JP2013219351A - Liquid immersion member, exposure apparatus, exposure method, device manufacturing method, program, and recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid immersion member capable of suppressing the occurrence of an exposure failure.SOLUTION: The liquid immersion member forms a liquid immersion space between itself and an object movable below an optical member so as to fill an optical path of exposure light emitted from an emission surface of the optical member with a liquid. The liquid immersion member includes: a first member arranged on at least a part of the periphery of the optical member; and a second member which is movable below the first member and has a recovery port for recovering at least a part of the liquid in the liquid immersion space.

Description

The present invention relates to a liquid immersion member, an exposure apparatus, an exposure method, a device manufacturing method, a program, and a recording medium.
This application claims priority based on US provisional application 61 / 622,278 of April 10, 2012, the contents of which are incorporated herein by reference.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

U.S. Pat. No. 7,864,292

  In the immersion exposure apparatus, for example, if a liquid flows out of a predetermined space or remains on an object such as a substrate, an exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide a liquid immersion member, an exposure apparatus, and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method, a program, and a recording medium that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, the liquid that forms the immersion space on the object that is movable below the optical member so that the optical path of the exposure light emitted from the emission surface of the optical member is filled with the liquid. A first member disposed on at least a part of the periphery of the optical member; and a recovery port that is movable below the first member and recovers at least a part of the liquid in the immersion space. A liquid immersion member comprising a second member is provided.

  According to the second aspect of the present invention, there is provided an exposure apparatus that exposes a substrate with exposure light through a liquid, the exposure apparatus including the liquid immersion member of the first aspect.

  According to a third aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the second aspect and developing the exposed substrate.

  According to a fourth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a liquid, wherein the immersion light is filled so that an optical path of the exposure light emitted from the exit surface of the optical member is filled with the liquid. Forming the space, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and disposing the substrate below the first member disposed at least part of the periphery of the optical member And moving a second member having a recovery port for recovering at least part of the liquid in the immersion space.

  According to a fifth aspect of the present invention, there is provided a device manufacturing method comprising exposing a substrate using the exposure method of the fourth aspect and developing the exposed substrate.

  According to the sixth aspect of the present invention, there is provided a program for causing a computer to execute control of an exposure apparatus that exposes a substrate with exposure light via a liquid, and an optical path of exposure light emitted from an emission surface of an optical member Forming an immersion space such that the substrate is filled with liquid, exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and disposing at least part of the periphery of the optical member And a second program having a recovery port for recovering at least a part of the liquid in the immersion space is provided below the first member.

  According to the seventh aspect of the present invention, there is provided a computer-readable recording medium recording the program of the sixth aspect.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of the present invention, the occurrence of defective devices can be suppressed.

It is a figure which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a sectional side view which shows an example of the liquid immersion member which concerns on 1st Embodiment. It is the figure which looked at the liquid immersion member concerning a 1st embodiment from the lower part. FIG. 3 is a side sectional view showing a part of the liquid immersion member according to the first embodiment. FIG. 3 is a plan view showing a part of the liquid immersion member according to the first embodiment. It is a figure for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the exposure apparatus which concerns on 1st Embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. FIG. 6 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the first embodiment. FIG. 6 is a side sectional view showing a part of a liquid immersion member according to a second embodiment. It is the figure which looked at the liquid immersion member which concerns on 2nd Embodiment from the downward direction. It is the figure which looked at the liquid immersion member which concerns on 3rd Embodiment from the downward direction. FIG. 10 is a schematic diagram for explaining an example of the operation of the liquid immersion member according to the third embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 4th Embodiment. It is a schematic diagram for demonstrating an example of operation | movement of the liquid immersion member which concerns on 4th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows an example of a substrate stage. It is a flowchart for demonstrating an example of the manufacturing method of a device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. The immersion space refers to a portion (space, region) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ in the immersion space LS. In the present embodiment, water (pure water) is used as the liquid LQ.

  Further, the exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

  In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring stage 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with exposure light EL A projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, a liquid immersion member 5 that forms the liquid immersion space LS, and a control that controls the overall operation of the exposure apparatus EX. A device 6 and a storage device 7 connected to the control device 6 and storing various information relating to exposure are provided.

  The exposure apparatus EX includes a reference frame 8A that supports various measurement systems including the projection optical system PL and the measurement system 4, an apparatus frame 8B that supports the reference frame 8A, and a reference frame 8A and an apparatus frame 8B. And an anti-vibration device 10 that is disposed between the device frame 8B and suppresses transmission of vibration from the device frame 8B to the reference frame 8A. The vibration isolator 10 includes a spring device and the like. In the present embodiment, the vibration isolator 10 includes a gas spring (for example, an air mount). A detection system that detects the alignment mark of the substrate P or a detection system that detects the position of the surface of an object such as the substrate P may be supported by the reference frame 8A.

  In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

    The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

    The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

    The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 11 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X-axis, Y-axis, Z-axis, θX, θY, and θZ directions by the operation of the drive system 11. The drive system 11 may not include a planar motor. For example, the drive system 11 may include a linear motor.

    The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

    The projection optical system PL includes a terminal optical element 13 having an emission surface 12 from which the exposure light EL is emitted. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction and is parallel to the XY plane. Note that the exit surface 12 facing the −Z direction may be a convex surface or a concave surface. In addition, the emission surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis. In the present embodiment, the exposure light EL emitted from the emission surface 12 travels in the −Z direction.

    The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. In the present embodiment, the guide surface 14G and the XY plane are substantially parallel.

  In the present embodiment, the substrate stage 2 is a first holding that holds the substrate P in a releasable manner as disclosed in, for example, US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. And a second holding part that is disposed around the first holding part and holds the cover member T in a releasable manner. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. In the present embodiment, the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. For example, the drive system 15 may include a linear motor.

  The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 6 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  Next, the liquid immersion member 5 according to this embodiment will be described. 2 is a side sectional view showing an example of the liquid immersion member 5 according to the present embodiment, FIG. 3 is a view of the liquid immersion member 5 seen from the lower side (−Z side), and FIG. It is the figure which expanded the part. In the present embodiment, the liquid immersion member 5 is supported by the device frame 8B via the support device 50.

  The liquid immersion member 5 forms the liquid immersion space LS so that the optical path K of the exposure light EL emitted from the exit surface 12 of the last optical element 13 is filled with the liquid LQ. A part of the immersion space LS is formed between the object that can move in the XY plane including the position facing the emission surface 12 and the immersion member 5.

  An object that can move in the XY plane including a position facing the exit surface 12 includes an object that can face the exit surface 12 and includes an object that can be arranged in the projection region PR. The object includes an object that can move below the last optical element 13. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one. In the exposure of the substrate P, the immersion space LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ. When the substrate P is irradiated with the exposure light EL, the immersion space LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ.

