supplied from the second supply unit 41.

  In the present embodiment, the second supply unit 41 may be omitted. The immersion space LS can be formed by the liquid LQ supplied from the first supply unit 31.

  In the present embodiment, the guiding unit 38 may be omitted.

 In the present embodiment, the first member 21 may be movable. The first member 21 may move with respect to the last optical element 13. The first member 21 may move in at least one of the six directions of X axis, Y axis, Z axis, θX, θY, and θZ. For example, even if the first member 21 is moved in order to adjust the positional relationship between the terminal optical element 13 and the first member 21 or to adjust the positional relationship between the first member 21 and the second member 22. Good. Further, the first member 21 may be moved in parallel with at least a part of the movement of the substrate P (object). For example, the distance may be shorter than the second member 22 in the XY plane. Further, the first member 21 may move at a lower speed than the second member 22. The first member 21 may move at a lower acceleration than the second member 22.

 In addition, the 1st temperature adjustment apparatus which adjusts the temperature of the 1st member 21 may be arrange | positioned. The first temperature adjusting device may include, for example, a Peltier element disposed on the outer surface of the first member 21. The first temperature adjustment device may include a supply device that supplies a temperature adjustment fluid (one or both of a liquid and a gas) to a flow path formed inside the first member 21. A second temperature adjusting device that adjusts the temperature of the second member 22 may be arranged. The second temperature adjustment device may include a Peltier element disposed on the outer surface of the second member 22, or may include a supply device that supplies a temperature adjustment fluid to a flow path formed inside the second member 22. But you can.

 In the present embodiment, the liquid supply amount from the first supply unit 31 may be adjusted based on the movement condition of the second member 22. Further, the liquid supply amount from the first supply unit 31 may be adjusted based on the position of the second member 22. For example, the amount of liquid supplied from the first supply unit 31 when the second member 22 is disposed at at least one of the first end position and the second end position is such that the second member 22 is disposed at the center position. It may be adjusted so as to be larger than the liquid supply amount from the first supply unit 31 at the time. Further, when the second member 22 moves from the second end position to the first end position, the liquid supply amount from the first supply section 31 disposed on the + X side with respect to the optical path K is set to the −X side. The amount of liquid supply from the first supply unit 31 arranged in the above may be increased. Further, when the second member 22 moves from the first end position to the second end position, the liquid supply amount from the first supply section 31 disposed on the −X side with respect to the optical path K is set to the + X side. The amount of liquid supply from the first supply unit 31 arranged in the above may be increased. By doing so, generation of bubbles in the liquid LQ is suppressed.

  In the present embodiment, the second member 22 is moved in the step direction (X-axis direction) during the step movement operation of the substrate P in order to suppress the remaining liquid LQ due to the step movement operation of the substrate P. However, in order to suppress the liquid LQ remaining due to the scan movement operation of the substrate P, the second member 22 may be moved in the scan direction (Y-axis direction) in the scan movement operation of the substrate P. Good.

Second Embodiment
A second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 is a diagram illustrating an example of the liquid immersion member 5B according to the present embodiment. The liquid immersion member 5B includes a first member 21B and a second member 22. A first space SP1 is formed on the upper surface 25 side of the second member 22.

  The first space SP1 is disposed outside the portion SP1c with respect to the optical path K of the exposure light EL with respect to the portion SP1c having a gap W1 between the first member 21B and the second member 22 and the optical path K of the exposure light EL. A gap with the member 22 includes a portion SP1d having a dimension W2. The dimension W2 is smaller than the dimension W1.

  In the present embodiment, the liquid immersion member 5B includes a wall portion 236 that is disposed so as to surround the optical path K of the exposure light EL in the first space SP1. In the present embodiment, the wall portion 236 is disposed on the first member 21B. The wall portion 236 is a convex portion that is disposed on the lower surface 23 of the first member 21 </ b> B and protrudes toward the second member 22. The portion SP1d is defined by the wall portion 236. The portion SP1d includes a space between the upper surface 25 and the lower surface of the wall portion 236 facing the upper surface 25. The portion SP1c includes a space between the upper surface 25 and the lower surface 23.

  In the present embodiment, the wall portion 236 is disposed outside the second collection unit 24 with respect to the optical path K of the exposure light EL. The portion SP1d is disposed outside the second collection unit 24 with respect to the optical path K of the exposure light EL. The wall portion 236 (part SP1d) is disposed inside the first recovery unit 27 with respect to the optical path K of the exposure light EL.

  The wall portion 236 may be disposed on the second member 22. The wall portion 236 may be disposed on at least a part of the upper surface 25. The wall portion 236 may include a convex portion provided on the upper surface 25. The wall portion 236 may be disposed on both the first member 21 and the second member 22, or may be disposed on either the first member 21 or the second member 22. The wall portion 236 may be disposed on one or both of the lower surface 23 and the upper surface 25. The wall portion 236 may include both a convex portion provided on the lower surface 23 and a convex portion provided on the upper surface 25. When the wall portion 236 is disposed on the upper surface 25, the portion SP1c includes a space between the lower surface 23 and the upper surface 25, and the portion SP1d is between the lower surface 23 and the upper surface of the wall portion 236 facing the lower surface 23. Including space.

