JP2014120693A - Liquid immersion member, exposure apparatus, exposure method, device manufacturing method, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid immersion member which can suppress occurrence of poor exposure.SOLUTION: The liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate with exposure light through liquid between the substrate and an emission surface of an optical member, and liquid immersion space is formed on an object which can move in the lower part of the optical member. The liquid immersion member has a movable member which has a fluid collection opening where an object can be faced and which can be moved with respect to the optical member, and a gas-liquid separation device which separates liquid and gas collected from the fluid collection opening.

Description

  The present invention relates to a liquid immersion member, an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.

 As an exposure apparatus used in a photolithography process, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid, for example, as disclosed in Patent Document 1 below is known.

U.S. Pat. No. 7,864,292

 In the exposure apparatus, if a foreign substance or the like adheres to the substrate, an exposure failure may occur. As a result, a defective device may occur.

   An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the surface, having a fluid recovery port that can be opposed to an object, movable with respect to the optical member, and liquid and gas recovered from the fluid recovery port. There is provided a liquid immersion member comprising a gas-liquid separation device for separation.

  According to the second aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the movable member having a fluid recovery port that can be opposed to an object, movable with respect to the optical member, and connected to the fluid recovery port. An immersion member is provided that includes an internal space into which the liquid from the fluid recovery port flows, and a buffer unit that is disposed in the internal space and reduces the momentum of the liquid that has flowed into the internal space from the fluid recovery port.

  According to the third aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the movable member having a fluid recovery port that can be opposed to an object, movable with respect to the optical member, and connected to the fluid recovery port. And an inner space into which liquid from the fluid recovery port flows, and an inner surface of the inner space immediately above the fluid recovery port is provided with an inclined liquid immersion member.

  According to the fourth aspect of the present invention, an object that is used in an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and is movable below the optical member. A liquid immersion member that forms a liquid immersion space on the movable member having a fluid recovery port that can be opposed to an object, movable with respect to the optical member, and connected to the fluid recovery port. An internal space into which liquid from the fluid recovery port flows, a wall member disposed in the internal space, having a lower surface and an upper surface, forming a lower space on the lower surface side, and forming an upper space on the upper surface side There is provided a liquid immersion member comprising a slit connecting the upper space and the lower space.

  According to a fifth aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the exposure apparatus including any one of the first to fourth liquid immersion members.

  According to the sixth aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the optical member having an exit surface from which the exposure light is emitted, and movable below the optical member. A liquid immersion space can be formed on the object, and is disposed at least part of the periphery of the optical path of the exposure light, and has a fluid recovery port that can be opposed to the object, and a movable member movable with respect to the optical member An exposure apparatus is provided that includes a gas-liquid separation device that separates a liquid and a gas recovered from a fluid recovery port.

  According to a seventh aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the fifth or sixth aspect and developing the exposed substrate. .

  According to an eighth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and having a fluid recovery port that can be opposed to the substrate. A substrate movable under the optical member using a liquid immersion member comprising a movable member movable with respect to the optical member, and a gas-liquid separation device that separates the liquid and gas recovered from the fluid recovery port Forming a liquid immersion space above, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and moving the movable member at least in part of the substrate exposure And an exposure method is provided.

  According to a ninth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an exit surface of an optical member and the substrate, and having a fluid recovery port capable of facing the substrate. A movable member that is movable with respect to the optical member, and an internal space that is formed in the movable member so as to be connected to the fluid recovery port, and is disposed in the internal space from the fluid recovery port. Forming a liquid immersion space on a substrate movable below the optical member using a liquid immersion member including a buffer portion that reduces a momentum of the liquid flowing into the space; and a liquid in the liquid immersion space There is provided an exposure method including exposing a substrate with exposure light emitted from an exit surface via a movable member and moving a movable member in at least part of the exposure of the substrate.

  According to a tenth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a liquid between an emission surface of the optical member and the substrate, and having a fluid recovery port capable of facing the substrate. A movable member movable with respect to the optical member, and an internal space formed in the movable member so as to be connected to the fluid recovery port and into which liquid from the fluid recovery port flows, and an internal space immediately above the fluid recovery port The inner surface of the liquid crystal is formed on the substrate movable under the optical member by using an inclined liquid immersion member, and is ejected from the ejection surface through the liquid in the liquid immersion space. There is provided an exposure method including exposing a substrate with exposure light, and moving a movable member in at least a part of exposure of the substrate.

  According to an eleventh aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate, and having a fluid recovery port capable of facing the substrate. A movable member that is movable with respect to the optical member, and is formed in the movable member so as to be connected to the fluid recovery port. And using a liquid immersion member comprising a wall member in which a lower space is formed on the lower surface side and an upper space is formed on the upper surface side, and a slit connecting the upper space and the lower space. At least part of the exposure of the substrate, forming a liquid immersion space on the movable substrate, exposing the substrate with exposure light emitted from the exit surface via the liquid in the immersion space, and Moving the movable member. An exposure method is provided.

  According to a twelfth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to any one of the eighth to eleventh aspects; and developing the exposed substrate. Is provided.

  According to a thirteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A liquid immersion member having a fluid recovery port that can be opposed to a substrate and having a movable member movable with respect to an optical member, and a gas-liquid separation device that separates liquid and gas recovered from the fluid recovery port is used. Forming a liquid immersion space on the substrate movable under the optical member, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and A program is provided that performs moving the movable member in at least part of the exposure.

  According to a fourteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A movable member movable with respect to the optical member, a movable member that is connected to the fluid collecting port, and an internal space into which liquid from the fluid collecting port flows; A liquid immersion space on a substrate movable under the optical member by using an immersion member that is disposed in the internal space and includes a buffer portion that reduces a momentum of the liquid flowing into the internal space from the fluid recovery port. Forming the substrate, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and moving the movable member in at least part of the exposure of the substrate. A program is provided.

  According to a fifteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A movable member movable with respect to the optical member, a movable member that is connected to the fluid collecting port, and an internal space into which liquid from the fluid collecting port flows; An inner surface of the internal space directly above the fluid recovery port is formed with a liquid immersion space on a substrate movable below the optical member by using an inclined liquid immersion member; There is provided a program for executing exposure of a substrate with exposure light emitted from an emission surface via a liquid in a space and moving a movable member in at least a part of exposure of the substrate.

  According to a sixteenth aspect of the present invention, there is provided a program for causing a computer to execute control of an immersion exposure apparatus that exposes a substrate with exposure light via a liquid between an emission surface of an optical member and the substrate. A movable member movable with respect to the optical member, a movable member that is connected to the fluid collecting port, and an internal space into which liquid from the fluid collecting port flows; A wall member disposed in the internal space, having a lower surface and an upper surface, a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side; and a slit connecting the upper space and the lower space. Using a liquid immersion member, a liquid immersion space is formed on a substrate movable below the optical member, and the substrate is exposed with exposure light emitted from the exit surface through the liquid in the liquid immersion space. And at least part of the exposure of the substrate Program for executing a method comprising moving is provided a.

  According to the seventeenth aspect of the present invention, there is provided a computer-readable recording medium recording the program according to any one of the thirteenth to sixteenth aspects.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 1st Embodiment. FIG. 3 is a side sectional view showing a part of the liquid immersion member according to the first embodiment. FIG. 6 is a diagram illustrating an example of the operation of the liquid immersion member according to the first embodiment. It is the figure which looked at the liquid immersion member concerning a 1st embodiment from the lower part. FIG. 3 is an exploded perspective view illustrating an example of a liquid immersion member according to the first embodiment. FIG. 3 is an exploded perspective view illustrating an example of a liquid immersion member according to the first embodiment. It is a figure which shows an example of the support apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the support apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the support apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the support apparatus which concerns on 1st Embodiment. It is a figure which shows an example of the gas-liquid separator which concerns on 1st Embodiment. It is a figure which shows an example of the gas-liquid separator which concerns on 1st Embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. FIG. 6 is a side sectional view showing a part of a liquid immersion member according to a second embodiment. It is a figure which shows a part of liquid immersion member which concerns on 2nd Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 2nd Embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a third embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a fourth embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a fifth embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a sixth embodiment. It is a sectional side view which shows a part of liquid immersion member concerning 7th Embodiment. It is a sectional side view which shows a part of liquid immersion member which concerns on 8th Embodiment. It is a sectional side view which shows a part of liquid immersion member which concerns on 8th Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 9th Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 9th Embodiment. FIG. 10 is a side sectional view showing a part of a liquid immersion member according to a ninth embodiment. It is the figure which looked at the liquid immersion member which concerns on 9th Embodiment from the downward direction. It is a perspective view which shows an example of the liquid immersion member which concerns on 9th Embodiment. It is a perspective view which shows an example of the support apparatus which concerns on 9th Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 10th Embodiment. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

 Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

   The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

   In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL The projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, the liquid immersion member 5 that forms the liquid immersion space LS of the liquid LQ, and the overall operation of the exposure apparatus EX are controlled. And a storage device 7 that is connected to the control device 6 and stores various types of information related to exposure.

   The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). One or both of a detection system that detects the alignment mark of the substrate P and a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

 In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

   The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

   The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

   The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. The drive system 11 may include a linear motor.

   The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

   The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis.

 With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

   The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

  The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal.

 Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

 The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the liquid immersion member 5 according to this embodiment will be described. The liquid immersion member may be referred to as a nozzle member. FIG. 2 is a cross-sectional view of the liquid immersion member 5 parallel to the XZ plane. FIG. 3 is an enlarged view of a part of FIG. FIG. 4 is a diagram illustrating an example of the operation of the liquid immersion member 5. FIG. 5 is a view of the liquid immersion member 5 as viewed from below (−Z side). 6 and 7 are exploded perspective views of the liquid immersion member 5.

  The immersion member 5 forms an immersion space LS for the liquid LQ on an object that can move below the last optical element 13.

 An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the liquid immersion member 5 and can be opposed to the liquid immersion member 5.

 In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one.

 In the exposure of the substrate P, the immersion space LS is formed so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

   In the following description, it is assumed that the object is the substrate P. As described above, the object may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3.

 The immersion space LS may be formed so as to straddle two objects. For example, the immersion space LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2. The immersion space LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The immersion space LS is formed so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. At least a part of the immersion space LS is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the immersion space LS is formed in a space between the immersion member 5 and the substrate P (object).

  The liquid immersion member 5 includes a first member 21 disposed on at least a part of the periphery of the terminal optical element 13, and a second member 22 disposed on at least a part of the periphery of the optical path K below the first member 21. It has. The second member 22 is movable with respect to the first member 21.

 The first member 21 is disposed at a position farther from the substrate P (object) than the second member 22. At least a part of the second member 22 is disposed between the first member 21 and the substrate P (object). At least a part of the second member 22 is disposed between the terminal optical element 13 and the substrate P (object).

  The first member 21 includes a lower surface 23 facing the −Z direction, and a fluid recovery unit 24 disposed at least at a part of the periphery of the lower surface 23. The second member 22 includes an upper surface 25 that faces the + Z direction, a lower surface 26 that faces the −Z direction, and a fluid recovery portion 27 that is disposed on at least a part of the periphery of the lower surface 26. The fluid recovery unit 24 recovers at least a part of the liquid LQ in the immersion space LS. The fluid recovery unit 27 recovers at least a part of the liquid LQ in the immersion space LS.

  The first member 21 has an inner side surface 28 that faces the side surface 13F of the terminal optical element 13, and an outer surface 29 that faces the optical path K (the optical axis of the terminal optical element 13). The second member 22 has an inner surface 30 that faces the outer surface 29 with a gap.

 The inner side surface 28 of the first member 21 faces the side surface 13F of the last optical element 13 with a gap therebetween.

 The second member 22 can face the lower surface 23. The second member 22 can face the fluid recovery unit 24. At least a part of the upper surface 25 of the second member 22 faces the lower surface 23 with a gap. At least a part of the upper surface 25 faces the emission surface 12 with a gap.

 The substrate P (object) can face the lower surface 26. The substrate P (object) can face at least a part of the fluid recovery unit 27. At least a part of the upper surface of the substrate P faces the lower surface 26 with a gap. At least a part of the upper surface of the substrate P faces the emission surface 12 with a gap.

  A first space SP <b> 1 is formed between the lower surface 23 and the lower surface of the fluid recovery unit 24 and the upper surface 25. A second space SP2 is formed between the lower surface 26 and the lower surface of the fluid recovery unit 27 and the upper surface of the substrate P (object). A third space SP3 is formed between the side surface 13F and the inner side surface 28.

 A side surface 13F of the last optical element 13 is disposed around the exit surface 12. The side surface 13F is a non-emission surface that does not emit the exposure light EL. The exposure light EL passes through the emission surface 12 and does not pass through the side surface 13F.

  The lower surface 23 of the first member 21 does not collect the liquid LQ. The lower surface 23 is a non-recovery part and cannot recover the liquid LQ. The lower surface 23 of the first member 21 can hold the liquid LQ with the second member 22.

  The upper surface 25 of the second member 22 does not collect the liquid LQ. The upper surface 25 is a non-recovery part and cannot recover the liquid LQ. The upper surface 25 of the second member 22 can hold the liquid LQ with the first member 21.

  The lower surface 26 of the second member 22 does not collect the liquid LQ. The lower surface 26 is a non-recovery part and cannot recover the liquid LQ. The lower surface 26 of the second member 22 can hold the liquid LQ with the substrate P (object).

  The inner side surface 28, the outer side surface 29, and the inner side surface 30 do not collect the liquid LQ. The inner side surface 28, the outer side surface 29, and the inner side surface 30 are non-recovery parts and cannot recover the liquid LQ.

  In the present embodiment, the lower surface 23 is substantially parallel to the XY plane. The upper surface 25 is also substantially parallel to the XY plane. The lower surface 26 is also substantially parallel to the XY plane. That is, the lower surface 23 and the upper surface 25 are substantially parallel. The upper surface 25 and the lower surface 26 are substantially parallel.

  Note that the lower surface 23 may be non-parallel to the XY plane. The lower surface 23 may be inclined with respect to the XY plane, or may include a curved surface.

 Note that the upper surface 25 may be non-parallel to the XY plane. The upper surface 25 may be inclined with respect to the XY plane or may include a curved surface.

 Note that the lower surface 26 may be non-parallel to the XY plane. The lower surface 26 may be inclined with respect to the XY plane and may include a curved surface.

  The lower surface 23 and the upper surface 25 may be parallel or non-parallel. The upper surface 25 and the lower surface 26 may be parallel or non-parallel. The lower surface 23 and the lower surface 26 may be parallel or non-parallel.

  The first member 21 has an opening 34 through which the exposure light EL emitted from the emission surface 12 can pass. The second member 22 has an opening 35 through which the exposure light EL emitted from the emission surface 12 can pass. The dimension of the opening 34 in the XY plane is larger than the dimension of the opening 35. In the present embodiment, the shape of the opening 35 in the XY plane is a rectangular shape. The opening 35 is long in the X-axis direction. The shape of the opening 35 may be an ellipse that is long in the X-axis direction or a polygon that is long in the X-axis direction.

 At least a part of the last optical element 13 is disposed inside the opening 34. A lower surface 23 is disposed around the lower end of the opening 34. An upper surface 25 is disposed around the upper end of the opening 35. A lower surface 26 is disposed around the lower end of the opening 35.

 In the present embodiment, at least a part of the inner surface 35U of the second member 22 that defines the opening 35 facing the optical path K is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K. Thereby, the 2nd member 22 can move smoothly in the state where 35U of inner surfaces of the 2nd member 22 are arranged in immersion space LS. Further, even when the second member 22 moves in a state where the inner surface 35U of the second member 22 is disposed in the immersion space LS, the pressure of the liquid LQ in the immersion space LS is suppressed from fluctuating.