  In the following description, it is assumed that the object facing the emission surface 12 is the substrate P. As described above, the object that can face the emission surface 12 may be at least one of the substrate stage 2 and the measurement stage 3, or may be an object different from the substrate P, the substrate stage 2, and the measurement stage 3. Further, the immersion space LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2, or the immersion space LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3. In some cases.

  In the present embodiment, the liquid immersion member 5 includes a first member 61 disposed at least at a part of the periphery of the terminal optical element 13 and a second member 62 having a recovery port 64 for recovering the liquid LQ. . At least a part of the second member 62 is disposed below the first member 61. At least a part of the first member 61 is disposed at a position farther from the substrate P (object) than the second member 62. The second member 62 is disposed between at least a part of the first member 61 and the substrate P (object).

  In the present embodiment, the liquid immersion member 5 includes a supply port 63 that supplies the liquid LQ for forming the liquid immersion space LS. The supply port 63 is disposed inside the recovery port 64 with respect to the radiation direction with respect to the optical axis (optical path K) of the last optical element 13. In the present embodiment, the supply port 63 is disposed in the first member 61. The supply port 63 may be disposed in the second member 62, or may be disposed in both the first member 61 and the second member 62.

  In the present embodiment, the first member 61 is disposed on at least a part of the periphery of the last optical element 13 via a gap. In the present embodiment, the first member 61 is annular. In the present embodiment, a part of the first member 61 is disposed around the terminal optical element 13, and a gap loop is formed between the terminal optical element 13 and the first member 61. The shape of the gap may be circular or non-circular.

  In the present embodiment, a part of the first member 61 is disposed below the emission surface 12. That is, a part of the first member 61 is disposed around the optical path K between the emission surface 12 and the upper surface of the substrate P (object).

  The first member 61 includes a first portion 611 that is at least partially opposed to the exit surface 12 of the terminal optical element 13, and a second portion 612 that is disposed at least partially around the outer surface 16 of the terminal optical element 13. And a third portion 613 disposed around the second portion 612. The outer surface 16 of the last optical element 13 does not emit the exposure light EL. In other words, the exposure light EL does not pass through the outer surface 16. In the present embodiment, at least part of the periphery of the optical axis (optical path K) of the terminal optical element 13, the outer surface 16 is inclined upward toward the outside with respect to the radiation direction with respect to the optical axis (optical path K) of the terminal optical element 13. To do.

  The third portion 613 is disposed above the first portion 611. The third portion 613 is disposed outside the first portion 611 with respect to the radiation direction with respect to the optical axis (optical path K) of the terminal optical element 13.

  Note that the first member 61 may not have the first portion 611. For example, the first member 61 may be disposed above the emission surface 12. Further, the first member 61 may not have the second portion 612. For example, the first member 61 (the first portion 611 and the third portion 613) may be disposed below the emission surface 12.

  In the present embodiment, the first member 61 is supported by the device frame 8 </ b> B via the support device 50. In the present embodiment, the support device 50 and the third portion 613 are connected. The position of the device frame 8B is substantially fixed. The support device 50 supports the first member 61 above the substrate P (object). The support device 50 supports the first member 61 such that a gap is formed between the terminal optical element 13 and the first member 61. The position of the projection optical system PL (terminal optical element 13) is substantially fixed. The position of the first member 61 is also substantially fixed. That is, in this embodiment, the last optical element 13 and the first member 61 do not substantially move. The relative position between the last optical element 13 and the first member 61 does not change.

  The first member 61 has an opening 61H through which the exposure light EL emitted from the emission surface 12 can pass. The first portion 611 has an opening 61H. Further, the first member 61 has an upper surface 61A at least partially facing the emission surface 12, and a lower surface 61B facing the opposite direction of the upper surface 61A. The first portion 611 has an upper surface 61A and a lower surface 61B. The upper surface 61A and the emission surface 12 are opposed to each other through a gap. The substrate P (object) can face the lower surface 61B through a gap. The upper surface 61A is disposed around the upper end of the opening 61H. The lower surface 61B is disposed around the lower end of the opening 61H. In the present embodiment, the upper surface 61A is substantially parallel to the XY plane. The lower surface 61B is substantially parallel to the XY plane. The lower surface 61B can hold the liquid LQ with the substrate P (object).

  The first member 61 is disposed around the upper surface 61A, and has an inner surface 61C that faces the outer surface 16 of the last optical element 13, and an outer surface 61D that faces in the opposite direction of the inner surface 61C. The outer surface 61D is disposed around the lower surface 61B. The inner surface 61C and the outer surface 61D are disposed in the second portion 612. The outer surface 16 and the inner surface 61C are opposed to each other through a gap. The inner surface 61C and the outer surface 61D are inclined upward toward the outer side with respect to the radiation direction with respect to the optical axis (optical path K) of the terminal optical element 13. Note that at least one of the inner surface 61C and the outer surface 61D may be parallel to the optical axis of the last optical element 13 (parallel to the Z axis).

  The first member 61 has an upper surface 61E disposed around the inner surface 61C and a lower surface 61G facing in the opposite direction of the upper surface 61E. The third portion 613 has an upper surface 61E and a lower surface 61G. The lower surface 61G is disposed around the outer surface 61D. The outer surface 61D is disposed so as to connect the outer edge of the lower surface 61B and the inner edge of the lower surface 61G. In the present embodiment, the upper surface 61E and the lower surface 61G are substantially parallel to the XY plane, but may not be parallel.

  The second member 62 is movable with respect to the first member 61. Further, the second member 62 is movable with respect to the last optical element 13. That is, in the present embodiment, the relative position between the second member 62 and the first member 61 changes. The relative position between the second member 62 and the last optical element 13 changes.

  In the present embodiment, the second member 62 is rotatable in the direction of θZ. That is, the second member 62 can rotate around an axis parallel to the Z axis (for example, around the optical axis). In addition to the movement in the θZ direction, the second member 62 may be movable in at least one of the X axis, the Y axis, the Z axis, θX, and θY.

  The second member 62 is movable below at least a part of the first member 61. In the present embodiment, the second member 62 is movable below the third portion 613. In the present embodiment, the second member 62 is supported by the device frame 8B via the support device 50. The first member 61 may be supported by a member (frame) different from the device frame 8B. For example, the first member 61 may be supported by the reference frame 8A.

  With respect to the direction parallel to the optical axis of the last optical element 13, at least a part of the second member 62 is arranged to be movable (rotated) between the first member 61 and the substrate P (object). The second member 62 can move (rotate) between the first member 61 and the substrate P (object). In the present embodiment, the second member 62 can move (rotate) in parallel with at least a part of the movement of the substrate P (object). In the present embodiment, the second member 62 can move (rotate) in a state where the immersion space LS is formed. The second member 62 can move (rotate) in a state where the liquid LQ exists in at least a part of the space between the second member 62 and the substrate P (object). The second member 62 can move (rotate) in coordination with the movement of the substrate P (object), or can move (rotate) independently of the substrate P (object).