  In the example illustrated in FIG. 13, the guide portion 38 as described in the above embodiment may or may not be provided. When the guide portion 38 is provided, the portion SP1c includes the portion SP1a and the portion SP1b described in the above embodiment. When the guide unit 38 is provided, the guide unit 38 may be disposed inside the wall 236 (part SP1d) and the second recovery unit 24 with respect to the optical path K of the exposure light EL. In addition, when the guidance | induction part 38 is provided, the guidance | induction part 38 may be arrange | positioned inside the 2nd collection | recovery part 24 with respect to the optical path K of exposure light EL, and may be arrange | positioned outside. For example, the guide unit 38 may be disposed outside the second collection unit 24 and inside the wall unit 236 with respect to the optical path K of the exposure light EL.

 In the example illustrated in FIG. 13, the second supply unit 41 as described in the above embodiment may or may not be provided. When the second supply unit 41 is provided, the second supply unit 41 may be disposed inside the wall 236 (part SP1d) and the second recovery unit 236 with respect to the optical path K of the exposure light EL. In addition, when the 2nd supply part 41 is provided, the 2nd supply part 41 may be arrange | positioned inside the 2nd collection | recovery part 24 with respect to the optical path K of exposure light EL, and may be arrange | positioned outside. Good. For example, the second supply unit 41 may be disposed outside the second collection unit 24 and inside the wall 236 with respect to the optical path K of the exposure light EL.

 Moreover, in the example shown in FIG. 13, both the guidance | induction part 38 and the 2nd supply part 41 may be provided, only any one may be provided and both do not need to be provided. When both the guide unit 38 and the second supply unit 41 are provided, the second supply unit 27, the guide unit 38, the second collection unit 24, and the wall unit are directed outward in the radiation direction with respect to the optical path K of the exposure light EL. 236 may be arranged in this order, the guiding unit 38, the second supply unit 41, the second collection unit 24, and the wall unit 236 may be arranged in this order, or the second collection unit 24, the second supply unit 41. The guide unit 38 and the wall part 236 may be arranged in this order, or the second recovery unit 24, the guide part 38, the second supply unit 41, and the wall part 236 may be arranged in this order.

  As described above, according to the present embodiment, the provision of the portion SP1c suppresses the liquid LQ in the first space SP1 from flowing into the outer space. Moreover, it is suppressed that a foreign material penetrate | invades into 1st space SP1 (part SP1c) from the space outside 1st space SP1.

<Third Embodiment>
A third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 14 is a diagram illustrating an example of the liquid immersion member 5C according to the present embodiment. In the present embodiment, the first recovery part 27 is movable relative to the second member 22C.

 In FIG. 14, the liquid immersion member 5 </ b> C includes a first member 21, a second member 22 </ b> C, a recovery member 42 having a first recovery part 27, and a connection member 43 that connects the second member 22 </ b> C and the recovery member 42. Have The second member 22C has an upper surface 25C that can face the lower surface 23 of the first member 21, and a lower surface 26C that can face the substrate P (object). The connection member 43 is a deformable member. The connection member 43 may include an extendable / contractible member. The connection member 43 may include an elastic member that can be elastically deformed. The connection member 43 may include a flexible member that can be bent. The connection member 43 may include a bellows member.

  The second member 22C is movable by the operation of the driving device 321C. The collection member 42 is movable by the operation of the drive device 322C. The second member 22C and the recovery member 42 are connected via a deformable connection member 43. Therefore, the second member 22C and the recovery member 42 can be moved relative to each other.

  In the present embodiment, the connection member 43 is disposed between the second member 22C and the recovery member 42. No gap is formed between the second member 22C and the recovery member 42. The movement of the liquid LQ from one side to the other side of the first space SP1 on the upper surface 25C side and the second space SP2 on the lower surface 26C side is suppressed.

  The recovery member 42 (first recovery part 27) is movable with respect to the first member 21 during at least part of the period in which the second member 22C moves relative to the first member 21.

 The moving direction of the second member 22C relative to the first member 21 and the moving direction of the collecting member 42 (first collecting unit 27) may be the same direction or different directions. For example, in at least a part of the period in which the second member 22C moves in the + X direction, the collection member 42 (first collection unit 27) may move in the + X direction or may move in the −X direction. . Further, the recovery member 42 (first recovery part 27) may be moved in the Y-axis direction during at least a part of the period in which the second member 22C moves in the X-axis direction.

 Further, the relative speed of the second member 22C with respect to the first member 21 and the relative speed of the recovery member (first recovery part 27) may be different. For example, in at least a part of the period during which the second member 22 </ b> C moves with respect to the first member 21, the recovery member 42 (first recovery unit 27) is lower than the relative speed of the second member 22 </ b> C with respect to the first member 21. You may move with respect to the 1st member 21 with relative speed. Further, in at least a part of the period during which the second member 22 </ b> C moves with respect to the first member 21, the collection member 42 (first collection unit 27) is higher than the relative speed of the second member 22 </ b> C with respect to the first member 21. You may move with respect to the 1st member 21 with relative speed. For example, the second member 22C moves in the + X direction with respect to the first member 21 at a speed Va, and the recovery member 42 (first recovery part 27) + X at a speed Vb different from the speed Va with respect to the first member 21. You may move in the direction. The speed Vb may be lower or higher than the speed Va.

 Further, the relative acceleration of the second member 22C with respect to the first member 21 and the relative acceleration of the recovery member (first recovery portion 27) may be different. For example, the recovery member 42 (first recovery part 27) is lower than the relative acceleration of the second member 22C with respect to the first member 21 during at least a part of the period during which the second member 22C moves relative to the first member 21. You may move with respect to the 1st member 21 by relative acceleration. Further, in at least a part of the period during which the second member 22 </ b> C moves with respect to the first member 21, the collection member 42 (first collection unit 27) is higher than the relative acceleration of the second member 22 </ b> C with respect to the first member 21. You may move with respect to the 1st member 21 by relative acceleration. For example, the second member 22C moves in the + X direction with respect to the first member 21 at an acceleration Aa, and the recovery member 42 (first recovery unit 27) + X with an acceleration Ab different from the acceleration Aa with respect to the first member 21. You may move in the direction. The acceleration Ab may be lower or higher than the acceleration Aa.