  The first member 21 is disposed around the last optical element 13. The first member 21 is an annular member. The first member 21 is disposed so as not to contact the terminal optical element 13. A gap is formed between the first member 21 and the last optical element 13. The first member 21 does not face the emission surface 12.

  The second member 22 is disposed around the optical path K of the exposure light EL emitted from the emission surface 12. The second member 22 is an annular member. The second member 22 is disposed so as not to contact the first member 21. A gap is formed between the second member 22 and the first member 21.

 The second member 22 is movable with respect to the first member 21. The second member 22 is movable with respect to the last optical element 13. The relative position between the second member 22 and the first member 21 changes. The relative position between the second member 22 and the last optical element 13 changes.

  The second member 22 is movable in the XY plane perpendicular to the optical axis of the last optical element 13. The second member 22 is movable substantially parallel to the XY plane. As shown in FIG. 4, in the present embodiment, the second member 22 is movable at least in the X-axis direction. Note that the second member 22 may be movable in at least one direction of the Y axis, the Z axis, θX, θY, and θZ in addition to the X axis direction.

  In the present embodiment, the terminal optical element 13 does not move substantially. The first member 21 also does not move substantially. The first member 21 does not substantially move with respect to the last optical element 13.

 The second member 22 is movable below at least a part of the first member 21. The second member 22 is movable between the first member 21 and the substrate P (object).

 As the second member 22 moves in the XY plane, the dimension of the gap between the outer surface 29 of the first member 21 and the inner surface 30 of the second member 22 changes. In other words, the size of the space between the outer surface 29 and the inner surface 30 changes as the second member 22 moves in the XY plane. For example, in the example shown in FIG. 4, the second member 22 moves in the −X direction, whereby the dimension of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 becomes smaller (outer side). The space between the side surface 29 and the inner side surface 30 is reduced). The movement of the second member 22 in the + X direction increases the size of the gap between the outer surface 29 and the inner surface 30 on the + X side with respect to the last optical element 13 (between the outer surface 29 and the inner surface 30). Space becomes larger). In the present embodiment, the movable range (movable range) of the second member 22 is determined so that the first member 21 (outer surface 29) and the second member 22 (inner surface 30) do not contact each other.

  The liquid immersion member 5 includes a liquid supply unit 31 that supplies the liquid LQ for forming the liquid immersion space LS. The liquid supply unit 31 is disposed on the first member 21.

 The liquid supply unit 31 may be disposed on both the first member 21 and the second member 22. The liquid supply unit 31 is disposed on the first member 21 and may not be disposed on the second member 22. The liquid supply unit 31 is disposed on the second member 22 and may not be disposed on the first member 21. The liquid supply unit 31 may be arranged on a member different from the first member 21 and the second member 22.

 The fluid recovery unit 24 and the fluid recovery unit 27 are disposed outside the liquid supply unit 31 in the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). In the present embodiment, the liquid supply unit 31 includes an opening (liquid supply port) disposed on the inner surface 28 of the first member 21. The liquid supply unit 31 is disposed so as to face the side surface 13F. The liquid supply unit 31 supplies the liquid LQ to the third space SP3 between the side surface 13F and the inner side surface 28. In the present embodiment, the liquid supply unit 31 is disposed on each of the + X side and the −X side with respect to the optical path K (terminal optical element 13).

 The liquid supply unit 31 may be disposed in the Y axis direction with respect to the optical path K (terminal optical element 13), or around the optical path K (terminal optical element 13) including the X axis direction and the Y axis direction. A plurality of them may be arranged. There may be one liquid supply unit 31. Instead of the liquid supply unit 31 or in addition to the liquid supply unit 31, a liquid supply unit that can supply the liquid LQ may be provided on the lower surface 23.

  In the present embodiment, the liquid supply part (liquid supply port) 31 is connected to the liquid supply device 31 </ b> S via a supply flow path 31 </ b> R formed inside the first member 21. The liquid supply device 31S can supply the liquid supply unit 31 with the clean and temperature-adjusted liquid LQ. The liquid supply unit 31 supplies the liquid LQ from the liquid supply device 31S in order to form the immersion space LS.

  An opening 40 is formed between the inner edge of the lower surface 23 and the upper surface 25. The optical path space SPK including the optical path K between the emission surface 12 and the substrate P (object) and the first space SP1 between the lower surface 23 and the upper surface 25 are connected via the opening 40. The optical path space SPK includes a space between the exit surface 12 and the substrate P (object) and a space between the exit surface 12 and the upper surface 25. The opening 40 is disposed so as to face the optical path K. The third space SP3 between the side surface 13F and the inner side surface 28 and the first space SP1 are connected via the opening 40.

  At least a part of the liquid LQ from the liquid supply unit 31 is supplied to the first space SP <b> 1 between the lower surface 23 and the upper surface 25 through the opening 40. At least a part of the liquid LQ supplied from the liquid supply unit 31 to form the immersion space LS is supplied onto the substrate P (object) facing the emission surface 12 through the opening 34 and the opening 35. . Thereby, the optical path K is filled with the liquid LQ. At least a part of the liquid LQ from the liquid supply unit 31 is supplied to the second space SP2 between the lower surface 26 and the upper surface of the substrate P (object).

  Regarding the Z-axis direction, the dimension of the first space SP1 is smaller than the dimension of the second space SP2. In addition, regarding the Z-axis direction, the dimension of the first space SP1 may be substantially equal to the dimension of the second space SP2, or may be larger than the dimension of the second space SP2.

  The fluid recovery unit 24 is disposed outside the lower surface 23 with respect to the optical path K (the optical axis of the terminal optical element 13). The fluid recovery unit 24 is disposed around the lower surface 23. The fluid recovery unit 24 is disposed around the optical path K of the exposure light EL. Note that the fluid recovery unit 24 may be disposed in a part of the periphery of the lower surface 23. For example, a plurality of fluid recovery units 24 may be arranged around the lower surface 23. The fluid recovery unit 24 is disposed so as to face the first space SP1. The fluid recovery unit 24 recovers at least a part of the liquid LQ in the first space SP1.

  The fluid recovery unit 27 is disposed outside the lower surface 26 with respect to the optical path K (the optical axis of the terminal optical element 13). The fluid recovery unit 27 is disposed outside the lower surface 26 with respect to the center of the opening 35. The fluid recovery unit 27 is disposed around the lower surface 26. The fluid recovery unit 27 is disposed around the optical path K of the exposure light EL. Note that the fluid recovery unit 27 may be disposed at a part of the periphery of the lower surface 26. For example, a plurality of fluid recovery units 27 may be arranged around the lower surface 26. The fluid recovery unit 27 is disposed so as to face the second space SP2. The fluid recovery unit 27 recovers at least a part of the liquid LQ in the second space SP2.

  The fluid recovery unit 27 is disposed outside the first member 21 with respect to the optical path K (the optical axis of the terminal optical element 13). The fluid recovery unit 27 is disposed outside the first space SP1 with respect to the optical path K (the optical axis of the terminal optical element 13).

  In the present embodiment, the movement of the liquid LQ from one of the first space SP1 on the upper surface 25 side and the second space SP2 on the lower surface 26 side is suppressed. The first space SP <b> 1 and the second space SP <b> 2 are partitioned by the second member 22. The liquid LQ in the first space SP1 can move to the second space SP2 through the opening 35. The liquid LQ in the first space SP1 cannot move to the second space SP2 without passing through the opening 35. The liquid LQ existing in the first space SP1 outside the opening 35 with respect to the optical path K cannot move to the second space SP2. The liquid LQ in the second space SP2 can move to the first space SP1 through the opening 35. The liquid LQ in the second space SP2 cannot move to the first space SP1 without passing through the opening 35. The liquid LQ present in the second space SP2 outside the opening 35 with respect to the optical path K cannot move to the first space SP1. That is, in this embodiment, the liquid immersion member 5 does not have a flow path that fluidly connects the first space SP1 and the second space SP2 other than the opening 35.

  In the present embodiment, the fluid recovery unit 27 recovers at least a part of the liquid LQ in the second space SP2, and does not recover the liquid LQ in the first space SP1. The fluid recovery unit 24 recovers at least a part of the liquid LQ in the first space SP1, and does not recover the liquid LQ in the second space SP2.

 Further, the liquid LQ that has moved to the outside of the first space SP1 (outside of the outer surface 29) with respect to the optical path K is suppressed by the inner surface 30 from moving onto the substrate P (second space SP2).

 The fluid recovery unit 24 includes an opening (fluid recovery port) disposed at least at a part of the periphery of the lower surface 23 of the first member 21. The fluid recovery unit 24 is disposed so as to face the upper surface 25. The fluid recovery unit 24 is connected to the fluid recovery device 24C via a recovery channel (space) 24R formed inside the first member 21. The fluid recovery device 24C can connect the fluid recovery unit 24 and the vacuum system. The fluid recovery unit 24 can recover at least a part of the liquid LQ in the first space SP1. At least a part of the liquid LQ in the first space SP1 can flow into the recovery channel 24R via the fluid recovery unit 24.

 In the present embodiment, the fluid recovery unit 24 includes a porous member 36, and the fluid recovery port includes a hole of the porous member 36. In the present embodiment, the porous member 36 includes a mesh plate. The porous member 36 has a lower surface that can be opposed to the upper surface 25, an upper surface that faces the recovery flow path 24R, and a plurality of holes that connect the lower surface and the upper surface. The fluid recovery unit 24 recovers the liquid LQ through the hole of the porous member 36. The liquid LQ in the first space SP1 recovered from the fluid recovery unit 24 (hole of the porous member 36) flows into the recovery channel 24R, flows through the recovery channel 24R, and is recovered by the fluid recovery device 24C.

  In the present embodiment, substantially only the liquid LQ is recovered via the fluid recovery unit 24, and recovery of the gas GS is limited. The control device 6 controls the pressure (first space) on the lower surface side of the porous member 36 so that the liquid LQ in the first space SP1 passes through the hole of the porous member 36 and flows into the recovery flow path 24R and does not pass the gas GS. The difference between the pressure of SP1) and the pressure on the upper surface side (pressure of the recovery flow path 24R) is adjusted. An example of a technique for recovering only the liquid through the porous member is disclosed in, for example, US Pat. No. 7,292,313.

  Note that both the liquid LQ and the gas GS may be collected (sucked) through the porous member 36. The porous member 36 may not be provided on the first member 21. That is, the fluid (one or both of the liquid LQ and the gas GS) in the first space SP1 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the fluid recovery unit 24 includes the lower surface of the porous member 36. The lower surface of the fluid recovery unit 24 is disposed around the lower surface 23. In the present embodiment, the lower surface of the fluid recovery unit 24 is substantially parallel to the XY plane. In the present embodiment, the lower surface and the lower surface 23 of the fluid recovery unit 24 are disposed in the same plane (they are flush).

  The lower surface of the fluid recovery unit 24 may be disposed on the + Z side with respect to the lower surface 23, or may be disposed on the −Z side. Note that the lower surface of the fluid recovery unit 24 may be inclined with respect to the lower surface 23 or may include a curved surface.

  In addition, the fluid recovery unit 24 for recovering the fluid (one or both of the liquid LQ and the gas GS) in the first space SP1 may be disposed on the second member 22 so as to face the first space SP1. The fluid recovery unit 24 may be disposed on both the first member 21 and the second member 22. The fluid recovery unit 24 is disposed on the first member 21 and may not be disposed on the second member 22. The fluid recovery unit 24 is disposed on the second member 22 and may not be disposed on the first member 21.

 The fluid recovery part 27 includes an opening (fluid recovery port) disposed at least at a part of the periphery of the lower surface 26 of the second member 22. The fluid recovery unit 27 is disposed so as to face the upper surface of the substrate P (object). The fluid recovery unit 27 is connected to the fluid recovery device 27C via a recovery flow path (space) 27R formed inside the second member 22. The fluid recovery device 27C can connect the fluid recovery unit 27 and the vacuum system. The fluid recovery part 27 can recover at least a part of the liquid LQ in the second space SP2. At least a part of the liquid LQ in the second space SP2 can flow into the recovery channel 27R via the fluid recovery unit 27.

 In the present embodiment, the fluid recovery unit 27 includes a porous member 37, and the fluid recovery port includes a hole of the porous member 37. In the present embodiment, the porous member 37 includes a mesh plate. The porous member 37 has a lower surface on which the upper surface of the substrate P (object) can be opposed, an upper surface facing the recovery flow path 27R, and a plurality of holes connecting the lower surface and the upper surface. The fluid recovery unit 27 recovers the fluid (one or both of the liquid LQ and the gas GS) through the hole of the porous member 37. The liquid LQ in the second space SP2 recovered from the fluid recovery part 27 (the hole of the porous member 37) flows into the recovery channel 27R, flows through the recovery channel 27R, and is recovered by the fluid recovery device 27C.

  The recovery flow path 27R is disposed outside the inner side surface 30 with respect to the optical path K (the optical axis of the terminal optical element 13). The recovery flow path 27R is disposed above the fluid recovery unit 27. By moving the second member 22, the fluid recovery portion 27 and the recovery flow path 27 </ b> R of the second member 22 move outside the outer surface 29 of the first member 21.

  The gas GS is recovered together with the liquid LQ via the fluid recovery unit 27. Note that only the liquid LQ may be recovered through the porous member 37, and the recovery of the gas GS may be limited. The porous member 37 may not be provided on the second member 22. That is, the fluid (one or both of the liquid LQ and the gas GS) in the second space SP2 may be recovered without passing through the porous member.

 In the present embodiment, the lower surface of the fluid recovery unit 27 includes the lower surface of the porous member 37. The lower surface of the fluid recovery unit 27 is disposed around the lower surface 26. In the present embodiment, the lower surface of the fluid recovery unit 27 is substantially parallel to the XY plane. In the present embodiment, the lower surface of the fluid recovery unit 27 is disposed on the + Z side with respect to the lower surface 26.

 In the present embodiment, the second member 22 has a lower surface 26 </ b> U that is disposed outside the fluid recovery unit 27 with respect to the center of the opening 35 and is disposed above (+ Z side) the fluid recovery unit 27. The lower surface 26U is a non-recovery part that cannot recover the liquid LQ in the immersion space LS. The lower surface 26U may be liquid repellent with respect to the liquid LQ. The contact angle of the lower surface 26U with respect to the liquid LQ may be 90 degrees or more, 100 degrees or more, 110 degrees or more, or 120 degrees or more. The lower surface 26U may include the surface (lower surface) of a film that is liquid repellent with respect to the liquid LQ. The liquid repellent film may be formed of a resin containing fluorine. The liquid repellent film may include, for example, PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer) or PTFE (Polytetrafluoroethylene).

  The distance between the lower surface 26U and the substrate P (object) is larger than the distance between the lower surface of the fluid recovery unit 27 and the substrate P (object). Thereby, even if the liquid LQ in the immersion space LS contacts the lower surface 26U, a phenomenon that a part of the liquid LQ is separated from the immersion space LS, and the separated liquid LQ is separated from the lower surface 26U and the substrate P (object ) Is suppressed from occurring (bridge phenomenon).

  Note that the lower surface and the lower surface 26 of the fluid recovery unit 27 may be disposed in the same plane (may be flush with each other). The lower surface of the fluid recovery unit 27 may be arranged on the −Z side with respect to the lower surface 26. The lower surface of the fluid recovery unit 27 may be inclined with respect to the lower surface 26 or may include a curved surface.