  The second member 62 may move (rotate) when the second member 62 and the substrate P (object) do not face each other. In other words, the second member 62 may move (rotate) when there is no object below the second member 62. The second member 62 may move (rotate) when the liquid LQ does not exist in the space between the second member 62 and the substrate P (object). For example, the second member 62 may move (rotate) when the immersion space LS is not formed.

  In the present embodiment, the second member 62 is disposed on at least a part of the periphery of the terminal optical element 13. In this embodiment, the 2nd member 62 is arrange | positioned through the 1st member 61 and a gap | interval. The second member 62 is disposed on at least a part of the periphery of the first member 61 with a gap. The second member 62 is disposed below at least a part of the first member 61 with a gap therebetween.

  In the present embodiment, the second member 62 is annular. In the present embodiment, the second member 62 has an opening 66. The exposure light EL can pass through the opening 66 of the second member 62. In the present embodiment, at least a part of the first member 61 can be disposed in the opening 66 of the second member 62. In the present embodiment, the second member 62 is disposed around the second portion 612 below the third portion 613. The second member 62 is disposed such that a gap is formed between the second portion 612 and the third portion 613.

  For example, as shown in FIG. 3, in the present embodiment, the second member 62 has an annular shape. In the present embodiment, the opening 66 is substantially circular.

  In the present embodiment, the second member 62 has an upper surface 62A that faces the lower surface 61G of the first member 61, and a lower surface 62B that faces the opposite direction of the upper surface 62A. The upper surface 62A is disposed around the upper end of the opening 66. The lower surface 62 </ b> B is disposed around the lower end of the opening 66. The lower surface 62B can face the substrate P (object). The lower surface 61G of the first member 61 and the upper surface 62A of the second member 62 oppose each other via a gap. The substrate P (object) can face the lower surface 62B through a gap. In the present embodiment, the second member 62 can move (rotate) below the lower surface 61 </ b> G of the first member 61 via the first member 61 and a gap.

  In the present embodiment, the second member 62 is disposed around the outer surface 61 </ b> D of the first member 61. In the present embodiment, the second member 62 has an inner surface 62 </ b> C disposed around the outer surface 61 </ b> D of the first member 61. The inner surface 62C connects the inner edge of the upper surface 62A and the inner edge of the lower surface 62B. In the present embodiment, the inner surface 62C is inclined upward toward the outside with respect to the radiation direction with respect to the optical axis (optical path K) of the terminal optical element 13. The inner surface 62C may be parallel to the optical axis of the last optical element 13 (parallel to the Z axis). The second member 62 has an outer surface 62D that connects the outer edge of the upper surface 62A and the outer edge of the lower surface 62B.

  The second member 62 moves (rotates) in the space around the outer surface 61D. The second member 62 moves (rotates) in a space around the outer surface 61 </ b> D so as not to contact the first member 61.

  In the present embodiment, the first member 61 and at least a part of the second member 62 may contact each other.

  In the present embodiment, the second member 62 moves around an axis parallel to the optical axis of the last optical element 13. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis. The second member 62 may move around the optical axis of the terminal optical element 13, or may move around an axis parallel to the Z axis away from the optical axis of the terminal optical element 13.

  As described above, the second member 62 can rotate around an axis parallel to the optical axis of the last optical element 13. The second member 62 may rotate about the optical axis of the terminal optical element 13 or may rotate about an axis parallel to the Z axis away from the optical axis of the terminal optical element 13.

  In the following description, as an example, it is assumed that the second member 62 is rotatable around the optical axis of the last optical element 13.

  As shown in FIG. 3, the exposure apparatus EX includes a drive system 43 that moves the second member 62. The drive system 43 can rotate the second member 62 around the optical axis of the last optical element 13. In the example shown in FIG. 3, the drive system 43 includes a connection member 43C connected to the outer surface 62D of the second member 62, a first gear member 44 connected to the connection member 43C, and a first gear member 44 engaged with the first gear member 44. It has a two-gear member 45 and a motor 46 that can rotate the second gear member 45. A plurality of teeth of the first gear member 44 are arranged on at least a part of the periphery of the optical axis of the last optical element 13. When the second gear member 45 is rotated by the operation of the motor 46, the first gear member 44 moves around the optical axis of the last optical element 13. As a result, the second member 62 connected to the first gear member 44 via the connecting member 43C rotates around the optical axis of the last optical element 13 in the θZ direction.

  In addition, the drive system 43 is not restricted to the form shown in FIG. In addition to the θZ direction, the drive system 43 may be configured to move the second member 62 in at least one direction of the X axis, the Y axis, the Z axis, θX, and θY.

  The supply port 63 is connected to the liquid supply device via a supply channel formed inside the first member 61. The supply port 63 supplies the liquid LQ from the liquid supply device in order to form the immersion space LS. In the present embodiment, the supply port 63 is disposed on the inner surface 61C so as to face the gap between the emission surface 12 and the upper surface 61A. The supply port 63 may be disposed on the inner surface 61C so as to face the gap between the outer surface 16 and the inner surface 61C. The liquid LQ supplied from the supply port 63 is supplied onto the substrate P (object) through the opening 61H.

  In the present embodiment, the collection port 64 of the second member 62 is arranged so that the substrate P (object) faces each other. The recovery port 64 is connected to the liquid recovery device via a recovery flow path (space) 67 formed inside the second member 62. The liquid recovery apparatus can connect the recovery port 64 and the vacuum system. The recovery port 64 can recover at least a part of the liquid LQ in the immersion space LS.

  In the present embodiment, the second member 62 includes a porous member 65. The collection port 64 includes a hole of the porous member 65. In the present embodiment, the porous member 65 includes a mesh plate. The porous member 65 has a lower surface to which the substrate P (object) can face, an upper surface facing the recovery flow path 67, and a plurality of holes connecting the lower surface and the upper surface. The liquid LQ on the substrate P (object) recovered from the recovery port 64 (hole of the porous member 65) flows into the recovery flow path 67.

  In the present embodiment, the second member 62 is disposed so as to face the recovery channel 67, and faces the recovery channel 67 and the first discharge port 68 that can discharge the liquid LQ of the recovery channel 67. And a second discharge port 69 that is disposed and capable of discharging the gas in the recovery passage 67. The first discharge port 68 is suppressed (restricted) from discharging gas from the first discharge port 68. The second discharge port 69 is suppressed (restricted) from discharging the liquid LQ from the second discharge port 69.