 In addition, the recovery member 42 (first recovery unit 27) may move together with the second member 22C during at least a part of the period during which the second member 22C moves relative to the first member 21. For example, the recovery member 42 (first recovery unit 27) is at a speed Va with respect to the first member 21 during at least a part of the period in which the second member 22C moves in the + X direction with respect to the first member 21 at the speed Va. You may move in the + X direction.

 Further, the recovery member 42 (first recovery part 27) may be substantially stationary with respect to the first member 21 during at least a part of the period during which the second member 22 </ b> C moves relative to the first member 21. . In other words, the collection member 42 (first collection unit 27) does not have to move during at least a part of the period during which the second member 22C moves.

  Further, the relative speed of the collection member 42 (first collection unit 27) with respect to the first member 21 may change during at least a part of the period in which the second member 22C moves with respect to the first member 21. For example, the speed of the recovery member 42 may change from one of the first speed and the second speed higher than the first speed to the other. The first speed of the collecting member 42 may be lower than the moving speed of the second member 22C, and the second speed of the collecting member 42 may be higher than the moving speed of the second member 22C. Both the first speed and the second speed of the recovery member 42 may be higher or lower than the moving speed of the second member 22C.

  In the present embodiment, an opening (hole) that fluidly connects the first space SP1 on the upper surface 25C side and the second space SP2 on the lower surface 26C side is formed outside the opening 35 with respect to the optical path K. May be. The opening (hole) may be formed in the second member 22 </ b> C or may be formed in the connection member 43.

  In the present embodiment, the connection member 43 may be omitted. Since the second member 22C and the recovery member 42 are separate members, the second member 22C and the recovery member 42 (first recovery unit 27) are relatively movable. Further, a gap may be formed between the second member 22C and the recovery member 42. Through the gap, the first space SP1 on the upper surface 25C side and the second space SP2 on the lower surface 26C side may be fluidly connected.

  The first recovery unit 27 can recover at least a part of the liquid LQ from the second space SP2 by fluidly connecting the first space SP1 on the upper surface 25C side and the second space SP2 on the lower surface 26C side. And at least a part of the liquid LQ from the first space SP1 can be recovered.

  In the first and second embodiments described above, an opening that fluidly connects the first space SP1 and the second space SP2 to a part of the second member 22 outside the opening 35 with respect to the optical path K. (Hole) may be formed. Also in this case, the first recovery unit 27 can recover at least a part of the liquid LQ from the second space SP2, and can recover at least a part of the liquid LQ from the first space SP1.

<Fourth embodiment>
A fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  15 is a cross-sectional view parallel to the YZ plane showing the liquid immersion member 5D according to the present embodiment, FIG. 16 is a cross-sectional view parallel to the XZ plane showing the liquid immersion member 5D, and FIG. 17 is a part of FIG. 18 is a view of the liquid immersion member 5D as viewed from the lower side (−Z side), FIG. 19 is a perspective view of the liquid immersion member 5D, and FIG. It is the figure seen from the -Z side).

  The liquid immersion member 5D is disposed in at least part of the periphery of the optical path K of the exposure light EL below the first member 21D, and the first member 21D disposed at least part of the periphery of the last optical element 13. The second member 22D is movable with respect to the first member 21D.

  In the present embodiment, the first member 21 </ b> D is disposed around the terminal optical element 13. The first member 21D is an annular member. In the present embodiment, the second member 22D is disposed around the optical path K. The second member 22D is an annular member.

  The first member 21D has a lower surface 23D that faces the −Z direction. The second member 22D has an upper surface 25D facing the + Z direction and a lower surface 26D facing the -Z direction. The substrate P (object) can face the lower surface 26D. The upper surface 25D is opposed to the lower surface 23D via a gap. In the present embodiment, the upper surface 25D faces the emission surface 12 with a gap. Note that the upper surface 25D may not face the emission surface 12.

  The liquid immersion member 5D includes a first supply part 31 that supplies the liquid LQ for forming the liquid immersion space LS, and a second supply part 41 that supplies the liquid LQ to the first space SP1 on the upper surface 25D side.

  The first supply unit 31 faces the third space SP3. The first supply unit 31 is disposed on the first member 21D. The second supply unit 41 faces the first space SP1. The second supply unit 41 is disposed on the first member 21D.

  In addition, the 1st supply part 31 may be arrange | positioned at one or both of 1st member 21D and 2nd member 22D. In addition, the 2nd supply part 41 may be arrange | positioned at 2nd member 22D so as to face 1st space SP1. The second supply unit 41 may be disposed on one or both of the first member 21D and the second member 22D.

  The liquid immersion member 5D includes a recovery unit 27D that recovers at least a part of the liquid LQ in the liquid immersion space LS. The collection unit 27D is disposed on the first member 21D. During the period in which the second member 22D moves relative to the first member 21D, the collection unit 27D is stationary with respect to the first member 21D.

 In the present embodiment, at least a part of the second member 22D faces the recovery unit 27D. Note that the second member 22D may not face the collection unit 27D.