 In the present embodiment, the lower surface and the lower surface 26 of the fluid recovery unit 27 may be disposed at substantially the same position (height) in the Z-axis direction. The lower surface and the lower surface 26 of the fluid recovery unit 27 may be disposed in substantially the same plane (may be flush with each other). That is, in this embodiment, the lower surface 26 and the lower surface of the porous member 37 may be disposed at substantially the same height, or may be disposed in the same plane. The lower surface of the fluid recovery unit 27 may be disposed below the lower surface 26 (−Z side). The lower surface of the fluid recovery unit 27 may be inclined with respect to the lower surface 26 or may include a curved surface.

  In the present embodiment, the recovery operation of the liquid LQ from the fluid recovery unit 27 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 31, whereby the one-side terminal optical element 13 and the liquid immersion unit are immersed. An immersion space LS is formed with the liquid LQ between the member 5 and the substrate P (object) on the other side.

  In the present embodiment, the recovery operation of the fluid from the fluid recovery unit 24 is executed in parallel with the supply operation of the liquid LQ from the liquid supply unit 31 and the recovery operation of the fluid from the fluid recovery unit 27. .

  In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS is formed between the second member 22 and the substrate P (object). A part of the interface LG of the liquid LQ in the immersion space LS is formed between the first member 21 and the second member 22. A part of the interface LG of the liquid LQ in the immersion space LS is formed between the terminal optical element 13 and the first member 21.

  In the following description, the interface LG of the liquid LQ formed between the first member 21 and the second member 22 is appropriately referred to as a first interface LG1. The interface LG formed between the second member 22 and the substrate P (object) is appropriately referred to as a second interface LG2. The interface LG formed between the last optical element 13 and the first member 21 is appropriately referred to as a third interface LG3.

  In the present embodiment, the first interface LG <b> 1 is formed between the lower surface and the upper surface 25 of the fluid recovery unit 24. The second interface LG2 is formed between the lower surface of the fluid recovery unit 27 and the upper surface of the substrate P (object).

  In the present embodiment, the first interface LG1 is formed between the lower surface and the upper surface 25 of the fluid recovery unit 24, and the liquid LQ in the first space SP1 is outside the fluid recovery unit 24 (for example, the inner surface 29 and the inner surface 29). The movement to the space between the side surfaces 30 is suppressed. There is no liquid LQ in the space between the outer side surface 29 and the inner side surface 30. A space between the outer side surface 29 and the inner side surface 30 is a gas space.

 A space between the outer side surface 29 and the inner side surface 30 is connected to the space CS. In other words, the space between the outer surface 29 and the inner surface 30 is open to the atmosphere. When the pressure in the space CS is atmospheric pressure, the space between the outer surface 29 and the inner surface 30 is opened to the atmosphere. Therefore, the second member 22 can move smoothly. Note that the pressure in the space CS may be higher or lower than the atmospheric pressure.

  Next, an example of the operation of the second member 22 will be described. The second member 22 is movable in cooperation with the movement of the substrate P (object). The second member 22 is movable independently of the substrate P (object). The second member 22 is movable in parallel with at least part of the movement of the substrate P (object).

 The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves. The second member 22 may be moved in the moving direction of the substrate P (object). For example, the second member 22 may be moved in the moving direction of the substrate P in at least a part of the period in which the substrate P is moved. For example, when the substrate P is moved in one direction (for example, + X direction) in the XY plane, the second member 22 moves in one direction (+ X direction) in the XY plane in synchronization with the movement of the substrate P. May be.

 The second member 22 may be moved in a state where the immersion space LS is formed. The second member 22 may be moved in a state where the liquid LQ in the immersion space LS is in contact. The second member 22 may be moved in a state where the liquid LQ exists in the first space SP1 and the second space SP2. The second member 22 may be moved in parallel with the supply of the liquid LQ from the liquid supply unit 31. The second member 22 may be moved in parallel with the recovery of the liquid LQ from the fluid recovery unit 24. The second member 22 may be moved in parallel with the recovery of the liquid LQ from the fluid recovery unit 27. The second member 22 may be moved in parallel with the supply of the liquid LQ from the liquid supply unit 31 and the recovery of the liquid LQ from the fluid recovery unit 24 (fluid recovery unit 27).

 The second member 22 may be moved in at least a part of a period in which the exposure light EL is emitted from the emission surface 12.

 The second member 22 may be moved in parallel with at least a part of the period during which the substrate P (object) moves in the state where the immersion space LS is formed. The second member 22 may be moved in at least a part of a period in which the exposure light EL is emitted from the emission surface 12 in a state where the immersion space LS is formed.

 The second member 22 may move when the second member 22 and the substrate P (object) do not face each other. For example, the second member 22 may move when no object is present below the second member 22. The second member 22 may move when the liquid LQ is not present in the space between the second member 22 and the substrate P (object). For example, the second member 22 may move when the immersion space LS is not formed.

  In the present embodiment, the second member 22 moves based on, for example, the moving condition of the substrate P (object). The control device 6 moves the second member 22 in parallel with at least a part of the movement of the substrate P (object) based on, for example, the movement condition of the substrate P (object). The control device 6 performs the second member while supplying the liquid LQ from the liquid supply unit 31 and collecting the liquid LQ from the fluid recovery unit 27 and the fluid recovery unit 24 so that the immersion space LS is continuously formed. 22 is moved.

 In this embodiment, the 2nd member 22 is movable so that relative movement with respect to the board | substrate P (object) may become small. The second member 22 is movable so that the relative movement between the second member 22 and the substrate P (object) is smaller than the relative movement between the last optical element 13 and the substrate P (object). The second member 22 is movable so that the relative movement between the second member 22 and the substrate P (object) is smaller than the relative movement between the first member 21 and the substrate P (object). For example, the second member 22 may move in synchronization with the substrate P (object).

 The relative movement includes at least one of a relative speed and a relative acceleration. For example, the second member 22 has a lower relative velocity with respect to the substrate P (object) in a state where the immersion space LS is formed, that is, in a state where the liquid LQ exists in the second space SP2. You may move on.

 Further, the second member 22 is configured such that the relative acceleration with respect to the substrate P (object) becomes small in the state where the immersion space LS is formed, that is, in the state where the liquid LQ exists in the second space SP2. You may move on.

 Further, the second member 22 is in a state where the immersion space LS is formed, that is, in a state where the liquid LQ is present in the second space SP2, the relative speed with respect to the substrate P (object) is the first speed. You may move so that it may become smaller than the relative speed of the member 21 and the board | substrate P (object).

 Further, the second member 22 has a relative acceleration with respect to the substrate P (object) in a state where the immersion space LS is formed, that is, in a state where the liquid LQ is present in the second space SP2. You may move so that it may become smaller than the relative acceleration of the member 21 and the board | substrate P (object).

  The second member 22 is movable in the moving direction of the substrate P (object), for example. For example, when the substrate P (object) moves in the + X direction (or −X direction), the second member 22 can move in the + X direction (or −X direction). In addition, when the substrate P (object) moves in the + Y direction (or -Y direction) while moving in the + X direction, the second member 22 is movable in the + X direction. Further, when the substrate P (object) moves in the + Y direction (or −Y direction) while moving in the −X direction, the second member 22 is movable in the −X direction.

 That is, in the present embodiment, when the substrate P (object) moves in a certain direction including a component in the X-axis direction, the second member 22 moves in the X-axis direction. For example, the second member 22 may move in the X-axis direction in parallel with at least part of the movement of the substrate P (object) in a certain direction including the component in the X-axis direction.

 Note that the second member 22 may be movable in the Y-axis direction. When the substrate P (object) moves in a certain direction including a component in the Y-axis direction, the second member 22 may move in the Y-axis direction. For example, in parallel with at least a part of the movement of the substrate P (object) in a certain direction including the component in the Y-axis direction, the second member 22 is configured so that the relative speed difference with the substrate P (object) becomes small. You may move in the Y-axis direction.

  Next, an example of the support device 50 that supports the liquid immersion member 5 will be described. 8 and 9 are side views showing examples of the liquid immersion member 5 and the support device 50 according to the present embodiment. 10 and 11 are plan views illustrating examples of the liquid immersion member 5 and the support device 50 according to the present embodiment. 8 is a diagram viewed from the −Y side, and FIG. 9 is a diagram viewed from the + X side. 10 is a diagram viewed from the + Z side, and FIG. 11 is a diagram viewed from the −Z side.

  In the present embodiment, the support device 50 includes a first support member 51 that supports the first member 21, a second support member 52 that supports the second member 22, and a support frame 53 that supports the first support member 51. And a moving frame 54 that supports the second support member 52.

 The first support member 51 is connected to the first member 21. The first member 21 is fixed to the first support member 51. The first support member 51 is disposed so as to surround the first member 21.

  The support frame 53 is connected to the first support member 51. The first support member 51 is fixed to the support frame 53. The support frame 53 supports the first member 21 via the first support member 51.

 The second support member 52 is connected to the second member 22. The second member 22 is fixed to the second support member 52. In the present embodiment, the second support member 51 is connected to a part of the second member 22 on the + Y side with respect to the center of the opening 35. The second support member 52 is connected to the second member 22 outside the first member 21 with respect to the optical path K. The second support member 52 has an upper surface 52A facing the + Z direction and a lower surface 52B facing the −Z direction.

 The moving frame 54 is connected to the second support member 52. The second support member 52 is fixed to the moving frame 54. The moving frame 54 supports the second member 22 via the second support member 52.

  In the present embodiment, the first member 21 and the second member 22 do not contact each other. The first support member 51 and the second support member 52 do not contact each other. The lower surface 51B of the first support member 51 and the upper surface 52A of the second support member 52 oppose each other via a gap.

  The support device 50 includes a prevention device 55 that suppresses vibration of the first member 21. The vibration isolator 55 suppresses the vibration of the first member 21 accompanying the movement of the second member 22, for example. The vibration isolator 55 is controlled by the control device 6. At least a part of the vibration isolator 55 is disposed between the support frame 53 and the apparatus frame 8B.

  The support device 50 includes a drive device 56 that moves the second member 22. The second member 22 is moved by the driving device 56. The driving device 56 includes, for example, a motor, and can move the second member 22 using Lorentz force. The driving device 56 can move the second member 22 relative to the first member 21. The driving device 56 is controlled by the control device 6. At least a part of the driving device 56 is supported by the device frame 8B.

  The moving frame 54 supports the second member 22 via the second support member 52. In the present embodiment, the driving device 56 moves the moving frame 54. When the moving frame 54 is moved by the driving device 56, the second support member 52 is moved. When the second support member 52 is moved by the driving device 56, the second member 22 is moved.

 The support frame 53 is supported by the apparatus frame 8B. The support frame 53 is supported by the device frame 8B via the vibration isolator 55. The vibration isolator 55 supports the first member 21 via the support frame 53 and the first support member 51. The first member 21 is supported by the vibration isolator 55 via the first support member 51 and the support frame 53. The device frame 8 </ b> B supports the first member 21 via the vibration isolation device 55, the support frame 53, and the first support member 51.

  The moving frame 54 is supported by the apparatus frame 8B. The moving frame 54 is supported by the device frame 8B via the driving device 56. The drive device 56 supports the second member 22 via the moving frame 54 and the second support member 52. The second member 22 is supported by the driving device 56 via the second support member 52 and the moving frame 54. The device frame 8B supports the second member 22 via the drive device 56, the moving frame 54, and the second support member 52.

 In the present embodiment, the apparatus frame 8B includes a reference frame 8A that supports the projection optical system PL (terminal optical element 13), a support frame 53 (vibration isolation device 55) that supports the first member 21, and a second member 22. The moving frame 54 (drive device 56) to be supported is supported.

  In the present embodiment, the driving device 56 is disposed on the −X side with respect to the optical axis of the last optical element 13. In the present embodiment, the moving frame 54 is a rod member that is long in the X-axis direction. In the present embodiment, the driving device 56 is connected to the end portion on the −X side of the moving frame 54. The second support member 52 is connected to the + X side end of the moving frame 54.

 The support device 50 includes a guide device 57 that guides the second member 22. In the present embodiment, the guide device 57 guides the second member 22 in the X-axis direction. In the present embodiment, at least a part of the guide device 57 is disposed between the first support member 51 (first member 21) and the second support member 52 (second member 22).

  The second member 22 is guided in the X-axis direction by the guide device 57. In the present embodiment, the movement of the second member 22 in the Y axis, Z axis, θX, θY, and θZ directions is limited. The guide device 57 includes a gas bearing 57G between the lower surface 51B of the first support member 51 and the upper surface 52A of the second support member 52. The guide device 57 includes a so-called air guide mechanism. The second support member 22 (second member 22) is supported on the first support member 21 (first member 21) in a non-contact manner by the gas bearing 57G. By the gas bearing 57G, the second support member 22 (second member 22) is guided in the X-axis direction in a non-contact state with respect to the first support member 21 (first member 21).

  FIG. 12 is a cross-sectional view illustrating an example of the second support member 52. The second support member 52 supports the second member 22. The second support member 52 includes a gas-liquid separator 70 that separates the liquid LQ and the gas GS recovered from the fluid recovery part (fluid recovery port) 27 to which the substrate P (object) can face.

  The second support member 52 is connected to the fluid recovery part (fluid recovery port) 27 of the second member 22, and passes through the internal space 71 into which the fluid (one or both of the liquid LQ and the gas GS) from the fluid recovery part 27 flows. Have. The internal space 71 may be referred to as a flow path (recovery flow path) 71. The internal space 71 is connected to the recovery flow path 27R of the second member 22. The fluid (one or both of the liquid LQ and the gas GS) recovered from the fluid recovery unit 27 and flowing into the recovery flow path 27R flows into the internal space 71.

  In the present embodiment, at least a part of the gas-liquid separator 70 is disposed in the internal space 71. The gas-liquid separator 70 faces the internal space 71, the first discharge port 73 that can discharge the gas GS in the internal space 71, and the discharge of the gas GS is suppressed from the first discharge port 73, and the liquid LQ is discharged. A possible second outlet 74.

  The recovery flow path 27R (fluid recovery 27) and the fluid recovery device 27C are connected via an internal space 71. The fluid recovery device 27C is connected to the internal space 71. The fluid recovery device 27C includes a gas recovery device 271C that recovers the gas GS from the gas-liquid separation device 70 and a liquid recovery device 272C that recovers the liquid LQ from the gas-liquid separation device 70.

  The internal space 71 includes a first flow path 75 connected to the first discharge port 73 and a second flow path 76 connected to the second discharge port 74.

  The first flow path 75 has a first inner surface 75W. The first flow path 75 is defined by the first inner surface 75W. The second flow path 76 has a second inner surface 76W. The second flow path 76 is defined by the second inner surface 76W.

  The gas-liquid separator 70 has a porous member 72 disposed in the internal space 71. The porous member 72 defines at least a part of the first flow path 75. The porous member 72 defines at least a part of the second flow path 76.

 In the present embodiment, the porous member 72 may be porous, a plate in which a plurality of holes (through holes) are formed, a mesh, or a mesh plate. The porous member 72 may be a sintered member (for example, sintered metal) in which a plurality of pores are formed. The porous member 72 may be a foam member (for example, a foam metal).

  The porous member 72 has a space (internal space) 77 connected to the recovery flow path 27R. The space 77 is formed inside the porous member 72. The porous member 72 has an inner surface 72 </ b> A that faces the space 77. At least a part of the first inner surface 75W includes an inner surface 72W.