  In the present embodiment, the liquid LQ on the substrate P (object) recovered from the recovery port 64 flows into the recovery channel 67 and is then discharged from the first discharge port 68. The liquid recovery device is connected to the first discharge port 68. The liquid LQ on the substrate P (object) recovered from the recovery port 64 is recovered by the liquid recovery device via the first discharge port 68. The second exhaust port 69 can be connected to a gas recovery device including a vacuum system, and the gas in the recovery flow path 67 is recovered to the gas recovery device via the second exhaust port 69.

  In the present embodiment, the first discharge port 68 is disposed in the first discharge member 71. The second discharge port 69 is disposed in the second discharge member 72. In the present embodiment, the first discharge member 71 includes a porous member 71T. The first discharge port 68 includes a hole of the porous member 71T. The first discharge member 71 and the second discharge member 72 are supported by the first member 61.

  FIG. 5 is a view showing a part of the upper surface 62 </ b> A of the second member 62. In the present embodiment, the second member 62 has an opening 71K in which the first discharge member 71 is disposed and an opening 72K in which the second discharge member 72 is disposed. The dimension of the opening 71 </ b> K is larger than the dimension of the outer shape of the first discharge member 71. The dimension of the opening 72 </ b> K is larger than the dimension of the outer shape of the second discharge member 72. The opening 71K and the opening 72K are arcuate. When the second member 62 moves (rotates) around the optical axis of the last optical element 13, the first discharge member 71 can move inside the opening 71K, and the second discharge member 72 can move inside the opening 72K. Is movable. Thereby, the 2nd member 62 can move (rotate) in the state where the 1st and 2nd discharge members 71 and 72 are arranged in openings 71K and 72K.

  In the present embodiment, the recovery operation of the liquid LQ from the recovery port 64 is executed in parallel with the supply operation of the liquid LQ from the supply port 63, so that the terminal optical element 13 and the liquid immersion member 5 on one side are performed. And an immersion space LS is formed with the liquid LQ between the substrate P (object) on the other side.

  A part of the interface LG of the liquid LQ in the immersion space LS is formed between the second member 62 and the substrate P (object). In the present embodiment, a part of the interface LG of the liquid LQ in the immersion space LS is formed between the inner surface 61C of the first member 61 and the outer surface 16 of the terminal optical element 13.

  In the following description, the interface LG of the liquid LQ formed between the second member 62 and the substrate P (object) is appropriately referred to as a first interface LG1, and is between the first member 61 and the last optical element 13. The interface LG of the liquid LQ formed in the above is appropriately referred to as a third interface LG3.

  In the present embodiment, the control device 6 moves (rotates) the second member 62 in parallel with at least a part of the movement of the substrate P (object) based on, for example, the movement condition of the substrate P (object).

  The second member 62 can recover the liquid LQ from the recovery port 64 while moving (rotating). The control device 6 moves (rotates) the second member 62 in parallel with the recovery of the liquid LQ from the recovery port 64. The control device 6 moves (rotates) the second member 62 while supplying the liquid LQ from the supply port 63 and recovering the liquid LQ from the recovery port 64 so that the immersion space LS is continuously formed. .

  As described above, the second member 62 can move in the θZ direction in the state where the immersion space LS is formed. The second member 62 can move (rotate) between the first member 61 (third portion 613) and the substrate P (object) in a state where the immersion space LS is formed.

  In the present embodiment, the second member 62 rotates so that the relative movement with the substrate P (object) becomes small. The second member 62 rotates so that the relative movement between the second member 62 and the substrate P (object) is smaller than the relative movement between the first member 61 and the substrate P (object). For example, the second member 62 may move in synchronization with the substrate P (object).

  The relative movement includes at least one of a relative speed and a relative acceleration. For example, the second member 62 may rotate so that the relative speed with respect to the substrate P (object) becomes small in a state where the immersion space LS is formed. Further, the second member 62 may rotate so that the relative acceleration with respect to the substrate P (object) becomes small in a state where the immersion space LS is formed. Further, the second member 62 is configured such that the relative speed between the second member 62 and the substrate P (object) is smaller than the relative speed between the first member 61 and the substrate P (object) in the state where the immersion space LS is formed. It may be rotated. The second member 62 is such that the relative acceleration between the substrate P (object) and the first member 61 and the substrate P (object) is smaller than that in the state where the immersion space LS is formed. It may be rotated.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  At a substrate exchange position away from the liquid immersion member 5, a process of loading (loading) the substrate P before exposure into the substrate stage 2 (first holding unit) is performed. In addition, the measurement stage 3 is disposed so as to face the last optical element 13 and the liquid immersion member 5 in at least a part of the period in which the substrate stage 2 is separated from the liquid immersion member 5. The control device 6 supplies the liquid LQ from the supply port 63 and recovers the liquid LQ from the recovery port 64 to form the immersion space LS on the measurement stage 3.

  After the substrate P before exposure is loaded onto the substrate stage 2 and the measurement process using the measurement stage 3 is completed, the control device 6 causes the last optical element 13 and the liquid immersion member 5 to face the substrate stage 2 (substrate P). Then, the substrate stage 2 is moved. The recovery of the liquid LQ from the recovery port 64 is performed in parallel with the supply of the liquid LQ from the supply port 63 in a state where the last optical element 13 and the liquid immersion member 5 and the substrate stage 2 (substrate P) face each other. Thus, an immersion space LS is formed between the last optical element 13 and the immersion member 5 and the substrate stage 2 (substrate P) so that the optical path K is filled with the liquid LQ.

  The control device 6 starts the exposure process for the substrate P. The control device 6 emits the exposure light EL from the illumination system IL in a state where the immersion space LS is formed on the substrate P. The illumination system IL illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is irradiated onto the substrate P via the projection optical system PL and the liquid LQ in the immersion space LS between the emission surface 12 and the substrate P. As a result, the substrate P is exposed with the exposure light EL emitted from the emission surface 12 through the liquid LQ in the immersion space LS, and the pattern image of the mask M is projected onto the substrate P.

    The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 6 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction.

  FIG. 6 is a diagram illustrating an example of the substrate P held on the substrate stage 2. In the present embodiment, a plurality of shot areas S, which are exposure target areas, are arranged in a matrix on the substrate P. The control device 6 sequentially exposes the plurality of shot regions S of the substrate P held by the first holding unit with the exposure light EL through the liquid LQ in the immersion space LS.

  For example, in order to expose the first shot region S of the substrate P, the control device 6 allows the substrate P (first shot region S) to be projected onto the projection region PR of the projection optical system PL while the immersion space LS is formed. The projection optical system moves in the Y-axis direction while moving the mask M in the Y-axis direction with respect to the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. The first shot region S is irradiated with the exposure light EL through the PL and the liquid LQ in the immersion space LS on the substrate P. Thereby, the pattern image of the mask M is projected onto the first shot area S of the substrate P, and the first shot area S is exposed with the exposure light EL emitted from the emission surface 12. After the exposure of the first shot region S is completed, the control device 6 moves the substrate P in the XY plane in a state where the immersion space LS is formed in order to start the exposure of the next second shot region S. The second shot area S is moved to the exposure start position by moving in the direction intersecting the X axis (for example, the X axis direction or a direction inclined with respect to the X axis and Y axis directions in the XY plane). Thereafter, the control device 6 starts exposure of the second shot region S.