  The collection unit 27D is disposed outside the lower surface 23D with respect to the optical path K (the optical axis AX of the terminal optical element 13). In the present embodiment, the substrate P (object) can face at least a part of the collection unit 27D. The recovery unit 27D can recover at least a part of the liquid LQ from the first space SP1 that the upper surface 25D faces. Further, the recovery unit 27D can recover at least a part of the liquid LQ from the second space SP2 that the lower surface 26D faces.

  The second member 22D is moved by the driving device 127. The drive device 127 includes, for example, a motor, and moves the second member 22D using Lorentz force. In the present embodiment, the support member 128 is connected to at least a part of the upper surface 25D of the second member 22D. In the present embodiment, the support member 128 is disposed on each of the + Y side and the −Y side with respect to the optical path K (terminal optical element 13). The support member 128 is moved by the operation of the driving device 127. The drive device 127 moves the second member 22 </ b> D by moving the support member 128.

 The arrangement of the plurality of support members 128 is not limited to the + Y side and the −Y side. For example, it may be arranged on each of the + X side and the −X side, or may be arranged on each of the + Y side, the −Y side, the + X side, and the −X side. Further, the second member 22D may be supported by one support member.

  In the present embodiment, the first member 21 </ b> D has an inner surface 130 that faces the side surface 13 </ b> F of the last optical element 13, and an upper surface 131 that is disposed around the upper end of the inner surface 130.

  In the present embodiment, the plurality of support members 128 are movably disposed in the plurality of holes 132 provided in the first member 21D. In the present embodiment, holes 132 are provided on the + Y side and the −Y side with respect to the optical path K, respectively. Each of the holes 132 is formed in the first member 21D so as to be connected to the first space SP1. At least a part of the support member 128 is disposed in the hole 132.

 Each of the holes 132 connects the first member 21D with the upper space (including the third space SP3) and the lower space (including the first space SP1) of the first member 21D in the Z-axis direction. To penetrate. In the present embodiment, each of the holes 132 is formed so as to connect the inner surface 130 and the lower surface 23D of the first member 21D. Further, as shown in FIG. 19 and the like, each of the holes 132 extends in the X-axis direction, and the support member 28 arranged in the hole 132 is movable in the X-axis direction. The driving device 127 is connected to the support member 128 on the inner surface 130 side. That is, in the present embodiment, the driving device 127 is connected to the support member 128 directly or indirectly through another member in the upper space of the first member 21D. When the support member 128 is moved in the X-axis direction by the driving device 127, the second member 22D is moved in the X-axis direction.

 Note that at least one of the holes 132 in which the support member 128 is disposed may be formed so as to connect the upper surface 131 and the lower surface 23D of the first member 21D. Note that the support member 128 may be moved by a plurality of drive devices 127, or one support member 128 may be moved by one drive device 127. A plurality of support members 28 may be connected by a connecting member (not shown), and the connecting member may be moved by the driving device 127.

  In the present embodiment, the second member 22D and the support member 128 do not contact the first member 21D. A gap is formed between the first member 21D and the second member 22D, and a gap is formed between the first member 21D and the support member 128. The driving device 127 can move the second member 22D and the support member 128 so that the second member 22D and the support member 128 do not contact the first member 21D. Note that at least one of the second member 22D and the support member 128 may be in contact with the first member 21D.

 In the present embodiment, the second member 22D is movable in the X-axis direction. The second member 22D is movable substantially parallel to the XY plane. The second member 22D may be movable in at least one direction of the Y axis, the Z axis, θX, θY, and θZ in addition to the X axis direction.

  In the present embodiment, the terminal optical element 13 does not move substantially. The first member 21D also does not move substantially. The second member 22D is movable relative to the last optical element 13 and the first member 21D below at least part of the first member 21D. The second member 22D is movable between the first member 21D and the substrate P (object).

  The first member 21D has an upper surface 136 that is connected to the lower end of the inner surface 130 and faces in the opposite direction (+ Z direction) of the lower surface 23D. The upper surface 136 is disposed around the upper end of the opening 34. The lower surface 23 </ b> D is disposed around the lower end of the opening 34. The upper surface 25D is disposed around the upper end of the opening 35. The lower surface 26 </ b> D is disposed around the lower end of the opening 35.

  The liquid LQ supplied from the first supply unit 31 flows through the upper surface 136 and then is supplied to the upper surface 25D. At least a part of the liquid LQ supplied to the upper surface 25D is supplied onto the substrate P (object) through the opening 35 provided in the second member 22D. Thereby, the optical path K is filled with the liquid LQ. Further, at least a part of the liquid LQ from the opening 35 is supplied to the second space SP2.

  In addition, at least a part of the liquid LQ supplied from the first supply unit 31 to the upper surface 25D is supplied to the first space SP1 through the opening 40 between the lower surface 23D and the upper surface 25D.

  At least a part of the collection unit 27D is arranged so that the substrate P (object) faces each other. In addition, at least a part of the collection unit 27D is disposed so that the second member 22D is opposed. The recovery unit 27D has a recovery port 137 for recovering the liquid LQ. The recovery port 137 is connected to the liquid recovery device via a recovery flow path (space) 137R formed inside the first member 21D. The liquid recovery apparatus can connect the recovery port 137 and the vacuum system.

 The recovery port 137 can recover at least a part of the liquid LQ in the immersion space LS. At least a part of the liquid LQ on the substrate P (object) can flow into the recovery channel 137R through the recovery port 137. At least a part of the liquid LQ in the first space SP1 can flow into the recovery channel 137R via the recovery port 137. Further, at least a part of the liquid LQ in the second space SP2 can flow into the recovery channel 137R via the recovery port 137.