  A space 78 is formed between the outer surface 72B of the porous member 72 and the inner surface 52S of the second support member 52 (internal space 71). The outer surface 72 </ b> B of the porous member 72 faces the space 78. At least a part of the second inner surface 76W includes an outer surface 72B. At least a part of the second inner surface 76W includes an inner surface 52S.

  In the present embodiment, the first flow path 75 includes a space 77. The second flow path 76 includes a space 78. At least a part of the first inner surface 75 </ b> W of the first flow path 75 includes the inner surface 72 </ b> A of the porous member 72. At least a part of the second inner surface 76 </ b> W of the second flow path 76 includes the outer surface 72 </ b> B of the porous member 72.

 In the present embodiment, the first channel 75 is directly connected to the recovery channel 27R (fluid recovery unit 27). The second channel 76 is not directly connected to the recovery channel 27R. The second channel 76 is connected to the recovery channel 27R (fluid recovery unit 27) via the hole of the porous member 72 and the first channel 75.

  The gas recovery device 271 </ b> C is connected to the first discharge port 73. The first discharge port 73 faces the first flow path 75. The gas recovery device 271 </ b> C is connected to the first flow path 75 via the first discharge port 73.

  The liquid recovery device 272C is connected to the second discharge port 74. The second discharge port 74 faces the second flow path 76. The liquid recovery device 272C is connected to the second flow path 76 via the second discharge port 74.

 The gas recovery device 271C can connect the first flow path 75 and the vacuum system. The gas recovery device 271C may include a vacuum system. The gas recovery device 271C includes a pressure adjustment device, and can adjust the pressure of the first flow path 75.

  The liquid recovery apparatus 272C can connect the second flow path 76 and the vacuum system. The liquid recovery apparatus 272C may include a vacuum system. The liquid recovery device 272C includes a pressure adjustment device and can adjust the pressure of the second flow path 76.

  The gas recovery device 271C and the liquid recovery device 272C are controlled by the control device 6. The control device 6 can adjust one or both of the gas recovery device 271 </ b> C and the liquid recovery device 272 </ b> C to adjust the pressure difference between the first flow path 75 and the second flow path 76.

  In the present embodiment, only the liquid LQ of the liquid LQ and the gas GS in the first flow path 75 moves to the second flow path 76 via the porous member 72, and the second flow path 75 to the second flow path 76. The pressure difference between the first flow path 75 and the second flow path 76 is adjusted so that the movement of the gas GS to the flow path 76 is suppressed (restricted).

  FIG. 13 is a schematic diagram showing a gas-liquid separator 70 including a porous member 72. The control device 6 prevents the liquid LQ in the first flow path 75 from flowing into the second flow path 76 through the hole in the porous member 72 and prevents the gas GS in the first flow path 75 from passing through the hole in the porous member 72. Further, the difference between the pressure Pg on the inner surface 72A side of the porous member 72 (pressure of the first flow path 75) Pg and the pressure on the outer surface 72B side (pressure of the second flow path 76) Pw is adjusted. An example of a technique for allowing only the liquid LQ to pass through the holes of the porous member and not allowing the gas GS to pass through is disclosed in, for example, US Pat. No. 7,292,313.

  The liquid LQ that has flowed into the first flow path 75 from the fluid recovery section 27 via the recovery flow path 27R moves to the second flow path 76, so that the ratio of the gas GS in the first flow path 75 is the ratio of the liquid LQ to the liquid LQ. Higher than the share. That is, the ratio of the gas GS in the fluid existing in the first flow path 75 is higher than the ratio of the gas GS in the fluid existing in the second flow path 76. The ratio of the liquid LQ in the fluid existing in the second flow path 76 is higher than the ratio of the liquid LQ in the fluid existing in the first flow path 75. As described above, the liquid LQ and the gas GS are separated in the internal space 71.

  In the present embodiment, the liquid LQ substantially does not exist in the space around the first discharge port 73 in the first flow path 75. In the 1st discharge port 73, discharge | emission of the liquid LQ is suppressed rather than discharge | emission of gas GS. The gas GS in the first flow path 75 is discharged from the first discharge port 73. The gas GS discharged from the first discharge port 73 is recovered by the gas recovery device 271C.

  In the present embodiment, the second flow path 76 is filled with the liquid LQ. At the second discharge port 74, the discharge of the gas GS is suppressed more than the discharge of the liquid LQ. The liquid LQ in the second flow path 76 is discharged from the second discharge port 74. The liquid LQ discharged from the second discharge port 74 is recovered by the liquid recovery device 272C.

  That is, by the gas-liquid separation device 70, the fluid recovery device 27C can separate and recover the gas GS discharged from the first discharge port 73 and the liquid LQ discharged from the second discharge port 74.

  In the present embodiment, the first flow path 75 is bent. That is, the first flow path 75 has a bent portion. In other words, the first flow path 75 meanders. Thereby, in the 1st flow path 75, the contact area of 72 A of inner surfaces with respect to the fluid (The liquid LQ and the gas GS or both) which flowed in from the collection | recovery flow path 27R becomes large. Further, the first flow path 75 in which the fluid flows between one end of the first flow path 75 connected to the recovery flow path 27R and the other end of the first flow path 75 connected to the first discharge port 73. The distance becomes longer. Therefore, the gas-liquid separation process is sufficiently performed, and only the gas GS is substantially discharged from the first discharge port 73.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. The measurement stage 3 is disposed so as to face the terminal optical element 13 and the liquid immersion member 5 at least during a period in which the substrate stage 2 is separated from the liquid immersion member 5. The control device 6 supplies the liquid LQ from the liquid supply unit 31 and recovers the liquid LQ from the fluid recovery unit 27 to form the immersion space LS on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. With the last optical element 13 and the liquid immersion member 5 facing the substrate stage 2 (substrate P), the liquid LQ is recovered from the fluid recovery unit 27 in parallel with the supply of the liquid LQ from the liquid supply unit 31. As a result, an immersion space LS is formed between the last optical element 13 and the immersion member 5 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ.

  In the present embodiment, the recovery of the liquid LQ from the fluid recovery unit 24 is performed in parallel with the supply of the liquid LQ from the liquid supply unit 31 and the recovery of the liquid LQ from the fluid recovery unit 27.

 The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS between the emission surface 12 and the substrate P. Accordingly, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the emission surface 12 of the last optical element 13 and the substrate P, and the pattern of the mask M Are projected onto the substrate P.

   The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 14 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S that are exposure target areas are arranged in a matrix on the substrate P. The control device 6 moves the substrate P held by the first holding unit in the Y-axis direction (scanning direction) with respect to the exposure light EL emitted from the exit surface 12 of the last optical element 13, and then exits the exit surface. Each of the plurality of shot regions S of the substrate P is sequentially exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS between the substrate 12 and the substrate P.

 For example, in order to expose one shot region S of the substrate P, the control device 6 performs exposure light EL (projection region of the projection optical system PL) emitted from the emission surface 12 in a state where the immersion space LS is formed. (PR), the substrate P is moved in the Y-axis direction, and the mask M is moved in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. Meanwhile, the exposure light EL is irradiated onto the shot region S via the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P. Thereby, an image of the pattern of the mask M is projected onto the shot area S, and the shot area S is exposed with the exposure light EL emitted from the emission surface 12.

 After the exposure of the shot area S is completed, the control device 6 moves the substrate P to the Y axis in the XY plane in the state where the immersion space LS is formed in order to start the exposure of the next shot area S. In a direction intersecting with (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) and the next shot area S is moved to the exposure start position. Thereafter, the control device 6 starts exposure of the shot area S.

   In the state where the immersion space LS is formed on the substrate P (substrate stage 2), the control device 6 sets the shot region with respect to the position (projection region PR) irradiated with the exposure light EL from the emission surface 12. An operation of exposing the shot area while moving in the Y-axis direction, and after the exposure of the shot area, the next shot area is exposed in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The substrate P is moved in a direction intersecting the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so as to be arranged at the start position. Each of the plurality of shot areas of the substrate P is sequentially exposed while repeating the operation.

   In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. In addition, after the exposure of a certain shot area, in the state where the immersion space LS is formed on the substrate P (substrate stage 2) and before the exposure of the next shot area is started, in the XY plane The operation of moving the substrate P is appropriately referred to as a step movement operation.

  In the present embodiment, the scan movement operation includes an operation in which the substrate P moves in the Y-axis direction from a state in which a certain shot region S is arranged at the exposure start position to a state in which the shot area S is arranged at the exposure end position. In the step movement operation, the substrate P intersects with the Y-axis direction in the XY plane from a state where a certain shot area S is arranged at the exposure end position to a state where the next shot area S is arranged at the exposure start position. Includes movement in the direction.

  The exposure start position includes the position of the substrate P when one end of the shot area S in the Y-axis direction passes through the projection area PR for exposure of the shot area S. The exposure end position includes the position of the substrate P when the other end portion in the Y-axis direction of the shot area S irradiated with the exposure light EL passes through the projection area PR.

 The exposure start position of the shot area S includes a scan movement operation start position for exposing the shot area S. The exposure start position of the shot area S includes a step movement operation end position for arranging the shot area S at the exposure start position.

 The exposure end position of the shot area S includes a scan movement operation end position for exposing the shot area S. The exposure end position of the shot area S includes a step movement operation start position for placing the next shot area S at the exposure start position after the exposure of the shot area S is completed.

  In the following description, a period during which the scan movement operation is performed for exposure of a certain shot area S is appropriately referred to as a scan movement period. In the following description, a period during which the step movement operation is performed for the start of exposure of the next shot area S from the end of exposure of a certain shot area S is appropriately referred to as a step movement period.

  The scan movement period includes an exposure period from the start of exposure of a certain shot area S to the end of exposure. The step movement period includes a movement period of the substrate P from the end of exposure of a certain shot area S to the start of exposure of the next shot area S.

  In the scan movement operation, the exposure light EL is emitted from the emission surface 12. In the scan movement operation, the exposure light EL is irradiated to the substrate P (object). In the step movement operation, the exposure light EL is not emitted from the emission surface 12. In the step movement operation, the exposure light EL is not irradiated onto the substrate P (object).

 The control device 6 sequentially exposes each of the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement mainly in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation from the end of exposure of a certain shot area S to the start of exposure of the next shot area S includes one or both of acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

 In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS may be formed on the substrate stage 2 (cover member T). In at least part of the scan movement operation and the step movement operation, the immersion space LS may be formed so as to straddle the substrate P and the substrate stage 2 (cover member T). When the substrate P is exposed with the substrate stage 2 and the measurement stage 3 approaching or in contact with each other, the immersion space LS is formed in the substrate stage 2 (cover member T) in at least a part of the scan movement operation and the step movement operation. And the measurement stage 3 may be formed.

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7.

  The exposure conditions (exposure control information) include arrangement information of the plurality of shot areas S (positions of the plurality of shot areas S on the substrate P). The exposure condition (exposure control information) includes dimension information (dimension information about the Y-axis direction) of each of the plurality of shot regions S.

 Based on the exposure conditions (exposure control information) stored in the storage device 7, the control device 6 sequentially exposes each of the plurality of shot regions S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement distance, movement direction, and movement locus in the XY plane.

  As an example, when sequentially exposing each of the plurality of shot areas S, the control device 6 causes the projection area PR of the projection optical system PL and the substrate P to be relative to each other along the movement locus indicated by the arrow Sr in FIG. The projection region PR is irradiated with the exposure light EL while moving the substrate stage 2 so as to move, and the plurality of shot regions S are sequentially exposed with the exposure light EL via the liquid LQ. The controller 6 sequentially exposes each of the plurality of shot areas S while repeating the scan movement operation and the step movement operation.

  In the present embodiment, the second member 22 moves in at least a part of the exposure processing of the substrate P. For example, the second member 22 moves in parallel with at least a part of the step movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. For example, the second member 22 moves in parallel with at least a part of the scanning movement operation of the substrate P (substrate stage 2) in a state where the immersion space LS is formed. In parallel with the movement of the second member 22, the exposure light EL is emitted from the emission surface 12. Note that the second member 22 does not have to move during the scan movement operation. That is, the second member 22 may not move in parallel with the emission of the exposure light EL from the emission surface 12. For example, when the substrate P (substrate stage 2) performs a step movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) is small. Good. Further, when the substrate P (substrate stage 2) performs the scanning movement operation, the second member 22 moves so that the relative movement (relative speed, relative acceleration) with the substrate P (substrate stage 2) becomes small. Also good.

  FIG. 15 schematically illustrates an example of the movement trajectory of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed while performing the step movement including the component in the + X direction. FIG. The shot areas Sa, Sb, and Sc are arranged in the X-axis direction.

  As shown in FIG. 15, when the shot areas Sa, Sb, and Sc are exposed, the substrate P is located under the last optical element 13 from the position d1 to the position d2 adjacent to the position d1 on the + Y side. Path Tp1, path Tp2 from position d2 to position d3 adjacent to + X side with respect to position d2, path Tp3 from position d3 to position d4 adjacent to −Y side with respect to position d3, and from position d4 to The path Tp4 from the position d4 to the position d5 adjacent to the + X side and the path Tp5 from the position d5 to the position d6 adjacent to the position +5 on the + Y side are sequentially moved. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve passing through the position d2.5. The path Tp4 includes a curve passing through the position d4.5. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the + Y direction. The path Tp3 is a path along which the substrate P moves in the −Y direction. The path Tp5 is a path along which the substrate P moves in the + Y direction. The path Tp2 and the path Tp4 are paths along which the substrate P moves in a direction whose main component is the + direction.

  When the substrate P moves along the path Tp1 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sa through the liquid LQ. When the substrate P moves along the path Tp3 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ. When the substrate P moves along the path Tp5 in a state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ. When the substrate P moves along the path Tp2 and the path Tp4, the exposure light EL is not irradiated.

 Each of the movement of the substrate P along the path Tp1, the movement along the path Tp3, and the movement along the path Tp5 includes a scanning movement operation. Each of the operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 includes a step movement operation.

  That is, each of the period during which the substrate P moves along the path Tp1, the period during which the path Tp3 moves, and the period during which the substrate P moves along the path Tp5 is a scan movement period (exposure period). Each of the period during which the substrate P moves along the path Tp2 and the period during which the substrate P moves along the path Tp4 is a step movement period.

 FIG. 16 is a schematic diagram illustrating an example of the operation of the second member 22. FIG. 16 is a view of the second member 22 as viewed from the upper surface 25 side.

 When the substrate P is at the position d1, the second member 22 is disposed at the position shown in FIG. 16A with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d2, the second member 22 is disposed at the position shown in FIG. 16B with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scan movement operation from the position d1 to the position d2 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P.

 When the substrate P is at the position d2.5, the second member 22 is disposed at the position shown in FIG. 16C with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d3, the second member 22 is disposed at the position shown in FIG. 16D with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d2 to the position d3 of the substrate P, the second member 22 moves in the + X direction that is the same as the step movement direction (+ X direction) of the substrate P.

 When the substrate P is at the position d4, the second member 22 is disposed at the position shown in FIG. 16E with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the scanning movement operation from the position d3 to the position d4 of the substrate P, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P.

 When the substrate P is at the position d4.5, the second member 22 is disposed at the position shown in FIG. 16F with respect to the projection region PR (the optical path K of the exposure light EL). When the substrate P is at the position d5, the second member 22 is disposed at the position shown in FIG. 16G with respect to the projection region PR (the optical path K of the exposure light EL). That is, during the step movement operation from the position d4 to the position d5 of the substrate P, the second member 22 moves in the same + X direction as the step movement direction (+ X direction) of the substrate P.