  In the state where the immersion space LS is formed on the substrate P (substrate stage 2), the control device 6 sets the shot region with respect to the position (projection region PR) irradiated with the exposure light EL from the emission surface 12. An operation of exposing the shot area while moving in the Y-axis direction, and after the exposure of the shot area, the next shot area is exposed in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The substrate P is moved in a direction intersecting the Y-axis direction in the XY plane (for example, the X-axis direction or a direction inclined with respect to the X-axis and Y-axis directions in the XY plane) so as to be arranged at the start position. The plurality of shot areas of the substrate P are sequentially exposed while repeating the operation.

  In the following description, in order to expose the shot area, a position (projection area) where the exposure light EL from the emission surface 12 is irradiated in a state where the immersion space LS is formed on the substrate P (substrate stage 2). The operation of moving the substrate P (shot region) in the Y-axis direction with respect to (PR) is appropriately referred to as a scan movement operation. Further, after the exposure of a certain shot area is completed, in the state where the immersion space LS is formed on the substrate P (substrate stage 2), the exposure of the next shot area is started in the XY plane. The operation of moving the substrate P is appropriately referred to as a step movement operation. The control device 6 sequentially exposes the plurality of shot regions S of the substrate P while repeating the scan movement operation and the step movement operation. The scan movement operation is a constant speed movement exclusively in the Y-axis direction. The step movement operation includes acceleration / deceleration movement. For example, the step movement operation between two shot areas adjacent in the X-axis direction includes acceleration / deceleration movement in the Y-axis direction and acceleration / deceleration movement in the X-axis direction.

  In at least a part of the scan movement operation and the step movement operation, at least a part of the immersion space LS may be formed on the substrate stage 2 (cover member T).

  The control device 6 moves the substrate P (substrate stage 2) by controlling the drive system 15 based on the exposure conditions of the plurality of shot regions S on the substrate P. The exposure conditions for the plurality of shot areas S are defined by, for example, exposure control information called an exposure recipe. The exposure control information is stored in the storage device 7. Based on the exposure conditions stored in the storage device 7, the control device 6 sequentially exposes the plurality of shot areas S while moving the substrate P under a predetermined movement condition. The movement condition of the substrate P (object) includes at least one of movement speed, acceleration, movement distance, movement direction, and movement locus in the XY plane.

  As an example, the control device 6 projects while moving the substrate stage 2 so that the projection region PR of the projection optical system PL and the substrate P move relatively along the movement locus indicated by the arrow Sr in FIG. The region PR is irradiated with the exposure light EL, and the plurality of shot regions S of the substrate P are sequentially exposed with the exposure light EL through the liquid LQ.

  Thereafter, the above processing is repeated, and a plurality of substrates P are sequentially exposed.

  In the present embodiment, the second member 62 moves in at least a part of the exposure processing of the substrate P. The second member 62 moves relative to the substrate P (substrate stage 2) (relative speed) when the substrate P (substrate stage 2) performs a scan movement operation and a step movement operation in a state where the immersion space LS is formed. , Move (rotate) so that the relative acceleration becomes small.

  FIG. 7 is a diagram schematically illustrating an example of the movement locus of the substrate P when the shot area Sa, the shot area Sb, and the shot area Sc are sequentially exposed.

  As shown in FIG. 7, when the shot area Sa is exposed, the substrate P has a path Tp1 from the position d1 to the position d2 adjacent to the −Y side with respect to the position d1 below the terminal optical element 13, The path Tp2 from the position d2 to the position d3 adjacent to the −X side with respect to the position d2, the path Tp3 from the position d3 to the position d4 adjacent to the + Y side with respect to the position d3, and the position d4 to the position d4. On the other hand, the path Tp4 to the position d5 adjacent to the −X side and the path Tp5 from the position d5 to the position d6 adjacent to the −Y side with respect to the position d5 are sequentially moved. The positions d1, d2, d3, d4, d5, and d6 are positions in the XY plane.

  At least a part of the path Tp1 is a straight line parallel to the Y axis. At least a part of the path Tp3 is a straight line parallel to the Y axis. At least a part of the path Tp5 includes a straight line parallel to the Y axis. The path Tp2 includes a curve. The path Tp4 includes a curve. The position d1 includes the start point of the path Tp1, and the position d2 includes the end point of the path Tp1. The position d2 includes the start point of the path Tp2, and the position d3 includes the end point of the path Tp2. The position d3 includes the start point of the path Tp3, and the position d4 includes the end point of the path Tp3. The position d4 includes the start point of the path Tp4, and the position d5 includes the end point of the path Tp4. The position d5 includes the start point of the path Tp5, and the position d6 includes the end point of the path Tp5. The path Tp1 is a path along which the substrate P moves in the −Y direction. The path Tp3 is a path along which the substrate P moves in the + Y direction. The path Tp5 is a path along which the substrate P moves in the −Y direction.

  When the substrate P moves along the path Tp1 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sa through the liquid LQ. The operation in which the substrate P moves along the path Tp1 includes a scan movement operation. Further, when the substrate P moves along the path Tp3 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sb through the liquid LQ. The operation in which the substrate P moves along the path Tp3 includes a scan movement operation. Further, when the substrate P moves along the path Tp5 in the state where the immersion space LS is formed, the exposure light EL is irradiated to the shot region Sc through the liquid LQ. The operation in which the substrate P moves along the path Tp5 includes a scan movement operation. The operation of moving the substrate P along the path Tp2 and the operation of moving along the path Tp4 include a step movement operation.

  FIG. 8 is a schematic diagram illustrating an example of the operation of the second member 62. In the present embodiment, the second member 62 rotates so that the relative speed with respect to the substrate P (object) decreases when the substrate P (object) moves at least part of the path Tp2. The second member 62 rotates so that the relative speed with respect to the substrate P (object) decreases when the substrate P (object) moves at least part of the path Tp4. That is, the second member 62 rotates so that the relative speed with respect to the substrate P (object) becomes small when the step movement operation is performed in the state where the immersion space LS is formed. In other words, the second member 62 rotates in parallel with at least a part of the step movement operation of the substrate P (object).

  For example, when the substrate P (object) moves along the path Tp2, as shown in FIG. 8A, the control device 6 causes the second member so that the relative speed between the second member 62 and the substrate P decreases. 62 is rotated. Further, when the substrate P (object) moves along the path Tp4, as shown in FIG. 8B, the control device 6 causes the second member so that the relative speed between the second member 62 and the substrate P becomes small. 62 is rotated.