 In the present embodiment, the recovery unit 27D includes a porous member 138, and the recovery port 137 includes a hole of the porous member 138. In the present embodiment, the porous member 138 includes a mesh plate. The porous member 138 has a lower surface 139 to which the substrate P (object) can face, an upper surface facing the recovery flow path 137R, and a plurality of holes connecting the lower surface 139 and the upper surface. The liquid LQ on the substrate P (object) recovered from the recovery port 137 (hole of the porous member 138) flows into the recovery flow path 137R.

  In the present embodiment, the recovery operation of the liquid LQ from the recovery unit 27D is executed in parallel with the supply operation of the liquid LQ from the first supply unit 31, so that the terminal optical element 13 on one side and the liquid immersion device are immersed. An immersion space LS is formed with the liquid LQ between the member 5D and the substrate P (object) on the other side.

  A part of the interface LG of the liquid LQ in the liquid immersion space LS is formed between the liquid immersion member 5D and the substrate P (object). In the present embodiment, the interface LG is formed between the first member 21D and the substrate P (object).

 In the present embodiment, at least a part of the third space SP3 is filled with the liquid LQ in the immersion space LS. A part of the interface LG of the liquid LQ is formed between the terminal optical element 13 and the first member 21.

  In the present embodiment, a second recovery unit that faces the first space SP1 and can recover the liquid LQ in the first space SP1 may be provided. The second recovery unit may be provided on the first member 21D, may be provided on the second member 22D, or may be provided on both the first member 21D and the second member 22D.

  The liquid immersion member 5D includes a guide portion 380 that guides at least part of the liquid LQ in the first space SP1. As shown in FIG. 20, in the present embodiment, the guide portion 380 includes a convex portion provided on the lower surface 23D of the first member 21D. The guide unit 380 can guide at least a part of the liquid LQ supplied from the first supply unit 31 to the first space SP1 through the opening 40, for example. In addition, the guide unit 380 can guide at least a part of the liquid LQ supplied from the second supply unit 41 to the first space SP1.

  The guiding unit 380 guides at least a part of the liquid LQ in the first space SP1 from the optical path K of the exposure light EL toward the outside. As shown in FIG. 20, in the present embodiment, the collection unit 27D is disposed outside the guide unit 380 with respect to the optical path K of the exposure light EL. The guide unit 380 guides at least part of the liquid LQ in the first space SP1 to the recovery unit 27D.

  In the present embodiment, the second supply unit 41 is disposed outside the guide unit 380 with respect to the optical path K of the exposure light EL. The collection unit 27D is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL.

  In the present embodiment, the lower end portion of the hole 132 facing the first space SP1 is disposed outside the guiding portion 380 with respect to the optical path K of the exposure light EL. A lower end portion of the hole 132 facing the first space SP1 is disposed outside the second supply unit 41 with respect to the optical path K of the exposure light EL.

  The guiding portion 380 includes a wall portion 380R disposed at least at a part around the optical path K of the exposure light EL, and a slit (opening) 380K formed in a part of the wall portion 380R. The wall 38R is arranged so as to surround the optical path K of the exposure light EL in the first space SP1. The wall portion 380R is disposed so as to surround the opening 34. The slits 380K are formed on the + X side and the −X side with respect to the optical path K, respectively. In the present embodiment, the slits 380K are formed on the + Y side and the −Y side with respect to the optical path K, respectively.

  Note that the wall portion 380R may not surround the opening 34 (the optical path K of the exposure light EL). For example, the wall portion 380R is disposed on each of the + X side and the −X side of the opening 34 (the optical path K of the exposure light EL), and may not be disposed on each of the + Y side and the −Y side.

  In addition, the guidance part 380 may be arrange | positioned at 2nd member 22D. In addition, the guidance | induction part 380 may be arrange | positioned in both 1st member 21D and 2nd member 22D, and may be arrange | positioned in any one of 1st member 21D and 2nd member 22D.

  Further, as shown in FIGS. 17 and 20, etc., in the present embodiment, the first space SP1 includes the portion SP1e having a gap W3 between the first member 21D and the second member 22D and the optical path of the exposure light EL. The portion SP1e is disposed outside the portion SP1e with respect to K, and includes a portion SP1f having a dimension W4 in which the gap between the first member 21D and the second member 22D is smaller than the dimension W3. In the present embodiment, the portion SP1f is defined by a wall portion 390 arranged so as to surround the optical path K of the exposure light EL in the first space SP1.

  In the present embodiment, the wall portion 390 is disposed on the lower surface 23D of the first member 21D. When the wall portion 390 is disposed on the lower surface 23D, the portion SP1e includes a space between the lower surface 23D and the upper surface 25D, and the portion SP1f is between the upper surface 25D and the lower surface of the wall portion 390 facing the upper surface 25D. Including space. When the wall portion 390 is disposed on the upper surface 25D, the portion SP1e includes a space between the lower surface 23D and the upper surface 25D, and the portion SP1f is between the lower surface 23D and the upper surface of the wall portion 390 facing the lower surface 23D. Including space. Note that the wall portion 390 may be disposed on both the lower surface 23D and the upper surface 25D.

  In the present embodiment, the recovery unit 27D is disposed outside the portion SP1f with respect to the optical path K of the exposure light EL.

  In the present embodiment, the lower end portion of the hole 132 facing the first space SP1 faces the portion SP1e.

  As described above, in the present embodiment, since the second supply unit 41, the guide unit 380, and the wall unit 390 (part SP1f) are provided, the space between the first member 21D and the substrate P (object). From entering into the first space SP1 and the entry of foreign matter into the first space SP1 through the hole 132 are suppressed. Thereby, it is suppressed that a foreign material enters into the optical path space SPK. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, the second supply unit 41 may be omitted. Also by the action of one or both of the guiding portion 380 and the wall portion 390, the entry of foreign matter into the optical path space SPK is suppressed.