 When the substrate P is at the position d6, the second member 22 is disposed at the position shown in FIG. 16H with respect to the projection region PR (the optical path K of the exposure light EL). In other words, during the scanning movement of the substrate P from the position d5 to the position d6, the second member 22 moves in the −X direction opposite to the step movement direction (+ X direction) of the substrate P.

 In the present embodiment, the position of the second member 22 shown in FIGS. 16 (A), 16 (D), and 16 (G) is the movable range (movable range) of the second member 22 defined in the X-axis direction. ) At the end on the most + X side (second end position). The position of the second member 22 shown in FIGS. 16B, 16E, and 16H is −X of the movable range (movable range) of the second member 22 defined in the X-axis direction. This is the position of the side end (first end position). The position of the second member 22 shown in FIGS. 16C and 16F is the center position (center position) of the movable range (movable range) of the second member 22 defined in the X-axis direction. .

  When the substrate P moves along the path Tp1, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 16A to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp2, the second member 22 changes from the state shown in FIG. 16 (B) to the state shown in FIG. 16 (D) through the state shown in FIG. 16 (C). Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp3, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 16D to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position. When the substrate P moves along the path Tp4, the second member 22 changes from the state shown in FIG. 16 (E) to the state shown in FIG. 16 (G) through the state shown in FIG. 16 (F). Move in the direction. That is, the second member 22 moves from the first end position to the second end position through the center position. When the substrate P moves along the path Tp5, the second member 22 moves in the −X direction so as to change from the state shown in FIG. 16G to the state shown in FIG. That is, the second member 22 moves from the second end position through the center position to the first end position.

  That is, in the present embodiment, the second member 22 moves in the + X direction so that the relative movement with the substrate P becomes small in at least a part of the period in which the substrate P moves along the path Tp2. In other words, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small during at least a part of the period during which the substrate P includes a + X direction component. To do. Similarly, the second member 22 moves in the + X direction so that the relative speed with respect to the substrate P in the X-axis direction becomes small in at least part of the period in which the substrate P moves along the path Tp4.

  In the present embodiment, the second member 22 moves in the −X direction during at least a part of the period in which the substrate P moves along the path Tp3. Thereby, after the movement of the path Tp3 of the substrate P, in the movement of the path Tp4, the exposure light EL can pass through the opening 35 even if the second member 22 moves in the + X direction. The same applies when the substrate P moves along the paths Tp1 and Tp5.

 That is, when the substrate P repeats the scan movement operation and the step movement operation including the component in the + X direction, the second member 22 is positioned at the first end position so that the relative speed with respect to the substrate P is reduced during the step movement operation. The second member 22 moves from the second end position so that the second member 22 can move again in the + X direction during the next step movement operation during the scan movement operation. Return to the first end position. In other words, since the second member 22 moves in the −X direction during at least a part of the period during which the substrate P performs the transscan movement operation, the size of the opening 35 is minimized.

  In this embodiment, even if the second member 22 is disposed at the first end position (second end position), at least a part of the fluid recovery unit 27 continues to face the substrate P (object). . Thereby, for example, in the step movement operation, the fluid recovery unit 27 can recover the liquid LQ on the substrate P (object).

 In the example described with reference to FIGS. 15 and 16, the second member 22 is disposed at the second end position when the substrate P is at the positions d1, d3, and d5. When the board | substrate P exists in position d1, d3, d5, the 2nd member 22 may be arrange | positioned in a center position, and may be arrange | positioned between a center position and a 2nd edge part position.

 In the example described with reference to FIGS. 15 and 16, the second member 22 is disposed at the first end position when the substrate P is at the positions d2, d4, and d6. When the board | substrate P exists in position d2, d4, d6, the 2nd member 22 may be arrange | positioned in a center position, and may be arrange | positioned between a center position and a 1st edge part position.

  Further, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed at a position different from the center position. That is, when the substrate P is at the positions d2.5 and d4.5, the second member 22 may be disposed, for example, between the center position and the second end position, or the center position and the first end. You may arrange | position between part positions.

  As described above, according to the present embodiment, since the gas-liquid separation device 70 that separates the liquid LQ recovered from the fluid recovery unit 27 and the gas GS is provided, the occurrence of defective exposure and the generation of defective devices are prevented. Can be suppressed.

  In the present embodiment, the liquid LQ is recovered from the fluid recovery part 27 while the second member 22 having the recovery flow path 27R and the second support member 52 having the internal space 71 move. Therefore, when the liquid LQ recovered from the fluid recovery unit 27 and the gas GS are recovered by the fluid recovery device 27C without being separated, the liquid LQ recovered from the fluid recovery unit 27R is separated from the fluid recovery unit 27 and the fluid. The possibility of colliding with the inner surface (the inner surface of the recovery channel 27R and the inner surface of the internal space 71) of the flow channel (the recovery channel 27R and the internal space 71) with the recovery device 27C increases. In addition, a phenomenon occurs in which the flow path between the fluid recovery unit 27 and the fluid recovery device 27C is blocked by the liquid LQ (so-called blocking phenomenon), or the phenomenon that the flow path is blocked by the liquid LQ. There is a possibility that the phenomenon will be repeated. As a result, the pressure of the flow path (recovery flow path 27R and internal space 71) may fluctuate greatly, or the liquid LQ may become a minute droplet or vibration may occur in the flow path.

 As a result, at least a part of the liquid LQ (including minute droplets of the liquid LQ) existing in the flow path falls on the substrate P (object) as a foreign substance via the fluid recovery part (fluid recovery port) 27. This may cause a defective exposure such as a defect in the pattern formed on the substrate P.

  Further, when the liquid LQ and the gas GS recovered from the fluid recovery unit 27 are recovered by the fluid recovery device 27C without being separated, a flow path (recovery flow) between the fluid recovery unit 27 and the fluid recovery device 27C is used. In the path 27R and the internal space 71), the possibility of heat of vaporization increases.

  According to this embodiment, since the gas-liquid separation device 70 is provided, occurrence of the above-described phenomenon is suppressed. Therefore, the occurrence of exposure failure can be suppressed, and the occurrence of defective devices can be suppressed.

Second Embodiment
A second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

 FIG. 17 is a side sectional view showing a part of the second member 22B according to the present embodiment. 18 is a view taken along the line AA in FIG. FIG. 19 is a view of an example of the second member 22B according to the present embodiment as viewed from above. In FIG. 19, a part of the second member 22B is shown in cross section.

  In the present embodiment, the second member 22B of the liquid immersion member 5B is configured to separate the fluid recovery unit 27 that can face the substrate P (object), the liquid LQ recovered from the fluid recovery unit 27, and the gas GS. And a separation device 80.

 The second member 22B is connected to a fluid recovery unit (fluid recovery port) 27, and an internal space (recovery flow) into which fluid (one or both of the liquid LQ and the gas GS) from the fluid recovery unit (fluid recovery port) 27 flows. Road) 81.

 In the present embodiment, at least a part of the gas-liquid separation device 80 is disposed in the internal space 81. The gas-liquid separator 80 faces the internal space 81, the first discharge port 83 that can discharge the gas GS in the internal space 81, and the discharge of the gas GS is suppressed from the first discharge port 83, and the liquid LQ is discharged. A possible second outlet 84.

  The internal space 81 includes a first flow path 85 connected to the first discharge port 83 and a second flow path 86 connected to the second discharge port 84.

  The first flow path 85 has a first inner surface 85W. The first flow path 85 is defined by the first inner surface 85W. The second flow path 86 has a second inner surface 86W. The second flow path 86 is defined by the second inner surface 86W.

  The gas-liquid separator 80 has a porous member 82 disposed in the internal space 81. The porous member 82 defines at least a part of the first flow path 85. The porous member 82 defines at least a part of the second flow path 86.

 In the present embodiment, the porous member 82 may be porous, a plate having a plurality of holes (through holes), a mesh, or a mesh plate. The porous member 82 may be a sintered member (for example, sintered metal) in which a plurality of pores are formed. The porous member 82 may be a foam member (for example, foam metal).

  The porous member 82 has a space (internal space) 87. The space 87 is formed inside the porous member 82. The porous member 82 has an inner surface 82 </ b> A that faces the space 87. At least a part of the second inner surface 86W includes an inner surface 82A.

  A space 88 is formed between the outer surface 82B of the porous member 82 and the inner surface 22S of the second member 22 (internal space 81). The outer surface 82 </ b> B of the porous member 82 faces the space 88. At least a part of the first inner surface 85W includes an outer surface 82B. At least a part of the first inner surface 85W includes the inner surface 22S.

  In the present embodiment, the porous member 82 is an annular member that surrounds the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The outer surface 82B of the porous member 82 includes an inner side surface 82Ba facing inward with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13), and an outer side surface 82Bb facing the opposite side of the inner side surface 82Ba.

  In the present embodiment, the porous member 82 has a passage (through hole) 89 formed so as to connect the inner surface 82Ba and the outer surface 82Bb. The fluid (one or both of the liquid LQ and the gas GS) can pass through the passage 89.

  A plurality of passages 89 are arranged around the optical path K of the exposure light EL (the optical axis of the terminal optical element 13).

  The passage 89 is disposed at a position different from the space 87 with respect to the Z-axis direction. In the present embodiment, the passage 89 is disposed on the −Z side (downward) of the space 87. The passage 89 may be disposed on the + Z side (upward) of the space 87. At least a part of the inner surface that defines the passage 89 includes a surface 82Bc of the porous member 82.

  The first flow path 85 includes a first portion 85A that the inner surface 82Ba faces, a second portion 85B that the outer surface 82Bb faces, and a third portion 85C that the surface 82Bc faces. The third portion 85 </ b> C includes a passage 89.

  In the present embodiment, the first flow path 85 includes a space 88. The second flow path 86 includes a space 87. At least a part of the first inner surface 85 </ b> W of the first flow path 85 includes the outer surface 82 </ b> B of the porous member 82. At least a part of the second inner surface 86 </ b> W of the second flow path 86 includes the inner surface 82 </ b> A of the porous member 82.

 In the present embodiment, the first flow path 85 is directly connected to the fluid recovery part (fluid recovery port) 27. The second flow path 86 is not directly connected to the fluid recovery part (fluid recovery port) 27. The second flow path 86 is connected to the fluid recovery part (fluid recovery port) 27 through the hole of the porous member 82 and the first flow path 85.

 The fluid recovery device 27C includes a gas recovery device 271C that recovers the gas GS from the gas-liquid separation device 80 and a liquid recovery device 272C that recovers the liquid LQ from the gas-liquid separation device 70.

  The gas recovery device 271 </ b> C is connected to the first discharge port 83. The first outlet 83 faces the first flow path 85. The gas recovery device 271 </ b> C is connected to the first flow path 85 through the first discharge port 83.

  The liquid recovery device 272C is connected to the second discharge port 84. The second discharge port 84 faces the second flow path 86. The liquid recovery device 272C is connected to the second flow path 86 via the second discharge port 84.

 The gas recovery device 271C can connect the first flow path 85 and the vacuum system. The gas recovery device 271C may include a vacuum system. The gas recovery device 271C includes a pressure adjustment device, and can adjust the pressure of the first flow path 85.

  The liquid recovery apparatus 272C can connect the second flow path 86 and the vacuum system. The liquid recovery apparatus 272C may include a vacuum system. The liquid recovery device 272C includes a pressure adjusting device and can adjust the pressure of the second flow path 86.

  The gas recovery device 271C and the liquid recovery device 272C are controlled by the control device 6. The controller 6 can adjust the pressure difference between the first flow path 85 and the second flow path 86 by controlling one or both of the gas recovery apparatus 271C and the liquid recovery apparatus 272C.

  In the present embodiment, only the liquid LQ of the liquid LQ and the gas GS in the first flow path 85 moves to the second flow path 86 via the porous member 82, and the second flow path 85 to the second flow path 86. The pressure difference between the first flow path 85 and the second flow path 86 is adjusted so that the movement of the gas GS to the flow path 86 is suppressed (restricted).

  The control device 6 prevents the liquid LQ in the first flow path 85 from flowing into the second flow path 86 through the hole in the porous member 82 and preventing the gas GS in the first flow path 85 from passing through the hole in the porous member 82. In addition, the difference between the pressure Pg on the outer surface 82B side of the porous member 82 (pressure in the first flow path 85) Pg and the pressure on the inner surface 82A side (pressure in the second flow path 86) Pw is adjusted. An example of a technique in which only the liquid LQ is allowed to pass through the holes of the porous member and the gas GS is not allowed to pass is disclosed in, for example, US Pat. No. 7,292,313.

  In the present embodiment, the liquid LQ in the first portion 85A of the first flow path 85 can move to the second flow path 86, for example, via the inner surface 82Ba of the porous member 82. The liquid LQ in the second portion 85B of the first flow path 85 can move to the second flow path 86 via, for example, the outer surface 82Bb of the porous member 82. The liquid LQ in the third portion 85C (flow path 89) of the first flow path 85 is movable to the second flow path 86, for example, via the surface 82Bc of the porous member 82.

  When the liquid LQ that has flowed into the first flow path 85 from the fluid recovery unit 27 moves to the second flow path 86, the ratio of the gas GS in the first flow path 85 becomes higher than the ratio of the liquid LQ. That is, the ratio of the gas GS in the fluid existing in the first flow path 85 is higher than the ratio of the gas GS in the fluid existing in the second flow path 86. The ratio that the liquid LQ occupies in the fluid present in the second flow path 86 is higher than the ratio that the liquid LQ occupies in the fluid that exists in the first flow path 85. As described above, the liquid LQ and the gas GS are separated in the internal space 81.

  In the present embodiment, substantially no liquid LQ is present in the space around the first outlet 83 in the first flow path 85. At the first discharge port 83, the discharge of the liquid LQ is suppressed more than the discharge of the gas GS. The gas GS in the first flow path 85 is discharged from the first discharge port 83. The gas GS discharged from the first discharge port 83 is recovered by the gas recovery device 271C.

  In the present embodiment, the second flow path 86 is filled with the liquid LQ. At the second discharge port 84, the discharge of the gas GS is suppressed more than the discharge of the liquid LQ. The liquid LQ in the second flow path 86 is discharged from the second discharge port 84. The liquid LQ discharged from the second discharge port 84 is recovered by the liquid recovery device 272C.

  That is, by the gas-liquid separation device 80, the fluid recovery device 27C can separate and recover the gas GS discharged from the first discharge port 83 and the liquid LQ discharged from the second discharge port 84.

  As described above, in the present embodiment, at least a part of the first inner surface 85W of the first flow path 85 is defined by the inner surface 82Ba, the outer surface 82Bb, and the surface 82Bc of the porous member 82. Thereby, in the 1st flow path 85, the contact area of the outer surface 82B of the porous member 82 with respect to the fluid (one or both of liquid LQ and gas GS) which flowed in from the fluid collection | recovery part 27 becomes large.

 The first flow path through which the fluid flows between one end of the first flow path 85 connected to the fluid recovery unit 27 and the other end of the first flow path 85 connected to the first discharge port 83. The distance of 85 becomes longer. Therefore, the gas-liquid separation process is sufficiently performed, and substantially only the gas GS is discharged from the first discharge port 83.