  That is, in the example shown in FIGS. 7 and 8, when the substrate P moves in the −Y direction while moving in the −X direction, and then moves along the path Tp2 that moves in the + Y direction while moving in the −X direction, The two members 62 rotate about 90 degrees in the clockwise direction around the optical axis of the last optical element 13 so that the relative speed with the substrate P becomes small. When the substrate P moves in the + Y direction while moving in the −X direction, and then moves along the path Tp4 that moves in the −Y direction while moving in the −X direction, the second member 62 is relative to the substrate P. It rotates about 90 degrees in the counterclockwise direction around the optical axis of the last optical element 13 so as to reduce the speed.

  In the following description, a clockwise direction around an axis parallel to the Z axis is appropriately referred to as a + θZ direction, and a counterclockwise direction is appropriately referred to as a −θZ direction.

  The second member 62 may move (rotate) during the entire period when the substrate P (object) performs the step movement operation, or may move (rotate) during a part of the period. . For example, as shown in the schematic diagram of FIG. 9, the second member 62 may rotate during a partial period when the substrate P performs a step movement operation. As shown in FIG. 9, in the path (Tp2, Tp4, etc.) where the step movement operation is performed, the substrate P (object) moves in the −Y direction while moving in the + X direction, for example, and then moves in the + X direction. Move in + Y direction. The −Y direction is the reverse direction of the + Y direction. The second member 62 may start rotating when the substrate P starts moving in the + Y direction, and may end rotating when the substrate P ends moving in the + X direction. That is, in FIG. 9, when the substrate P moves along the path TpS including the step movement operation, the second member 62 rotates in the −θZ direction only during a part of the period TpSp when performing the step movement operation. Good. The starting point da of the path TpSp includes a position where the substrate P starts to move in the + Y direction. The end point db of the path TpSp includes a position where the substrate P finishes moving in the + X direction.

  For example, as shown in FIG. 10, after sequentially exposing the shot area Sd, the shot area Se, and the shot area Sf arranged in the X-axis direction, the shot area Se and Sd are arranged in the X-axis direction. Even when the shot area Sh and the shot area Si are sequentially exposed, the second member 62 can be rotated. For example, when the substrate P moves along the path Tp6 in the step movement operation, the second member 62 is rotated about 90 degrees in the -θZ direction, and when the substrate P moves along the path Tp8, the second member 62 is moved in the + θZ direction. The second member 62 may be rotated about 90 degrees in the + θZ direction when the substrate P moves along the path Tp10. Note that the second member 62 may be rotated by about 90 degrees in the -θZ direction when the substrate P is moving along the path Tp9 between the path Tp8 and the path Tp10.

  In the present embodiment, the second member 62 is rotated about 90 degrees in the + θZ direction and about 90 degrees in the −θZ direction, but the movement condition of the substrate P (object) is repeated. Based on the above, the second member 62 may continue to rotate in the + θZ direction, or may continue to rotate in the −θZ direction.

  As described above, according to the present embodiment, since the second member 62 having the recovery port 64 movable (rotated) below the first member 61 is provided, the liquid immersion space LS is formed. Thus, even if an object such as the substrate P moves in the XY plane, for example, the liquid LQ is prevented from flowing out of the space between the liquid immersion member 5 and the object, or the liquid remaining on the object. . In addition, generation of bubbles (gas portion) in the liquid LQ in the immersion space LS is also suppressed.

  Further, by moving the second member 62 so that the relative movement (relative speed, relative acceleration) with the object becomes small, even if the object moves at a high speed while the immersion space LS is formed, It is possible to prevent the liquid LQ from flowing out, the liquid LQ from remaining, or the generation of bubbles in the liquid LQ.

  Therefore, the occurrence of defective exposure and the occurrence of defective devices can be suppressed.

  In the present embodiment, since the first member 61 is disposed at least at a part of the periphery of the terminal optical element 13, the object moves or the second member is in a state where the immersion space LS is formed. Even when 62 moves, it is possible to prevent the pressure from changing between the last optical element 13 and the first member 61 and the shape of the third interface LG3 of the liquid LQ from greatly changing. Therefore, for example, the generation of bubbles in the liquid LQ and the excessive force acting on the last optical element 13 are suppressed. In the present embodiment, since the first member 61 does not substantially move, the pressure varies greatly between the last optical element 13 and the first member 61, or the shape of the third interface LG3 of the liquid LQ is changed. Large fluctuations are suppressed.

  The first member 61 may be movable. The first member 61 may move in at least one of the six directions of the X axis, the Y axis, the Z axis, θX, θY, and θZ. The first member 61 may move independently of the second member 62. For example, even if the first member 61 is moved in order to adjust the positional relationship between the terminal optical element 13 and the first member 61 or to adjust the positional relationship between the first member 61 and the second member 62. Good. Further, the first member 61 may be moved in parallel with at least a part of the movement of the substrate P (object). For example, it may be moved (rotated, etc.) by a shorter distance than the second member 62 in the XY plane. Further, the first member 61 may move (rotate or the like) at a lower speed than the second member 62. Further, the first member 61 may move (rotate or the like) at a lower acceleration than the second member 62.

Second Embodiment
A second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  11 and 12 are diagrams illustrating an example of the first member 610 and the second member 620 according to the present embodiment. As shown in FIGS. 11 and 12, in the present embodiment, the lower surface 620 </ b> B is disposed on the second member 620. The second member 620 has an opening 620H through which the exposure light EL from the emission surface 12 passes. The lower surface 620B is disposed around the opening 620H. As the second member 620 moves, the lower surface 620B also moves. For example, when the second member 620 rotates, the lower surface 620B also rotates.

  In the present embodiment, the opening 620H is circular. Thereby, even if the lower surface 620B (opening 620H) rotates, the exposure light EL from the emission surface 12 can be applied to the substrate P (object).

  Also in the present embodiment, the second member 620 can recover the liquid LQ while moving. Also in the present embodiment, the occurrence of exposure failure is suppressed by moving the second member 620.

<Third Embodiment>
A third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 is a diagram illustrating an example of the first member 613 and the second member 623 according to the present embodiment. The second member 623 has a lower surface 623B. The lower surface 623B is disposed around the opening 623H through which the exposure light EL from the emission surface 12 passes.

  In the present embodiment, the outer shape of the lower surface 623B is a polygon. In the present embodiment, the outer surface of the lower surface 623B is a hexagon.

  In the present embodiment, the lower surface 623B includes a guide portion 60 that can guide at least a part of the liquid LQ in the immersion space LS to the guide space 60S. The guide portion 60 includes, for example, a part (side) of the outer shape of the lower surface 623B. When the substrate P (object) moves in the XY plane with the immersion space LS formed, at least a part of the liquid LQ in the immersion space LS is guided to the guide space 60S.

