HK1204682A1 - 液浸構件及曝光裝置 - Google Patents

液浸構件及曝光裝置

Info

Publication number
HK1204682A1
HK1204682A1 HK15105266.9A HK15105266A HK1204682A1 HK 1204682 A1 HK1204682 A1 HK 1204682A1 HK 15105266 A HK15105266 A HK 15105266A HK 1204682 A1 HK1204682 A1 HK 1204682A1
Authority
HK
Hong Kong
Prior art keywords
exposure apparatus
liquid immersion
immersion member
liquid
exposure
Prior art date
Application number
HK15105266.9A
Other languages
English (en)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1204682A1 publication Critical patent/HK1204682A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
HK15105266.9A 2012-04-10 2015-06-03 液浸構件及曝光裝置 HK1204682A1 (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261622235P 2012-04-10 2012-04-10
US13/793,667 US9323160B2 (en) 2012-04-10 2013-03-11 Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
PCT/JP2013/058454 WO2013153939A1 (en) 2012-04-10 2013-03-15 Liquid immersion member and exposure apparatus

Publications (1)

Publication Number Publication Date
HK1204682A1 true HK1204682A1 (zh) 2015-11-27

Family

ID=49292050

Family Applications (3)

Application Number Title Priority Date Filing Date
HK18105176.5A HK1245901A1 (zh) 2012-04-10 2015-05-11 液浸構件及曝光裝置
HK15104439.4A HK1204090A1 (zh) 2012-04-10 2015-05-11 液浸構件及曝光裝置
HK15105266.9A HK1204682A1 (zh) 2012-04-10 2015-06-03 液浸構件及曝光裝置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
HK18105176.5A HK1245901A1 (zh) 2012-04-10 2015-05-11 液浸構件及曝光裝置
HK15104439.4A HK1204090A1 (zh) 2012-04-10 2015-05-11 液浸構件及曝光裝置

Country Status (8)

Country Link
US (4) US9323160B2 (zh)
EP (1) EP2836875B1 (zh)
JP (3) JP6245179B2 (zh)
KR (1) KR102158968B1 (zh)
CN (2) CN104350425B (zh)
HK (3) HK1245901A1 (zh)
TW (3) TWI698720B (zh)
WO (1) WO2013153939A1 (zh)

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US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
WO2015052781A1 (ja) 2013-10-08 2015-04-16 株式会社ニコン 液浸部材、露光装置及び露光方法、並びにデバイス製造方法
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CN109856922B (zh) * 2017-11-30 2020-11-13 上海微电子装备（集团）股份有限公司 浸没流体控制装置、浸没式光刻系统与回收控制方法
KR102649164B1 (ko) 2017-12-15 2024-03-20 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법
JP6575629B2 (ja) * 2018-04-04 2019-09-18 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
CN117742084A (zh) * 2020-12-25 2024-03-22 浙江启尔机电技术有限公司 一种改善浸没流场压力特性的浸液供给回收装置

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US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
US8068209B2 (en) 2007-03-23 2011-11-29 Nikon Corporation Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) * 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
JP2009088037A (ja) * 2007-09-28 2009-04-23 Nikon Corp 露光方法及びデバイス製造方法、並びに露光装置
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8610873B2 (en) 2008-03-17 2013-12-17 Nikon Corporation Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate
US8289497B2 (en) 2008-03-18 2012-10-16 Nikon Corporation Apparatus and methods for recovering fluid in immersion lithography
US8233139B2 (en) 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
JP2011086804A (ja) * 2009-10-16 2011-04-28 Nikon Corp 液浸部材、露光装置、露光方法、及びデバイス製造方法
JP5232901B2 (ja) * 2011-07-22 2013-07-10 株式会社ニコン 露光装置及びデバイス製造方法
NL2009271A (en) 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) * 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Also Published As

Publication number Publication date
JP6569717B2 (ja) 2019-09-04
US10139736B2 (en) 2018-11-27
US9323160B2 (en) 2016-04-26
TW201804261A (zh) 2018-02-01
US20180039186A1 (en) 2018-02-08
JP2015515738A (ja) 2015-05-28
HK1204090A1 (zh) 2015-11-06
HK1245901A1 (zh) 2018-08-31
CN107728434A (zh) 2018-02-23
EP2836875B1 (en) 2020-11-18
JP6245179B2 (ja) 2017-12-13
TW201928530A (zh) 2019-07-16
CN107728434B (zh) 2020-04-03
EP2836875A1 (en) 2015-02-18
JP2019191613A (ja) 2019-10-31
CN104350425B (zh) 2017-11-28
US9810999B2 (en) 2017-11-07
WO2013153939A1 (en) 2013-10-17
TWI658335B (zh) 2019-05-01
TW201344376A (zh) 2013-11-01
US10520828B2 (en) 2019-12-31
KR102158968B1 (ko) 2020-09-23
US20130265555A1 (en) 2013-10-10
TWI698720B (zh) 2020-07-11
JP2018022198A (ja) 2018-02-08
US20190056672A1 (en) 2019-02-21
TWI611270B (zh) 2018-01-11
KR20150005603A (ko) 2015-01-14
US20160223915A1 (en) 2016-08-04
CN104350425A (zh) 2015-02-11

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