  As described above, since the gas-liquid separation device 80 for separating the liquid LQ recovered from the fluid recovery unit 27 and the gas GS is provided, when the liquid LQ and the gas GS are recovered from the fluid recovery unit 27, The flow path pressure between the fluid recovery unit 27 and the fluid recovery device 27C is greatly fluctuated, and the liquid LQ is prevented from being a minute droplet or generating vibrations in the flow path. In addition, at least a part of the liquid LQ (including minute droplets of the liquid LQ) present in the flow path falls on the substrate P (object) as a foreign substance via the fluid recovery unit 27 (fluid recovery port). Occurrence of the phenomenon is suppressed. Further, the generation of heat of vaporization in the flow path between the fluid recovery unit 27 and the fluid recovery device 27C is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the present embodiment, a plurality of passages 89 connected to the gas recovery device 271C are arranged around the optical path K of the exposure light EL. In the present embodiment, the passages 89 are arranged at substantially equal intervals around the optical path K. Therefore, the pressure (negative pressure) is made uniform in the annular internal space 81 (first flow path 85) and the fluid recovery unit 27. As a result, it is possible to prevent the pressure in the internal space 81 (fluid recovery unit 27) from fluctuating greatly, the liquid LQ from forming small droplets in the internal space 81, and the occurrence of vibrations.

  In the above-described embodiment, the liquid immersion member 5 may include the gas-liquid separation device 70 described with reference to FIGS. 12 and 13. For example, at least a part of the gas-liquid separation device 70 may be disposed in the recovery flow path (internal space) 27R of the second member 22. For example, the porous member 71 described with reference to FIGS. 12 and 13 may be disposed in the recovery flow path (internal space) 27 </ b> R of the second member 22. That is, the liquid immersion member 5 faces the recovery flow path (internal space) 27R, the first discharge port from which the gas GS in the recovery flow path 27R can be discharged, and the discharge of the gas GS is suppressed more than the first discharge port. A second discharge port capable of discharging the liquid LQ, a first flow path connected to the first discharge port, having a first inner surface, and at least a part of the first inner surface including the first surface of the porous member 71; A second flow path connected to the second discharge port and having a second inner surface, at least a part of the second inner surface including the second surface of the porous member 71, and the liquid LQ of the first flow path and The pressure difference between the first channel and the second channel may be adjusted so that only the liquid LQ of the gas G moves to the second channel via the porous member 71. In this case, the space 77 (first flow path) inside the porous member 71 disposed in the internal space 27R is directly connected to the fluid recovery part (fluid recovery port) 27. The second flow path is connected to the fluid recovery part (fluid recovery port) 27 through the hole of the porous member 71 and the first flow path. The first flow path is connected to a gas recovery device 271C including a vacuum system. The second flow path is connected to a liquid recovery device 272C including a vacuum system. The first flow path may have a bent portion.

  In the first and second embodiments described above, a reinforcing member such as a rib may be disposed on the porous member 37 facing the substrate P (object). By disposing the reinforcing member on the porous member 37, the strength of the porous member 37 is increased, and the porous member 37 is prevented from vibrating. For this reason, the liquid LQ present in the porous member 37 is suppressed to be a minute droplet, and the liquid LQ (droplet) is prevented from falling on the substrate P (object) as a foreign substance.

  In the first and second embodiments described above, the liquid LQ (including the fine droplets of the liquid LQ) is also applied from the fluid recovery unit 27 onto the substrate P (object) by increasing the suction force of the fluid recovery device 27C. Occurrence of the phenomenon of falling is suppressed.

<Third Embodiment>
A third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 20 is a side sectional view showing a part of the second member 22C of the liquid immersion member 5C according to the present embodiment. In the present embodiment, the second member 22C is formed in the second member 22C so as to be connected to the fluid recovery unit (fluid recovery port) 27, and the fluid (one or both of the liquid LQ and the gas GS) from the fluid recovery unit 27 is formed. ) Flows into the recovery channel (internal space) 27R, and the buffer unit 90 is disposed in the recovery channel 27R and reduces the momentum of the liquid LQ that has flowed into the recovery channel 27R from the fluid recovery unit 27.

  In the present embodiment, at least a part of the buffer portion 90 is disposed immediately above the fluid recovery portion (fluid recovery port) 27.

  In the present embodiment, the buffer 90 includes a porous member 91. The porous member 91 may be porous, a plate in which a plurality of holes (through holes) are formed, a mesh, or a mesh plate. The porous member 91 may be a sintered member (for example, sintered metal) in which a plurality of pores are formed. The porous member 91 may be a foam member (for example, foam metal). The porous member 91 may be a sponge.

 The porous member 91 is disposed on the inner surface (ceiling surface) 94 of the recovery flow path 27 </ b> R directly above the fluid recovery unit 27. The ceiling surface 94 faces downward. The upper surface of the porous member 37 and at least a part of the lower surface of the porous member 91 face each other. Note that the porous member 91 disposed in the recovery flow path 27R may not be disposed directly above the fluid recovery unit 27 or may not face the porous member 37.

  The buffer 90 may be a liquid absorbing member having liquid absorbency (water absorption). As the liquid absorbing member, at least one of the porous members 91 described above may be used.

  According to the present embodiment, the momentum of the liquid LQ that has flowed into the recovery flow path 27R from the fluid recovery section 27 is reduced by the buffer section 90 provided in the recovery flow path 27R of the second member 22. Therefore, at least a part of the liquid LQ (including minute droplets of the liquid LQ) flowing into the recovery flow path 27R from the fluid recovery part (fluid recovery port) 27 is generated by the fluid recovery part 27 (fluid recovery part 27). It is possible to prevent the phenomenon of falling on the substrate P (object) as a foreign substance through the mouth).

 For example, when the liquid LQ and the gas GS are recovered together from the fluid recovery part 27 (when the gas-liquid mixture is recovered), the liquid LQ that has flowed into the second member 22 (recovery flow path 27R) from the fluid recovery part 27 Vigorously hits the inner surface of the second member 22 (recovery flow path 27R), vibration occurs, or the liquid LQ (including droplets of the liquid LQ) hits the inner surface of the second member 22 (recovery flow path 27R). May bounce off and fall onto the substrate P (object) via the fluid recovery part 27 (fluid recovery port).

  According to the present embodiment, the buffer unit 90 suppresses the occurrence of vibration and the drop of the liquid LQ (foreign matter) on the substrate P (object). Therefore, the occurrence of defective exposure and the occurrence of defective devices can be suppressed.

<Fourth embodiment>
A fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 21 is a side sectional view showing a part of the second member 22D of the liquid immersion member 5D according to the present embodiment. In FIG. 21, the second member 22D includes a buffer 90B that is disposed in the recovery channel 27R and reduces the momentum of the liquid LQ that has flowed into the recovery channel 27R from the fluid recovery unit (fluid recovery port) 27.

  In the present embodiment, the buffer portion 90 </ b> B includes an uneven portion 92. At least a part of the concavo-convex portion 92 is disposed immediately above the fluid recovery portion 27. The uneven portion 92 is formed on the inner surface (ceiling surface) 94B of the recovery flow path 27R facing downward. The upper surface of the porous member 37 and at least a part of the uneven portion 92 face each other.

 In addition, the member which has an uneven | corrugated | grooved part may be arrange | positioned in the collection | recovery flow path 27R. The member having the uneven portion may be a member different from the second member 22.

 The uneven portion 92 may not be disposed immediately above the fluid recovery portion 27 or may not face the porous member 37.

  Also in the present embodiment, the occurrence of vibration and the drop of the liquid LQ (foreign matter) on the substrate P (object) are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  The liquid immersion member (such as 5) may have both the gas-liquid separation device and the buffer unit. In other words, the exposure apparatus EX may have both the gas-liquid separation device 70 described in the first embodiment and the buffer unit 90 described in the third embodiment, or has been described in the second embodiment. You may have both the gas-liquid separator 80 and the buffer part 90 demonstrated in 3rd Embodiment.

<Fifth Embodiment>
A fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 22 is a side sectional view showing a part of the second member 22E of the liquid immersion member 5E according to the present embodiment. In the present embodiment, the second member 22E is formed on the second member 22E so as to be connected to the fluid recovery part (fluid recovery port) 27, and the fluid (one or both of the liquid LQ and the gas GS from the fluid recovery part 27). ) Flows into the recovery channel (internal space) 27R.

 In the present embodiment, the inner surface (ceiling surface) 94C of the recovery channel (internal space) 27R immediately above the fluid recovery unit 27 is inclined. In the present embodiment, the upper surface of the porous member 37 and the ceiling surface 94C of the recovery flow path 27R are nonparallel. In the present embodiment, the surface (XY plane) of the substrate P and the ceiling surface 94C of the recovery flow path 27R are nonparallel.

  In the present embodiment, the ceiling surface 94C of the recovery flow path 27R is inclined upward toward the outside with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The ceiling surface 94C of the recovery flow path 27R may be inclined downward toward the outside with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13).

  According to this embodiment, the liquid LQ (including droplets of the liquid LQ) flows into the second member 22 (recovery flow path 27R) from the fluid recovery unit 27 vigorously by gas-liquid mixture recovery, and the fluid recovery unit 27 Even when it hits the inner surface (ceiling surface) 94C of the recovery channel 27R directly above, the ceiling surface 94C is inclined, so that the liquid LQ is prevented from splashing toward the fluid recovery unit 27. For this reason, the liquid LQ (including liquid LQ droplets) hitting the ceiling surface 94C of the recovery flow path 27R rebounds and drops onto the substrate P (object) via the fluid recovery part 27 (fluid recovery port). It is suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In addition, the above-mentioned 1st-5th embodiment may be combined suitably. For example, the buffer portion 90 may be disposed on the ceiling surface 94C of the inclined collection channel 27R.

<Sixth Embodiment>
A sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 23 is a side sectional view showing a part of the second member 22F of the liquid immersion member 5F according to the present embodiment. In the present embodiment, the second member 22F is formed in the second member 22F so as to be connected to the fluid recovery part (fluid recovery port) 27, and the fluid (one or both of the liquid LQ and the gas GS from the fluid recovery part 27). ) Flows into the recovery channel (internal space) 27R.

 In the present embodiment, the inner surface (upper surface) 95 of the recovery flow path (internal space) 27 </ b> R is disposed around the upper surface of the porous member 37. The upper surface of the porous member 37 and the upper surface 95 of the recovery flow path 27R are disposed at substantially the same height. The upper surface of the porous member 37 and the upper surface 95 of the recovery flow path 27R are disposed substantially in the same plane.

  In the present embodiment, for example, a drop of the liquid LQ that hits the inner surface (the ceiling surface or the like) of the recovery channel 27R has a high possibility of falling on the upper surface 95 and is unlikely to fall on the fluid recovery unit 27. That is, the drop of the liquid LQ that hits the inner surface of the recovery flow path 27R is highly likely to be received by the upper surface 95, and is less likely to fall on the substrate P (object) via the fluid recovery part 27. Thus, in the present embodiment, the fluid recovery unit 27 is small so that the liquid LQ does not fall into the fluid recovery unit 27 in the recovery channel 27R, and the upper surface for receiving the liquid LQ around the fluid recovery unit 27. 95 is provided.

  Also in the present embodiment, it is possible to suppress a phenomenon in which at least a part of the liquid LQ that has flowed into the recovery flow path 27R from the fluid recovery unit 27 falls onto the substrate P (object) via the fluid recovery unit 27. . Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

<Seventh embodiment>
A seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 24 is a side sectional view showing a part of the second member 22G of the liquid immersion member 5G according to this embodiment. In the present embodiment, the second member 22G is formed in the second member 22G so as to be connected to the fluid recovery part (fluid recovery port) 27, and the fluid (one or both of the liquid LQ and the gas GS) from the fluid recovery part 27 is formed. ) Flows into the recovery channel (internal space) 27R.

 In the present embodiment, inner surfaces (upper surfaces) 95 </ b> B and 95 </ b> C of the recovery flow path (internal space) 27 </ b> R are disposed around the upper surface of the porous member 37. The upper surface 95B is disposed inside the upper surface of the porous member 37 with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The upper surface 95C is disposed outside the upper surface of the porous member 37 with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13).

 The upper surface of the porous member 37 and the upper surfaces 95B and 95C of the recovery channel 27R are arranged at different heights. In the present embodiment, the upper surface 95B and the upper surface 95C are disposed above (+ Z side) the upper surface of the porous member 37.

  The upper surface 95B and the upper surface 95C are disposed at different heights. In the present embodiment, the upper surface 95C is disposed above (+ Z side) the upper surface 95B.

  For example, a drop of the liquid LQ that hits the inner surface (the ceiling surface or the like) of the recovery channel 27R is highly likely to fall on the upper surfaces 95B and 95C, and is less likely to fall on the fluid recovery unit 27. That is, the drop of the liquid LQ that hits the inner surface of the recovery flow path 27R is highly likely to be received by the upper surfaces 95B and 95C, and is less likely to fall onto the substrate P (object) via the fluid recovery unit 27. Thus, in the present embodiment, the fluid recovery unit 27 is small so that the liquid LQ does not fall into the fluid recovery unit 27 in the recovery channel 27R, and the upper surface for receiving the liquid LQ around the fluid recovery unit 27. 95B and 95C are provided.

  Also in the present embodiment, it is possible to suppress a phenomenon in which at least a part of the liquid LQ that has flowed into the recovery flow path 27R from the fluid recovery unit 27 falls onto the substrate P (object) via the fluid recovery unit 27. . Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

<Eighth Embodiment>
An eighth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 25 is a side sectional view showing a part of the second member 22H of the liquid immersion member 5H according to the present embodiment. In the present embodiment, the second member 22H is formed on the second member 22H so as to be connected to the fluid recovery part (fluid recovery port) 27, and the fluid (one or both of the liquid LQ and the gas GS from the fluid recovery part 27). ) Flows into the recovery flow path (internal space) 27R and the recovery flow path 27R, has a lower surface 96A and an upper surface 96B, a lower space 271R is formed on the lower surface 96A side, and an upper space 272R on the upper surface 96B side. And a slit 97 connecting the lower space 271R and the upper space 272R.

  The lower space 271 </ b> R and the upper space 272 </ b> R are connected via a slit 97. The fluid (one or both of the liquid LQ and the gas GS) recovered from the fluid recovery unit 27 flows into the lower space 271R. At least part of the fluid flowing into the lower space 271R can move to the upper space 272R via the slit 97.

  In the present embodiment, the upper space 272R is connected to a fluid recovery device 27C including a vacuum system. An opening 98 is formed so as to face the upper space 272R. The opening 98 is connected to the fluid recovery device 27C. The upper space 272R is connected to the fluid recovery device 27C through the opening 98.

  At least a part of the fluid in the upper space 272R is recovered by the fluid recovery device 27C. At least a part of the fluid in the lower space 271R is recovered by the fluid recovery device 27C via the slit 97 and the upper space 272R.

  In the present embodiment, the slit 97 is formed between the inner surface of the recovery flow path 27 </ b> R (second member 22) and the side surface of the wall member 96. The slit 97 may be formed in the wall member 96 so as to connect (penetrate) the lower surface 96A and the upper surface 96B of the wall member 96.

  The slit 97 is disposed at a position different from the position immediately above the fluid recovery section (fluid recovery port) 27.

  In the example shown in FIG. 25, the slit 97 is disposed inside the center of the fluid recovery part 27 (porous member 37) with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The slit 97 may be disposed on the inner side of the inner end portion of the fluid recovery unit 27 (porous member 37) with respect to the radiation direction with respect to the optical path K of the exposure light EL.

 As described with reference to FIGS. 4 and 16, in the present embodiment, the second member 22 is moved in the X-axis direction. The slit 97 is formed at the end of the recovery channel 27R in the moving direction of the second member 22.

 In the present embodiment, the slit 97 is disposed inside the center of the fluid recovery part 27 (porous member 37) with respect to the optical path K of the exposure light EL in the X-axis direction.