  In the present embodiment, the lower surface 623B rotates so that the liquid LQ is guided in the moving direction of the substrate P (object). In the present embodiment, the guide space 60S is positioned in the moving direction of the substrate P (object).

  For example, as shown in the schematic diagram of FIG. 14, when the substrate P moves along the path Tp14 and the path Tp15, at least a part of the liquid LQ in the immersion space LS is guided in the moving direction of the substrate P (object). In addition, the lower surface 623B (second member 623) rotates. The operation in which the substrate P moves along the path Tp14 includes a step movement operation. The operation in which the substrate P moves along the path Tp15 includes a scan movement operation. 14 shows the second member 623 when the substrate P is viewed from the upper surface 623A facing the exit surface 12 when the substrate P is disposed at each of the positions dc, dd, de, and df of the paths Tp14 and Tp15. An example is shown schematically.

  By rotating the lower surface 623B so that the liquid LQ is guided in the moving direction of the substrate P, for example, thinning of the liquid LQ flowing out of the space between the lower surface 623B and the upper surface of the substrate P is suppressed. As a result, the liquid LQ flowing out from the space between the lower surface 623B and the upper surface of the substrate P is smoothly recovered from the recovery port 64. Further, the liquid LQ remaining on the substrate P is also suppressed. Further, a large variation in the shape of the immersion space LS (the shape of the first interface LG1) is suppressed.

<Fourth embodiment>
A fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  15 and 16 are schematic views showing an example of the liquid immersion member 504 according to this embodiment. FIGS. 15A and 16A are views of the liquid immersion member 504 viewed from below. FIG. 15B and FIG. 16B are side sectional views showing a part of the liquid immersion member 504.

  In the present embodiment, the outer shape of the lower surface 504B changes so that the liquid LQ in the immersion space LS is guided in the moving direction of the substrate P (object).

  In the present embodiment, the lower surface 504B includes the lower surfaces of a plurality of plate members. In the example shown in FIGS. 15 and 16, the lower surface 504 </ b> B is formed by at least a part of the lower surface 624 </ b> A of the first plate member 6241 and at least a part of the lower surface 624 </ b> B of the second plate member 6242.

  Note that the recovery port 64 (porous member 65) is disposed at least partially around the lower surface 504B. The collection port 64 (porous member 65) is disposed around the opening 504K through which the exposure light EL from the emission surface 12 can pass. Each of the first and second plate members 6241 and 6242 has 6241K and 6242K through which the exposure light EL from the emission surface 12 can pass.

  Each of the first and second plate members 6241 and 6242 is rotatable. The outer shape of the lower surface 504B changes depending on the positions of the first and second plate members 6241 and 6242. For example, the lower surface 504B can change from one of the state shown in FIG. 15 and the state shown in FIG.

  The control device 6 rotates at least one of the first plate member 6241 and the second plate member 6242 based on the moving direction of the substrate P (object). As a result, the angles of the sides of the first and second plate members 6241 and 6242 change, and the liquid LQ can be guided in a direction corresponding to the sides.

<Fifth Embodiment>
A fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 17 is a schematic diagram illustrating an example of the liquid immersion member 505 according to the present embodiment. FIG. 17A is a view of the liquid immersion member 505 as viewed from below. FIG. 17B is a side sectional view showing a part of the liquid immersion member 505. As shown in FIG. 17, the member 5050 having the lower surface 505B may move in the normal direction (Z-axis direction) of the lower surface.

  Further, when the lower surface 506B is formed by the lower surfaces of a plurality of members as in the liquid immersion member 506 shown in FIG. 18, the positions of the plurality of members in the Z-axis direction may change. In the example shown in FIG. 18, the lower surface 506B is formed by the lower surface 626A of the first plate member 6261 and the lower surface 626B of the second plate member 6262. The second plate member 6262 is disposed around the first plate member 6261. The first plate member 6261 is movable in the Z-axis direction. The second plate member 6262 is also movable in the Z-axis direction.

  Further, like the liquid immersion member 507 shown in FIG. 19, the lower surface 507B may be inclined based on the moving direction of the substrate P (object).

  As shown in FIG. 20, when the substrate P (object) moves in the −Y direction, the −Y side portion of the space between the lower surface 507B and the upper surface of the substrate P is more than the + Y side portion. The lower surface 507B may be inclined so as to increase. Further, as shown in FIG. 21, when the substrate P (object) moves in the −Y direction, the −Y side portion of the space between the lower surface 507B and the upper surface of the substrate P is more than the + Y side portion. The lower surface 507B may be inclined so as to be smaller.

  As shown in FIG. 22, the lower surface 508B may have a concave portion (groove portion) 508K or may have a convex portion. For example, as shown in FIG. 22, when the lower surface 508B has a recess 508K, the direction in which the liquid LQ flows out is limited. Therefore, thinning of the liquid LQ is suppressed, and the liquid LQ is smoothly recovered from the recovery port 64.

  In the first to fifth embodiments described above, the first member (such as 61) may move (rotate, etc.) together with the second member (such as 62). Further, the first member (such as 61) and the second member (such as 62) may be integrated.

  In the above-described embodiment, the second member (62 and the like) is an annular member surrounding the optical axis of the last optical element 13, but a plurality of second members are arranged around the optical axis. May be. Further, the plurality of second members may move independently. Moreover, some 2nd members move among some 2nd members, and some 2nd members do not need to move.

  Further, the second member (such as 62) may not include the porous member 65. That is, the liquid LQ may be collected without the second member (62) or the like being interposed through the porous member. Further, the second member (such as 62) may not include the first discharge port 68 and the second discharge port 69 separately. For example, the liquid LQ and the gas may be discharged from the recovery channel 67.

  In the above-described embodiment, the control device 6 includes a computer system including a CPU and the like. The control device 6 includes an interface capable of executing communication between the computer system and an external device. The storage device 7 includes a memory such as a RAM, and a recording medium such as a hard disk and a CD-ROM. The storage device 7 is installed with an operating system (OS) that controls the computer system, and stores a program for controlling the exposure apparatus EX.

  Note that an input device capable of inputting an input signal may be connected to the control device 6. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various information including programs recorded in the storage device 7 can be read by the control device (computer system) 6. In the storage device 7, liquid immersion exposure is performed in which the control device 6 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  According to the above-described embodiment, the program recorded in the storage device 7 causes the control device 6 to form an immersion space so that the optical path of the exposure light emitted from the emission surface of the optical member is filled with the liquid. Exposing the substrate with exposure light emitted from the exit surface through the liquid in the immersion space, and disposed below the first member disposed at least at a part of the periphery of the optical member. The second member having a recovery port for recovering at least a part of the liquid may be moved.