  In the present embodiment, the guiding unit 380 may be omitted. Also by the action of one or both of the second supply part 41 and the wall part 390, entry of foreign matter into the optical path space SPK is suppressed.

  In the present embodiment, the wall portion 390 may be omitted. Also by the action of one or both of the second supply unit 41 and the guide unit 380, foreign substances are prevented from entering the optical path space SPK.

  In the present embodiment, a recovery unit that can recover the liquid LQ on the substrate P (object) may be provided on the lower surface 26D of the second member 22D.

  In the present embodiment, the recovery unit 27D may be provided on a member different from the first member 21D and the second member 22D. The other member (collection unit 27D) may be movable relative to the second member 22D. Further, the other member (collection unit 27D) may be movable relative to the first member 21D. Moreover, the other member (collection part 27D) may move with respect to the first member 21D at a relative speed lower than the relative speed of the second member 22D with respect to the first member 21D. Moreover, the other member (collection part 27D) may move together with the second member 22D.

  In the first to fourth embodiments described above, as shown in FIG. 21, at least a part of the first member 214 may face the exit surface 12 of the last optical element 13. In the example shown in FIG. 21, the first member 214 has an upper surface 44 disposed around the opening 34. An upper surface 44 is disposed around the upper end of the opening 34. A lower surface 23 is disposed around the lower end of the opening 34. A part of the upper surface 44 faces the emission surface 12. In the example shown in FIG. 21, a part of the upper surface 25 of the second member 22 is also opposed to the emission surface 12.

  As shown in FIG. 22, the lower surface 23 of the first member may be disposed on the + Z side with respect to the emission surface 12. The position (height) of the lower surface 23 in the Z-axis direction and the position (height) of the exit surface 12 may be substantially equal. The lower surface 23 of the first member may be disposed on the −Z side with respect to the emission surface 12.

  In each of the above-described embodiments, the first member 21 may be provided with a suction port that sucks at least one of the liquid LQ and the gas from the space between the first member 21 and the last optical element 13.

  In each of the above-described embodiments, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  According to the above-described embodiment, the program recorded in the storage device 7 is transmitted to the control device 6 at least around the optical member, the first member, and the periphery of the optical path of the exposure light below the first member. A second member having a second upper surface disposed on at least a portion of the first member and opposed to the first lower surface of the first member with a gap, and a second lower surface capable of facing the substrate, and an immersion space A first supply section for supplying a liquid, wherein a gap between the first member and the second member is disposed outside the first portion with respect to the first portion and the optical path of the first dimension, and the first member and the second member; The liquid immersion space is formed on the substrate movable below the optical member by using the liquid immersion member formed in the first space on the second upper surface side with the second portion whose gap is smaller than the first dimension. Forming and exposing light emitted from the exit surface via the liquid in the immersion space And exposing the substrate, at least part of the exposure of the substrate, a program to be executed and moving the second member relative to the first member, it is provided.

  Further, according to the above-described embodiment, the program recorded in the storage device 7 is transmitted to the control device 6 by the first member disposed at least at a part around the optical member, and the optical path of the exposure light below the first member. A second member having a second upper surface disposed on at least a part of the periphery of the first member and opposed to the first lower surface of the first member via a gap, and a second lower surface capable of facing the substrate, to form an immersion space A liquid immersion member including a first supply unit that supplies the liquid and a guide unit that is disposed on one or both of the first lower surface and the second upper surface and guides at least part of the liquid in the first space on the second upper surface side Forming a liquid immersion space on a substrate movable under the optical member, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and In at least part of the exposure of the substrate, the first member And moving the second member Te, it may be executed.

  Further, according to the above-described embodiment, the program recorded in the storage device 7 is transmitted to the control device 6 by the first member disposed at least at a part around the optical member, and the optical path of the exposure light below the first member. A second member having a second upper surface disposed on at least a part of the periphery of the first member and opposed to the first lower surface of the first member via a gap, and a second lower surface capable of facing the substrate, to form an immersion space The liquid is moved below the optical member by using a liquid immersion member that includes a first supply part that supplies the liquid and a second space that faces the first space on the second upper surface side and supplies the liquid to the first space. Forming a liquid immersion space on the possible substrate, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and at least part of the exposure of the substrate. Moving the second member relative to the one member, Good.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. The exposure apparatus may be used. For example, as shown in FIG. 23, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 24, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 21 ... 1st member, 22 ... 2nd member, 22S DESCRIPTION OF SYMBOLS ... Support member, 23 ... Lower surface, 24 ... 2nd collection | recovery part, 25 ... Upper surface, 26 ... Lower surface, 27 ... 1st collection | recovery part, 29 ... Outer surface, 30 ... Inner surface, 31 ... Liquid supply part, 32 ... Drive apparatus , 34 ... opening, 35 ... opening, 38 ... guide part, EL ... exposure light, EX ... exposure apparatus, IL ... illumination system, K ... optical path, LQ ... liquid, LS ... immersion space, P ... substrate.