  As shown in FIG. 26, the slit 97 is disposed outside the center of the fluid recovery part 27 (porous member 37) with respect to the radiation direction with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). Also good. The slit 97 may be disposed on the outer side of the outer end portion of the fluid recovery unit 27 (the porous member 37) in the radiation direction with respect to the optical path K of the exposure light EL. In the example shown in FIG. 26, the slit 97 is disposed outside the center of the fluid recovery part 27 (porous member 37) with respect to the optical path K of the exposure light EL in the X-axis direction.

 The slit 97 may be formed at the end in the Y-axis direction in the recovery channel 27R. The slits 97 may be formed at both the end in the X-axis direction and the end in the Y-axis direction of the recovery flow path 27R.

  The second member 22 is moved in the X-axis direction while the fluid recovery operation (fluid suction operation by the fluid recovery device 27C) from the fluid recovery unit 27 is performed. At least a part of the liquid LQ that has flowed into the lower space 271R from the fluid recovery portion (fluid recovery port) 27 flows into the upper space 272R through the slit 97. Since the wall member 96 is provided, the liquid LQ (including droplets of the liquid LQ) flowing into the upper space 272R is suppressed from moving (falling) to the fluid recovery unit 27.

  In the present embodiment, the fluid recovery operation from the fluid recovery unit 27 is performed while the second member 22 is moved. Therefore, the liquid LQ (including liquid LQ droplets) that has flowed into the lower space 271R from the fluid recovery unit 27 is prevented from hitting the lower surface 96A of the wall member 96 and splashing (falling) toward the fluid recovery unit 27.

  Therefore, at least a part of the liquid LQ that has flowed into the recovery flow path 27R via the fluid recovery part 27 is prevented from falling onto the substrate P (object) via the fluid recovery part 27. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

<Ninth Embodiment>
A ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

 FIG. 27 is a cross-sectional view parallel to the YZ plane of the liquid immersion member 500 according to this embodiment. FIG. 28 is a cross-sectional view of the liquid immersion member 500 parallel to the XZ plane. FIG. 29 is an enlarged view of a part of FIG. FIG. 30 is a view of the liquid immersion member 500 as viewed from below (−Z side). FIG. 31 is a perspective view of the liquid immersion member 500. FIG. 32 is a perspective view showing an example of a support device 5000 that supports the liquid immersion member 500.

  The liquid immersion member 500 is disposed on at least a part of the periphery of the optical path K below the first member 210 and is disposed on at least a part of the periphery of the last optical element 13. The movable second member 220, the liquid supply unit 330 that can supply the liquid LQ for forming the immersion space LS, and the fluid recovery unit that can recover the fluid (one or both of the liquid LQ and the gas GS). 230. The first member 210 is an annular member disposed around the terminal optical element 13. The second member 220 is an annular member disposed around the optical path K. The first member 210 has an opening 340 through which the exposure light EL from the emission surface 12 can pass. The second member 220 has an opening 350 through which the exposure light EL from the emission surface 12 can pass.

  The first member 210 has a lower surface 240 facing the −Z direction. The second member 220 has an upper surface 250 facing the + Z direction and a lower surface 260 facing the −Z direction. The substrate P (object) can face the lower surface 260. The upper surface 250 faces the lower surface 240 with a gap. In the present embodiment, at least a part of the upper surface 250 faces the emission surface 12 with a gap. Note that the upper surface 250 may not face the emission surface 12.

  Liquid supply unit 330 includes an opening (liquid supply port) through which liquid LQ can be supplied. The fluid recovery unit 230 is disposed outside the liquid supply unit 330 with respect to the radial direction with respect to the optical axis (optical path K) of the last optical element 13.

  The liquid supply unit 330 is disposed on the first member 210. In the present embodiment, the liquid supply unit 330 is disposed so as to face the side surface 13F. The liquid supply unit 330 supplies the liquid LQ to the third space SP3. The liquid supply unit 330 may be disposed on the second member 220, or may be disposed on both the first member 210 and the second member 220.

  The fluid recovery unit 230 is disposed outside the lower surface 240 of the first member 210 with respect to the optical path K of the exposure light EL (the optical axis of the terminal optical element 13). The lower surface 240 does not collect the liquid LQ. The substrate P (object) can face at least a part of the fluid recovery unit 230. The fluid recovery unit 230 can recover at least a part of the liquid LQ from the first space SP1 that the upper surface 250 faces and the second space SP2 that the lower surface 260 faces. The first space SP1 includes a space between the lower surface 240 and the upper surface 250. The second space SP2 includes a space between the lower surface 260 and the upper surface of the substrate P (object). In the present embodiment, the fluid recovery unit 230 is disposed on the first member 210. At least a part of the second member 220 faces the fluid recovery unit 230. Note that the second member 220 may not face the fluid recovery unit 230. The fluid recovery unit 230 may be disposed on a member different from the first member 210 and the second member 220.

 In the present embodiment, the fluid recovery unit 230 includes a porous member 380. The liquid LQ on the substrate P (object) is collected through the holes of the porous member 380. The hole (opening) of the porous member 380 functions as a fluid recovery port for recovering the fluid (one or both of the liquid LQ and the gas GS). In the present embodiment, the porous member 380 includes a mesh plate.

  In parallel with the operation of supplying the liquid LQ from the liquid supply unit 330, the recovery operation of the liquid LQ from the fluid recovery unit (fluid recovery port) 230 is executed, whereby the one-side terminal optical element 13 and the liquid immersion member An immersion space LS is formed with the liquid LQ between 500 and the other substrate P (object).

  The support device 5000 includes a first support member 400 that supports the first member 210, a second support member 280 that supports the second member 200, and a drive device 270 that can move the second member 220. The first support member 400 is supported by the support frame 53. The driving device 270 is supported by the support frame 53. The second support member 280 is connected to the drive device 270. The second support member 280 is supported by the support frame 53 via the driving device 270.

  The support frame 53 supports the first member 210 via the first support member 400. The support frame 53 supports the second member 220 via the driving device 270 and the second support member 280.

  The second member 220 is moved by the driving device 270. The driving device 270 includes, for example, a motor, and moves the second member 220 using Lorentz force. The driving device 270 moves the second member 220 at least in the X-axis direction. The driving device 270 may move the second member 220 in six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ.

  The support member 280 is connected to at least a part of the second member 220. When the support member 280 is moved by the driving device 270, the second member 220 is moved. In the present embodiment, the support member 280 includes a first portion 2801 having an upper end and a lower end, a second portion 2802 connected to the upper end of the first portion 2801, and a third portion 2803 connected to the second portion 2802. And have. A lower end portion of the first portion 2801 is connected to at least a part of the upper surface 250 of the second member 220.

 In the present embodiment, the first portion 2801 of the support member 280 is disposed on each of the + Y side and the −Y side with respect to the optical path K (the optical axis of the terminal optical element 13).

 Note that the arrangement of the plurality of first portions 2801 is not limited to the + Y side and the −Y side. For example, it may be arranged on each of the + X side and the −X side, or may be arranged on each of the + Y side, the −Y side, the + X side, and the −X side.

  In the present embodiment, the second portion 2802 is connected to a plurality of first portions 2801. The third portion 2803 is disposed between the second portion 2802 and the driving device 270. The driving device 270 is connected to the third portion 2803. Note that the second portion 2802 and the third portion 2803 may be regarded as one portion. In the present embodiment, the driving device 270 is disposed on the −Y side with respect to the optical axis of the terminal optical element 13.

  In the present embodiment, the first member 210 has an inner surface 300 that faces the side surface 13F of the last optical element 13 and an upper surface 310 that is disposed around the upper end of the inner surface 300. The side surface 13F of the last optical element 13 is a non-emission surface on which the exposure light EL is not emitted. The exposure light EL does not pass through the side surface 13F, but passes through the exit surface 12.

  In the present embodiment, the plurality of first portions 2801 are movably disposed in the plurality of holes 320 provided in the first member 210. In the present embodiment, holes 320 are provided on the + Y side and the −Y side with respect to the optical path K, respectively. Each of the holes 320 penetrates the first member 210 so as to connect the upper space and the lower space of the first member 210 in the Z-axis direction. The space above the first member 210 includes a third space SP3 between the last optical element 13 and the first member 210. The space below the first member 210 includes a first space SP <b> 1 between the first member 210 and the second member 220. The space below the first member 210 may include a second space SP2 between the second member 220 and an object (such as the substrate P).

 In the present embodiment, each of the holes 320 is formed so as to connect the inner surface 300 and the lower surface 240 of the first member 210. Further, as shown in FIG. 31, each of the holes 320 extends in the X-axis direction, and the first portion 2801 arranged in the hole 320 is movable in the X-axis direction. When the support member 280 is moved in the X-axis direction by the driving device 270, the second member 220 is moved in the X-axis direction.

 Note that at least one of the holes 320 in which the first portion 2801 is disposed may be formed so as to connect the upper surface 310 and the lower surface 240 of the first member 210.

  In the present embodiment, the second member 220 and the support member 280 do not contact the first member 210. A gap is formed between the first member 210 and the second member 220, and a gap is formed between the first member 210 and the support member 280. The driving device 270 can move the second member 220 and the support member 280 so that the second member 220 and the support member 280 do not contact the first member 210.

  In the present embodiment, at least a part of the gas-liquid separation device 700 that separates the liquid LQ recovered from the fluid recovery unit 230 and the gas GS is disposed on the first support member 400. The first support member 400 is connected to the fluid recovery unit 230 and has an internal space (recovery flow path) 710 into which the fluid from the fluid recovery unit 230 flows.

  The gas-liquid separator 700 disposed in the internal space 710 of the first support member 400 may be, for example, the gas-liquid separator 70 described in the first embodiment.

  As described above, the gas-liquid separation device 700 separates the liquid LQ and the gas GS recovered from the fluid recovery unit 230 disposed in the first member 210 that does not substantially move with respect to the last optical element 13. May be. Also in the present embodiment, the occurrence of vibration and the drop of the liquid LQ (including the liquid LQ droplets) from the fluid recovery unit 230 onto the substrate P (object) are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  Note that at least one of the elements described in the first to eighth embodiments may be arranged in the liquid immersion member 500 of the present embodiment. For example, the recovery channel (internal space) formed in the liquid immersion member 500 (first member 210) into which the fluid recovered from the fluid recovery unit 230 flows is described in the second embodiment, for example. A gas-liquid separator 80 may be disposed. Further, for example, the buffer 90 (90B) described in the above-described third embodiment may be arranged in the recovery channel (internal space) formed in the liquid immersion member 500 (first member 210). Further, the inner surface (ceiling surface) of the recovery channel of the liquid immersion member 500 (first member 210) may be inclined, or a wall member and a slit may be provided in the recovery channel.

<Tenth Embodiment>
A tenth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

 FIG. 33 is a cross-sectional view parallel to the YZ plane showing an example of the liquid immersion member 5J according to this embodiment. In FIG. 33, at least a part of the liquid immersion member 5J is disposed around the last optical element 13. At least a part of the liquid immersion member 5J is disposed around the optical path K of the exposure light EL emitted from the emission surface 12. The liquid immersion member 5J does not substantially move with respect to the last optical element 13.

  The liquid immersion member 5J includes a liquid supply unit 31J that supplies the liquid LQ for forming the liquid immersion space LS, and a fluid recovery unit 27J that recovers at least part of the liquid LQ in the liquid immersion space LS. The substrate P (object) can face the fluid recovery part 27J. The fluid recovery unit 27J includes an opening (fluid recovery port) that can recover the fluid. The fluid recovery part (fluid recovery port) 27J includes a hole of the porous member 37J.

  The liquid immersion member 5J is connected to a fluid recovery part (fluid recovery port) 27J, and an internal space (recovery flow path) 27JR into which fluid (one or both of the liquid LQ and gas GS) from the fluid recovery part 27J flows, At least a portion is disposed in the internal space 27JR, and includes a gas-liquid separator 800 that separates the liquid LQ and the gas GS recovered from the fluid recovery unit 27J.

  The gas-liquid separator 800 has the same configuration as the gas-liquid separator 80 described in the second embodiment. That is, the gas-liquid separator 800 faces the internal space 27JR, the first exhaust port 830 capable of exhausting the gas GS in the internal space 27JR, and the discharge of the gas GS is suppressed more than the first exhaust port 830, and the liquid LQ And a second discharge port 840 capable of discharging the water.

  The liquid immersion member 5J is connected to the first discharge port 830, has a first inner surface, and at least a part of the first inner surface includes the outer surface of the porous member 820, a second discharge port 840, The second flow path 860 includes a second inner surface, and at least a part of the second inner surface includes the inner surface of the porous member 820. The first flow path 850 is connected to a gas recovery device 271C including a vacuum system. The second flow path 860 is connected to a liquid recovery device 272C including a vacuum system.

 Of the liquid LQ and gas GS in the first flow path 850, the first flow path 850 and the second flow path 860 are such that only the liquid LQ moves to the second flow path 860 via the porous member 820. The pressure difference is adjusted.

  As described above, the liquid LQ recovered from the fluid recovery unit 27J and the gas GS are separated by the gas-liquid separation device 800 provided in the liquid immersion member 5J that does not substantially move with respect to the last optical element 13. May be. Also in the present embodiment, the occurrence of vibration and the drop of the liquid LQ (foreign matter) from the fluid recovery unit 27J onto the substrate P (object) are suppressed. Therefore, the occurrence of exposure failure and the occurrence of defective devices are suppressed.

  In the first to tenth embodiments described above, as shown in FIG. 34, at least a part of the first member (21 or the like) may face the exit surface 12 of the last optical element 13. That is, a part of the first member (21 or the like) may be disposed between the emission surface 12 and the upper surface of the substrate P (object).

 In the example shown in FIG. 34, the first member 21 has an upper surface 44 disposed around the opening 34. An upper surface 44 is disposed around the upper end of the opening 34. In the example shown in FIG. 34, a part of the upper surface of the second member (22 or the like) also faces the emission surface 12.

  In each of the above-described embodiments, as shown in FIG. 34, a liquid supply unit (liquid supply port) 3100 may be provided so as to face the first space SP1. In the example shown in FIG. 34, the liquid supply unit 3100 is disposed on the lower surface of the first member (21 or the like) so as to face the first space SP1. The liquid supply unit 3100 may be disposed on the upper surface of the second member (22 or the like) so as to face the first space SP1.

  By supplying the liquid LQ from the liquid supply unit 3100, for example, even if the liquid LQ supplied from the liquid supply unit 31 facing the third space SP3 does not flow into the first space SP1, the first space SP1 is liquid. Filled with LQ.

 In each embodiment described above, the second member 22 does not have to face the emission surface 12. In other words, the second member 22 may not be disposed between the emission surface 12 and the upper surface of the substrate P (object). For example, as illustrated in FIG. 35, the lower surface of the first member (21 or the like) may be disposed on the + Z side with respect to the emission surface 12. Note that the position (height) of the lower surface of the first member (21, etc.) in the Z-axis direction and the position (height) of the exit surface 12 may be substantially equal. The lower surface of the first member (21 or the like) may be disposed on the −Z side with respect to the emission surface 12.

 In each of the above-described embodiments, the size of the gap between the upper surface of the substrate P (object) and the emission surface 12 is substantially the same as the size of the gap between the upper surface of the substrate P and the lower surface of the second member (22, etc.). May be equal.

 In each of the above-described embodiments, the dimension of the gap between the upper surface of the substrate P (object) and the emission surface 12 is smaller than the dimension of the gap between the upper surface of the substrate P and the lower surface of the second member (22 or the like). Also good.

  In each of the above-described embodiments, the first member 21 may be provided with a suction port that sucks at least one of the liquid LQ and the gas from the space between the first member (21 and the like) and the last optical element 13.