  When the program stored in the storage device 7 is read into the control device 6, various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate to form a liquid immersion space. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ. The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ, as disclosed in Japanese Patent Publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ is water, but a liquid other than water may be used. The liquid LQ is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, U.S. Pat. No. 6,611,316 on the substrate via the projection optical system, and the substrate is subjected to one scanning exposure. An exposure apparatus that double-exposes one shot area almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the embodiments described above, the exposure apparatus EX includes a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. A twin stage type exposure apparatus provided with For example, as shown in FIG. 23, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaping mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in US Pat. No. 6,778,257 ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion space between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 24, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 3 ... Measurement stage, 5 ... Liquid immersion member, 6 ... Control apparatus, 7 ... Memory | storage device, 12 ... Ejection surface, 13 ... Terminal optical element, 61 ... 1st member, 61B ... Lower surface, 61C ... Inner surface 61D ... outer surface, 61G ... lower surface, 61H ... opening, 62 ... second member, 62A ... upper surface, 62B ... lower surface, 62C ... inner surface, 63 ... supply port, 64 ... recovery port, 65 ... porous member, 43 ... drive system , EL: exposure light, EX: exposure apparatus, IL: illumination system, K: optical path, LQ: liquid, LS: immersion space, P: substrate.

Claims (39)

An immersion member that forms an immersion space on the upper side of the optical member so that the optical path of the exposure light emitted from the emission surface of the optical member is filled with the liquid,
A first member disposed on at least a part of the periphery of the optical member;
A liquid immersion member comprising: a second member that is movable below the first member and has a recovery port that recovers at least a part of the liquid in the liquid immersion space.   The liquid immersion member according to claim 1, wherein the movement of the second member includes rotation around an axis parallel to the optical axis of the optical member.   The liquid immersion member according to claim 2, wherein the second member is movable substantially parallel to the predetermined surface.   The liquid immersion member according to claim 2 or 3, wherein the second member is rotatable between the first member and the object.   The second member according to claim 2, wherein the second member rotates in parallel with at least a part of the movement of the object in a state where the liquid exists in at least a part of a space between the second member and the object. The liquid immersion member according to any one of claims.   The liquid immersion member according to any one of claims 1 to 5, wherein the second member is disposed at least at a part around the optical member and the first member.   The liquid immersion member according to claim 1, wherein the second member is movable while recovering the liquid from the recovery port.   The liquid immersion member according to claim 1, wherein the first member is disposed at least at a part of the periphery of the optical member via a gap.   The liquid recovery member according to claim 1, wherein the recovery port is disposed so that the object is opposed to the recovery port. The second member includes a porous member,
The liquid recovery member according to claim 1, wherein the recovery port includes a hole of the porous member.   The liquid immersion member according to claim 1, further comprising a supply port that supplies a liquid for forming the liquid immersion space.   The liquid immersion member according to claim 11, wherein the supply port is disposed inside the recovery port with respect to a radial direction with respect to the optical path.   The liquid supply member according to claim 11, wherein the supply port is disposed in the first member.   The liquid immersion member according to any one of claims 1 to 13, wherein the first member does not substantially move.   The liquid immersion member according to claim 1, wherein the first member is movable with respect to the optical member.   The liquid immersion member according to claim 15, wherein the first member is movable separately from the second member.   The liquid immersion member according to claim 15, wherein the first member moves together with the second member. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the liquid immersion member according to claim 1.   The exposure apparatus according to claim 18, wherein the second member moves so that a relative speed with respect to the object decreases.   The exposure apparatus according to claim 18 or 19, wherein the second member moves such that a relative speed between the second member and the object is smaller than a relative speed between the first member and the object.   21. The exposure apparatus according to any one of claims 18 to 20, wherein the second member moves in synchronization with the object. In the state where the immersion space is formed, the object has a first path parallel to the first axis in the predetermined plane, and a first path orthogonal to the first axis from a first position of the end point of the first path. Sequentially moving a second path including a curve to a second position adjacent to one side of the first position with respect to a direction parallel to two axes;
The exposure according to any one of claims 18 to 21, wherein the second member rotates so that a relative speed with respect to the object decreases when the object moves along at least a part of the second path. apparatus. In the second path, the object moves in a second direction parallel to the second axis while moving in a first direction parallel to the first axis, and then moves in the second direction. Move in the opposite direction,
23. The second member according to claim 22, wherein the second member starts the rotation when the object starts moving in the reverse direction, and ends the rotation when the object ends the movement in the second direction. Exposure device.   The said liquid immersion member is arrange | positioned around the opening which the said exposure light inject | emitted from the said emission surface can pass, and has the lower surface which can hold | maintain the said liquid between the said objects. The exposure apparatus according to one item.   25. The exposure apparatus according to claim 24, wherein a lower surface of the liquid immersion member is disposed on the second member.   The exposure apparatus according to claim 24, wherein a lower surface of the liquid immersion member is disposed on the first member.   The exposure apparatus according to any one of claims 24 to 26, wherein a lower surface of the liquid immersion member is movable.   28. The exposure apparatus according to claim 27, wherein the movement of the lower surface of the liquid immersion member includes rotation of the lower surface. The lower surface of the liquid immersion member has a guide portion capable of guiding at least part of the liquid in the liquid immersion space to the guide space,
The exposure apparatus according to claim 28, wherein a lower surface of the liquid immersion member rotates so that the liquid is guided in a moving direction of the object.   The exposure apparatus according to claim 28, wherein an outer shape of a lower surface of the liquid immersion member changes so that the liquid is guided in a moving direction of the object.   31. The exposure apparatus according to claim 27, wherein a lower surface of the liquid immersion member moves in a normal direction of the lower surface of the liquid immersion member.   32. The exposure apparatus according to any one of claims 27 to 31, wherein a lower surface of the liquid immersion member is inclined based on a moving direction of the object.   The exposure apparatus according to any one of claims 18 to 32, further comprising a drive system that moves the second member.   The exposure apparatus according to any one of claims 18 to 33, wherein the object includes at least one of the substrate and a substrate stage that moves while holding the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 18 to 34;
Developing the exposed substrate. A device manufacturing method. An exposure method for exposing a substrate with exposure light through a liquid,
Forming an immersion space so that the optical path of the exposure light emitted from the exit surface of the optical member is filled with the liquid;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving a second member disposed below at least a part of the periphery of the optical member and having a recovery port for recovering at least a part of the liquid in the immersion space. Exposure method. Exposing the substrate using the exposure method of claim 36;
Developing the exposed substrate. A device manufacturing method. A program that causes a computer to execute control of an exposure apparatus that exposes a substrate with exposure light via a liquid,
Forming an immersion space so that the optical path of the exposure light emitted from the exit surface of the optical member is filled with the liquid;
Exposing the substrate with the exposure light emitted from the exit surface through the liquid in the immersion space;
Moving a second member disposed below at least a portion of the first member disposed around the optical member and having a recovery port for recovering at least a portion of the liquid in the immersion space. Program to make.   A computer-readable recording medium on which the program according to claim 38 is recorded.

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