Claims (56)

A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member;
A second lower surface, which is disposed at least part of the periphery of the optical path of the exposure light below the first member and faces the first lower surface of the first member via a gap, and the second lower surface capable of facing the object. A second member movable relative to the first member;
A first supply unit for supplying a liquid for forming the immersion space,
In the first space on the second upper surface side, the gap between the first member and the second member is disposed outside the first portion with respect to the first portion having the first dimension and the optical path, A liquid immersion member including a second portion having a second dimension in which a gap between one member and the second member is smaller than the first dimension. A first wall portion disposed so as to surround the optical path of the exposure light in the first space;
The liquid immersion member according to claim 1, wherein the second portion is defined by the first wall portion.   The liquid immersion member according to claim 2, wherein the first wall portion is disposed on one or both of the first lower surface and the second lower surface.   The liquid immersion member according to any one of claims 1 to 3, further comprising a guide portion that is disposed on one or both of the first lower surface and the second upper surface and guides at least a part of the liquid in the first space. . A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member;
A second lower surface, which is disposed at least part of the periphery of the optical path of the exposure light below the first member and faces the first lower surface of the first member via a gap, and the second lower surface capable of facing the object. A second member movable relative to the first member;
A first supply unit for supplying a liquid for forming the immersion space;
A liquid immersion member, comprising: a guiding portion that is disposed on one or both of the first lower surface and the second upper surface and guides at least part of the liquid in the first space on the second upper surface side.  The at least part of the liquid from the first supply unit flows into the first space through an opening between an inner edge of the first lower surface and the second upper surface. Liquid immersion material. The second member moves in a plane perpendicular to the optical axis of the optical member;
The liquid immersion member according to any one of claims 4 to 6, wherein the guide portion guides at least a part of the liquid in a direction parallel to a moving direction of the second member.   The liquid immersion member according to any one of claims 4 to 7, wherein the guide portion guides at least a part of the liquid so as to go outward from an optical path of the exposure light.   The said guidance | induction part has a 2nd wall part arrange | positioned so that the optical path of the said exposure light may be enclosed, and the slit formed in a part of said 2nd wall part. The exposure apparatus described.   The liquid immersion member according to claim 9, wherein the second wall portion is disposed on one or both of the first lower surface and the second upper surface. A second supply part facing the first space on the second upper surface side and supplying a liquid to the first space;
The liquid immersion member according to any one of claims 4 to 10, wherein the guide unit is disposed outside the second supply unit with respect to the optical path of the exposure light.   The liquid immersion member according to any one of claims 1 to 10, further comprising a second supply unit that faces the first space on the second upper surface side and supplies the liquid to the first space. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A first member disposed on at least a part of the periphery of the optical member;
A second lower surface, which is disposed at least part of the periphery of the optical path of the exposure light below the first member and faces the first lower surface of the first member via a gap, and the second lower surface capable of facing the object. A second member movable relative to the first member;
A first supply unit for supplying a liquid for forming the immersion space;
A liquid immersion member comprising: a second supply unit that faces the first space on the second upper surface side and supplies the liquid to the first space.   The liquid immersion member according to any one of claims 11 to 13, wherein the second supply unit is disposed on the first lower surface.   The liquid immersion member according to claim 1, wherein the second member moves in a plane perpendicular to the optical axis of the optical member. A recovery unit for recovering at least part of the liquid in the immersion space;
4. The liquid immersion member according to claim 1, wherein at least a part of the recovery unit is disposed outside the second part with respect to the optical path of the exposure light. A recovery unit for recovering at least part of the liquid in the immersion space;
The liquid immersion member according to any one of claims 4 to 10, wherein at least a part of the recovery unit is disposed outside the guide unit with respect to an optical path of the exposure light. A recovery unit for recovering at least part of the liquid in the immersion space;
The liquid immersion member according to any one of claims 11 to 13, wherein at least a part of the recovery unit is disposed outside the second supply unit with respect to the optical path of the exposure light.   The liquid immersion member according to any one of claims 16 to 18, wherein the recovery unit includes a first recovery unit that can face the object, and a second recovery unit that faces the first space.   The liquid immersion member according to any one of claims 1 to 15, further comprising a first recovery portion that can face the object and recovers at least a part of the liquid in the immersion space.   The liquid immersion member according to claim 19 or 20, wherein the first recovery unit recovers at least a part of the liquid from the second space on the second lower surface side.   The liquid immersion member according to any one of claims 19 to 21, wherein the first recovery unit is movable relative to the second member.   The at least part of a period during which the second member moves relative to the first member, the first recovery part is movable relative to the first member. Liquid immersion member.   In at least a part of a period during which the second member moves with respect to the first member, the first recovery unit is configured to move the first member at a relative speed lower than a relative speed of the second member relative to the first member. The liquid immersion member according to claim 23, which moves relative to   25. The liquid immersion member according to claim 23 or 24, wherein the first recovery part is substantially stationary with respect to the first member during at least a part of a period during which the second member moves relative to the first member. .   The liquid according to any one of claims 19 to 25, wherein the first recovery part moves together with the second member during at least a part of a period during which the second member moves relative to the first member. Immersion member.   27. The exposure apparatus according to any one of claims 19 to 26, wherein at least a part of the second member faces the first recovery unit.   The liquid immersion member according to any one of claims 19 to 27, wherein the first recovery unit is disposed on the first member.   The liquid immersion member according to any one of claims 19 to 28, wherein the first recovery unit is disposed on the second member.   30. The liquid immersion member according to any one of claims 19 to 29, wherein the first recovery unit is capable of recovering at least part of the liquid from the first space.   30. The liquid immersion member according to claim 19, wherein the first recovery part does not recover the liquid in the first space.   The said 1st collection | recovery part is a liquid immersion member as described in any one of Claims 19-31 containing a porous member.   The liquid immersion member according to any one of claims 1 to 15, further comprising a second recovery portion facing the first space and capable of recovering at least part of the liquid in the first space.   The liquid immersion member according to claim 19 or 33, wherein the second recovery unit is disposed on the first member.   The liquid immersion member according to claim 33 or 34, wherein the second recovery part includes a porous member. A support member connected to a part of the second upper surface and moved by operation of a driving device;