 In each of the above-described embodiments, the first member (21 or the like) may not be annular. For example, the first member 21 may be disposed in a part of the periphery of the terminal optical element 13 (optical path K). For example, a plurality of the first members 21 may be arranged around the last optical element 13 (optical path K).

  In each of the above-described embodiments, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  According to the above-described embodiment, the program recorded in the storage device 7 has a fluid recovery port that can be opposed to the substrate in the control device 6, a movable member that is movable with respect to the optical member, and a recovery from the fluid recovery port. Forming a liquid immersion space on a substrate movable below the optical member, using a liquid immersion member comprising a gas-liquid separation device that separates the liquid and gas formed; and You may perform exposing a board | substrate with the exposure light inject | emitted from an emission surface via a liquid, and moving a movable member in at least one part of exposure of a board | substrate.

  In addition, the program recorded in the storage device 7 includes a fluid recovery port that can be opposed to the substrate in the control device 6 according to the above-described embodiment, and a movable member movable with respect to the optical member, and a fluid recovery port. An internal space into which the liquid from the fluid recovery port flows and a buffer portion that is disposed in the internal space and reduces the momentum of the liquid that has flowed into the internal space from the fluid recovery port. The liquid immersion space is formed on the substrate movable under the optical member by using the liquid immersion member, and the substrate is exposed with the exposure light emitted from the emission surface through the liquid in the liquid immersion space. And moving the movable member in at least a part of the exposure of the substrate.

  In addition, the program recorded in the storage device 7 includes a fluid recovery port that can be opposed to the substrate in the control device 6 according to the above-described embodiment, and a movable member movable with respect to the optical member, and a fluid recovery port. And an internal space into which liquid from the fluid recovery port flows, and the inner surface of the internal space immediately above the fluid recovery port uses an inclined liquid immersion member, Forming a liquid immersion space on a substrate movable under the optical member, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and exposing the substrate At least a part of the movable member may be moved.

  In addition, the program recorded in the storage device 7 includes a fluid recovery port that can be opposed to the substrate in the control device 6 according to the above-described embodiment, and a movable member movable with respect to the optical member, and a fluid recovery port. An inner space into which liquid from the fluid recovery port flows, and an inner space having a lower surface and an upper surface, a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side. A liquid immersion space is formed on a substrate movable under the optical member by using an immersion member including a wall member in which the upper space is formed and a slit connecting the upper space and the lower space. And exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and moving the movable member in at least a part of the exposure of the substrate. .

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the above-described embodiments, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. The exposure apparatus may be used. For example, as shown in FIG. 36, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 37, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for manufacturing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  2 ... Substrate stage, 3 ... Measurement stage, 5 ... Immersion member, 6 ... Control device, 7 ... Storage device, 8A ... Reference frame, 8B ... Device frame, 12 ... Ejection surface, 13 ... End optical element, 21st 1 member 22 ... second member 23 ... lower surface 24 ... fluid recovery unit 25 ... upper surface 26 ... lower surface 27 ... fluid recovery unit 27C ... fluid recovery device 29 ... outer side surface 30 ... inner side surface 31 DESCRIPTION OF SYMBOLS ... Liquid supply part, 32 ... Drive apparatus, 34 ... Opening, 35 ... Opening, 36 ... Porous member, 37 ... Porous member, 51 ... First support member, 52 ... Second support member, 53 ... Support frame, 54 ... Movement Frame, 55 ... vibration isolator, 56 ... drive device, 70 ... gas-liquid separator, 71 ... internal space, 72 ... porous member, 72A ... inner surface, 72B ... outer surface, 73 ... first discharge port, 74 ... second exhaust Outlet, 75 ... first flow path, 75W ... first inner surface, 76 ... first Flow path, 76W ... second inner surface, 77 ... space, 78 ... space, 80 ... gas-liquid separator, 81 ... internal space, 82 ... porous member, 82A ... inner surface, 82B ... outer surface, 83 ... first discharge port, 84 2nd discharge port, 85 ... 1st flow path, 85W ... 1st inner surface, 86 ... 2nd flow path, 86W ... 2nd inner surface, 87 ... space, 88 ... space, 89 ... channel | path, 90 ... buffer part, 90B DESCRIPTION OF SYMBOLS ... Buffer part, 91 ... Porous member, 92 ... Uneven part, 96 ... Wall member, 97 ... Slit, 271C ... Gas recovery device, 272C ... Liquid recovery device, EL ... Exposure light, EX ... Exposure device, GS ... Gas, IL ... illumination system, K ... optical path, LQ ... liquid, LS ... immersion space, P ... substrate.

Claims (55)

A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A movable member having a fluid recovery port to which the object can face and movable with respect to the optical member;
A liquid immersion member comprising: a gas-liquid separator that separates the liquid and gas recovered from the fluid recovery port. The movable member is connected to the fluid recovery port, and has an internal space into which liquid from the fluid recovery port flows,
The liquid immersion member according to claim 1, wherein at least a part of the gas-liquid separation device is disposed in the internal space. The gas-liquid separator is
A first discharge port facing the internal space and capable of discharging the gas in the internal space;
3. The liquid immersion member according to claim 2, further comprising: a second discharge port that is capable of discharging a liquid, the discharge of gas being suppressed from the first discharge port. A first flow path connected to the first outlet, having a first inner surface, wherein at least a part of the first inner surface includes the first surface of the first porous member;
A second flow path connected to the second discharge port, having a second inner surface, wherein at least a part of the second inner surface includes the second surface of the first porous member,
Of the liquid and gas in the first flow path, the first flow path and the second flow path are arranged such that substantially only the liquid moves to the second flow path through the first porous member. The liquid immersion member according to claim 3, wherein the pressure difference is adjusted. The first flow path is connected to a first recovery device including a first vacuum system;
The liquid immersion member according to claim 4, wherein the second flow path is connected to a second recovery device including a second vacuum system.   The liquid immersion member according to claim 4, wherein the first flow path has a bent portion.   The liquid immersion member according to any one of claims 2 to 6, further comprising a buffer portion that is disposed in the internal space and reduces a momentum of the liquid flowing into the internal space from the fluid recovery port. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A movable member having a fluid recovery port to which the object can face and movable with respect to the optical member;
An internal space formed in the movable member to be connected to the fluid recovery port, and into which liquid from the fluid recovery port flows;
A liquid immersion member comprising: a buffer portion that is disposed in the internal space and reduces a momentum of the liquid that has flowed into the internal space from the fluid recovery port.   The liquid immersion member according to claim 7 or 8, wherein the buffer portion is disposed immediately above the fluid recovery port.   The said buffer part is a liquid immersion member as described in any one of Claims 7-9 containing a porous member.   The said buffer part is a liquid immersion member as described in any one of Claims 7-10 containing a liquid absorption member.   The liquid immersion member according to any one of claims 7 to 11, wherein the buffer portion includes an uneven portion.   The liquid immersion member according to any one of claims 2 to 12, wherein an inner surface of the internal space immediately above the fluid recovery port is inclined. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A movable member having a fluid recovery port to which the object can face and movable with respect to the optical member;
An internal space that is formed in the movable member so as to be connected to the fluid recovery port, and into which the liquid from the fluid recovery port flows,
An inner surface of the internal space immediately above the fluid recovery port is an inclined liquid immersion member. A wall member disposed in the internal space, having a lower surface and an upper surface, wherein a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side;
The liquid immersion member according to any one of claims 2 to 14, further comprising a slit connecting the upper space and the lower space. A liquid that is used in an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate, and forms an immersion space on an object that is movable below the optical member. An immersion member,
A movable member having a fluid recovery port to which the object can face and movable with respect to the optical member;
An internal space formed in the movable member to be connected to the fluid recovery port, and into which liquid from the fluid recovery port flows;
A wall member disposed in the internal space, having a lower surface and an upper surface, wherein a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side;
A liquid immersion member comprising: a slit connecting the upper space and the lower space.   The liquid immersion member according to claim 15 or 16, wherein the upper space is connected to a vacuum system.   The liquid immersion member according to any one of claims 15 to 17, wherein the slit is formed between an inner surface of the internal space and a side surface of the wall member.   The liquid immersion member according to any one of claims 15 to 18, wherein the slit is formed at a position different from a position immediately above the fluid recovery port. The movable member moves in a plane perpendicular to the optical axis of the optical member;
The said slit is a liquid immersion member as described in any one of Claims 15-19 formed in the edge part of the moving direction of the said movable member in the said internal space. The movable member has an opening through which the exposure light can pass, and a lower surface disposed around the opening and capable of facing the object,
The lower surface of the movable member is disposed around the opening, and has a non-recovery portion that cannot recover the liquid.
21. The liquid immersion member according to claim 1, wherein the recovery unit including the fluid recovery port is disposed outside the non-recovery unit with respect to the center of the opening. A supply unit for supplying a liquid for forming the immersion space;
The liquid immersion member according to any one of claims 1 to 21, wherein the fluid recovery port is disposed outside the supply unit with respect to an optical path of the exposure light. A first member disposed on at least a part of the periphery of the optical member;
A second member that is disposed below the first member so that the object can face the second member and is movable with respect to the first member;
The liquid immersion member according to any one of claims 1 to 22, wherein the movable member includes the second member. The second member has an opening through which the exposure light can pass, and a second lower surface that is disposed around the opening and can face the object,
The second lower surface is disposed around the opening and has a non-recovery portion that cannot recover the liquid.
24. The liquid immersion member according to claim 23, wherein the recovery part including the fluid recovery port is disposed outside the non-recovery part with respect to the center of the opening.   25. The liquid immersion member according to claim 23, wherein a supply unit that supplies a liquid for forming the liquid immersion space is disposed in the first member.   The liquid immersion member according to any one of claims 23 to 25, wherein the first member does not substantially move with respect to the optical member.   The liquid immersion member according to any one of claims 23 to 26, wherein the first member has an opening through which exposure light can pass.   The liquid immersion member according to any one of claims 1 to 27, wherein the movable member moves in a plane perpendicular to the optical axis of the optical member. Comprising a porous member disposed so that the object can face each other;
The liquid immersion member according to any one of claims 1 to 28, wherein the fluid recovery port includes a hole of the porous member.   The liquid immersion member according to any one of claims 1 to 29, wherein the movable member is movable in a state where the liquid immersion space is formed.   The liquid immersion member according to any one of claims 1 to 30, wherein the movable member is movable in a state where the liquid in the liquid immersion space is in contact with the liquid immersion space.   The liquid immersion member according to any one of claims 1 to 31, wherein the movable member is movable in at least a part of a period in which the exposure light is emitted from the emission surface. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the liquid immersion member according to any one of claims 1 to 32. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An optical member having an exit surface from which the exposure light is emitted;
An immersion space for the liquid can be formed on an object that can move below the optical member, and is disposed at least at a part of the periphery of the optical path of the exposure light, and has a fluid recovery port that can face the object. A movable member movable with respect to the optical member;
An exposure apparatus comprising: a gas-liquid separator that separates liquid and gas recovered from the fluid recovery port. A support member that supports the movable member, is connected to the fluid recovery port of the movable member, and has an internal space into which liquid flows from the fluid recovery port;
A drive device capable of moving the support member,
The exposure apparatus according to claim 34, wherein at least a part of the gas-liquid separation device is disposed in the internal space.   The gas-liquid separation device faces the internal space, and includes a first discharge port that can discharge the gas in the internal space, and a second discharge port that can discharge the liquid more effectively than the first discharge port. 36. The exposure apparatus according to claim 35, further comprising a discharge port. A first flow path connected to the first outlet, having a first inner surface, wherein at least a part of the first inner surface includes the first surface of the first porous member;
A second flow path connected to the second discharge port, having a second inner surface, wherein at least a part of the second inner surface includes the second surface of the first porous member,
Of the liquid and gas in the first flow path, the first flow path and the second flow path are arranged such that substantially only the liquid moves to the second flow path through the first porous member. 37. The exposure apparatus according to claim 36, wherein the pressure difference is adjusted.   38. The exposure apparatus according to claim 37, wherein the first flow path has a bent portion.   39. The exposure apparatus according to any one of claims 33 to 38, wherein the movable member is moved so that relative movement with the object is small.   40. The exposure according to any one of claims 33 to 39, wherein the movable member is moved such that a relative movement between the movable member and the object is smaller than a relative movement between the optical member and the object. apparatus. The object includes the substrate;
In a state where the immersion space is formed, the substrate moves in the plane substantially perpendicular to the optical axis of the optical member and then moves in the second path,
In the first path, the movement of the substrate includes movement in a second direction substantially parallel to the second axis in the plane;
In the second path, the movement of the substrate includes movement in a third direction substantially parallel to a third axis perpendicular to the second axis in the plane,
41. The exposure apparatus according to claim 39, wherein the movable member moves in the third direction during at least a part of a period during which the substrate moves in the second path.   The exposure light is irradiated to the shot region of the substrate through the liquid in the immersion space when the substrate moves along the first path, and the exposure light is not irradiated when moved along the second path. Item 42. The exposure apparatus according to Item 41. The substrate moves along the third path after moving along the second path,
In the third path, the movement of the substrate includes movement in a third direction opposite to the first direction;
43. The exposure apparatus according to claim 41, wherein the movable member moves in a fourth direction opposite to the second direction during at least a part of a period during which the substrate moves in the third path.   44. The exposure apparatus according to any one of claims 33 to 43, wherein the object includes a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 33 to 44;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
A liquid immersion having a fluid recovery port that can be opposed to the substrate and movable with respect to the optical member, and a gas-liquid separator that separates the liquid and gas recovered from the fluid recovery port. Forming a liquid immersion space on the substrate that is movable below the optical member using a member;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. And a buffer part that is disposed in the internal space and reduces the momentum of the liquid that has flowed into the internal space from the fluid recovery port, and is movable below the optical member. Forming a liquid immersion space on the substrate;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. And an inner surface of the internal space immediately above the fluid recovery port is inclined by using a liquid immersion member, and the liquid liquid is placed on the substrate movable below the optical member. Forming an immersion space;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. An exposure method for exposing the substrate with exposure light through a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. An inner space, a wall member disposed in the inner space, having a lower surface and an upper surface, a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side, the upper space and the lower space Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member comprising a slit connecting the side space;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. Exposing the substrate using the exposure method according to any one of claims 46 to 49;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
A liquid immersion having a fluid recovery port that can be opposed to the substrate and movable with respect to the optical member, and a gas-liquid separator that separates the liquid and gas recovered from the fluid recovery port. Forming a liquid immersion space on the substrate that is movable below the optical member using a member;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. And a buffer part that is disposed in the internal space and reduces the momentum of the liquid that has flowed into the internal space from the fluid recovery port, and is movable below the optical member. Forming a liquid immersion space on the substrate;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. And an inner surface of the internal space immediately above the fluid recovery port is inclined by using a liquid immersion member, and the liquid liquid is placed on the substrate movable below the optical member. Forming an immersion space;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate. A program that causes a computer to execute control of an immersion exposure apparatus that exposes the substrate with exposure light via a liquid between an emission surface of the optical member and the substrate,
The substrate has a fluid recovery port that can be opposed to the substrate, and is formed on the movable member so as to be connected to the fluid recovery port. An inner space, a wall member disposed in the inner space, having a lower surface and an upper surface, a lower space is formed on the lower surface side, and an upper space is formed on the upper surface side, the upper space and the lower space Forming a liquid immersion space on the substrate movable below the optical member using a liquid immersion member comprising a slit connecting the side space;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving the movable member in at least a part of the exposure of the substrate.   The computer-readable recording medium which recorded the program as described in any one of Claims 51-54.

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