A through hole that is formed in the first member so as to be connected to the first space and in which at least a part of the support member is disposed,
The liquid immersion member according to any one of claims 1 to 3, wherein an end portion of the through hole facing the first space faces the first portion. A support member connected to a part of the second upper surface and moved by operation of a driving device;
A through hole that is formed in the first member so as to be connected to the first space and in which at least a part of the support member is disposed,
The liquid immersion member according to any one of claims 4 to 10, wherein an end portion of the through hole facing the first space is disposed outside the guide portion with respect to an optical path of the exposure light. A support member connected to a part of the second upper surface and moved by operation of a driving device;
A through hole that is formed in the first member so as to be connected to the first space and in which at least a part of the support member is disposed,
14. The liquid immersion member according to claim 11, wherein an end of the through hole facing the first space is disposed outside the second supply unit with respect to the optical path of the exposure light. . The first member has a first opening through which the exposure light can pass,
The liquid immersion member according to any one of claims 1 to 38, wherein the second member has a second opening through which the exposure light can pass.   The liquid immersion member according to any one of claims 1 to 39, wherein the second member is movable in a state where the liquid immersion space is formed.   The liquid immersion member according to any one of claims 1 to 39, wherein the second member is movable in a state where the liquid in the liquid immersion space is in contact with the liquid immersion space.   The liquid immersion member according to any one of claims 1 to 41, wherein the second member is movable in at least a part of a period in which the exposure light is emitted from the emission surface. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the liquid immersion member according to any one of claims 1 to 42. The object includes the substrate;
In a state where the immersion space is formed, the substrate moves in the plane substantially perpendicular to the optical axis of the optical member and then moves in the second path,
In the first path, the movement of the substrate includes movement in a second direction substantially parallel to the second axis in the plane;
In the second path, the movement of the substrate includes movement in a third direction substantially parallel to a third axis perpendicular to the second axis in the plane,
44. The exposure apparatus according to claim 43, wherein the second member moves in the third direction during at least a part of a period during which the substrate moves along the second path.   The exposure light is irradiated to the shot region of the substrate through the liquid in the immersion space when the substrate moves along the first path, and the exposure light is not irradiated when moved along the second path. Item 45. The exposure apparatus according to Item 44. The substrate moves along the third path after moving along the second path,
In the third path, the movement of the substrate includes movement in a third direction opposite to the first direction;
46. The exposure apparatus according to claim 44, wherein the second member moves in a fourth direction opposite to the second direction during at least a part of a period during which the substrate moves in the third path.   47. The exposure apparatus according to any one of claims 43 to 46, wherein the object includes a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 43 to 47;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing the substrate and a second lower surface on which the substrate can be opposed, and a first supply part for supplying a liquid for forming an immersion space, and the first member and the first member A gap between the first member and the second member is disposed outside the first portion with respect to the optical path, and a gap between the first member and the second member is smaller than the first dimension. Forming a liquid immersion space on the substrate movable under the optical member using a liquid immersion member formed in the first space on the second upper surface side; and
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least part of the exposure of the substrate. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing each other and a second lower surface on which the substrate can be opposed, a first supply unit for supplying a liquid for forming an immersion space, and the first lower surface and the second upper surface. Using the liquid immersion member including a guiding portion that is disposed on one or both sides and guides at least a part of the liquid in the first space on the second upper surface side, on the substrate that is movable below the optical member, Forming a liquid immersion space;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least part of the exposure of the substrate. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing each other and a second lower surface on which the substrate can face, a first supply part for supplying a liquid for forming an immersion space, and a first space on the second upper surface side. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member that includes a second supply unit that supplies liquid to the first space.
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the second member relative to the first member in at least part of the exposure of the substrate. Exposing the substrate using the exposure method according to any one of claims 49 to 51;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing the substrate and a second lower surface on which the substrate can be opposed, and a first supply part for supplying a liquid for forming an immersion space, and the first member and the first member A gap between the first member and the second member is disposed outside the first portion with respect to the optical path, and a gap between the first member and the second member is smaller than the first dimension. Forming a liquid immersion space on the substrate movable under the optical member using a liquid immersion member formed in the first space on the second upper surface side; and
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
A program for executing movement of the second member relative to the first member in at least a part of exposure of the substrate. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing each other and a second lower surface on which the substrate can face, a first supply part for supplying a liquid for forming an immersion space, and the first lower surface and the second upper surface. On the substrate that is movable under the optical member using a liquid immersion member that includes a guiding portion that is disposed on one or both of the first space and guides at least part of the liquid in the first space on the second upper surface side. Forming an immersion space for the liquid;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
A program for executing movement of the second member relative to the first member in at least a part of exposure of the substrate. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A first member disposed at least part of the periphery of the optical member; disposed at least part of the periphery of the optical path of the exposure light below the first member; A second member having a second upper surface facing each other and a second lower surface on which the substrate can face, a first supply part for supplying a liquid for forming an immersion space, and a first space on the second upper surface side. Forming a liquid immersion space on the substrate that is movable below the optical member using a liquid immersion member that includes a second supply unit that supplies liquid to the first space.
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
A program for executing movement of the second member relative to the first member in at least a part of exposure of the substrate.   The computer-readable recording medium which recorded the program as described in any one of Claims 53-55.

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